CN101546008A - Color filter and manufacturing method thereof - Google Patents
Color filter and manufacturing method thereof Download PDFInfo
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- CN101546008A CN101546008A CN200810088551A CN200810088551A CN101546008A CN 101546008 A CN101546008 A CN 101546008A CN 200810088551 A CN200810088551 A CN 200810088551A CN 200810088551 A CN200810088551 A CN 200810088551A CN 101546008 A CN101546008 A CN 101546008A
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Abstract
The invention discloses a color filter manufactured by an ink jet process and a manufacturing method thereof. The color filter comprises a substrate, a plurality of pixel regions positioned on the surface of the substrate, and a plurality of color photoresists. Each pixel region comprises a plurality of sub pixel regions, and the color photoresists are arranged in the sub pixel regions correspondingly. The color photoresists comprise a plurality of hydrophilic photoresists and a plurality of hydrophobic photoresists, wherein the hydrophilic photoresists and the hydrophobic photoresists are arranged in an alternating mode to avoid the overflowing of the color photoresists.
Description
Technical field
The present invention relates to a kind of colored filter and preparation method thereof, refer to a kind of colored filter that is applied to color monitor and preparation method thereof especially.
Background technology
Flourish along with electronics and information industry, LCD (liquid crystal display, LCD) the range of application and the market demand are also constantly enlarging, from small sized product, as accutron, to the portable information products, as PDA(Personal Digital Assistant), notebook (notebook), to such an extent as to future very may business-like big view display.Because LCD is in light weight, volume is little, have the advantage of the few and radiationless pollution of power consumption simultaneously again, therefore be widely used on above-mentioned consumption and the information products.For instance, Thin Film Transistor-LCD (thin film transistor liquid crystaldisplay, TFT-LCD) include basically thin-film transistor array base-plate, colored filter (color filter) substrate and be filled in thin-film transistor array base-plate and colored filter substrate between liquid crystal material.
In the manufacturing process of conventional thin film transistor LCD, the method of making colored filter consists predominantly of red (red, R), green (green, G), blue (blue, B) three steps such as the rotary coating of the photic resist slurry of three primary colors, contraposition exposure and developing process.Yet, the utilization rate of the photoresist slurry of traditional color filter manufacturing process only has an appointment 1～2%, there is ninety percent photoresist slurry in the process of rotary coating, to be thrown out of approximately, seventy percent photoresist slurry dissolved the removing in the process of developing of can having an appointment again afterwards.In addition, make the method for colored filter traditionally and need respectively carry out coating process, pre-curing process, exposure technology and developing process one time, make that technology is complicated and power consumption is high at the photoresist slurry of each color.In order to improve this shortcoming, industry begins to utilize the ink-jetting process method to improve tradition to utilize the rotary coating mode to make the shortcoming of colored filter at present.
Please refer to Fig. 1, Fig. 1 is the method synoptic diagram of known ink-jetting process.As shown in Figure 1, at first provide glass substrate 26, then utilize ink-jet apparatus 20 on glass substrate 26, to make required color filter patterns.Wherein ink-jet apparatus 20 includes at least one ink gun (hereinafter to be referred as shower nozzle) 22 and control board (figure does not show), glass substrate 26 surfaces then include black matrix pattern (black matrix pattern, BM pattern) 28, be used for covering the light of improper reflection or refraction.Utilize shower nozzle 22 directly glass substrate 26 to be sprayed then, photoresist slurry 24 of all kinds is sprayed between the black matrix pattern 28 according to the demand of different process and product.Treat photoresist slurry 24 of all kinds all spray finish after, again photoresist slurry 24 is carried out hardening process, to form stable colored photoresist, finish the making of colored filter 10.
Yet the situation of photoresist slurry 24 overflows takes place in regular meeting in known ink-jetting process.As shown in Figure 2, after finishing the blue photoresist slurry 25B ink-jet of first road, carry out the red photoresist slurry 25R ink-jet of second road the time, red photoresist slurry 25R can make photoresist slurry of all kinds mix mutually towards the direction generation overflow of blue photoresist slurry 25B.Thus, produced colored filter 10 can have the problem of COLOR COMPOSITION THROUGH DISTRIBUTION inequality, adopts the display of this colored filter 10 more can have serious color offset phenomenon.
Summary of the invention
Therefore one of fundamental purpose of the present invention is to provide a kind of method of making colored filter of improvement, to improve problem such as known colored photoresist slurry overflow.
