CN101536158B - 清洁基板的方法 - Google Patents

清洁基板的方法 Download PDF

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Publication number
CN101536158B
CN101536158B CN2007800422482A CN200780042248A CN101536158B CN 101536158 B CN101536158 B CN 101536158B CN 2007800422482 A CN2007800422482 A CN 2007800422482A CN 200780042248 A CN200780042248 A CN 200780042248A CN 101536158 B CN101536158 B CN 101536158B
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CN
China
Prior art keywords
surface tension
substrate
water
azeotrope
liquid
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CN2007800422482A
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English (en)
Chinese (zh)
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CN101536158A (zh
Inventor
金大熙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aisi Co ltd
Original Assignee
MUJIN ELECTRONICS CO Ltd
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Publication of CN101536158A publication Critical patent/CN101536158A/zh
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    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5031—Azeotropic mixtures of non-halogenated solvents
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02052—Wet cleaning only

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CN2007800422482A 2006-11-14 2007-11-09 清洁基板的方法 Active CN101536158B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020060112014 2006-11-14
KR1020060112014A KR100862911B1 (ko) 2006-11-14 2006-11-14 기판 세정 방법
KR10-2006-0112014 2006-11-14
PCT/KR2007/005633 WO2008060069A1 (en) 2006-11-14 2007-11-09 Method for cleaning a substrate

Publications (2)

Publication Number Publication Date
CN101536158A CN101536158A (zh) 2009-09-16
CN101536158B true CN101536158B (zh) 2012-01-11

Family

ID=39401843

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800422482A Active CN101536158B (zh) 2006-11-14 2007-11-09 清洁基板的方法

Country Status (4)

Country Link
KR (1) KR100862911B1 (ko)
CN (1) CN101536158B (ko)
TW (1) TWI361451B (ko)
WO (1) WO2008060069A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113539900B (zh) * 2021-07-16 2023-09-19 长江存储科技有限责任公司 用于干燥晶圆的方法和装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1441466A (zh) * 2002-02-28 2003-09-10 A技术株式会社 洁净与干燥半导体晶圆的方法与装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7021319B2 (en) 2000-06-26 2006-04-04 Applied Materials Inc. Assisted rinsing in a single wafer cleaning process
KR100413030B1 (en) * 2002-10-01 2003-12-31 Tech Ltd A Semiconductor wafer cleaning and drying apparatus
JP4333866B2 (ja) 2002-09-26 2009-09-16 大日本スクリーン製造株式会社 基板処理方法および基板処理装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1441466A (zh) * 2002-02-28 2003-09-10 A技术株式会社 洁净与干燥半导体晶圆的方法与装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开2004-119717A 2004.04.15

Also Published As

Publication number Publication date
KR100862911B1 (ko) 2008-10-13
TW200822195A (en) 2008-05-16
KR20080043444A (ko) 2008-05-19
CN101536158A (zh) 2009-09-16
WO2008060069A1 (en) 2008-05-22
TWI361451B (en) 2012-04-01

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Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20220823

Address after: Gyeonggi Do, South Korea

Patentee after: Aisi Co.,Ltd.

Address before: Seoul, South Kerean

Patentee before: MUJIN ELECTRONICS Co.,Ltd.