CN105785630A - Display panel and manufacture method for same - Google Patents
Display panel and manufacture method for same Download PDFInfo
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- CN105785630A CN105785630A CN201410775193.8A CN201410775193A CN105785630A CN 105785630 A CN105785630 A CN 105785630A CN 201410775193 A CN201410775193 A CN 201410775193A CN 105785630 A CN105785630 A CN 105785630A
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- light shielding
- substrate
- optical filtering
- filtering portion
- display floater
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Abstract
The invention discloses a display panel and a manufacture method for the same. The display panel comprises a first baseplate, a second baseplate and a display medium layer, wherein the first baseplate comprises a base material, multiple light shielding parts and multiple light filtering parts; the light shielding parts and the light filtering parts are disposed on a first surface of the base material; the light shielding parts and the light filtering parts are disposed at intervals; the thickness of one of the light filtering parts is smaller than the maximum thickness of the adjacent light shielding parts; the second baseplate and the first baseplate are disposed oppositely; and the display medium layer is disposed between the first baseplate and the second baseplate. According to the invention, a linkage action of a color layer is controlled by back face exposure, so that a part of color layer which is not exposed and linked thoroughly is removed in a developing technology. In this way, in comparison with the prior art, the irregular color phenomenon caused by different thicknesses of light filtering layer materials in the prior art can be improved.
Description
Technical field
The present invention is about a kind of display floater and manufacture method thereof, especially in regard to display floater and the manufacture method thereof of a kind of display device.
Background technology
Progress along with science and technology, display device has been used in various field widely, especially liquid crystal indicator or organic LED display device, because having that build is frivolous, low power consumption and the advantageous characteristic such as radiationless, gradually replace conventional cathode ray tube display device, and apply to the electronic product of numerous species, for instance mobile phone, portable multimedia device, notebook computer or TV etc..
For liquid crystal indicator, existing a kind of liquid crystal indicator comprises a display panels (LCDPanel) and a backlight module (BacklightModule), and both are oppositely arranged.The liquid crystal layer that display panels mainly comprises a colored optical filtering substrates, a thin film transistor base plate and is located between two substrates.Wherein, colored optical filtering substrates and thin film transistor base plate and liquid crystal layer can form the pixel of multiple array configuration.And backlight module can emit beam through display panels, and show that color forms an image via each pixel of display panels.
In the manufacturing technology of existing colored optical filtering substrates, chromatograph (i.e. chromatic filter layer) is usually through steps such as coating, exposure, development and bakings to complete its pattern (pattern).But, prior art is to arrange in the way of coating colour layer material comprehensively, therefore has the material of more than half all to be got rid of by the developing agent of developing process later, cause the waste of colour layer material and the increase of cost.Additionally, owing to colour layer material can be stayed on substrate, in above-mentioned technique, also easily because the factor of technique or equipment causes material thickness difference to produce the phenomenon of irregular colour and affect yield, the product particularly in high-res (high ppi) is more serious.
For solving the problems such as waste of material and cost increase, industry develops injection and injects the technology of chromatograph (ink-jet), but, the colour layer material that this technology sprays also can because of with black matrix" (blackmatrix, BM) hydrophilic, hydrophobic gender gap or discharge-amount between are uneven so that cause material thickness difference to produce irregular colour after baking-curing sizing；Or, the discharge-amount of colour layer material is improved in order to improve discharge-amount uneven, but the problem that the discharge-amount improving material is also easily caused chromatograph colour mixture.
Therefore, how a kind of display floater and manufacture method thereof are provided, can improve in prior art, the irregular colour phenomenon that the difference in thickness of colour layer material causes, it has also become one of important topic.
Summary of the invention
The purpose of the present invention is for providing a kind of display floater and manufacture method thereof, in order to improve in prior art, and the irregular colour phenomenon that the difference in thickness of colour layer material causes.
The technical scheme is that a kind of display floater of offer, including a first substrate, a second substrate and a display dielectric layer.First substrate has a base material, multiple light shielding part and multiple optical filtering portion, these light shielding parts and these optical filtering portions are arranged on a first surface of base material, these light shielding parts and these optical filtering portions are that interval is arranged, and the thickness of one of them in these optical filtering portions is less than the maximum gauge of these adjacent light shielding parts.Second substrate is relative with first substrate and sets.Display dielectric layer is arranged between first substrate and second substrate.