According to a preferred embodiment of the invention, colored filter includes substrate, a plurality of pixel region is arranged at substrate surface, and a plurality of colored photoresist.Each pixel region all includes pixel region a plurality of times, and each colored photoresist correspondence is arranged in each time pixel region.Colored photoresist includes a plurality of water wettability photoresists and a plurality of hydrophobicity photoresist, and wherein water wettability photoresist and hydrophobicity photoresist are alternately arranged with each other.
According to another preferred embodiment of the invention, the present invention provides a kind of method of making colored filter in addition.Substrate at first is provided, and substrate surface includes a plurality of pixel regions, and respectively this pixel region includes pixel region a plurality of times.Then, in each time pixel region, form colored photoresist.Colored photoresist includes a plurality of water wettability photoresists and a plurality of hydrophobicity photoresist, and wherein water wettability photoresist and hydrophobicity photoresist are alternately arranged with each other.
For above-mentioned purpose of the present invention, feature and advantage can be become apparent, better embodiment cited below particularly, and conjunction with figs. are described in detail below.Yet following better embodiment and graphic only for reference and explanation usefulness are not to be used for to the present invention's limitr in addition.
Description of drawings
Fig. 1 is the method synoptic diagram of known ink-jetting process.
Fig. 2 is the synoptic diagram of known slurry overflow.
What Fig. 3,4,5,6,7 and 8 illustrated is the method synoptic diagram that first preferred embodiment of the invention is made colored filter.
What Fig. 9 and Figure 10 illustrated is the synoptic diagram that second preferred embodiment of the invention is made the method for colored filter.
What Figure 11 illustrated is the schematic top plan view of the colored filter of third preferred embodiment of the invention.
What Figure 12 illustrated is the schematic top plan view of the colored filter of four preferred embodiment of the invention.
What Figure 13 illustrated is the schematic top plan view of the colored filter of fifth preferred embodiment of the invention.
What Figure 14 illustrated is the schematic top plan view of the colored filter of sixth preferred embodiment of the invention.
What Figure 15 illustrated is the schematic top plan view of the pixel region of seventh preferred embodiment of the invention.
What Figure 16 illustrated is the schematic top plan view of the pixel region of eighth preferred embodiment of the invention.
What Figure 17 illustrated is the schematic top plan view of the pixel region of ninth preferred embodiment of the invention.
What Figure 18 illustrated is the schematic top plan view of the pixel region of tenth preferred embodiment of the invention.
Description of reference numerals
10 colored filters, 20 ink-jet apparatus
22 shower nozzles, 24 photoresist slurries
The red photoresist slurry of the blue photoresist slurry of 25B 25R
26 glass substrates, 28 black matrix patterns
50 colored filters, 52 pel arrays
56 pixel regions of 54 pixel regions
60 ink-jet apparatus, 62 shower nozzles
The green photoresist slurry of the red photoresist slurry of 64R 64G
The yellow photoresist slurry of the blue photoresist slurry of 64B 64Y
The green photoresist of the red photoresist 65G of 65R
The yellow photoresist of the blue photoresist 65Y of 65B
The green photoresist of 66 substrate 67G
70 black matrix patterns, 72 water wettability photoresists
74 hydrophobicity photoresists, 76 uviol lamps
Embodiment
See also Fig. 3 to Fig. 8, it illustrates is the method synoptic diagram that first preferred embodiment of the invention is made colored filter, and wherein components identical or position are continued to use identical symbol and represented.Fig. 4 illustrates is the schematic top plan view of colored filter shown in Figure 3, and Fig. 8 illustrates is the schematic top plan view of colored filter shown in Figure 7.Be noted that graphic only for the purpose of description, do not map according to life size.As shown in Figure 3, at first provide substrate 66, glass substrate for example, substrate 66 surfaces have black matrix pattern 70, can be used to cover the light of improper reflection or refraction, improving the contrast of display, and use and define pixel region 56 a plurality of times.
As shown in Figure 4, substrate 66 surface definition have pel array 52, pel array 52 to include a plurality of pixel regions 54 that array way is arranged that are.In this embodiment, each pixel region 54 all includes pixel region 56 four times.In other words, the inferior pixel region 56 of each pixel region 54 can be parallel to each other and side by side, is arranged in the array of a four lines one row.
