CN110747432A - Electronic equipment, shell of electronic equipment and machining method of shell - Google Patents

Electronic equipment, shell of electronic equipment and machining method of shell Download PDF

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Publication number
CN110747432A
CN110747432A CN201911193692.5A CN201911193692A CN110747432A CN 110747432 A CN110747432 A CN 110747432A CN 201911193692 A CN201911193692 A CN 201911193692A CN 110747432 A CN110747432 A CN 110747432A
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China
Prior art keywords
shell
housing
color
film
film layer
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Pending
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CN201911193692.5A
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Chinese (zh)
Inventor
莫博宇
王坤
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Vivo Mobile Communication Co Ltd
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Vivo Mobile Communication Co Ltd
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Priority to CN201911193692.5A priority Critical patent/CN110747432A/en
Publication of CN110747432A publication Critical patent/CN110747432A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04Coating on selected surface areas, e.g. using masks
    • C23C14/042Coating on selected surface areas, e.g. using masks using masks
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3464Sputtering using more than one target
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00Casings, cabinets or drawers for electric apparatus

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Casings For Electric Apparatus (AREA)

Abstract

The invention discloses a preparation method of a shell of electronic equipment, which comprises the following steps: arranging a film layer on a shell substrate, wherein the film layer comprises at least three sub-film layers which are overlapped layer by layer, the refractive indexes of the adjacent two sub-film layers are different, and the sub-film layers with low refractive indexes and the sub-film layers with high refractive indexes are alternately overlapped; preparing the graphs with the same color into a single-color design according to the target color combination of the shell; preparing a shielding photomask matched with each single-color design pattern, wherein a through hole is formed in the position, opposite to the graph of the corresponding single-color design pattern, of each shielding photomask; sequentially opening holes in the film layer in the area opposite to the through hole through a shielding photomask, wherein the depth of each opening corresponds to one target color; after the film layer is perforated, the shell is prepared according to the shell substrate provided with the film layer. The scheme can solve the problem that the existing electronic equipment is poor in attractiveness. The invention discloses a shell of electronic equipment and the electronic equipment.

