CN102505108A - Method for preparing lens plated with patterns without sight obstruction - Google Patents
Method for preparing lens plated with patterns without sight obstruction Download PDFInfo
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- CN102505108A CN102505108A CN2011104324913A CN201110432491A CN102505108A CN 102505108 A CN102505108 A CN 102505108A CN 2011104324913 A CN2011104324913 A CN 2011104324913A CN 201110432491 A CN201110432491 A CN 201110432491A CN 102505108 A CN102505108 A CN 102505108A
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- substrate
- pattern
- view
- coating materials
- rete
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Abstract
The invention discloses a method for preparing a lens plated with patterns without sight obstruction. The method comprises the steps of: cleaning a substrate, and then putting the substrate in an ion source vacuum machine in a high vacuum state; evaporating a film layer with high refractivity on the substrate and taking the film layer out; sticking a required hollow-out pattern film-plating plate to the film layer of the substrate; evaporating another film layer with low refractivity at the hollow-out part so as to form patterns without sight obstruction through interference; and, after the vacuum state in the machine is returned to a normal pressure, taking the lens with formed patterns out. Through secondary molding, the lens prepared by the method disclosed by the invention does not affect the visual effect of wearers; in addition, the patterns on the lens are brighter and clearer, so that better visual effect is achieved.
Description
Technical field
The present invention discloses the do not obstruct the view eyeglass preparation method of pattern of a kind of plating, divides by International Patent Classification (IPC) (IPC) to belong to glasses lens plated manufacturing technology field, especially relates to the pattern rete that a kind of eyeglass plating is not obstructed the view.
Background technology
Pattern on the common glasses lens can be obstructed the view, and influences the normal visual effect of wearer, and can damage eyes; Eyeglass tradition process of plating is following: first chromium plating powder, plate one deck SiO (silicon oxide) again, and form interference figure; But because chromium is a kind of metallic substance, plates out the pattern that comes and on substrate, have background color, and the part that eyeglass has plated is different with the partial penetration rate of not plating; So have influence on visual effect, the wearer feels can be uncomfortable.
The document CN200910111752.4 of application discloses the preparation method that a kind of optical base-substrate plates the pattern of not obstructing the view before the applicant, and its process method is with silicon oxide (SiO)+five oxidation Tritanium/Trititanium (Ti
3O
5)+silicon oxide (SiO) once shaped is full of oxonium ion under the low dummy status of processing requirement and gets final product, but the pattern on the eyeglass is relatively fuzzyyer, not obvious after the moulding.
Optical mirror slip how to develop a not overslaugh sight line reaches purpose attractive in appearance, practical by the human consumer of wearing spectacles; And do not influence wearer's sight line effect; Be those skilled in the art's research topics; This creator just has proposition of the present invention through studying for a long time and combining a large amount of experiments.
Summary of the invention
Deficiency to prior art; The invention provides a kind of rational in infrastructure, eyeglass preparation method that pattern is not obstructed the view in the beautiful tangible plating of pattern; Optical mirror slip through the post forming preparation has safety and Health, visual effect is unaffected, and can reach the aesthetic that eyeglass presents pattern.
For achieving the above object, the present invention realizes through following technical scheme:
The do not obstruct the view eyeglass preparation method of pattern of a kind of plating, its step is following:
One), behind the substrate cleaning, be positioned in the ion source vacuum board under the high vacuum state, behind the rete of first vapor deposition one deck high refractive index on the substrate, takes out from the vacuum board;
Two), more needed pierced pattern plated film plate is affixed on the rete of substrate; Be positioned over once more in the vacuum machine; The pattern that another low-index film of vapor deposition interferes formation not obstructed the view at the hollow out position; Utilize the thickness difference of low refractive Coating Materials to make base material become existing distinct colors, the vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure;
Wherein the high refractive index layer gauge control is at 650-1200nm, and the low-index film gauge control is at 600-1100nm.
Further, be full of argon ion in the described ion source vacuum board, and vacuum tightness vacuum tightness is evacuated at least 10 in it
-3To 10
-5Torr.
Further, high refractive index layer is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of high refractive Coating Materials evaporation back with molecule to be steamed in the openwork part substrate, forms high refractive index layer; Low-index film is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low refractive Coating Materials evaporation back with molecule to be steamed in the mixed membranous layer at pierced pattern place; Form low-index film, the difference of low refractive index film layer thickness and the color that appears has colors such as gold, blue look, redness, silver color.
Further, said high refractive Coating Materials is titanium oxide TiO
2, ZIRCONIUM DIOXIDE 99.5 ZrO
2, three oxidations, two tantalum Ta
2O
3, five oxidation Tritanium/Trititanium Ti
3O
5Any one, low refractive Coating Materials is silicon-dioxide SiO
2, high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any formation is affixed on the rete of substrate, SiO
2The pattern that vapor deposition interferes formation not obstructed the view in the hollow out position of above-mentioned rete.