As shown in Figure 5, then utilize and respectively spray required colored photoresist slurry in each time pixel region 56 of ink-jet apparatus 60 on substrate 66.Ink-jet apparatus 60 can include a plurality of shower nozzles 62, and is used for supplying with colored photoresist slurry and controls the control board (figure do not show) of shower nozzle 62 moving directions.Wherein, the colored photoresist slurry that is positioned at odd-numbered line is a water wettability photoresist 72, and the colored photoresist slurry that is positioned at even number line is a hydrophobicity photoresist 74.According to the type and the demand of product, colored photoresist slurry can have various required colors.For instance, the colored photoresist slurry in each pixel region 54 can be respectively red photoresist slurry 64R, green photoresist slurry 64G, blue photoresist slurry 64B and yellow photoresist slurry 64Y from left to right.Wherein, red photoresist slurry 64R that substrate 66 surfaces are sprayed and blue photoresist slurry 64B are all water wettability photoresist 72, and green photoresist slurry 64G that substrate 66 surfaces are sprayed and yellow photoresist slurry 64Y are all hydrophobicity photoresist 74.
In this embodiment, the shower nozzle 62 that is used for exporting photoresist slurry of all kinds makes each shower nozzle 62 can correspond to each time pixel region 56 just through suitable configuration.Therefore, the red photoresist slurry 64R of present embodiment, green photoresist slurry 64G, blue photoresist slurry 64B and yellow photoresist slurry 64Y can finish in same ink-jetting process in spraying simultaneously.Because water wettability photoresist 72 is adjacent with hydrophobicity photoresist 74, have alternative between the therefore adjacent colored photoresist slurry, be difficult for taking place overflow phenomena.
As shown in Figure 6, afterwards colored photoresist slurry is carried out hardening process, for example utilize the colored photoresist slurry of uviol lamp 76 irradiations, make colored photoresist slurry sclerosis.Then as Fig. 7 and shown in Figure 8, colored photoresist slurry is carried out hard curing process, make red photoresist slurry 64R, green photoresist slurry 64G, blue photoresist slurry 64B and the yellow photoresist slurry 64Y can be respectively at forming stable red photoresist 65R, green photoresist 65G, blue photoresist 65B and yellow photoresist 65Y on the substrate 66, and finish the making of colored filter 50.Wherein, the thickness of the colored photoresist after hard the baking is about 2 microns, and the thickness of black matrix pattern 70 is about 1.2 microns.
Because the vertical bar shape (stripe) that the colored filter of present embodiment made adopts red, green, blue, Huang Sise to constitute is arranged, therefore only need to use red water wettability photoresist, green hydrophobicity photoresist, blue water wettability photoresist and yellow hydrophobicity photoresist can produce the colored filter that has high color saturation and be difficult for overflow.
It should be noted that color filter making method of the present invention also not only is confined to the technology of the foregoing description.In other embodiment of the present invention, colored photoresist slurry of all kinds can be accepted ink-jet, sclerosis and hard curing process separately.See also Fig. 9 to Figure 10, it illustrates is the synoptic diagram that second preferred embodiment of the present invention is made the method for colored filter, and wherein components identical or position are continued to use identical symbol and represented.As shown in Figure 9, respectively spray hydrophilic red photoresist slurry in the inferior pixel region 56 prior to each pixel region 54 first row, in regular turn red photoresist slurry is carried out hardening process and hard curing process afterwards, on substrate 66, to form stable red photoresist 65R.
Thereafter as shown in figure 10, carry out ink-jetting process, hardening process and the hard curing process of colored photoresist slurry of all kinds separately, in inferior pixel region 56, to form hydrophobic green photoresist 65G, hydrophilic blue photoresist 65B and hydrophobic yellow photoresist 65Y in regular turn, finish the making of colored filter 50.In addition, known this field person should understand, the formation order of aforementioned photoresist of all kinds can be adjusted according to demands such as technology and products, for example can form blue photoresist 65B earlier and form red photoresist 65R, green photoresist 65G and yellow photoresist 65Y again.
Present invention be primarily characterized in that to make to include water wettability photoresist 72 and hydrophobicity photoresist 74 on the colored filter simultaneously, and water wettability photoresist 72 is adjacent one another are with hydrophobicity photoresist 74.Because water wettability photoresist 72 is adjacent with hydrophobicity photoresist 74, have alternative between the therefore adjacent colored photoresist, be difficult for taking place overflow phenomena.In order to keep the alternative between the colored photoresist, water wettability photoresist 72 can the possess hydrophilic property group and the hydrophobic group of not having, and hydrophobicity photoresist 74 can have hydrophobic group and not have hydrophilic radical.Generally speaking, water wettability photoresist 72 can have polar group or charged ionic group, for example ether group, hydrogen-oxygen group, carboxyl group or amine groups.In other words, water wettability photoresist 72 can include the material that chemical formula is R-O-R, R-OH, R-COOH or R-NH, and wherein R is generally groups.On the other hand, hydrophobic grouping is generally non-polar group, is generally the hydrocarbon group of carbon atom number between 8 to 20, and for instance, hydrophobic grouping can include alcohol groups, phenyl group, fat group or the polypropylene group of long chain hydrocarbon group, high carbon number.