Description

Electronic equipment, shell of electronic equipment and machining method of shell
Technical Field
The invention relates to the technical field of communication equipment, in particular to electronic equipment, a shell of the electronic equipment and a processing method of the shell.
Background
With the development of technology, the performance of electronic devices is more and more excellent, and the competition of manufacturers is more and more intense, and accordingly, more and more novel electronic devices are developed. At present, users pay more and more attention to the aesthetic property of electronic equipment, so the requirement on the aesthetic property of the electronic equipment is higher and higher.
In order to make the appearance of the electronic device appear more colors, the housing of the electronic device is usually subjected to surface treatment processes such as spraying metallic paint, plating metal film, plating gradient color optical film, printing film and the like. However, the above processes have problems, and some of the processes affect the antenna signal of the electronic device, especially, the antenna signal of the 5G era comes, and the influence on the antenna signal of the electronic device inevitably causes the communication function of the electronic device to be degraded. Meanwhile, the process is common, more and more manufacturers are used, homogenization of the electronic equipment is serious, novelty is lacked, and finally aesthetic fatigue of users is caused. Therefore, the current electronic equipment still has the problem of poor aesthetic property.
Disclosure of Invention
The invention discloses a method for processing a shell of electronic equipment, which aims to solve the problem of poor aesthetic property of the conventional electronic equipment.
In order to solve the problems, the invention adopts the following technical scheme:
a method for preparing a shell of an electronic device comprises the following steps:
arranging a film layer on a shell substrate, wherein the film layer comprises at least three sub-film layers which are overlapped layer by layer, the refractive indexes of the adjacent two sub-film layers are different, and the sub-film layers with low refractive indexes and the sub-film layers with high refractive indexes are alternately overlapped;
preparing the figures with the same color into a single-color design according to the target color combination of the shell;
preparing a shielding photomask matched with each monochromatic design pattern, wherein a through hole is formed in the position, opposite to the graph of the corresponding monochromatic design pattern, of each shielding photomask;
sequentially perforating the area, opposite to the through hole, on the film layer through each shielding photomask, wherein the depth of each perforation corresponds to one target color;
after the film layer is perforated, the shell is prepared according to the shell substrate provided with the film layer.
The shell of the electronic equipment is prepared by the shell processing method.
An electronic device comprising the housing described above.
The technical scheme adopted by the invention can achieve the following beneficial effects:
in the shell processing method disclosed by the embodiment of the invention, the membrane layer is arranged on the shell base material, so that the membrane layer comprises at least three sub-membrane layers which are overlapped layer by layer, the graphs with the same color in the target color combination preset for the shell are prepared into the single-color design patterns, then the corresponding shielding photomask is prepared for each single-color design pattern, then the blind holes which are consistent with the graphs contained in each single-color design pattern are arranged in the target area of the membrane layer through the shielding photomask, the depth of each open hole is different, so that different target colors correspond to the areas with different thicknesses of the membrane layer, the areas with different thicknesses of the membrane layer act together based on the principle of film interference color development of light, and finally the target color combination can be presented, the shell prepared by adopting the shell base material with the target color combination can realize the colorful effect, and the shell can present colorful visual effect to users undoubtedly, this can certainly improve the aesthetic appearance of the housing.
Compared with the existing shell which adopts pure color or gradient color, the shell prepared by the shell processing method disclosed by the embodiment of the invention can show a color effect through the optical effect between areas with different thicknesses of the film layer, the preparation process has a novel effect and can avoid interference on an antenna, and the process can make a highly complex color mixing effect by drawing the same color and preparing the blind holes with corresponding depths, can realize more mixed colors and can finally improve the aesthetic property of the shell.
Drawings
The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the invention and not to limit the invention. In the drawings:
fig. 1 is a schematic flow chart illustrating a method for processing a housing of an electronic device according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a target color combination disclosed in the disclosure of an embodiment of the present invention, wherein each section line in FIG. 2 corresponds to a target color;
FIGS. 3-9 are schematic diagrams of different single color designs formed in accordance with FIG. 2, respectively;
FIGS. 10-16 are film diagrams corresponding to FIGS. 3-9, respectively;
FIGS. 17 and 18 are schematic views of the process of opening a hole for one target color, respectively;
fig. 19 is a schematic view of a housing substrate with a film layer having openings according to an embodiment of the disclosure.
Description of reference numerals:
100-shell substrate, 200-film, 210-sub-film, 220-blind hole, 300-shielding mask, 310-through hole.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the technical solutions of the present invention will be clearly and completely described below with reference to the specific embodiments of the present invention and the accompanying drawings. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The technical solutions disclosed in the embodiments of the present invention are described in detail below with reference to the accompanying drawings.
Referring to fig. 1 to 19, an embodiment of the invention discloses a method for processing a housing, where the housing may be a housing of an electronic device. The disclosed shell machining method comprises the following steps:
s101, disposing a film layer 200 on the housing substrate 100.
The housing substrate 100 is a main body of the prepared housing, and the housing substrate 100 can provide a position and support for other structures. The type of the housing substrate 100 can be various, and herein, the housing substrate 100 can be a light-transmitting substrate or a non-light-transmitting substrate; the housing substrate 100 may be a metal substrate or a non-metal substrate. In one embodiment, the housing substrate 100 may be a transparent substrate, such as a glass substrate. Of course, the housing substrate 100 may also be a non-metal substrate, such as a PET sheet.
In an embodiment of the present invention, the film layer 200 includes at least three sub-film layers 210 stacked layer by layer. The adjacent two sub-film layers 210 have different refractive indexes, and the sub-film layers 210 having a low refractive index and the sub-film layers 210 having a high refractive index are alternately stacked. In general, the materials of the sub-film layers 210 are different, so that the difference between the refractive indexes is realized. Of course, the difference in refractive index can also be achieved by providing specific microstructures. In one embodiment, the material of the low refractive index sub-film layer 210 may be silicon oxide, and the material of the high refractive index sub-film layer 210 may be titanium oxide. The embodiment of the invention does not limit the specific material of each sub-film layer 210, as long as the refractive index difference between the adjacent sub-film layers 210 can be satisfied.
It should be noted that, herein, the low refractive index and the high refractive index are relative concepts, and the embodiment of the invention does not limit the specific value of the refractive index of the two adjacent sub-film layers 210.
