CN100399069C - Method for manufacturing color optical filter - Google Patents

Method for manufacturing color optical filter Download PDF

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Publication number
CN100399069C
CN100399069C CNB2005100721398A CN200510072139A CN100399069C CN 100399069 C CN100399069 C CN 100399069C CN B2005100721398 A CNB2005100721398 A CN B2005100721398A CN 200510072139 A CN200510072139 A CN 200510072139A CN 100399069 C CN100399069 C CN 100399069C
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CN
China
Prior art keywords
light shield
method
characterized
colored filter
shield layer
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CNB2005100721398A
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Chinese (zh)
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CN1869740A (en
Inventor
许丰麟
李怀安
罗宇城
王君铭
陈玉仙
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中华映管股份有限公司
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Priority to CNB2005100721398A priority Critical patent/CN100399069C/en
Publication of CN1869740A publication Critical patent/CN1869740A/en
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Publication of CN100399069C publication Critical patent/CN100399069C/en

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Abstract

The present invention relates to a method for making a color light filter. First of all, a baseplate is provided, wherein a light-shading layer is arranged on the baseplate, and a plurality of sub-pixel areas are defined on the baseplate by the light-shading layer. Subsequently, template printing process is carried out, a water draining layer is formed on the light-shading layer, or surface silylation technology is carried out for the light-shading layer via ink-jet printing technology. Then, color light-filtering layers are formed in the sub-pixel areas. The method can prevent pigments in adjacent sub-pixel areas from mixing.

Description

Make the method for colored filter

Technical field

The present invention relates to a kind of manufacturing method of color filters, and particularly relate to a kind of manufacturing process of colored filter of the mutual colour mixture of pigment of avoiding adjacent pixel region.

Background technology

Along with the development of computing machine, network and multimedia technology usefulness, picture information little by little changes numerical information into from analog information.In recent years, the weight of many electronic installations and size have also become light and thin.With the display device is example, though (cathode ray tube CRT) is widely used traditional cathode-ray tube (CRT), yet it has larger volume, high radiant quantity, weight is heavier and shortcoming such as high energy consumption.Therefore, (flat panel display, FPD) advantage such as thin, in light weight, the smooth picture of the size that is had, radiationless and low energy consumption makes it little by little become the main flow of display device to flat-panel screens.Common flat-panel screens for example comprises LCD (liquidcrystal display at present, LCD), display of organic electroluminescence (organicelectro-luminescence display, OLED) or plasma scope (plasmadisplay panel, PDP), wherein ripe with the development of LCD especially.

Known LCD is by thin film transistor (TFT) (thin film transistor, TFT) array, colored filter, and be arranged at common composition of liquid crystal layer institute between thin film transistor (TFT) array and the colored filter.Generally speaking, can make LCD carry out full color by colored filter shows.Colored filter is arranged on the transparent glass substrate, wherein light shield layer and chromatic filter layer are arranged on the transparent glass substrate respectively, light shield layer is in order to shield lights, and chromatic filter layer comprises red filter unit, green filter unit and blue filter unit that corresponding pixel each time is provided with.

Recently, a kind of method of utilizing ink jet printing (inkjet printing) to form chromatic filter layer is developed.This manufacture method at first forms light shield layer on substrate, to define pixel region a plurality of times.Then, carry out ink-jet printing process so that pigment (red, green, blueness) is injected in defined pixel region of light shield layer.Then, carry out hot baking process (thermal bakingprocess) so that pigment is solidified.

Above-mentioned known method of making colored filter by ink-jet printing process still has some shortcomings.For example; in ink-jet printing process; when being injected into pigment in the inferior pixel region between the light shield layer pattern; usually can be a bit larger tham the volume that time pixel region is had owing to inject the volume of pigment, so the elevation of water of the pigment in the pixel region can be higher than the surface of light shield layer usually each time.Therefore, if fail ink-jet printing process is carried out good control, then just may produce the problem of colour mixture at the pigment of adjacent pixel region.

In order to address the above problem, a kind of known method is before forming chromatic filter layer, utilizes plasma modifying process (plasma modified process) earlier, and form hydrophobic membrane (hydrophobic film) on light shield layer.Yet inaccurate technological parameter may cause forming island structure (island structure) on light shield layer, and fails and then to cause the problem of pigment overflow between island structure as forming smooth hydrophobic membrane as the expection.Moreover, employed carbon tetrafluoride (CF in the plasma modifying process 4) be toxic gas, also can cause the big problem in the security.