In addition, water wettability photoresist 72 of the present invention and hydrophobicity photoresist 74 need not be confined to the configuration mode of previous embodiment.See also Figure 11 and Figure 12, what it illustrated is the schematic top plan view of the colored filter of the present invention the 3rd and the 4th preferred embodiment, and wherein components identical or position are continued to use identical symbol and represented.As shown in figure 11, the colored photoresist in each pixel region 54 is red photoresist 65R, green photoresist 65G, blue photoresist 65B and yellow photoresist 65Y from left to right.Be in aforementioned two embodiment main difference parts, red photoresist 65R and blue photoresist 65B that the 3rd embodiment is positioned at odd-numbered line are hydrophobicity photoresist 74, and the green photoresist 65G and the yellow photoresist 65Y that are positioned at even number line are water wettability photoresist 72.
Perhaps as shown in figure 12, in the pixel region 54 of odd column, red photoresist 65R and blue photoresist 65B are water wettability photoresist 72, and green photoresist 65G and yellow photoresist 65Y are hydrophobicity photoresist 74.And in the pixel region 54 of even column, red photoresist 65R and blue photoresist 65B are hydrophobicity photoresist 74, and green photoresist 65G and yellow photoresist 65Y are water wettability photoresist 72.Thus, all adjacent colored photoresists can have alternative.
On the other hand, colored filter of the present invention also can have different color scheme modes.See also Figure 13 and Figure 14, what it illustrated is the schematic top plan view of the colored filter of the present invention the 5th and the 6th preferred embodiment, and wherein components identical or position are continued to use identical symbol and represented.As Figure 13 and shown in Figure 14, be that in previous embodiment main difference part the colored photoresist in each pixel region 54 is respectively red photoresist 65R, green photoresist 65G, green photoresist 67G and blue photoresist 65B from left to right.Wherein, as shown in figure 13, the red photoresist 65R and the green photoresist 67G that are positioned at odd-numbered line are all water wettability photoresist 72, and the green photoresist 65G and the blue photoresist 65B that are positioned at even number line are all hydrophobicity photoresist 74.Vertical bar shape red, green, green, that Lan Sise constitutes is arranged because the colored filter of present embodiment made adopts, and therefore only needs to use red water wettability photoresist, green hydrophobicity photoresist, green water wettability photoresist and blue hydrophobicity photoresist can produce the colored filter that has high color saturation and be difficult for overflow.
Perhaps as shown in figure 14, in the pixel region 54 of odd-numbered line, red photoresist 65R and blue photoresist 65B are water wettability photoresist 72, and green photoresist 65G and green photoresist 67G are hydrophobicity photoresist 74.In the pixel region 54 of even number line, red photoresist 65R and blue photoresist 65B are hydrophobicity photoresist 74, and green photoresist 65G and green photoresist 67G are water wettability photoresist 72.
In addition, the inferior pixel region 56 of colored filter of the present invention can have any required arrangement mode.See also Figure 15 to Figure 18, what it illustrated is the schematic top plan view of the pixel region 54 of the present invention's the 7th to the tenth preferred embodiment.As Figure 15 and shown in Figure 16, in the 7th and the 8th preferred embodiment, each pixel region 54 can include pixel region 56 three times.The inferior pixel region 56 of the 7th preferred embodiment is to be mosaic (mosaic) mode to arrange, that is these times pixel region 56 is arranged as an array, and homochromy photoresist can be arranged along cornerwise direction.The inferior pixel region 56 of the 8th preferred embodiment is to be triangular shape (triangle) to arrange, that is to say, inferior pixel regions 56 of adjacent two row dislocation are each other arranged (stagger), make single pixel region 56 can be simultaneously in abutting connection with other six inferior pixel regions 56.In the 7th and the 8th preferred embodiment, the colored photoresist that is positioned at odd-numbered line odd column or even number line even column is a water wettability photoresist 72, and the remaining color photoresist is a hydrophobicity photoresist 74.As shown in figure 17, the inferior pixel region 56 of the 9th preferred embodiment is to be four pixel-wise to arrange (four pixel disposition).In other words, each pixel region 54 can include pixel region 56 four times, and these four pixel regions 56 can be arranged as a two-dimensional array.The red photoresist 65R that wherein is positioned at the odd-numbered line odd column can be hydrophobicity photoresist 74 with the blue photoresist 65B that is positioned at the even number line even column, and all the other green photoresist 65G can be water wettability photoresist 72.