In a more preferred embodiment, the thickness of at least three sub-film layers 210 may be increased or decreased in a direction away from the housing substrate 100, so as to achieve reflectivity in more visible light bands, and finally enable the structure to form more colors after the operation of opening the film layer 200 in the subsequent steps is completed. The sub-film layers 210 with decreasing or increasing thickness can achieve higher reflectivity of the full-band visible light, provided that the number of sub-film layers 210 is sufficient.
In a preferable embodiment, the outermost sub-film layer 210 of the film layer 200 may be a low refractive sub-film layer 210, in which case, the brightness of the entire film layer 200 can be improved, and finally the prepared shell has higher brightness.
S102, preparing the graphs with the same color into a single-color design according to the target color combination of the shell.
In a specific design process, a target color combination of the shell can be designed in advance, as shown in fig. 2, so that the shell has graphs of various colors (namely target colors), and the graphs of various colors can be distributed regularly or randomly, so that the shell has a gorgeous color effect. Specifically, the shapes of the respective patterns of the same color may be the same or different. In the embodiment of the present invention, the figure may be a triangle (as shown in fig. 2 to 9), a quadrangle, etc., and the shape of the figure is not limited by the implementation of the present invention.
In this step, the same color pattern is prepared into a single color design according to the target color combination, as shown in fig. 3 to 9, the single color design only relates to the collection of the same color pattern, and substantially all the patterns of the same color in the target color combination are sorted out.
In a specific operation, the color type of the target color combination and all the figures of each color can be determined, and then all the figures of each color can be prepared into a single-color design. The number of single color designs is equal to the number of colors combined by the target color combination, as shown in fig. 2 to 9. For example, the target color combination includes three colors of red, yellow and green, and the three colors correspond to a plurality of patterns, so that all patterns corresponding to red can be made into a single color design pattern, all patterns corresponding to yellow can be made into a single color design pattern, and all patterns corresponding to green can also be made into a single color design pattern.
In the actual design process, the more the variety of the target color combination is, the more gorgeous the whole vision of the target color combination is, so that the whole target color is gorgeous and colorful.
In an embodiment of the present invention, the target color combination may include at least three of red, orange, yellow, green, cyan, blue, and violet. In order to realize more gorgeous optical colors, in a preferable scheme, the target color combination may include red, orange, yellow, green, cyan, blue and violet, the monochromatic design sample diagrams of the seven colors are respectively shown in fig. 3 to fig. 9, and the target color combination is shown in fig. 2. The target color combination comprises more colors, so that the gorgeous color can be further improved, and the housing is provided with more gorgeous colors, and the aesthetic property of the finally prepared housing can be improved better.
S103, preparing the shielding photomask 300 matched with each single-color design pattern, and forming a through hole 310 in the position, opposite to the corresponding single-color design pattern, of each shielding photomask 300.
The preparation of the masking mask 300 in this step is prepared for the subsequent processes, and a matching masking mask 300 needs to be prepared for each single-color design, and the area of the masking mask 300 can at least cover each single-color design. To facilitate the subsequent operations, in a preferred embodiment, the area of the masking mask 300 may be larger than the area of the corresponding single-color design.
Specifically, each of the masking masks 300 has a through hole 310 at a position corresponding to a corresponding pattern of the single-color design pattern, and all the patterns of the same color need to have corresponding through holes 310 at corresponding positions.
S104, sequentially opening holes in the area, opposite to the through hole 310, of the film layer 200 through the shielding mask 300, wherein the depth of each opening corresponds to one target color.
Since a matching mask is prepared for each single color design in S103, each mask 300 can be used to open holes at different positions of the film 200, so that the film 200 can be finally formed into a combination of holes consistent with each color pattern of the target color combination. Specifically, the hole formed by each opening may be a blind hole 220. As shown in fig. 17 and 18, fig. 17 and 18 show a process schematic of the hole making for one target color.
It should be noted that, each time of opening corresponds to a single-color design pattern with a target color, in order to present a corresponding color, the thickness of the portion of the film layer 200 opposite to the opening corresponds to the target color after each opening.
According to the shell processing method disclosed by the embodiment of the invention, a light thin film interference color development principle is utilized, the thicknesses of different parts of the film layer correspond to different color effects, so that different target colors correspond to the thicknesses of different parts of the film layer 200, and finally, the purpose of color development is achieved through interference among the parts of the film layer 200 with different thicknesses, and after the hole opening operation corresponding to all the single-color design patterns is completed, all shell base materials which complete the hole opening operation can present a target color combination, as shown in fig. 19.
S105, after the film 200 is perforated, a housing is prepared according to the housing substrate 100 provided with the film 200.
In S105, openings corresponding to all the single-color design patterns are formed in the film layer 200, so as to finally form an original substrate for preparing the housing, and then the housing substrate provided with the plated film after the openings can be used for preparation according to the design of the housing. In general, a shell with a large area may be finally prepared by cutting (e.g., CNC machining), bending, or hot pressing. Specifically, the process of preparing the housing by using the housing substrate is a known technology, and is not described herein again. It should be noted that the blind holes 220 formed in the film layer 200 should not be damaged in the molding process of the housing.
In the method for processing the shell disclosed by the embodiment of the invention, the film layer 200 is arranged on the shell base material 100, so that the film layer 200 comprises at least three sub-film layers 210 which are overlapped layer by layer, the figures with the same color in the target color combination preset for the shell are prepared into the single-color design patterns, then the corresponding shielding photomask 300 is prepared for each single-color design pattern, then the blind holes 220 which are consistent with the figures contained in each single-color design pattern are arranged in the target area of the film layer 200 through the shielding photomask 300, the depth of each opening is different, so that different target colors correspond to the areas with different thicknesses of the film layer 200, the areas with different thicknesses of the film layer 200 act together based on the principle of optical thin film interference color development, and finally the target color combination can be presented, and the shell prepared by adopting the shell base material with the target color combination can undoubtedly realize the rich and bright color effect, the housing is enabled to present a gorgeous visual effect to the user, which undoubtedly can improve the aesthetic property of the housing.
Compared with the existing shell which adopts pure color or gradient color, the shell prepared by the shell processing method disclosed by the embodiment of the invention can show a color effect through the optical effect between the areas with different thicknesses of the film layer 200, the preparation process has a novel effect and can avoid interference on an antenna, and the process can make the shell processing method disclosed by the embodiment of the invention have a highly complex color mixing effect by drawing the same color and preparing the blind holes 220 with corresponding depths, can realize more mixed colors and can finally improve the attractiveness of the shell.
