CN1264029C - A process for making color filter - Google Patents
A process for making color filter Download PDFInfo
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- CN1264029C CN1264029C CN 03105433 CN03105433A CN1264029C CN 1264029 C CN1264029 C CN 1264029C CN 03105433 CN03105433 CN 03105433 CN 03105433 A CN03105433 A CN 03105433A CN 1264029 C CN1264029 C CN 1264029C
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Abstract
The present invention discloses a method for producing color filters. A color filter which has the advantages of high color reproducibility and high color resolution is produced by utilizing a method of forming photoresist spacers or insulated spacers in a non-pixel region and avoiding adjacent colors of coloring materials form mixing. The method of the present invention comprises the following steps: forming an interlayer insulated layer on a basal plate; forming a plurality of scanning lines and a plurality of signal lines on the interlayer insulated layer in order to define a plurality of pixel regions and a non-pixel region; forming a photoresist layer or an insulation layer on the interlayer insulated layer; forming the photoresist spacers or the insulated spacers in the non-pixel region by composing the photoresist layer or the insulation layer; projecting coloring material to the pixel regions with an ink-jet method.
Description
Technical field
The manufacture method of the relevant a kind of colored filter (color filter) of the present invention is particularly at utilizing ink-jet method to make the method for colored filter.
Background technology
Generally speaking, the main member of liquid crystal indicator is by the two plate electrode substrates that have the mutually relatively pixel (pixel) of configuration that is formed by electrode separately configuration relatively under the tool gap, during this time the crack around edge sealing and the double team liquid crystal layer constitutes.
In liquid crystal indicator, particularly can show in the liquid crystal indicator of any chromatic image picture, generally can use colored filter.Colored filter on arbitrary plate base of two plate electrode substrates, possess R, G, B (red, green, blue) three primary colors or corresponding to each pixel can be colored the configuration of polychrome form and aspect dyeing element.
In the manufacturing method of color filters, have be colored dispersed color on the layer with the pigment dispersing method that forms colored filter, be colored disperse dyes on the layer with the dyestuff dispersion method that forms colored filter or with electricity that the electricity that forms colored filter method or the ink printing made with the illuminating colour that the galley of intaglio plate or lithographic plate is used colored filter on substrate to form all commercializations of print process of colored filter.
But, in this type of existing manufacture method, because all use repeatedly photoetching process (Lithography process) and etch process in the colored filter manufacturing process, so the technology of colored filter contains very miscellaneous problem.And, further require the precision of photoetching and etch process for the correspondence Pixel Dimensions of miniaturization more and more, and have the problem that is difficult for realizing simultaneously this excellent precision and high qualification rate.And this photoetching and etch process need more than the triplicate at least, to produce the colored filter of R, G, B three looks, so technology is numerous and diverse and cost also increases thereupon.
In print process,, make the miscellaneous of galley and generation problem as hereinbefore in addition because have though when forming colored filter, directly do not use etching technique.And in print process, corresponding more meticulous Pixel Dimensions has actual difficult problem to form accurate colored filter.
Recently, the someone uses ink-jet method (Inkjet printing) to make colored filter.But make in the occasion of colored filter with ink-jetting style at this type of, the coloured material that generally throwed be colored part around can the mutual of color to be taken place at last with adjacent other color dyes material mix, and exist assertive colours to reproduce the problem of difficulty.Even therefore the mat ink discharge device may realize making the good turnout of colored filter, its color reproduction of the colored filter of gained is low.Therefore use the color reproduction and the low problem of display quality that have chromatic image in the liquid crystal indicator of colored filter of this ink-jetting style.
Summary of the invention
In the foregoing invention background, the existing ink-jet method (Inkjet printing) of using is made colored filter, coloured material be colored part around can with the mixing of adjacent other color dyes material generation color, and exist assertive colours to reproduce and resolve the problem of difficulty.The invention provides a kind of new manufacturing method of color filters, avoid said circumstances to produce.