In addition, publication number provides a kind of method for 09230127 Jap.P., and it is prior to be coated with 25% C comprehensively on the substrate 8F 17C 2H 4-Si-(OCH 3) 3/ methanol solution (C 8F 17C 2H 4-Si-(OCH 3) 3Be the product that silicon company of Japanese Toshiba makes, " TSL-8233 ").Then, utilize 1% fluorinated, acid damping fluid (buffer fluoric acid, 50% hydrofluorite (HF): 40% ammonium fluoride (NH again 4F)) carry out etch process.Then, in inferior pixel region, form chromatic filter layer again.Because 25% C 8F 17C 2H 4-Si-(OCH 3) 3/ methanol solution is coated on the whole base plate, so even after carry out cleaning, the substrate surface in the inferior pixel region also still can have hydrophobicity, therefore the pigment in adjacent pixel region still can produce the problem of colour mixture.In addition, the time of above-mentioned whole technologies need reach more than 8 hours, and the use of hydrofluorite has suitable danger.

Summary of the invention

In view of this, purpose of the present invention just provides a kind of method of making colored filter, is suitable for avoiding the colour mixture problem of the pigment of adjacent pixel region.

The present invention proposes a kind of method of making colored filter.At first, provide substrate, wherein substrate is provided with light shield layer, and this light shield layer defines pixel region a plurality of times on substrate.Then, carry out stencilization technology, only on this light shield layer, to form hydrophobic layer.Then, in inferior pixel region, form chromatic filter layer.

In one embodiment of this invention, the step of above-mentioned stencilization technology for example provides masterplate (stencil) to be positioned on the substrate earlier, and wherein masterplate covers time pixel region and exposes light shield layer.Then, on the light shield layer that masterplate exposed, insert the liquid hydrophobic material.Then, the liquid towards hydrophobic material is cured processing, to form hydrophobic layer.Afterwards, remove masterplate.

In one embodiment of this invention, the material of above-mentioned hydrophobic layer comprises paraffin (paraffin).

In one embodiment of this invention, the method for above-mentioned manufacturing colored filter also comprises removing hydrophobic layer after forming chromatic filter layer.

In one embodiment of this invention, use the above-mentioned hydrophobic layer of solution removal, this solution for example is ether (ether).

In one embodiment of this invention, form above-mentioned chromatic filter layer by carrying out ink-jet printing process or photoetching process.

In one embodiment of this invention, above-mentioned light shield layer for example is black matrix.

In one embodiment of this invention, the material of above-mentioned light shield layer comprises epoxy resin (Epoxyresin).

The present invention proposes the another kind of method of making colored filter.At first, provide substrate, wherein substrate is provided with light shield layer, and this light shield layer defines pixel region a plurality of times on substrate.Then, handle (surface silylatedtreatment) by ink-jet printing process only light shield layer is carried out the surface silicon alkanisation.Afterwards, in inferior pixel region, form chromatic filter layer.

In one embodiment of this invention, above-mentioned light shield layer for example is black matrix.

In one embodiment of this invention, the material of above-mentioned light shield layer comprises epoxy resin.

In one embodiment of this invention, above-mentioned surface silicon alkanisation is handled and is comprised silicon-coating alkanisation thing on the surface of light shield layer, and the chemical formula of this silanization thing for example is 2X-Si-2Y, and wherein X is a halogen, and Y is a hydrophobic functional group.For example, the silanization thing for example comprise dimethyldichlorosilane (Dimethyldichlorosilane, DMDCS).

In one embodiment of this invention, the method for above-mentioned manufacturing colored filter between the step of step that the surface silicon alkanisation is handled and formation chromatic filter layer, also comprises and carries out cleaning.

In one embodiment of this invention, above-mentioned cleaning comprises that use solution cleans light shield layer.For example, this solution comprises methyl alcohol.

In one embodiment of this invention, form above-mentioned chromatic filter layer by carrying out ink-jet printing process or photoetching process.

The present invention is because of before forming chromatic filter layer, adopt stencilization and on light shield layer, form hydrophobic layer or by ink-jet printing process light shield layer is carried out the surface silicon alkanisation and handle, therefore can thoroughly avoid the pigment of adjacent pixel region to produce the problem of colour mixture, and then promote the acceptance rate of technology.