As shown in figure 18, each pixel region 54 of the tenth preferred embodiment can include three inferior pixel regions 56 side by side parallel to each other, and these three pixel regions 56 can correspond to red photoresist 65R, green photoresist 65G and blue photoresist 65B respectively.The photoresist that wherein is positioned at odd-numbered line can be water wettability photoresist 72, and the photoresist that is positioned at even number line can be hydrophobicity photoresist 74, and water wettability photoresist 72 and hydrophobicity photoresist 74 are alternately arranged with each other.
Colored filter of the present invention can be applied in the various color monitor, for example organic macromolecular LED diode (polymer light emitting diode, PLED) display, or Thin Film Transistor-LCD.Wherein, each pixel region of colored filter can correspond on each pixel of color monitor, and the white light source that display is provided changes various required colors into.In other words, colored filter of the present invention can be applied in the various products with display, for example PDA(Personal Digital Assistant), mobile computer (notebook), desktop PC, LCD TV or mobile phone or the like product.
Utilize the rotary coating mode to make the method for colored filter compared to tradition, the present invention can promote the utilization rate of colored photoresist slurry, reduces material cost.In addition, the present invention only need utilize an ink-jet apparatus can form colored photoresist, does not need many cover exposure imaging equipment and a large amount of masks, therefore simplifies technology and equipment effectively.On the other hand,, have alternative between the therefore adjacent colored photoresist, be difficult for taking place overflow phenomena because the water wettability photoresist of colored filter of the present invention is adjacent with the hydrophobicity photoresist.Compared to utilizing known ink-jetting process to make the method for colored filter, the present invention can avoid the colored photoresist of colored filter to pollute each other, promotes the making yield rate of colored filter, and color monitor is had better be chromatic effect.
The above only is the preferred embodiments of the present invention, and all equalizations of doing according to claim of the present invention change and modify, and all should belong to covering scope of the present invention.
Claims (23)
1. colored filter comprises:
Substrate;
A plurality of pixel regions are arranged on this substrate, and respectively this pixel region includes pixel region a plurality of times; And
A plurality of colored photoresist correspondences are arranged in described pixel region, and wherein said colored photoresist includes a plurality of water wettability photoresists and a plurality of hydrophobicity photoresist, and is alternately arranged with each other.
2. colored filter as claimed in claim 1, wherein respectively this pixel region includes four time pixel regions, and respectively described pixel region of this pixel region is parallel to each other and side by side.
3. colored filter as claimed in claim 2, wherein respectively described pixel region of this pixel region corresponds to red photoresist, green photoresist, blue photoresist and yellow photoresist from left to right respectively.
4. colored filter as claimed in claim 3, wherein said red photoresist and described blue photoresist are described water wettability photoresist, and described green photoresist and described yellow photoresist are described hydrophobicity photoresist.
5. colored filter as claimed in claim 3, wherein said green photoresist and described yellow photoresist are described water wettability photoresist, and described red photoresist and described blue photoresist are described hydrophobicity photoresist.
6. colored filter as claimed in claim 2, wherein respectively described pixel region of this pixel region corresponds to red photoresist, the first green photoresist, the second green photoresist and blue photoresist from left to right respectively.
7. colored filter as claimed in claim 6, the wherein said red photoresist and the described second green photoresist are described water wettability photoresist, and the described first green photoresist and described blue photoresist are described hydrophobicity photoresist.
8. colored filter as claimed in claim 6, the wherein said first green photoresist and described blue photoresist are described water wettability photoresist, and described red photoresist and the described second green photoresist are described hydrophobicity photoresist.
9. colored filter as claimed in claim 1, wherein respectively this pixel region includes pixel region four times, and respectively described pixel region of this pixel region is arranged as a two-dimensional array.
10. colored filter as claimed in claim 9, the described colored photoresist that wherein is positioned at the odd-numbered line odd column is described hydrophobicity photoresist with the described colored photoresist that is positioned at the even number line even column.