One object of the present invention is to provide a kind of manufacturing method of color filters.By multi-strip scanning line and signal wire are treated as mask, from the glass substrate back-exposure, make the photoresist sept, avoid the mutual mixing phenomena of adjacent other color dyes material generation color, to make color reproduction and the good colored filter of color resolution.
Another purpose of the present invention is to provide a kind of manufacturing method of color filters.By the glass substrate face exposure, make the photoresist sept by mask, avoid the mutual mixing phenomena of adjacent other color dyes material generation color, to make color reproduction and the good colored filter of color resolution.
A further object of the present invention is to provide a kind of manufacturing method of color filters.By the glass substrate face exposure, make insulation spacer by mask, avoid the phase mixing phenomena of adjacent other color dyes material generation color, to make color reproduction and the good colored filter of color resolution.
According to above-described purpose, the invention provides a kind of manufacturing method of color filters, comprising: form interbedded insulating layer on one first an of substrate; Form multi-strip scanning line and many signal line on this interlayer insulating film, in order to define a plurality of pixel regions and a non-pixel region; Form a photosensitive material layer on this interlayer insulating film; By one second irradiation one exposure light of this substrate, this second face is positioned at this back side of first; This photosensitive material layer develops; And utilize ink-jet method that one coloured material is projeced into this a plurality of pixel regions.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are vertical mutually.
According to above-mentioned conception, wherein this substrate comprises a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are electrically connected with these a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, wherein this exposure light is selected from following group: G-line (G line), I-line (I line), Deep UV (deep UV).
According to above-mentioned conception, wherein this photosensitive material is a photoresist.
According to above-mentioned conception, wherein utilize ink-jet method that one coloured material is projeced into step behind these a plurality of pixel regions and also comprise this photosensitive material after developing is removed.
According to above-described purpose, the invention provides a kind of manufacturing method of color filters, comprising: form interbedded insulating layer on a substrate; Form multi-strip scanning line and many signal line on this interlayer insulating film, in order to define a plurality of pixel regions and a non-pixel region; Form a photosensitive material layer on this interlayer insulating film; Insert a mask above this substrate; Shine an exposure light in this photosensitive material layer by the top of this substrate; This photosensitive material layer develops; And utilize ink-jet method that one coloured material is projeced into this a plurality of pixel regions.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are vertical mutually.
According to above-mentioned conception, wherein this substrate comprises a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are electrically connected with these a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, wherein this is masked in the pattern tool opaqueness of this non-pixel region top.
According to above-mentioned conception, wherein this exposure light is selected from following group: G-line, I-line, DeepUV.
According to above-mentioned conception, wherein this photosensitive material is a photoresist.
According to above-mentioned conception, wherein utilize ink-jet method that one coloured material is projeced into step behind these a plurality of pixel regions and also comprise this photosensitive material after developing is removed.
According to above-described purpose, the invention provides a kind of manufacturing method of color filters, comprising: form interbedded insulating layer on a substrate; Form multi-strip scanning line and many signal line on this interlayer insulating film, in order to define a plurality of pixel regions and a non-pixel region; Form an insulation course on this interlayer insulating film; Form a photoresist layer on this insulation course; Insert a mask above this substrate; Shine an exposure light in this photoresist layer by the top of this substrate; This photoresist layer develops; This insulation course of etching; And utilize ink-jet method that one coloured material is projeced into this a plurality of pixel regions.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are vertical mutually.
According to above-mentioned conception, wherein this substrate comprises a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, wherein this multi-strip scanning line and these many signal line are electrically connected with these a plurality of thin film transistor (TFT)s.
According to above-mentioned conception, this first pattern tool opaqueness that is masked in this non-pixel region top wherein.
According to above-mentioned conception, wherein this exposure light is selected from following group: G-line, I-line, DeepUV.
According to above-mentioned conception, this insulation course step of etching also comprises this photoresist removal after the development.
