CN101517484A - 功能材料在基材上形成图案的方法 - Google Patents

功能材料在基材上形成图案的方法 Download PDF

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Publication number
CN101517484A
CN101517484A CNA2007800359722A CN200780035972A CN101517484A CN 101517484 A CN101517484 A CN 101517484A CN A2007800359722 A CNA2007800359722 A CN A2007800359722A CN 200780035972 A CN200780035972 A CN 200780035972A CN 101517484 A CN101517484 A CN 101517484A
Authority
CN
China
Prior art keywords
functional material
substrate
stamp
film
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2007800359722A
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English (en)
Chinese (zh)
Inventor
G·B·布朗谢特
李喜现
G·D·杰科克斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN101517484A publication Critical patent/CN101517484A/zh
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B1/00—Nanostructures formed by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82B—NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS, MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES AS DISCRETE UNITS; MANUFACTURE OR TREATMENT THEREOF
    • B82B3/00—Manufacture or treatment of nanostructures by manipulation of individual atoms or molecules, or limited collections of atoms or molecules as discrete units
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNA2007800359722A 2006-09-28 2007-09-07 功能材料在基材上形成图案的方法 Pending CN101517484A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/529,086 US20080083484A1 (en) 2006-09-28 2006-09-28 Method to form a pattern of functional material on a substrate
US11/529,086 2006-09-28

Publications (1)

Publication Number Publication Date
CN101517484A true CN101517484A (zh) 2009-08-26

Family

ID=38830972

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2007800359722A Pending CN101517484A (zh) 2006-09-28 2007-09-07 功能材料在基材上形成图案的方法

Country Status (6)

Country Link
US (1) US20080083484A1 (enExample)
EP (1) EP2067075B1 (enExample)
JP (1) JP5111510B2 (enExample)
KR (1) KR20090077785A (enExample)
CN (1) CN101517484A (enExample)
WO (1) WO2008042079A2 (enExample)

Cited By (3)

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CN102236036A (zh) * 2010-05-04 2011-11-09 迪普劳布株式会社 探针块用探针薄膜及其制造方法
CN102800379A (zh) * 2012-07-31 2012-11-28 江苏科技大学 一种用于线路制造的无需丝网印刷的银导电组合物
CN106647165A (zh) * 2016-09-28 2017-05-10 西安交通大学 一种基于柔性的可在任意曲面制造微纳结构的方法

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US8128393B2 (en) 2006-12-04 2012-03-06 Liquidia Technologies, Inc. Methods and materials for fabricating laminate nanomolds and nanoparticles therefrom
GB0701909D0 (en) * 2007-01-31 2007-03-14 Imp Innovations Ltd Deposition Of Organic Layers
US20080233280A1 (en) * 2007-03-22 2008-09-25 Graciela Beatriz Blanchet Method to form a pattern of functional material on a substrate by treating a surface of a stamp
DE102007027999A1 (de) * 2007-06-14 2008-12-18 Leonhard Kurz Gmbh & Co. Kg Heißprägen von Strukturen
GB2453766A (en) * 2007-10-18 2009-04-22 Novalia Ltd Method of fabricating an electronic device
US8877298B2 (en) * 2008-05-27 2014-11-04 The Hong Kong University Of Science And Technology Printing using a structure coated with ultraviolet radiation responsive material
KR101468960B1 (ko) * 2008-07-16 2014-12-04 삼성전자주식회사 리소그래피 마스크 제조방법 및 이를 이용한 미세패턴형성방법
US8899957B2 (en) 2009-09-25 2014-12-02 HGST Netherlands B.V. System, method and apparatus for manufacturing magnetic recording media
US20110120544A1 (en) 2009-11-20 2011-05-26 Levy David H Deposition inhibitor composition and method of use
EP2715778B1 (en) * 2011-05-23 2023-06-07 National University of Singapore Method of transferring thin films
CZ2011555A3 (cs) * 2011-09-06 2013-03-13 Active Optix S.R.O. Zpusob vytvárení výrobku s funkcním reliéfním povrchem s vysokým rozlisením
WO2013041136A1 (de) * 2011-09-21 2013-03-28 Ev Group E. Thallner Gmbh Verfahren zur herstellung einer polychromatisierenden schicht und substrat sowie leuchtdiode mit polychromatisierender schicht
CN102874030A (zh) * 2012-10-08 2013-01-16 蚌埠翼诚玻璃有限公司 一种用于制造玻璃浮雕的模具
US9205638B2 (en) 2013-02-05 2015-12-08 Eastman Kodak Company Method of forming printed patterns
US9728518B2 (en) * 2014-04-01 2017-08-08 Ati Technologies Ulc Interconnect etch with polymer layer edge protection
US20160124205A1 (en) * 2014-10-27 2016-05-05 Yale University Simple, Fast and Plasma-Free Method of Fabricating PDMS Microstructures on Glass by Pop Slide Pattering
US20180171468A1 (en) * 2016-12-21 2018-06-21 Ncc Nano, Llc Method for deposting a functional material on a substrate
EP3373712B1 (fr) * 2017-03-09 2023-03-29 MGI Digital Technology Procédé de dépôt de traces conductrices
CN109645986B (zh) * 2018-11-30 2021-10-22 昆明贵金属研究所 一种柔性生物电极用低温固化银/氯化银浆料及其制备方法
WO2021182551A1 (ja) * 2020-03-11 2021-09-16 Ｓｃｉｖａｘ株式会社 モールドおよびモールドの製造方法
CN114242924B (zh) * 2021-12-13 2023-09-26 广东省科学院半导体研究所 一种量子点光转换器件及其制备方法