As described above, the processed housing realizes color development by the principle of thin film interference of light, as long as color development after interference can be satisfied, and the specific depth of each opening is not limited in the embodiments of the present invention.
In the housing processing method disclosed in the embodiment of the invention, the shielding mask 300 is used for shielding a partial region in the target region of the film layer 200 during the hole opening process, and simultaneously, the region needing hole opening in the target region of the film layer 200 is exposed through the through hole 310 of the shielding mask, so that the hole opening with the preset depth is finally realized in the corresponding part in the target region. The material of the mask 300 may be various, for example, the mask 300 may be a PET sheet or a stainless steel sheet, and the specific material of the mask 300 is not limited in the embodiments of the present invention.
Since the preparation of the masking mask 300 is performed according to the monochromatic design pattern, and the corresponding through holes 310 need to be formed at the positions corresponding to the patterns of the monochromatic design pattern in the preparation process, the preparation method of the masking mask 300 may be various, for example, the position coordinates and the size of the patterns in the monochromatic design pattern may be obtained by using an image obtaining technology, and then the corresponding through holes 310 may be formed according to the obtained shape parameters and the obtained position parameters.
In a preferred embodiment, preparing the masking mask 300 matching each of the single color design drawings may include:
and step A1, preparing a matched film picture according to each single-color design pattern, wherein the film picture comprises a white area consistent with the shape of the picture.
In step B1, according to each film image, the portion of the mask blank corresponding to the white area is processed into a through hole 310, and a mask 300 is obtained. The step B1 may be performed in various ways, for example, mechanically or chemically. In a preferred embodiment, the through hole 310 can be formed by removing the portion of the mask blank opposite to the white area by laser. The laser processing method for processing the through hole 310 has the advantage of high precision.
Since the target color combination is to combine a plurality of colors, the masking mask 300 is prepared by the film image in the above preferred embodiment, and the technology for preparing the film image is mature, and has the advantages of convenient implementation and low cost. Meanwhile, the film map usually has a number, and the corresponding number is matched for each single-color design map, so that the probability of errors occurring in the preparation process can be reduced.
In one embodiment, the mask blank may be a PET sheet, a stainless steel sheet, or a substrate made of other metal or polymer material.
In the specific manufacturing process of the masking mask 300, the material of the masking mask 300 corresponding to each single color design may be the same or different. Specifically, the material and thickness of the mask blank can be selected according to the pattern size, the fineness and the corresponding opening depth of each single color design. In general, the thickness of the reticle substrate is typically less than 0.1 mm.
In the embodiment of the present invention, disposing the film layer 200 on the housing substrate 100 may include the following steps:
step A2, the shell substrate 100 is placed in the working chamber of the plasma coating sputtering machine.
In this step, the substrate 100 can be precisely fixed on the hanger by the positioning structure and then placed in the working chamber of the plasma coating sputtering machine.
Step B2, vacuumizing the working cavity to make the vacuum degree in the working cavity reach 1 × 10-4Pa。
Step C2, depositing the sub-film layer 210 by using a first target and a second target to form the film layer 200, wherein the refractive index of the first target may be greater than the refractive index of the second target. Specifically, the first target and the second target may be non-metallic materials. For example, the material of the first target may be silicon oxide, and the material of the second target may be titanium oxide.
The steps a2 to C2 can realize the arrangement of one sub-film layer 210, and all sub-film layers 210 included in the film layer 200 are plated on the case substrate 100 as required through multiple times of film plating, so that all sub-film layers 210 are plated on the case substrate 100.
In the embodiment of the present invention, the opening the film 200 in the region opposite to the through hole 310 sequentially through the masking mask 300 includes: the film 200 may be opened by etching through the masking mask 300 in the region opposite to the via 310. Of course, the holes can be formed on the film layer 200 by laser. In a specific embodiment, the housing substrate 100 provided with the film layer 200 is attached together and placed in the inner cavity of the plasma etching machine, and vacuum is pumped to reduce the vacuum degree of the inner cavity of the plasma etching machine to 1 × 10-4And Pa, adjusting plasma functional parameters after introducing plasma, removing partial area of the film layer 200 by using the bombardment removal effect of the plasma, and finally separating the shielding photomask 300 to finally enable the open hole corresponding to the target color to be left on the shell base material 100.
The shell manufactured by the shell processing method disclosed by the embodiment of the invention has no influence on the antenna of the electronic equipment, so that the shell processing method is very suitable for the requirements of the electronic equipment in the 5G era. Meanwhile, the shapes of the graphs with the same color are determined, so that the single-color design can be realized, the manufactured shell has the effect of clearer color boundary, and the attractiveness is improved.
Because the color formed by the interference of the light film has the effects of enhancing the brightness and improving the texture, the color can be achieved without texture design, and the manufacturing cost of the shell can be reduced.
Of course, in the housing processing method disclosed in the embodiment of the present invention, the processing of the film layer 200 may be performed on other supporting bodies in S101 to S105, after the opening corresponding to each target color is completed, the film layer 200 may be detached from the supporting bodies, and then the film layer 200 is pasted to the surfaces of other 3D-shaped products in an attaching manner, of course, the housing base material may be a 3D-shaped structural member, and the housing with a 3D structure is formed by providing the housing base material with a coating film.
Based on the shell processing method disclosed by the embodiment of the invention, the embodiment of the invention discloses a shell of electronic equipment, and the shell of the electronic equipment is processed by the shell processing method disclosed by the embodiment.
Based on the shell of the electronic equipment disclosed by the embodiment of the invention, the embodiment of the invention discloses the electronic equipment, and the disclosed electronic equipment comprises the shell of the electronic equipment.
The electronic equipment disclosed by the embodiment of the invention can be equipment such as a smart phone, a tablet computer, an electronic book reader, wearable equipment, a vehicle-mounted navigator, a game machine and the like, and the specific type of the electronic equipment is not limited by the embodiment of the invention.
In the above embodiments of the present invention, the difference between the embodiments is mainly described, and different optimization features between the embodiments can be combined to form a better embodiment as long as they are not contradictory, and further description is omitted here in view of brevity of the text.
The above description is only an example of the present invention, and is not intended to limit the present invention. Various modifications and alterations to this invention will become apparent to those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.