For above and other objects of the present invention, feature and advantage can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.

Description of drawings

Figure 1A~1G is depicted as a kind of making flow process diagrammatic cross-section of making the method for colored filter in a preferred embodiment of the present invention.

Fig. 2 A~2D is depicted as a kind of making flow process diagrammatic cross-section of making the method for colored filter in another preferred embodiment of the present invention.

Figure 3 shows that the reaction synoptic diagram between the light shield layer that dimethyldichlorosilane thing and epoxy resin forms.

The main element description of symbols

100: colored filter

100a, 200a: substrate

102,202: inferior pixel region

110,210: light shield layer

120: hydrophobic layer

122: the liquid hydrophobic material

130,230: chromatic filter layer

132,232: pigment

150: masterplate

160: scraper

222: solution

224: cleaning solution

Embodiment

Figure 1A~1G is depicted as a kind of making flow process diagrammatic cross-section of making the method for colored filter in a preferred embodiment of the present invention.

Please refer to Figure 1A, at first, provide substrate 100a, wherein, this substrate 100a is for example for having the glass substrate of high light transmittance.And substrate 100a is provided with light shield layer 110, and this light shield layer 110 defines pixel region 102 a plurality of times on substrate 100a.Wherein, light shield layer 110 for example is black matrix, and the material of light shield layer 110 for example is epoxy resin, or other has the material of good optical shielding property and antiradar reflectivity.In a preferred embodiment of the present invention, the method that forms light shield layer 110 comprises by method of spin coating 100a formation photosensitivity resin bed (not shown) on substrate.Then, this photosensitivity resin bed by photoetching process to form light shield layer 110.This light shield layer 110 is in order to separate the coloured light of emitted different colours effectively, to increase the purity of display color.

Then, please refer to Figure 1B~1E, carry out stencilization technology, on this light shield layer 110, to form hydrophobic layer 120.Shown in Figure 1B, masterplate 150 is arranged at earlier on the substrate 100a, and wherein, masterplate 150 covers time pixel region 102 and exposes light shield layer 110.Then, shown in Fig. 1 C, by scraper 160 liquid hydrophobic material 122 is inserted the upper surface of light shield layer 110, wherein, this hydrophobic material for example is a paraffin.Then, shown in Fig. 1 D, this liquid hydrophobic material 122 solidifies by cooling processing, and and then forms hydrophobic layer 120.Afterwards, shown in Fig. 1 E, remove masterplate 150, and keep hydrophobic layer 120 to be covered on the light shield layer 110 from substrate 100a.

Then, please refer to Fig. 1 F, in inferior pixel region 102, form chromatic filter layer 130.Shown in Fig. 1 F, utilize ink-jet printing process or photoetching process that pigment 132 is injected in 110 defined pixel regions of light shield layer 102.The pigment that injects time pixel region 102 for example is redness, green and blue pigment.And, utilize exposure technology or drying process that above-mentioned pigment 132 is solidified, and then in inferior pixel region 102, form chromatic filter layer 130.This chromatic filter layer 130 for example comprises red filter unit, green filter unit and the blue filter unit that corresponding each time pixel region 102 is arranged.

Afterwards, please refer to Fig. 1 G, utilize solution to remove hydrophobic layer 120, this solution for example is ether.Then, carry out cleaning and hot baking process.Thus, according to above-mentioned technology, just can produce colored filter 100 shown in Fig. 1 G.

From the above, in a preferred embodiment of the present invention, adopt for example paraffin, it has the characteristic of high hydrophobicity and low melting point (being about 50 ℃~65 ℃), and forms hydrophobic layer on light shield layer 110.It should be noted that therefore other zone except light shield layer can not covered by hydrophobic material, and this kind technology is simple than known method owing to be to utilize stencilization technology to form hydrophobic layer, and cost of manufacture is also lower.

Fig. 2 A~2D is depicted as a kind of making flow process diagrammatic cross-section of making the method for colored filter in another preferred embodiment of the present invention.

Shown in Fig. 2 A, at first, provide substrate 200a, and substrate 200a is provided with light shield layer 210, it defines pixel region 202 a plurality of times on substrate 200a.Wherein, light shield layer 210 for example is black matrix, and the composition material of light shield layer 210 for example is epoxy resin, or other has the material of good optical shielding property and antiradar reflectivity.Yet, the effect of this light shield layer 210 and technology all with the preferred embodiment of the invention described above in identical or similar, promptly no longer described in detail at this.