Description of drawings
Fig. 1 is illustrated to be the planimetric map of colour liquid crystal display device;
Fig. 2 is illustrated to be the fragmentary cross-sectional view of colour liquid crystal display device;
Fig. 3 A, B are illustrated to be the process schematic representation of the first embodiment of the present invention;
Fig. 4 A, B are illustrated to be the process schematic representation of the second embodiment of the present invention;
Fig. 5 is illustrated to be the fragmentary cross-sectional view of colour liquid crystal display device; And
Fig. 6 A, B are illustrated to be the process schematic representation of the third embodiment of the present invention.
Description of reference numerals in the accompanying drawing is as follows:
11: signal wire 12: sweep trace
13: thin film transistor (TFT) 15: pixel region
20: glass substrate 21: interlayer insulating film
22: photoresist layer 22 ': residual
23: exposure light 25: colored filter
46,56: mask 47,57: exposure light
51: interlayer insulating film 52: insulation course
52 ': not etched insulation course 53: photoresist layer
55: colored filter
Embodiment
Some embodiments of the present invention can be described in detail as follows.Yet except describing in detail, the present invention can also be widely implements at other embodiment, and scope of the present invention do not limited, and it is as the criterion with appended claim.
First embodiment of the present invention asks for an interview the planimetric map of Fig. 1 colour liquid crystal display device and the sectional view of Fig. 2 colour liquid crystal display device.Fig. 3 A, B are the schematic diagram of technology.The face that elements such as sweep trace, signal wire are disposed glass substrate in this embodiment explanation is called the front, and the another side that does not dispose said elements is called the back side.At first, form thin film transistor (TFT) 13 (TFT:Thin FilmTransistor) on glass substrate 20, this thin film transistor (TFT) 13 can use general semiconductor technology method and make.Then, form roughly comprehensive interlayer dielectric 21 that covers on glass substrate 20 and thin film transistor (TFT) 13, dispose sweep trace 12 then and perpendicular to the signal wire 11 of sweep trace 12 on interlayer dielectric 21 and be rectangular, wherein sweep trace 12, signal wire 11 are electrically connected with thin film transistor (TFT) 13.Then, as shown in Figure 3A, on the glass substrate front, form a photoresist layer 22, utilize sweep trace 12 and signal wire 11 to be used as mask then, make glass substrate 20 back side illuminaton exposure lights 23 in the mode from glass substrate 20 back-exposures, this exposure light 23 can be G-line, I-line or Deep-UV all can.These regional photoresists at this moment, are not scanned the zone that line 12 and signal wire 11 cover and all shine exposure light 23, so in follow-up step of developing, can be developed all that liquid is washed off and the interlayer insulating film 21 that exposes bottom.In fact, the zone of exposing interlayer insulating film promptly is a pixel region 15.To remain in photoresist 22 on sweep trace 12 and the signal wire 11 ' be used as sept, adopt ink discharge device to utilize ink-jet method that R, G, B three chromatic colorant materials are projeced into aforementioned pixel region 15, by this, the coated part of glass substrate 20 is colored, and forms colored filter 25.At last, remain in photoresist 22 on sweep trace 12 and the signal wire 11 ' can select to remove or do not remove all can.