Claims (10)

1. A method for preparing a shell of an electronic device, comprising:
arranging a film layer on a shell substrate, wherein the film layer comprises at least three sub-film layers which are overlapped layer by layer, the refractive indexes of the adjacent two sub-film layers are different, and the sub-film layers with low refractive indexes and the sub-film layers with high refractive indexes are alternately overlapped;
preparing the figures with the same color into a single-color design according to the target color combination of the shell;
preparing a shielding photomask matched with each monochromatic design pattern, wherein a through hole is formed in the position, opposite to the graph of the corresponding monochromatic design pattern, of each shielding photomask;
sequentially perforating areas, opposite to the through holes, on the film layer through the shielding photomask, wherein the depth of each perforating corresponds to one target color;
after the film layer is perforated, the shell is prepared according to the shell substrate provided with the film layer.
2. The method of manufacturing a housing of claim 1, wherein the at least three sub-film layers have thicknesses that increase or decrease in a direction away from the housing substrate.
3. The method of manufacturing a housing according to claim 1, wherein disposing a film layer on a housing substrate comprises:
putting the shell substrate into a working cavity of a plasma coating and sputtering machine;
vacuumizing the working cavity to reduce the vacuum degree of the working cavity to 1 × 10-4Pa;
And selecting a first target material and a second target material to form the sub-film layer by layer.
4. The method of manufacturing a housing according to claim 1, wherein preparing a masking mask matching each of the single color designs comprises:
preparing a matched film picture according to each single-color design drawing, wherein the film picture comprises a white area consistent with the drawing;
and processing the part of the photomask base material opposite to the white area into the through hole according to each film image to obtain the shielding photomask.
5. The method for preparing a housing according to claim 4, wherein the processing of the portion of the photo-mask blank opposite to the white area into the through hole includes:
and removing the part of the photomask base material opposite to the white area by adopting a laser mode.
6. The method for manufacturing a housing according to claim 4 or 5, wherein the photo-mask blank is a PET sheet or a stainless steel sheet, and the thickness of the photo-mask blank is less than 0.1 mm.
7. The method for manufacturing a housing according to claim 1, wherein the housing base material is a transparent base material, or the housing base material is a metal base material.
8. The method for preparing the housing according to claim 1, wherein the step of sequentially opening the hole in the film layer in the region opposite to the through hole by the shadow mask comprises:
and sequentially opening holes in the film layer in the area opposite to the through hole through the shielding photomask in an etching mode.
9. A housing for an electronic device, characterized in that the housing is prepared by the housing preparation method of any one of claims 1 to 8.
10. An electronic device, characterized in that the electronic device comprises the housing of claim 9.
CN201911193692.5A 2019-11-28 2019-11-28 Electronic equipment, shell of electronic equipment and machining method of shell Pending CN110747432A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115066132A (en) * 2022-06-20 2022-09-16 联想(北京)有限公司 Metal shell and manufacturing method thereof