The present invention also provides for the manufacture method of a kind of display floater, is included on a first surface of a base material and forms multiple light shielding part；On first surface, form multiple optical filtering portion, and between two these light shielding parts adjacent, there is an optical filtering portion；Base material is irradiated by a second surface relative with first surface, to carry out an exposure technology with a light；Carry out a developing process, so that the thickness in optical filtering portion is less than the maximum gauge of these adjacent light shielding parts；And carry out a curing process, to form a first substrate.
In one embodiment, one of them of these light shielding parts has at least one groove away from the side of first surface, and the cross sectional shape of groove is polygon or arc.
In one embodiment, one of them of these light shielding parts is divided into one first and one second, and first contact first surface, second is connected to first side away from first surface.
In one embodiment, on a cross section parallel with base material, first has one first maximum width, first junction with second has one second width, second has one the 3rd maximum width, and the first width is more than the second width, and the 3rd width is more than the second width.
In one embodiment, one of them of these optical filtering portions is completely covered the sidewall of first and the sidewall of second of part, and between ratio is second whole side-wall ratios the 1% to 90% of the sidewall of optical filtering portion covering second.
In one embodiment, the thickness of one of them in these optical filtering portions is between the 50%～95% of the maximum gauge of these adjacent light shielding parts.
In one embodiment, manufacture method also includes: first substrate and a second substrate is relatively set, and is arranged between first substrate and second substrate by a display dielectric layer to form display floater.
In one embodiment, formed in the step of one layer of light shield layer on first surface, on these light shielding parts, form at least one groove also by the accurate slit mask of half mode mask or gray level mask more than one or.
In one embodiment, light is that the wavelength of ultraviolet or this light is between 365 nanometers to 435 nanometers.
From the above, in the display floater and manufacture method thereof of the present invention, on the first surface of a base material, form multiple light shielding part, on first surface, also form multiple optical filtering portion, and make, between two these light shielding parts adjacent, there is an optical filtering portion.It addition, more irradiated base material by light by the second surface relative with first surface, to carry out an exposure technology so that developed and after curing process, the thickness in optical filtering portion is less than the maximum gauge of these adjacent light shielding parts.Therefore, the present invention is the link reaction that the mode by back-exposure controls chromatograph, to remove unexposed link part chromatograph completely in developing process.Whereby, compared with prior art, can improve in prior art, the irregular colour phenomenon that the difference in thickness of filter material causes.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of a kind of display floater of present pre-ferred embodiments.
Fig. 2 is the process step schematic diagram of a kind of display floater manufacture method of present pre-ferred embodiments.
The manufacture process schematic diagram of the first substrate of Fig. 3 A to Fig. 3 D respectively display floater.
Fig. 4 is another process step schematic diagram of the display floater manufacture method of present pre-ferred embodiments.
The manufacture process schematic diagram of Fig. 5 A to Fig. 8 B respectively first substrate of different embodiments.
Fig. 8 C is the schematic diagram of the first substrate of a kind of display floater.
Fig. 9 is the schematic diagram of a kind of display device.
Detailed description of the invention
Hereinafter with reference to correlative type, the display floater according to present pre-ferred embodiments and manufacture method thereof being described, wherein identical element will be illustrated with identical reference marks.
Refer to shown in Fig. 1, it is the schematic diagram of a kind of display floater 1 of present pre-ferred embodiments.
Display floater 1 includes first substrate 2, second substrate 3 and a display dielectric layer 4, and first substrate 2 is relative with second substrate 3 and sets, and display dielectric layer 4 is arranged between first substrate 2 and second substrate 3.The display floater 1 of the present embodiment is such as a display panels, therefore display dielectric layer 4 is folded between first substrate 2 and second substrate 3 for liquid crystal layer.Wherein, second substrate 3 is a thin film transistor base plate, and thin film transistor base plate can have tft layer 31 and a base material 32, and tft layer 31 is arranged at the base material 32 side towards first substrate 2.It addition, in various embodiments, if display floater 1 is an organic LED display panel, display dielectric layer 4 is Organic Light Emitting Diode layer.In the embodiment of organic LED display panel, Organic Light Emitting Diode substrate sends white light.