Second embodiment of the present invention asks for an interview the planimetric map of Fig. 1 colour liquid crystal display device and the sectional view of Fig. 2 colour liquid crystal display device.Fig. 4 A, B are the schematic diagram of technology again.The face that elements such as sweep trace, signal wire are disposed glass substrate in this embodiment explanation is called the front, and the another side that does not dispose said elements is called the back side.At first, form thin film transistor (TFT) 13 (TFT:Thin FilmTransistor) on glass substrate 20, this thin film transistor (TFT) 13 can use general semiconductor technology method and make.Then, form roughly comprehensive interlayer dielectric 21 that covers on glass substrate 20 and thin film transistor (TFT) 13, dispose sweep trace 12 then and perpendicular to the signal wire 11 of sweep trace 12 on interlayer dielectric 21 and be rectangular, wherein sweep trace 12, signal wire 11 are electrically connected with thin film transistor (TFT) 13.Then, shown in Fig. 4 A, form a photoresist layer 22 on interlayer insulating film 21, at the positive mask 46 that inserts of glass substrate, this mask 46 is the light-shielding pattern of the non-pixel region of a covering then.This photoresist layer 22 then exposes, develops.Exposure light 47 sees through mask 46 and be radiated on the photoresist layer 22, and this exposure light 47 can be G-line, I-line or Deep-UV all can from glass substrate 20 fronts at this moment.At this moment, not masked 46 zones that cover all shine exposure light 47, so in follow-up step of developing, these regional photoresists can be developed all that liquid is washed off and the interlayer insulating film 21 that exposes bottom.In fact, the zone of exposing interlayer insulating film promptly is a pixel region 15.To remain in photoresist 22 on the interlayer insulating film 21 ' be used as sept, adopt ink discharge device to utilize ink-jet method that R, G, B three chromatic colorant materials are projeced into aforementioned pixel region 15, by this, the coated part of glass substrate 20 is colored, and forms colored filter 25.At last, remain in photoresist 22 on the interlayer insulating film 21 ' can select to remove or do not remove all can.
The 3rd embodiment of the present invention asks for an interview the planimetric map of Fig. 1 colour liquid crystal display device and the sectional view of Fig. 5 colour liquid crystal display device.Fig. 6 A, B are the schematic diagram of technology again.The face that elements such as sweep trace, signal wire are disposed glass substrate in this embodiment explanation is called the front, and the another side that does not dispose said elements is called the back side.At first, form thin film transistor (TFT) 13 (TFT:Thin FilmTransistor) on glass substrate 50, this thin film transistor (TFT) 13 can use general semiconductor technology method and make.Then, form roughly comprehensive interlayer dielectric 51 that covers on glass substrate 50 and thin film transistor (TFT) 13, dispose sweep trace 12 then and perpendicular to the signal wire 11 of sweep trace 12 on interlayer dielectric 51 and be rectangular, wherein sweep trace 12, signal wire 11 are connected electrically on the glass substrate 50 with thin film transistor (TFT) 13.Then, as shown in Figure 6A, form an insulation course 52 on interlayer insulating film 51, this insulation course 52 can be silicon layer or silicon nitride layer.Form a photoresist layer 53 on insulation course 52, at the glass substrate 50 positive masks 56 that insert, this mask 56 is the light-shielding pattern of the non-pixel region of a covering then.This photoresist layer 53 then exposes, develops.Exposure light 57 sees through mask 56 and be radiated on the photoresist layer 53, and this exposure light 57 can be G-line, I-line or Deep-UV all can from glass substrate 50 fronts at this moment.At this moment, not masked 56 zones that cover all shine exposure light 57, so in follow-up step of developing, these regional photoresists all can be developed liquid and wash off and expose insulation course 52.In fact, the zone of exposing insulation course promptly is a pixel region 15.Then, the insulation course 52 that exposes of anisotropic etching.After etching is finished, be about to photoresist and remove, this moment, not etched insulation course 52 ' its purposes promptly was the sept when becoming color jet-ink.Adopt ink discharge device to utilize ink-jet method that R, G, B three chromatic colorant materials are projeced into aforementioned pixel region 15, by this, the coated part of glass substrate 50 is colored, and forms colored filter 55.
Though the present invention describes by enumerating several preferred embodiments, the present invention is not limited to the embodiment that enumerated.Though before enumerate and narrated specific embodiment, but apparent, other all should be included in the claim of the present invention not breaking away from the equivalence change of being finished under the spirit disclosed in this invention or modifying.In addition, all other other that finished under spirit disclosed in this invention are similar and approximate to be changed or modifies not breaking away from, also include in claim of the present invention.Should explain scope of the present invention with the widest definition simultaneously, use and comprise all modifications and similar approach.