Further, said high refractive Coating Materials is titanium oxide TiO
2, ZIRCONIUM DIOXIDE 99.5 ZrO
2, three oxidations, two tantalum Ta
2O
3, five oxidation Tritanium/Trititanium Ti
3O
5Any one, low refractive Coating Materials is silicon-dioxide SiO, high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any formation is affixed on the rete of substrate, the pattern that the SiO vapor deposition interferes formation not obstructed the view in the hollow out position of above-mentioned rete.
Further, described substrate is any one in acryl AC substrate, polycarbonate Polycarbonate substrate, nylon Nylon substrate, CR-39 substrate, the glass substrate.
The present invention is after any substrate in the plated film materials such as AC, PC, Nylon, CR-39, glass substrate is cleaned up; Be positioned in the ion source apparatus board then and pumping high vacuum; The first mixed membranous layer of vapor deposition one high refractive index and low-refraction on substrate; Needed pierced pattern template is affixed on above-mentioned rete, with the mode of resistive heating or electron beam gun flow of emitted electrons with low-refraction Coating Materials SiO, SiO
2Is steaming on high refractive index layer with the state of molecule wherein any material evaporation back, forms a low refractive index film layer, and two rete phase mutual interference form pierced pattern.The present invention uses high-index material extremely: TiO
2(titanium oxide), ZrO
2(ZIRCONIUM DIOXIDE 99.5), Ta
2O
3(three oxidations, two tantalums), Ti
3O
5(five oxidation Tritanium/Trititaniums) and SiO (silicon oxide), because of these materials are MOX, they do not have background color after being plated on the substrate; And the penetration coefficient of pattern part and other parts differs very little; Thereby sight line, the especially the present invention that can not influence the adorner be through post forming, and the eyeglass pattern of preparation is beautiful, obvious; The human consumer likes more, and visual effect is better.
Embodiment
Embodiment: the do not obstruct the view eyeglass preparation method of pattern of a kind of plating, its step is following:
One), behind the substrate cleaning, be positioned in the ion source vacuum board under the high vacuum state, behind the rete of first vapor deposition one deck high refractive index on the substrate, takes out from the vacuum board;
Two), more needed pierced pattern plated film plate is affixed on the rete of substrate; The pattern that another low-index film of vapor deposition interferes formation not obstructed the view at the hollow out position; Utilize the thickness difference of low refractive Coating Materials to make base material become existing distinct colors, the vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure;
Wherein the high refractive index layer gauge control is at 650-1200nm, and the low-index film gauge control is at 600-1100nm.
Be full of argon ion in the ion source vacuum board described in the present invention, and vacuum tightness vacuum tightness is evacuated at least 10 in it
-3To 10
-5Torr.High refractive index layer is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of high refractive Coating Materials evaporation back with molecule to be steamed in the openwork part substrate, forms high refractive index layer; Low-index film is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low refractive Coating Materials evaporation back with molecule to be steamed in the mixed membranous layer at pierced pattern place; Form low-index film, the difference of low refractive index film layer thickness and the color that appears has colors such as gold, blue look, redness, silver color.
High refractive Coating Materials is titanium oxide TiO described in the present invention
2, ZIRCONIUM DIOXIDE 99.5 ZrO
2, three oxidations, two tantalum Ta
2O
3, five oxidation Tritanium/Trititanium Ti
3O
5Any one, low refractive Coating Materials is silicon-dioxide SiO
2Or SiO, high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any formation is affixed on the rete of substrate, SiO
2Or the SiO vapor deposition forms the pattern of not obstructing the view in the interference of the hollow out position of above-mentioned rete.
Substrate of the present invention is any one in acryl AC substrate, polycarbonate Polycarbonate substrate, nylon Nylon substrate, CR-39 substrate, the glass substrate.
The present invention discloses the do not obstruct the view eyeglass preparation method of pattern of a kind of plating, behind the substrate cleaning, is positioned in the ion source vacuum board under the high vacuum state vapor deposition one high refractive index layer and taking out on substrate; Needed pierced pattern plated film plate is affixed on the rete of substrate; The pattern that another low-index film of vapor deposition interferes formation not obstructed the view at the hollow out position; Vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure, and the present invention is through post forming, and not only the eyeglass of preparation has the effect of not overslaugh sight line; And pattern more beautiful, obvious on the eyeglass, visual effect is better.
The present invention is following through the beautiful tangible reason of pattern that post forming obtains:
1, plates the material of high refractive index earlier, make to present the white white light of minute surface on the substrate;
2, stick plated film plate pattern again, the material that is steaming low-refraction again makes the figure of pattern present silver color, yellow, blue look, color such as pink;
3, the minute surface brilliant white presents the contrast vision with pattern such as silver-colored, yellow, blue, pink, makes the overall aesthetic more beautiful.
The above record is merely the embodiment that utilizes this origination techniques content, anyly is familiar with modification, the variation that this creation of this art utilization is done, and all belongs to the claim of this creation opinion, and is not limited to embodiment announcement person.