Then, shown in Fig. 2 B, by ink-jet printing process light shield layer 210 is carried out the surface silicon alkanisation and handle.This surface silicon alkanisation handle for example be silicon-coating alkanisation thing on light shield layer 210, wherein the chemical formula of silanization thing for example is 2X-Si-2Y, wherein X is a halogen, it for example is Cl, and Y is a hydrophobic functional group, it for example is CH 3In a preferred embodiment, the silanization thing for example for contain 20% dimethyldichlorosilane (Dimethyldichlorosilane, DMDCS)/solution 222 of toluene.Figure 3 shows that the reaction synoptic diagram between the light shield layer that dimethyldichlorosilane thing and epoxy resin forms.As shown in Figure 3, dimethyldichlorosilane-the Cl atom can with epoxy resin in-the OH radical reaction, and then form on the surface of light shield layer and to have-O-Si-CH 3Hydrophobic structure.

Then, please refer to Fig. 2 C, use cleaning solution 224 to carry out cleaning.In a preferred embodiment, this cleaning solution for example is a methyl alcohol because methyl alcohol can with in the dimethyldichlorosilane not Cheng Jian-the Cl atom is substituted by-CH 3Functional group.Then, can utilize the air knife (not shown) to remove cleaning solution 224.

Afterwards, shown in Fig. 2 D, carry out ink-jet printing process or photoetching process, and in inferior pixel region 202, form chromatic filter layer 230.It for example is that pigment 232 such as comprising redness, green and blueness is inserted time pixel region 202, and utilizes hot baking process that above-mentioned pigment 232 is solidified, and then forms chromatic filter layer 230 in inferior pixel region 202.

In above-mentioned preferred embodiment, utilize ink jet printing mode that light shield layer is carried out silanization and handle with light shield layer upgrading (modified).Owing to ink only can be coated on the light shield layer by ink jet printing mode, institute's pixel region in proper order can't be silylated and upgrading.Therefore, when pigment was injected into time pixel region, the phenomenon of pigment overflow can't take place, and then can avoid the mixed color phenomenon between the pixel adjacent time.In addition, the use amount of using ink-jetting style also can save the silanization thing.

What deserves to be mentioned is, though the foregoing description only proposes the technology of colored filter, but the those skilled in the art as can be known, said method also can be applicable to Organic Light Emitting Diode (polymerlight emitted diode, PLED) in the technology, so that (hole through layer HTL) waits structure interface to carry out the chemical upgrading to indium tin oxide (ITO), trap (thewell), bank (bank) or hole injection layer.

In sum, the method for the present invention's manufacturing colored filter is carried out the silanization processing by the formation hydrophobic layer or to the surface of light shield layer, and can thoroughly solve the colour mixture problem between the pixel region adjacent time.Compare in known technology, the invention provides safety and better simply technology, and have lower cost and higher technology acceptance rate.

Though the present invention discloses as above with preferred embodiment; right its is not in order to qualification the present invention, any one of ordinary skill in the art, without departing from the spirit and scope of the present invention; when can doing a little change and improvement, so protection scope of the present invention is as the criterion when looking the claim person of defining.

Claims (18)