It addition, refer to Fig. 1, Fig. 2 and coordinate shown in Fig. 3 A to Fig. 3 D, so that the process step of the display floater manufacture method of the present invention to be described.Wherein, Fig. 2 is the process step schematic diagram of a kind of display floater manufacture method of present pre-ferred embodiments, and the manufacture process schematic diagram of the first substrate 2 of Fig. 3 A to Fig. 3 B respectively display floater 1.In this, diagram shows an a first direction D1 and second direction D2, wherein, first direction D1 is the direction of the first surface S1 of vertical substrate 21, and second direction D2 is essentially the other direction (i.e. the direction of parallel first surface S1) of vertical first direction D1.
As in figure 2 it is shown, display floater manufacture method can include step S01 to step S05.
First, step S01 is: form multiple light shielding parts 221 on a first surface S1 of a base material 21.As shown in Figure 3A, step S01 is first masking process, to form one layer of light shield layer 22 on the first surface S1 of base material 21, and light shield layer 22 has the light shielding part 221 of multiple interval configuration, and makes two these light shielding parts 221 adjacent have a spacing d on second direction D2.Wherein, spacing d can determine according to the resolution of display floater 1, and can such as between 5 microns and 50 microns (um), owing to this technology can be applicable on the product of high-res (higher than 600ppi), therefore spacing d preferred values is between 5 to 15 microns, and namely the width in the optical filtering portion 231 of filter layer 23 can be controlled between 5 to 15 microns.In the present embodiment, base material 21 can made by light-transmitting materials, and be such as a glass substrate, a quartz base plate or a plastic base.And light shield layer 22 is light tight material, and can being black matrix" (BM), and its material is such as metal or resin, metal can be such as chromium, chromium oxide or nitrogen oxygen chromium compound.These light shielding parts 221 are light tight material, it is advantageous to person, and the optical density value (opticaldensity) of light shielding part 221, more than more than 3, therefore forms lighttight region on base material 21, and then defines the region of light-permeable.
Then, step S02 is carried out: on first surface S1, form multiple optical filtering portions 231, and between two these light shielding parts 221 adjacent, there is an optical filtering portion 231.In this, as shown in Figure 3 B, form a metafiltration photosphere 23 and there is multiple optical filtering portion 231, and these light shielding parts 221 are considered as a barricade, with prevent inject colour layer material (optical filtering portion 231) step in, material is excessive.Wherein, these optical filtering portions 231 comprise a red filter portion (being shown as R), one green filter portion (being shown as G) and a blue filter portion (being shown as B), and injecting height can higher or lower than these light shielding parts 221, its material is light-permeable material, can be such as pigment or dyestuff, and can pass through to spray (ink-jet) method of injection, staining, pigment dispersion method, print process, dry film method or electricity the modes such as method and are respectively formed between these light shielding parts 221 by the optical filtering portion 231 of different colours, these light shielding parts 221 and these optical filtering portions 231 is made to arrange for interval.The pigment of different colours or dyestuff are such as simultaneously or sequentially injected between two these light shielding parts 221 adjacent by shower nozzle J spraying injection method by the present embodiment, to form these optical filtering portions 231.But, in this step, optical filtering portion 231 does not limit and comprises red filter portion R, green filter portion G or blue filter portion B only, can add other colors according to product demand, to form the optical filtering portion 231 of other colors.
Then, step S03 is performed: irradiated base material 21 with a light E by a second surface S2 relative with first surface S1, to carry out an exposure technology.In this, as shown in Figure 3 C, carry out back-exposure technique, with the back side (i.e. second surface S2) in base material 21 with such as ultraviolet, or G-line, H-line or I-line equiwavelength light source irradiation base material 21 between 365 nanometers to 435 nanometers, these light shielding parts 221 are utilized (can sequentially to irradiate R as the arrange in pairs or groups mode of back-exposure of hard mask (hardmask), G, B, or irradiate R simultaneously, G, B), in the present embodiment, photoresist is such as negative photoresist, therefore can pass through to control light exposure and time of exposure, reach to control the chromatograph photoresist link reaction depth in these optical filtering portions 231.
Then, step S04 is: carry out a developing process, so that the thickness d 1 in optical filtering portion 231 is less than the maximum gauge d2 of these adjacent light shielding parts 221.In this, on the first direction D1 of vertical first surface S1, the thickness d 1 in all of optical filtering portion 231 is both less than the maximum gauge d2 of these adjacent light shielding parts 221, and preferably, the thickness d 1 in optical filtering portion 231 is between the 50%～95% of the maximum gauge d2 of these adjacent light shielding parts.Then, then step S05 is performed: carry out a curing process, to form a first substrate 2.As shown in Figure 3 D, unexposed link part chromatograph completely (light shielding part 221) can be taken away by developing process by developing agent reaction, after baking-curing technique, obtain the thickness in required optical filtering portion 231, the control of planarization Yu thickness to reach optical filtering portion 231.
