CN101527334A - New method for cleaning thin film solar cell during manufacturing process - Google Patents
New method for cleaning thin film solar cell during manufacturing process Download PDFInfo
- Publication number
- CN101527334A CN101527334A CN200910116049A CN200910116049A CN101527334A CN 101527334 A CN101527334 A CN 101527334A CN 200910116049 A CN200910116049 A CN 200910116049A CN 200910116049 A CN200910116049 A CN 200910116049A CN 101527334 A CN101527334 A CN 101527334A
- Authority
- CN
- China
- Prior art keywords
- cleaning
- cleaning fluid
- film solar
- solar cell
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a new method for cleaning a thin film solar cell during manufacturing process. A new cleaning method is adopted during production process of the thin film solar cell according to different characteristics of various processes. Totally four times of cleaning are needed during the production process as follows: cleaning before film engraving of transparent conductive glass, cleaning after film engraving of the transparent conductive glass, cleaning after film engraving by deposition of a functional layer of the thin film solar cell and cleaning the solar cell. According to process characteristics, an ultrasonic cleaner is used for all four times of cleaning in sequence during the cell manufacturing process, which improves performance of the thin film solar cell.
Description
Technical field
The present invention relates to the cleaning method in the thin-film solar cells manufacture process, specially refer to the ultrasonic cleaning in the extensive thin-film solar cells production procedure.
Background technology
Thin-film solar cells is produced, and belongs to semiconductor industry, and cleannes and connection validity are had very big requirement.Therefore, need in process of production substrate is cleaned.In the prior art, for reducing cost and process complexity, use a round brush cleaning machine to finish whole four times usually in process of production and clean; (1) transparent conducting glass cleans; (2) transparent conducting glass cleans after carving film; (3) clean after nesa coating deposition battery functi on layer is carved film; (4) back electrode deposition is finished the cleaning of carving battery sheet behind the film for the third time.Main bulky grain and the greasy dirt of removing the surface in (1) mainly is cutting edge residue after removing surface and the subparticle and the greasy dirt that pollute residual in (1) back and carving film in (2), removes in (3) and carves the residue of carving amorphous silicon edge behind the film behind the film; (4) remove in and carve aluminium and amorphous silicon residue in groove behind the film.
Traditional round brush cleans principle: organic molecule has hydrophilic group and hydrophobic group in the cleaning fluid, rule according to " structure of matter similar person mix ", when having greasy dirt to exist, organic molecule hydrophobic group one end attracts with oil, hydrophilic group one end is towards water, forming thin film surrounds little oil droplet, stop little oil droplet to be bonded to each other, thereby obtain with oil is dispersate, with water is the emulsion of dispersant, reached the purpose of deoiling, but the cleaning dynamics that round brush cleans is limited after all, does not reach the cleaning purpose with the pollutant that is insoluble to the spot of cleaning fluid adhesive force is strong slightly.Therefore, the quality of thin-film solar cells does not reach desirable requirement under traditional cleaning way, and film quality is not high; Simultaneously, also can cause damage, reduce product quality the back electrode metal film.And residual cleaning fluid can cause damage to the back electrode metal film behind the cleaning transparent conducting glass.
Summary of the invention
The object of the present invention is to provide a kind of new method of cleaning in the thin-film solar cells manufacture process, with the subparticle on the better removing transparent conducting glass and greasy dirt and at the prerequisite that does not injure the back electrode metallic diaphragm removal of residue that goes down, make product when obtaining good surface appearance, on electrical property, be greatly improved.
For achieving the above object, the invention provides following technical scheme:
A kind of new method of cleaning in thin-film solar cells (comprising amorphous silicon, microcrystal silicon, the CIGS etc.) manufacture process, clean in the described battery manufacture process and comprise that transparent conducting glass cleans, transparent conducting glass cleans after carving film, deposit film battery functi on layer is carved film and is cleaned, the battery sheet cleans, and it is characterized in that:
Described each clean process is:
(1) cleaning fluid is scrubbed, and utilizes hairbrush, cleaning fluid that the bulky grain dirt of glass surface is carried out the physical property cleaning;
(2) cleaning fluid ultrasonic cleaning, the ultrasonic wave compressional wave has density to change, produce bubble in some specific region in the process of stretching molecule, the form of cavitation bubble exists in solution, in following one-period, produce the cavitation bubble explosion, produce 1, this active force of 000atm affacts the surface, dashes the pollutant on surface, in addition, cleaning fluid has dissolution to surface contaminant;
(3) ultra-pure water ultrasonic waves for cleaning does not add cleaning fluid;
(4) destatic.