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US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
US6180239B1 (en) * 1993-10-04 2001-01-30 President And Fellows Of Harvard College Microcontact printing on surfaces and derivative articles
US5935415A (en) * 1994-12-22 1999-08-10 Uop Llc Continuous catalytic reforming process with dual zones
WO1997007429A1 (en) * 1995-08-18 1997-02-27 President And Fellows Of Harvard College Self-assembled monolayer directed patterning of surfaces
US5830823A (en) * 1995-11-07 1998-11-03 Larry F. Vaughn Method for printing
EP0827008A3 (en) * 1996-08-31 1998-11-18 Samsung Display Devices Co., Ltd. A flat panel display device and a manufacturing method therefor
US6517995B1 (en) * 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
US6641860B1 (en) * 2000-01-03 2003-11-04 T-Ink, L.L.C. Method of manufacturing printed circuit boards
US6380101B1 (en) * 2000-04-18 2002-04-30 International Business Machines Corporation Method of forming patterned indium zinc oxide and indium tin oxide films via microcontact printing and uses thereof
US20020098618A1 (en) * 2001-01-19 2002-07-25 Rogers John A. Method and apparatus for transferring a feature pattern from an inked surface to a substrate
US20020130444A1 (en) * 2001-03-15 2002-09-19 Gareth Hougham Post cure hardening of siloxane stamps for microcontact printing
US20050120902A1 (en) * 2001-04-25 2005-06-09 David Adams Edge transfer lithography
US7338613B2 (en) * 2001-09-10 2008-03-04 Surface Logix, Inc. System and process for automated microcontact printing
US6936181B2 (en) * 2001-10-11 2005-08-30 Kovio, Inc. Methods for patterning using liquid embossing
US8222072B2 (en) * 2002-12-20 2012-07-17 The Trustees Of Princeton University Methods of fabricating devices by low pressure cold welding
US20050191419A1 (en) * 2003-04-11 2005-09-01 Helt James M. Fabrication of nanostructures
US7105861B2 (en) * 2003-04-15 2006-09-12 Luminus Devices, Inc. Electronic device contact structures
US20050118338A1 (en) * 2003-05-02 2005-06-02 Johns Hopkins University Control of the spatial distribution and sorting of micro-or nano-meter or molecular scale objects on patterned surfaces
KR20050021055A (ko) * 2003-08-26 2005-03-07 삼성에스디아이 주식회사 플라즈마 디스플레이 패널
EP1538481A1 (en) * 2003-12-05 2005-06-08 Sony International (Europe) GmbH A method of activating a silicon surface for subsequent patterning of molecules onto said surface
US6981445B2 (en) * 2003-12-24 2006-01-03 Axela Biosensors Inc. Method and apparatus for micro-contact printing
US20060021533A1 (en) * 2004-07-30 2006-02-02 Jeans Albert H Imprint stamp
US20060196375A1 (en) * 2004-10-22 2006-09-07 Seth Coe-Sullivan Method and system for transferring a patterned material
EP1831730A1 (en) * 2004-12-21 2007-09-12 E.I. Dupont De Nemours And Company Process for forming a patterned fluoropolymer film on a substrate
CA2523896A1 (en) * 2005-10-19 2007-04-19 Francesco Stellacci Nanocontact printing
US20080000373A1 (en) * 2006-06-30 2008-01-03 Maria Petrucci-Samija Printing form precursor and process for preparing a stamp from the precursor

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102236036A (zh) * 2010-05-04 2011-11-09 迪普劳布株式会社 探针块用探针薄膜及其制造方法
CN102800379A (zh) * 2012-07-31 2012-11-28 江苏科技大学 一种用于线路制造的无需丝网印刷的银导电组合物
CN102800379B (zh) * 2012-07-31 2014-05-07 江苏科技大学 一种用于线路制造的无需丝网印刷的银导电组合物
CN106647165A (zh) * 2016-09-28 2017-05-10 西安交通大学 一种基于柔性的可在任意曲面制造微纳结构的方法
CN106647165B (zh) * 2016-09-28 2020-04-10 西安交通大学 一种基于柔性的可在任意曲面制造微纳结构的方法

Also Published As

Publication number Publication date
JP5111510B2 (ja) 2013-01-09
KR20090077785A (ko) 2009-07-15
WO2008042079A3 (en) 2008-05-22
US20080083484A1 (en) 2008-04-10
JP2010505264A (ja) 2010-02-18
EP2067075B1 (en) 2013-05-01
EP2067075A2 (en) 2009-06-10
WO2008042079A2 (en) 2008-04-10

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Application publication date: 20090826