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CN102098887A (en) * 2009-12-14 2011-06-15 深圳富泰宏精密工业有限公司 Housing of electronic device
CN102582159A (en) * 2011-01-14 2012-07-18 永恒科技有限公司 Plate capable of providing double-color surface and forming method of plate
US20140118903A1 (en) * 2012-11-01 2014-05-01 Samsung Electronics Co. Ltd. Case frame and manufacturing method thereof
CN106337163A (en) * 2016-11-22 2017-01-18 陈浩 Solid material surface transparent texture coating technology
CN106534418A (en) * 2016-12-21 2017-03-22 广东欧珀移动通信有限公司 Shell, manufacturing method and mobile terminal

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Publication number Priority date Publication date Assignee Title
CN101513812A (en) * 2008-02-21 2009-08-26 比亚迪股份有限公司 Method and control device for manufacturing product shell patterns
CN102098887A (en) * 2009-12-14 2011-06-15 深圳富泰宏精密工业有限公司 Housing of electronic device
CN102582159A (en) * 2011-01-14 2012-07-18 永恒科技有限公司 Plate capable of providing double-color surface and forming method of plate
US20140118903A1 (en) * 2012-11-01 2014-05-01 Samsung Electronics Co. Ltd. Case frame and manufacturing method thereof
CN106337163A (en) * 2016-11-22 2017-01-18 陈浩 Solid material surface transparent texture coating technology
CN106534418A (en) * 2016-12-21 2017-03-22 广东欧珀移动通信有限公司 Shell, manufacturing method and mobile terminal

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115066132A (en) * 2022-06-20 2022-09-16 联想(北京)有限公司 Metal shell and manufacturing method thereof

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