A kind of new method of cleaning in the described thin-film solar cells manufacture process is characterized in that using in the ultrasonic cleaning process shower water to comprise running water, pure water, high purity deionized water; Cleaning fluid comprises proper sourness or alkaline cleaning fluid.
Described cleaning new method is characterized in that, is applied to the cleaning process that thin film solar cell sheet is produced, and to improve battery sheet cleannes, improves battery flake products quality.
Described cleaning new method is characterized in that, is applied to the cleaning process that thin film solar cell sheet is produced, and to improve battery sheet cleannes, improves battery flake products quality.
Compare with original technology, the present invention has following obvious advantage:
(1) avoids contaminated cleaning solution, improved the cleanliness factor of substrate greatly;
(2) technology is simple: easy to operate to machine adjustments in the battery sheet cleaning process, avoid cross pollution.
Embodiment
Select for use the combination ultrasonic cleaning machine to clean the battery sheet, so that increase and decrease or change the combination of each process components, whole technological processes of this cleaning machine are:
A, pan feeding;
B, abluent are scrubbed: utilize hairbrush+abluent that the bulky grain pollutant of glass surface is carried out the physical property cleaning;
C, wind are cut;
D, abluent ultrasonic waves for cleaning: the cavitation effect that utilizes ultrasonic wave to produce, in water, generate numerous micro-bubble, pressure in each bubble reaches 1000 atmospheric pressure, utilizes to have the explosion of the micro-bubble of High Voltage at glass surface, and the dust that microcosmic surface sticks is removed processing;
E, wind are cut;
F, ultrasonic waves for cleaning: the cavitation effect that utilizes ultrasonic wave to produce, in water, generate numerous micro-bubble, pressure in each bubble reaches 1000 atmospheric pressure, utilizes to have the explosion of the micro-bubble of High Voltage at glass surface, and the dust cleaning fluid that microcosmic surface sticks is removed processing;
G, wind are cut;
H, destatic;
J, discharging.
By cleaning, can be good at cleaning the battery sheet and remove the residue that stay behind the film quarter.
Use the spray Cleaning for High Capacity water to comprise running water, pure water, high purity deionized water in the ultrasonic cleaning process; Cleaning fluid comprises proper sourness or alkaline cleaning fluid.
Claims (2)
1, a kind of new method of cleaning in the thin-film solar cells manufacture process, cleaning comprises that transparent conducting glass cleans in the described battery manufacture process, and transparent conducting glass cleans after carving film, and deposit film battery functi on layer is carved film and cleaned, the battery sheet cleans, and it is characterized in that:
Described each clean process is:
(1) cleaning fluid is scrubbed, and utilizes hairbrush, cleaning fluid that the bulky grain dirt of glass surface is carried out the physical property cleaning;
(2) cleaning fluid ultrasonic cleaning, the ultrasonic wave compressional wave has density to change, produce bubble in some specific region in the process of stretching molecule, the form of cavitation bubble exists in solution, in following one-period, produce the cavitation bubble explosion, produce 1, this active force of 000atm affacts the surface, dashes the pollutant on surface, in addition, cleaning fluid has dissolution to surface contaminant;
(3) ultra-pure water ultrasonic waves for cleaning does not add cleaning fluid;
(4) destatic.