1. method of making colored filter is characterized in that comprising:
Substrate is provided, and this substrate is provided with light shield layer, and this light shield layer defines a plurality of times pixel region on this substrate;
Carry out stencilization technology, only on this light shield layer, to form hydrophobic layer; And
In above-mentioned pixel region, form chromatic filter layer.
2. the method for manufacturing colored filter according to claim 1 is characterized in that the step of this stencilization technology comprises:
Provide masterplate to be positioned on this substrate, wherein this masterplate covers above-mentioned pixel region and exposes this light shield layer;
On this light shield layer that this masterplate exposed, insert the liquid hydrophobic material;
This liquid hydrophobic material is cured processing, to form this hydrophobic layer; And
Remove this masterplate.
3. the method for manufacturing colored filter according to claim 1 is characterized in that the material of this hydrophobic layer comprises paraffin.
4. the method for manufacturing colored filter according to claim 1 is characterized in that also comprising after forming this chromatic filter layer removing this hydrophobic layer.
5. the method for manufacturing colored filter according to claim 4 is characterized in that using solution and removes this hydrophobic layer.
6. the method for manufacturing colored filter according to claim 5 is characterized in that this solution comprises ether.
7. the method for manufacturing colored filter according to claim 1 is characterized in that forming this chromatic filter layer by carrying out ink-jet printing process or photoetching process.
8. the method for manufacturing colored filter according to claim 1 is characterized in that this light shield layer comprises black matrix.
9. the method for manufacturing colored filter according to claim 1 is characterized in that the material of this light shield layer comprises epoxy resin.
10. method of making colored filter is characterized in that comprising:
Substrate is provided, and this substrate is provided with light shield layer, and this light shield layer defines a plurality of times pixel region on this substrate;
Handle only this light shield layer is carried out the surface silicon alkanisation by ink-jet printing process; And
In above-mentioned pixel region, form chromatic filter layer.
11. the method for manufacturing colored filter according to claim 10 is characterized in that this light shield layer comprises black matrix.
12. the method for manufacturing colored filter according to claim 10 is characterized in that the material of this light shield layer comprises epoxy resin.
13. the method for manufacturing colored filter according to claim 10, it is characterized in that this surface silicon alkanisation processing comprises that silicon-coating alkanisation thing is on the surface of this light shield layer, and the chemical formula of this silanization thing is 2X-Si-2Y, and wherein X is a halogen, and Y is a hydrophobic functional group.
14. the method for manufacturing colored filter according to claim 13 is characterized in that this silanization thing comprises dimethyldichlorosilane.
15. the method for manufacturing colored filter according to claim 10 is characterized in that also comprising and carrying out cleaning between the step of this surface silicon alkanisation treatment step and this chromatic filter layer of formation.
16. the method for manufacturing colored filter according to claim 15 is characterized in that this cleaning comprises the step of using solution to clean this light shield layer.
17. the method for manufacturing colored filter according to claim 16 is characterized in that this solution comprises methyl alcohol.
18. the method for manufacturing colored filter according to claim 10 is characterized in that forming this chromatic filter layer by carrying out ink-jet printing process or photoetching process.
CNB2005100721398A 2005-05-25 2005-05-25 Method for manufacturing color optical filter CN100399069C (en)

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CN100399069C true CN100399069C (en) 2008-07-02

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100447591C (en) * 2007-01-24 2008-12-31 友达光电股份有限公司 Color filter substrate and manufacture method therefor
CN101546008B (en) * 2008-03-28 2010-12-01 中华映管股份有限公司 Color filter and manufacturing method thereof
CN101726783B (en) * 2008-10-13 2011-09-21 华映视讯(吴江)有限公司 Method for manufacturing colored filtering substrate
WO2010141713A2 (en) * 2009-06-04 2010-12-09 E. I. Du Pont De Nemours And Company Multicolor electronic devices and processes of forming the same by printing
CN104090419A (en) * 2014-07-11 2014-10-08 京东方科技集团股份有限公司 Color filter, manufacturing method thereof and display device

Citations (5)

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Publication number Priority date Publication date Assignee Title
JPH08292313A (en) * 1995-04-20 1996-11-05 Canon Inc Production of color filter, color filter obtained by this method and liquid crystal display device including this color filter
JP2000221485A (en) * 1999-01-29 2000-08-11 Nippon Sheet Glass Co Ltd Substrate for liquid crystal display and its manufacture
JP2000258622A (en) * 1999-03-10 2000-09-22 Canon Inc Color filter, its production and liquid crystal device using same
US6468702B1 (en) * 1999-06-14 2002-10-22 Lg. Philips Lcd Co., Ltd. Color filter and method of manufacturing the same
CN1517727A (en) * 2003-01-17 2004-08-04 统宝光电股份有限公司 Manufacturing meethod of colour filter

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08292313A (en) * 1995-04-20 1996-11-05 Canon Inc Production of color filter, color filter obtained by this method and liquid crystal display device including this color filter
JP2000221485A (en) * 1999-01-29 2000-08-11 Nippon Sheet Glass Co Ltd Substrate for liquid crystal display and its manufacture
JP2000258622A (en) * 1999-03-10 2000-09-22 Canon Inc Color filter, its production and liquid crystal device using same
US6468702B1 (en) * 1999-06-14 2002-10-22 Lg. Philips Lcd Co., Ltd. Color filter and method of manufacturing the same
CN1517727A (en) * 2003-01-17 2004-08-04 统宝光电股份有限公司 Manufacturing meethod of colour filter

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