Therefore, the present embodiment is the link reaction that the mode by back-exposure controls these optical filtering portions 231, to remove unexposed link part chromatograph completely in developing process so that the thickness d 1 in optical filtering portion 231 is less than the maximum gauge d2 of adjacent light shielding part 221.Whereby, compared with prior art, can improve in prior art, the irregular colour phenomenon that the difference in thickness of filter layer 23 material causes, also avoid adjacent optical filtering portion 231 to repeat crossover simultaneously on light shielding part 221, cause the phenomenon of colour mixture.
As shown in Figure 3 D, the first substrate 2 completed has base material 21, light shield layer 22 and filter layer 23.Light shield layer 22 is arranged on the first surface S1 of base material 21, and there are multiple light shielding parts 221 of interval configuration, and filter layer 23 is also arranged on first surface S1, and there is multiple optical filtering portion 231, and be respectively provided with an optical filtering portion 231 between two these light shielding parts 221 adjacent.It addition, on the first direction D1 of vertical first surface S1, the thickness d 1 in these optical filtering portions 231 is less than the maximum gauge d2 of these light shielding parts 221.It is specifically intended that first substrate relative to Fig. 1, Fig. 3 D 2 be Fig. 1 invert (upper and lower position is exchanged).It addition, although the surface in these optical filtering portions 231 of Fig. 3 D display is smooth aspect, but in these optical filtering portions 231 obtained in actual technique, also can have centre higher, the arc aspect that periphery is relatively low, or there is middle relatively low, that periphery is higher groove aspect.
Additionally, first substrate 2 also can have a protective layer (such as over-coating, figure does not show), protective layer may be disposed on base material 21 and cover light shield layer 22 and filter layer 23.The material of protective layer can be Other substrate materials, resin material or inorganic material (such as SiOx/SiNx) etc., in order to protect light shield layer 22 and filter layer 23 not to be destroyed by the impact of subsequent technique.
It addition, refer to shown in Fig. 4, it is another process step schematic diagram of display floater manufacture method of present pre-ferred embodiments.
In fig. 4 it is shown that the manufacture method of panel may also include a step S06: by relative with a second substrate 3 for first substrate 2 and set, and a display dielectric layer is arranged between first substrate 2 and second substrate 3 to form display floater 1.Owing to the display floater 1 of the present embodiment is display panels, therefore, first substrate 2 is relative with second substrate 3 and sets, sandwiched display dielectric layer 4 (Fig. 1) between the two.In addition, display floater 1 may also include multi-strip scanning line (figure do not show) and a plurality of data lines (figure does not show), and these scanning lines go out multiple (secondary) pixel ((secondary) pixel can a corresponding optical filtering portion 231) with these data wire definables.Therefore, the thin film transistor (TFT) conducting that each scanning line can be made respectively corresponding when these scanning lines of display floater 1 receive scan signal, and the data signal of every for correspondence a line (secondary) pixel is sent to by these data wires the pixel electrode of these (secondary) pixels of correspondence, make display floater 1 can show picture.
Refer to shown in Fig. 5 A to Fig. 8 B, the manufacture process schematic diagram of its respectively first substrate 2a～2d of different embodiments.
Formed on above-mentioned first surface S1 in the step S01 of multiple light shielding parts 221, as shown in Fig. 5 A and Fig. 5 B, also can form at least one groove U on these light shielding parts 221 respectively.In this, half mode mask (half-tonemask can be passed through, HTM) gray level mask more than or, or one accurate slit mask (fineslitmask) in these light shielding parts 221 away from the side of first surface S1 is formed a groove U, and the cross sectional shape of groove U is such as polygon (tetragon), then through forming first substrate 2a after exposure and curing process.The purpose designing groove U on these light shielding parts 221 is: if excessive when inserting pigment or dyestuff in step S02, excessive pigment or dyestuff can be allowed to enter in this groove U, and in back-exposure technique, pigment or dyestuff in groove U can be blocked portion 221 and cover without exposing, therefore can be removed completely in developing process.Whereby, pigment or the tolerance of dyestuff instillation technique can be improved.