2, a kind of new method of cleaning in the thin-film solar cells manufacture process according to claim 1 is characterized in that using in the ultrasonic cleaning process shower water to comprise running water, pure water, high purity deionized water; Cleaning fluid comprises acidity or alkaline cleaning fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910116049A CN101527334A (en) | 2009-01-12 | 2009-01-12 | New method for cleaning thin film solar cell during manufacturing process |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN200910116049A CN101527334A (en) | 2009-01-12 | 2009-01-12 | New method for cleaning thin film solar cell during manufacturing process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101527334A true CN101527334A (en) | 2009-09-09 |
Family
ID=41095101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910116049A Pending CN101527334A (en) | 2009-01-12 | 2009-01-12 | New method for cleaning thin film solar cell during manufacturing process |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101527334A (en) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102315335A (en) * | 2011-04-13 | 2012-01-11 | 东旭集团有限公司 | Preparation process for reducing dead zone area of thin film solar cell |
| CN103357633A (en) * | 2013-07-17 | 2013-10-23 | 北京四方继保自动化股份有限公司 | Cleaning method for thin film solar cell glass substrates |
| CN106334702A (en) * | 2016-10-24 | 2017-01-18 | 中山瑞科新能源有限公司 | Device capable of recycling TCO (transparent conductive oxide) glass automatically |
| CN108624872A (en) * | 2018-04-25 | 2018-10-09 | 北京铂阳顶荣光伏科技有限公司 | Solar film battery reactive tank and its cleaning method |
| CN113257661A (en) * | 2021-04-14 | 2021-08-13 | 中环领先半导体材料有限公司 | Method for improving rinsing effect of 8-inch abrasive washing FO tank |
| CN113561673A (en) * | 2021-07-09 | 2021-10-29 | 深圳市信濠光电科技股份有限公司 | Printing process of foldable glass |
-
2009
- 2009-01-12 CN CN200910116049A patent/CN101527334A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102315335A (en) * | 2011-04-13 | 2012-01-11 | 东旭集团有限公司 | Preparation process for reducing dead zone area of thin film solar cell |
| CN103357633A (en) * | 2013-07-17 | 2013-10-23 | 北京四方继保自动化股份有限公司 | Cleaning method for thin film solar cell glass substrates |
| CN106334702A (en) * | 2016-10-24 | 2017-01-18 | 中山瑞科新能源有限公司 | Device capable of recycling TCO (transparent conductive oxide) glass automatically |
| CN108624872A (en) * | 2018-04-25 | 2018-10-09 | 北京铂阳顶荣光伏科技有限公司 | Solar film battery reactive tank and its cleaning method |
| CN113257661A (en) * | 2021-04-14 | 2021-08-13 | 中环领先半导体材料有限公司 | Method for improving rinsing effect of 8-inch abrasive washing FO tank |
| CN113561673A (en) * | 2021-07-09 | 2021-10-29 | 深圳市信濠光电科技股份有限公司 | Printing process of foldable glass |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101527334A (en) | New method for cleaning thin film solar cell during manufacturing process | |
| CN110665893B (en) | Method for cleaning oversized monocrystalline silicon wafer | |
| CN102299207A (en) | Method for manufacturing porous pyramid-type silicon surface light trapping structure for solar cell | |
| CN103464415A (en) | Solar monocrystalline silicon cleaning solution and cleaning method | |
| KR20150065741A (en) | Edgeless pulse plating and metal cleaning methods for solar cells | |
| CN104148348A (en) | Process of pre-cleaning TCO substrate glass in thin-film solar cell production | |
| CN102306687A (en) | Crystalline silica solar energy cell PECVD rainbow film reworking method | |
| CN108054236A (en) | Cleaning monocrystalline silicon etching method | |
| CN102601074A (en) | Method for cleaning TFT-LCD (thin film transistor liquid crystal display) glass substrate | |
| CN106328769A (en) | Method for processing mono-crystalline silicon piece surface | |
| CN102527676B (en) | Cleaning process method for etching resistant mask slurry | |
| WO2012102368A1 (en) | Solar battery element manufacturing method, solar battery element, and solar battery module | |
| CN104201244B (en) | Substandard products reworking method after a kind of crystal silicon solar cell sheet silk screen printing | |
| CN103357633A (en) | Cleaning method for thin film solar cell glass substrates | |
| CN104600148B (en) | A kind of amorphous silicon thin-film solar cell and manufacture method | |
| CN102299209B (en) | Method for manufacturing integrated film solar cell assembly | |
| CN104112795B (en) | A kind of production method of silicon heterogenous solar cell | |
| CN109174779A (en) | A kind of cleaning method of the PERC technique ALD aluminium gaily decorated basket | |
| CN102698983A (en) | Cleaning method for solar energy level silicon slice | |
| CN105529380A (en) | Preparation method for single crystalline silicon solar cell piece with polished back surface | |
| CN102211097A (en) | Ultrasonic cleaning device for film coated graphite frame | |
| CN106299027B (en) | A kind of preparation method of N-type monocrystalline double-side cell | |
| CN103567633A (en) | Special cleaning method for removing dust for CIGS subjected to laser front cutting | |
| CN109638110A (en) | A kind of preparation method based on two-sided PERC cell piece back side SiNx multi-layer film structure | |
| CN102569506A (en) | Method for preparing metal electrode of solar battery from silane mask |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20090909 |