Claims (10)
1. manufacturing method of color filters comprises:
Form interbedded insulating layer on a substrate;
Form multi-strip scanning line and many signal line on this interlayer insulating film, in order to define a plurality of pixel regions and a non-pixel region;
Form a photosensitive material layer on this interlayer insulating film;
Insert a mask above this substrate;
Shine an exposure light in this photosensitive material layer by the top of this substrate;
This photosensitive material layer develops; And
Utilize ink-jet method that one coloured material is projeced into this a plurality of pixel regions.
2. manufacturing method of color filters as claimed in claim 1, wherein, this multi-strip scanning line and these many signal line are vertical mutually.
3. manufacturing method of color filters as claimed in claim 1, wherein, this substrate comprises a plurality of thin film transistor (TFT)s.
4. manufacturing method of color filters as claimed in claim 1, wherein, this multi-strip scanning line and these many signal line are electrically connected with a plurality of thin film transistor (TFT)s.
5. manufacturing method of color filters as claimed in claim 1, wherein, this exposure light is selected from following group: G line, I line, deep UV.
6. manufacturing method of color filters as claimed in claim 1, wherein, this photosensitive material is a photoresist.
7. manufacturing method of color filters as claimed in claim 6, wherein:
Before on this interlayer insulating film, form an insulation course earlier at this photosensitive material layer of formation on this interlayer insulating film; And
The step that after this photosensitive material layer that develops, also comprises this insulation course of etching.
8. manufacturing method of color filters comprises:
Form interbedded insulating layer on one first an of substrate;
Form multi-strip scanning line and many signal line on this first of this substrate, in order to define a plurality of pixel regions and a non-pixel region;
Form a photosensitive material layer on this interlayer insulating film;
By one second irradiation one exposure light of this substrate, this second face is positioned at this back side of first;
This photosensitive material layer develops; And
Utilize ink-jet method that one coloured material is projeced into this a plurality of pixel regions.
9. manufacturing method of color filters as claimed in claim 8, wherein, this exposure light is selected from following group: G line, I line, deep UV.
10. manufacturing method of color filters as claimed in claim 8, wherein, this photosensitive material is a photoresist.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03105433 CN1264029C (en) | 2003-02-20 | 2003-02-20 | A process for making color filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 03105433 CN1264029C (en) | 2003-02-20 | 2003-02-20 | A process for making color filter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1523381A CN1523381A (en) | 2004-08-25 |
| CN1264029C true CN1264029C (en) | 2006-07-12 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 03105433 Expired - Fee Related CN1264029C (en) | 2003-02-20 | 2003-02-20 | A process for making color filter |
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| Country | Link |
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| CN (1) | CN1264029C (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100410756C (en) * | 2005-01-25 | 2008-08-13 | 统宝光电股份有限公司 | Colour light filter base plate and producing method thereof |
| CN1900747B (en) * | 2005-07-18 | 2010-04-14 | 中华映管股份有限公司 | Method and device for producing color filter sheet |
| JP2008181067A (en) * | 2006-06-09 | 2008-08-07 | Fujifilm Corp | Jet ink for color filter, color filter, manufacturing method and displaying device for the color filter |
| CN101546008B (en) * | 2008-03-28 | 2010-12-01 | 中华映管股份有限公司 | Color filter and manufacturing method thereof |
| US10333066B2 (en) | 2013-06-28 | 2019-06-25 | Boe Technology Group Co., Ltd. | Pixel definition layer and manufacturing method thereof, display substrate and display device |
| CN103346123B (en) * | 2013-06-28 | 2015-07-01 | 京东方科技集团股份有限公司 | Pixel defining layer, manufacturing method thereof, display substrate and display device |
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2003
- 2003-02-20 CN CN 03105433 patent/CN1264029C/en not_active Expired - Fee Related
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| Publication number | Publication date |
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| CN1523381A (en) | 2004-08-25 |
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Granted publication date: 20060712 Termination date: 20180220 |