It addition, as shown in Fig. 6 A and Fig. 6 B, it it is two with Fig. 5 A and Fig. 5 B groove U quantity formed away from the side of first surface S1 the difference is that, each light shielding part 221 of first substrate 2b.
It addition, as shown in figs. 7 a and 7b, with Fig. 5 A and Fig. 5 B the difference is that, the cross sectional shape of the groove U of first substrate 2c is arc.
Additionally, as shown in Fig. 8 A and Fig. 8 B, with Fig. 5 A and Fig. 5 B the difference is that, in step S01, it it is not formation groove on these light shielding parts 221, but forming prominent shape so that each light shielding part 221 can be divided into one first P1 and one second P2, and second P2 is connected to first P1.In this, first P1 contacts first surface S1, and second P2 is then highlighted away from the side of first surface S1 by first P1.Finally, after development and curing process, first substrate 2d can be formed, and on first direction D1, the thickness in the optical filtering portion 231 of first substrate 2d is less than the maximum gauge d3 of light shielding part 221.
Special one is mentioned that, in a further embodiment, for instance shown in Fig. 8 C, first P1 of these light shielding parts 221 of first substrate 2e and the shape of second P2 and the first substrate 2d of Fig. 8 B different light shielding part 221 of Fig. 8 C (similar snow-man shape).Additionally, the optical filtering portion 231 of first substrate 2e is except the sidewall P11 that first P1 is completely covered, also cover the sidewall P21 of second P2 of part, and optical filtering portion 231 cover the ratio of sidewall P21 of second P2 can be second whole sidewall P21 ratio of P2 1% to 90% between.In addition, in the present embodiment, on a cross section parallel with base material 21 (namely on second direction D2), first P1 has one first maximum width W1, the junction of first P1 and second P2 has one second width W2, and second P2 has one the 3rd maximum width W3, and the first width W1 is more than the second width W2 (W1 > W2), and the 3rd width W3 is more than the second width W2 (W3 > W2).
It addition, refer to shown in Fig. 9, it is the schematic diagram of a kind of display device 5.
Display device 5 includes display floater 6 and a backlight module 7 (BacklightModule), and display floater 6 and backlight module 7 are oppositely arranged.Wherein, display device 5 is such as a liquid crystal indicator, and display floater 6 has a first substrate, a second substrate and a display dielectric layer, and display dielectric layer is folded between first substrate and second substrate.Wherein, the first substrate of display floater 6 can be above-mentioned first substrate 2,2a～2e one of them, or its change aspect, concrete technology contents can refer to above-mentioned, no longer explains more.When the light E that backlight module 7 sends is through display floater 6, can show that color forms image by each pixel of display floater 6.
In sum, in the display floater and manufacture method thereof of the present invention, on the first surface of a base material, form multiple light shielding part, on first surface, also form multiple optical filtering portion, and make, between two these light shielding parts adjacent, there is an optical filtering portion.It addition, irradiated base material also by light by the second surface relative with first surface, to carry out an exposure technology so that developed and after curing process, the thickness in optical filtering portion is less than the maximum gauge of these adjacent light shielding parts.Therefore, the present invention is the link reaction that the mode by back-exposure controls chromatograph, to remove unexposed link part chromatograph completely in developing process.Whereby, compared with prior art, can improve in prior art, the irregular colour phenomenon that the difference in thickness of filter material causes.
The foregoing is only illustrative, but not be restricted person.Any spirit without departing from the present invention and category, and to its equivalent modifications carried out or change, be intended to be limited solely by claim.
Claims (10)
1. a display floater, it is characterised in that including:
One first substrate, there is a base material, multiple light shielding part and multiple optical filtering portion, described light shielding part and described optical filtering portion are arranged on a first surface of this base material, described light shielding part and described optical filtering portion are that interval is arranged, and the thickness of one of them in described optical filtering portion is less than the maximum gauge of adjacent described light shielding part；
One second substrate is relative with this first substrate and set；And
One display dielectric layer, is arranged between this first substrate and this second substrate.
2. display floater as claimed in claim 1, it is characterised in that one of them of described light shielding part has at least one groove away from the side of this first surface, and the cross sectional shape of this groove is polygon or arc.
3. display floater as claimed in claim 1, it is characterised in that one of them of described light shielding part is divided into one first and one second, this first contacts this first surface, and this second is connected to this first side away from this first surface.