11. colored filter as claimed in claim 10, the described colored photoresist that wherein is positioned at the odd-numbered line even column is described water wettability photoresist with the described colored photoresist that is positioned at the even number line odd column.
12. colored filter as claimed in claim 1, wherein respectively this pixel region includes pixel region three times, and respectively described pixel region of this pixel region corresponds to red photoresist, green photoresist and blue photoresist respectively.
13. colored filter as claimed in claim 12, wherein said red photoresist, described green photoresist and described blue photoresist are to be triangular shape to arrange.
14. colored filter as claimed in claim 12, wherein said red photoresist, described green photoresist and described blue photoresist are to be the mosaic mode to arrange.
15. colored filter as claimed in claim 12, wherein respectively this redness photoresist of this pixel region, this green photoresist and this blueness photoresist is parallel to each other and side by side.
16. colored filter as claimed in claim 1, wherein the material of this water wettability photoresist has polar group or charged ionic group.
17. colored filter as claimed in claim 1, wherein the material of this water wettability photoresist has ether group, hydrogen-oxygen group, carboxyl group or amine groups.
18. colored filter as claimed in claim 1, wherein the material of this hydrophobicity photoresist has the long chain hydrocarbon group, and the long-chain hydroxyl groups has 8 to 20 carbon atoms.
19. a method of making colored filter comprises:
Substrate is provided, and this substrate surface includes a plurality of pixel regions, and respectively this pixel region includes pixel region a plurality of times; And
In respectively forming colored photoresist in this time pixel region, described colored photoresist includes a plurality of water wettability photoresists and a plurality of hydrophobicity photoresist, and wherein said water wettability photoresist and described hydrophobicity photoresist are alternately arranged with each other.
20. method as claimed in claim 19, wherein said colored photoresist include a plurality of first color photoresists and a plurality of second color photoresist.
21. method as claimed in claim 20, the wherein said first color photoresist is described water wettability photoresist, and the described second color photoresist is described hydrophobicity photoresist.
22. method as claimed in claim 21, the step that wherein forms described colored photoresist includes:
Carry out ink-jetting process, in described pixel region, spray a plurality of first color slurries and a plurality of second color slurry;
Described first color slurry and the described second color slurry are carried out ultraviolet light photopolymerization technology; And
Described first color slurry and the described second color slurry are carried out hard curing process, to form described first color photoresist and the described second color photoresist.
23. method as claimed in claim 21, the step that wherein forms described colored photoresist includes:
Carry out first ink-jetting process, in described pixel region, spray a plurality of first color slurries;
The described first color slurry is carried out the first ultraviolet light photopolymerization technology;
The described first color slurry is carried out the first hard curing process, to form the described first color photoresist;
Carry out second ink-jetting process, in described pixel region, spray a plurality of second color slurries;
The described second color slurry is carried out the second ultraviolet light photopolymerization technology; And
The described second color slurry is carried out the second hard curing process, to form the described second color photoresist.
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| CN2008100885512A CN101546008B (en) | 2008-03-28 | 2008-03-28 | Color filter and manufacturing method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN114106588A (en) * | 2020-08-25 | 2022-03-01 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
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| CN1266496C (en) * | 2003-01-17 | 2006-07-26 | 统宝光电股份有限公司 | Manufacturing meethod of colour filter |
| CN1264029C (en) * | 2003-02-20 | 2006-07-12 | 统宝光电股份有限公司 | A process for making color filter |
| JP2006154354A (en) * | 2004-11-30 | 2006-06-15 | Seiko Epson Corp | Forming method of color filter |
| CN100399069C (en) * | 2005-05-25 | 2008-07-02 | 中华映管股份有限公司 | Method for manufacturing color optical filter |
| CN100420999C (en) * | 2005-09-13 | 2008-09-24 | 友达光电股份有限公司 | Picture element unit |
| KR101281877B1 (en) * | 2006-09-18 | 2013-07-03 | 엘지디스플레이 주식회사 | Color filter array panel and Fabricating method thereof |
| CN101344605A (en) * | 2007-07-10 | 2009-01-14 | 财团法人工业技术研究院 | Colored filter and preparation thereof |
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| CN114106588A (en) * | 2020-08-25 | 2022-03-01 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
| CN114106588B (en) * | 2020-08-25 | 2023-01-03 | 上海迪赢生物科技有限公司 | Functionalized surface treatment method for high-flux nucleic acid in-situ synthesis by 3D ink-jet method |
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