Claims (6)
1. the plating eyeglass preparation method of pattern that do not obstruct the view is characterized in that step is following:
One), behind the substrate cleaning, be positioned in the ion source vacuum board under the high vacuum state, behind the rete of first vapor deposition one deck high refractive index on the substrate, takes out from the vacuum board;
Two), more needed pierced pattern plated film plate is affixed on the rete of substrate; Be positioned over once more in the vacuum machine; The pattern that another low-index film of vapor deposition interferes formation not obstructed the view at the hollow out position; Utilize the thickness difference of low refractive Coating Materials to make base material become existing distinct colors, the vacuum state in the board recovers to take out the eyeglass that forms pattern behind the normal pressure;
Wherein the high refractive index layer gauge control is at 650-1200nm, and the low-index film gauge control is at 600-1100nm.
2. the do not obstruct the view eyeglass preparation method of pattern of plating according to claim 1 is characterized in that: be full of argon ion in the described ion source vacuum board, and vacuum tightness vacuum tightness is evacuated to 10 in it at least
-3To 10
-5Torr.
3. the do not obstruct the view eyeglass preparation method of pattern of plating according to claim 1; It is characterized in that: step 1); High refractive index layer is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of high refractive Coating Materials evaporation back with molecule to be steamed in the openwork part substrate, forms high refractive index layer; Low-index film is through the mode of resistive heating or electron beam gun flow of emitted electrons the state of a kind of low refractive Coating Materials evaporation back with molecule to be steamed in the mixed membranous layer at pierced pattern place; Form low-index film, the difference of low refractive index film layer thickness and the color that appears has gold, blue look, redness, silver color, yellow, pink color.
4. according to the do not obstruct the view eyeglass preparation method of pattern of claim 1 or 3 described platings, it is characterized in that: said high refractive Coating Materials is titanium oxide TiO
2, ZIRCONIUM DIOXIDE 99.5 ZrO
2, three oxidations, two tantalum Ta
2O
3, five oxidation Tritanium/Trititanium Ti
3O
5Any one, low refractive Coating Materials is silicon-dioxide SiO
2, high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any formation is affixed on the rete of substrate, SiO
2The pattern that vapor deposition interferes formation not obstructed the view in the hollow out position of above-mentioned rete.
5. according to the do not obstruct the view eyeglass preparation method of pattern of claim 1 or 3 described platings, it is characterized in that: said high refractive Coating Materials is titanium oxide TiO
2, ZIRCONIUM DIOXIDE 99.5 ZrO
2, three oxidations, two tantalum Ta
2O
3, five oxidation Tritanium/Trititanium Ti
3O
5Any one, low refractive Coating Materials is silicon-dioxide SiO, high-index material TiO
2, ZrO
2, Ta
2O
3, Ti
3O
5Wherein any formation is affixed on the rete of substrate, the pattern that the SiO vapor deposition interferes formation not obstructed the view in the hollow out position of above-mentioned rete.
6. the do not obstruct the view eyeglass preparation method of pattern of plating according to claim 1, it is characterized in that: described substrate is any one in acryl AC substrate, polycarbonate Polycarbonate substrate, nylon Nylon substrate, CR-39 substrate, the glass substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104324913A CN102505108A (en) | 2011-12-21 | 2011-12-21 | Method for preparing lens plated with patterns without sight obstruction |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011104324913A CN102505108A (en) | 2011-12-21 | 2011-12-21 | Method for preparing lens plated with patterns without sight obstruction |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102505108A true CN102505108A (en) | 2012-06-20 |
Family
ID=46217238
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2011104324913A Pending CN102505108A (en) | 2011-12-21 | 2011-12-21 | Method for preparing lens plated with patterns without sight obstruction |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102505108A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108004502A (en) * | 2017-11-27 | 2018-05-08 | 信利光电股份有限公司 | A kind of preparation method of cover board between red blue phase |
| CN108930014A (en) * | 2018-07-31 | 2018-12-04 | 厦门腾诺光学科技有限公司 | A kind of production method of lens surface pattern plated film |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007248828A (en) * | 2006-03-16 | 2007-09-27 | Shincron:Kk | Method and apparatus for forming optical thin film |
| CN101550528A (en) * | 2009-05-07 | 2009-10-07 | 厦门美澜光电科技有限公司 | Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate |
-
2011
- 2011-12-21 CN CN2011104324913A patent/CN102505108A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007248828A (en) * | 2006-03-16 | 2007-09-27 | Shincron:Kk | Method and apparatus for forming optical thin film |
| CN101550528A (en) * | 2009-05-07 | 2009-10-07 | 厦门美澜光电科技有限公司 | Preparing method of plating patterns without prejudice to the line-of-sight on optical substrate |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108004502A (en) * | 2017-11-27 | 2018-05-08 | 信利光电股份有限公司 | A kind of preparation method of cover board between red blue phase |
| CN108930014A (en) * | 2018-07-31 | 2018-12-04 | 厦门腾诺光学科技有限公司 | A kind of production method of lens surface pattern plated film |
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| C12 | Rejection of a patent application after its publication | ||
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Application publication date: 20120620 |