4. display floater as claimed in claim 3, it is characterized in that, on a cross section parallel with this base material, this first has one first maximum width, this first has one second width with this junction of second, this second has one the 3rd maximum width, and this first width is more than this second width, and the 3rd width is more than this second width.
5. display floater as claimed in claim 3, it is characterized in that, one of them of described optical filtering portion be completely covered this sidewall of first and part this sidewall of second, and this optical filtering portion cover this sidewall of second ratio is these second whole side-wall ratios 1% to 90% between.
6. display floater as claimed in claim 1, it is characterised in that the thickness of one of them in described optical filtering portion is between the 50%～95% of the maximum gauge of adjacent described light shielding part.
7. the manufacture method of a display floater, it is characterised in that including:
Multiple light shielding part is formed on a first surface of a base material；
On this first surface, form multiple optical filtering portion, and between two adjacent described light shielding parts, there is an optical filtering portion；
This base material is irradiated by a second surface relative with this first surface, to carry out an exposure technology with a light；
Carry out a developing process, so that the thickness in this optical filtering portion is less than the maximum gauge of adjacent described light shielding part；And
Carry out a curing process, to form a first substrate.
8. manufacture method as claimed in claim 7, it is characterised in that also include:
This first substrate and a second substrate are set relatively, and a display dielectric layer is arranged between this first substrate and this second substrate to form this display floater.
9. manufacture method as claimed in claim 7, it is characterised in that formed in the step of one layer of light shield layer on this first surface, forms at least one groove also by half mode mask, gray level mask more than one or an accurate slit mask on described light shielding part.
10. manufacture method as claimed in claim 7, it is characterised in that this light is that the wavelength of ultraviolet or this light is between 365 nanometers to 435 nanometers.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410775193.8A CN105785630A (en) | 2014-12-15 | 2014-12-15 | Display panel and manufacture method for same |
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| CN201410775193.8A CN105785630A (en) | 2014-12-15 | 2014-12-15 | Display panel and manufacture method for same |
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| CN105785630A true CN105785630A (en) | 2016-07-20 |
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| CN201410775193.8A Pending CN105785630A (en) | 2014-12-15 | 2014-12-15 | Display panel and manufacture method for same |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021223300A1 (en) * | 2020-05-08 | 2021-11-11 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and display device |
| CN114280838A (en) * | 2021-12-28 | 2022-04-05 | Tcl华星光电技术有限公司 | Preparation method of color film substrate, color film substrate and display panel |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1431527A (en) * | 2002-01-11 | 2003-07-23 | 财团法人工业技术研究院 | Method for manufacturing color filter by use of micro flow liquid |
| JP2011128208A (en) * | 2009-12-15 | 2011-06-30 | Toppan Printing Co Ltd | Color filter substrate and method for manufacturing the same |
| CN102636904A (en) * | 2012-04-16 | 2012-08-15 | 深圳市华星光电技术有限公司 | Color filter and production method thereof as well as liquid crystal panel |
| CN102645693A (en) * | 2012-04-20 | 2012-08-22 | 深圳市华星光电技术有限公司 | Color filter and method for manufacturing same |
-
2014
- 2014-12-15 CN CN201410775193.8A patent/CN105785630A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1431527A (en) * | 2002-01-11 | 2003-07-23 | 财团法人工业技术研究院 | Method for manufacturing color filter by use of micro flow liquid |
| JP2011128208A (en) * | 2009-12-15 | 2011-06-30 | Toppan Printing Co Ltd | Color filter substrate and method for manufacturing the same |
| CN102636904A (en) * | 2012-04-16 | 2012-08-15 | 深圳市华星光电技术有限公司 | Color filter and production method thereof as well as liquid crystal panel |
| CN102645693A (en) * | 2012-04-20 | 2012-08-22 | 深圳市华星光电技术有限公司 | Color filter and method for manufacturing same |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021223300A1 (en) * | 2020-05-08 | 2021-11-11 | 武汉华星光电半导体显示技术有限公司 | Oled display panel and display device |
| US11925090B2 (en) | 2020-05-08 | 2024-03-05 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | OLED display panel including photoresist having stacked defining layers and display device |
| CN114280838A (en) * | 2021-12-28 | 2022-04-05 | Tcl华星光电技术有限公司 | Preparation method of color film substrate, color film substrate and display panel |
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Application publication date: 20160720 |