CN101489345A - Radio frequency automatic impedance matching method and radio frequency automatic impedance matcher - Google Patents
Radio frequency automatic impedance matching method and radio frequency automatic impedance matcher Download PDFInfo
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- CN101489345A CN101489345A CNA2008100561570A CN200810056157A CN101489345A CN 101489345 A CN101489345 A CN 101489345A CN A2008100561570 A CNA2008100561570 A CN A2008100561570A CN 200810056157 A CN200810056157 A CN 200810056157A CN 101489345 A CN101489345 A CN 101489345A
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Abstract
An embodiment of the invention discloses a method for matching automatic impedance of radio frequency. A controller obtains the impedance of each variable impedor presently in the matching network and the input impedance of matching network. The equivalent impedance of plasma chamber is calculated according to the equivalent impedance of predefined plasma chamber, the input impedance of matching network and the modeling relationship between the impedances of variable impedors. Then the obtained output impedance of radio frequency generator is used as the input impedance of matching network in impedance matching for calculating the impedance of each variable impedor in impedance matching according to the modeling relationship. The adjusting amount is calculated according to the difference between the impedance of each variable impedor in impedance matching and the impedance of present each variable impedor. The impedance of present each variable impedor is adjusted according to each adjusting amount. The embodiment of the invention simultaneously discloses a device for matching automatic impedance of radio frequency. The method and device applying the embodiment of the invention can quickly complete impedance matching.
Description
Technical field
The present invention relates to impedance match technique, particularly a kind of radio frequency automatic impedance matching method and radio frequency automatic impedance matcher.
Background technology
At typical radio frequency (RF, Radio Frequency) in the plasma producing apparatus, the RF generator of constant output impedance produces the RF ripple of fixed frequency, for plasma chamber provides RF power, produces the plasma that is used for etching or is used for other technology to excite.Wherein, the constant output impedance of RF generator is generally 50 Ω, and the fixed frequency of generation is generally 13.56MHz.Generally, the nonlinear load impedance of plasma chamber and the constant output impedance of RF generator are also unequal, so, between RF generator and plasma chamber, can there be more serious impedance mismatching, thereby make the bigger reflection power of existence on the RF transmission line between RF generator and the plasma chamber, the power that causes the RF generator to produce can't all flow to plasma chamber.
For addressing this problem, a radio frequency automatic impedance matcher is set between RF generator and plasma chamber in the prior art, as shown in Figure 1, Fig. 1 forms structural representation for existing radio frequency automatic impedance matcher.As seen from Figure 1, this radio frequency automatic impedance matcher mainly is made up of transducer, controller and actuator's three parts; Further comprise variable impedance element in the matching network and the drive unit that changes the variable impedance element value in the actuator wherein.Here the matching network of being mentioned is meant by variable impedance element, is generally two, and the network of the nonlinear load impedance of plasma chamber composition.The parameters such as voltage, electric current, forward power and backward power of sensor on the RF transmission line between radio frequency automatic impedance matcher and the RF generator is for controller provides the coupling control algolithm required input variable.The parameter that this input variable normally further calculates according to parameters such as voltage, electric current, forward power and backward powers.Wherein, backward power is the reflection power that the front is introduced.Simultaneously, transducer also is used to detect the input impedance of matching network, exports to controller.The input variable that controller provides according to transducer and the input impedance of matching network by certain coupling control algolithm, calculate the adjustment amount of variable impedance element, and export to the drive unit in the actuator.Drive unit changes the impedance of variable impedance element according to the adjustment amount that is received from controller, thereby makes the input impedance of matching network equate with the constant output impedance of RF generator, promptly reaches impedance matching.Like this, the reflection power on the RF transmission line is zero, and the power that the RF generator produces all has been transported to plasma chamber.
Wherein, the coupling control algolithm that controller adopted can be determined according to the topological structure of matching network and the electrical characteristic of variable impedance element.In traditional impedance matching algorithm, the error signal between the constant output impedance of the RF generator that controller goes out according to sensor and the input impedance of matching network calculates the adjustment amount of the variable impedance element in the matching network according to predetermined way.Wherein, the constant output impedance of RF generator can be drawn according to calculation of parameter such as detected voltage, electric currents by transducer, and sends to controller as input variable.Above-mentioned adjustment amount can be the product of error signal and predefined coefficient, is adjusted the impedance of variable impedance element in the matching network then according to this adjustment amount by drive unit.Controller constantly repeats the process of " detection-calculating-adjusting ", and the error signal that goes out up to sensor meets certain requirements, such as, less than pre-set threshold, think that then system reaches coupling.
But the adjustment amount that adopts tradition coupling control algolithm to obtain is a general adjustment trend, is not an accurate numerical value, such as, may be the product of error signal noted earlier and predefined coefficient.So, when adopting traditional coupling control algolithm to carry out impedance matching, need consumed time longer, matching speed is slow.
Summary of the invention
The embodiment of the invention provides a kind of radio frequency automatic impedance matcher, uses this equipment and can finish impedance matching fast.
The embodiment of the invention provides a kind of radio frequency automatic impedance matching method, uses this method and can finish impedance matching fast.
The technical scheme of the embodiment of the invention is achieved in that
A kind of radio frequency automatic impedance matcher, this radio frequency automatic impedance matcher comprises: first sensor, controller and actuator;
Described first sensor is used to detect the input impedance of matching network and the output impedance of radio frequency generator, and sends to described controller;
Described controller, be used for obtaining the impedance of current each variable impedance element of matching network, and receive the input impedance of the described matching network that described first sensor sends, according to the relation of the modeling between the input impedance of the impedance of the equiva lent impedance of predetermined plasma chamber, described each variable impedance element and described matching network, calculate the equiva lent impedance of described plasma chamber; And the input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of the RF generator that is received from described first sensor, according to the equiva lent impedance of output impedance of described RF generator and described plasma chamber, the impedance of each variable impedance element during the computing impedance coupling; The difference of the impedance of the impedance of each variable impedance element and described current each variable impedance element is calculated each adjustment amount during according to described impedance matching, and described each adjustment amount is sent to described actuator;
Described actuator is used for according to being received from each adjustment amount of described controller, the impedance of each variable impedance element when the impedance of described current each variable impedance element is adjusted into described impedance matching.
A kind of radio frequency automatic impedance matching method, this method comprises:
Controller obtains the impedance of current each variable impedance element in the matching network and the input impedance of described matching network; According to the relation of the modeling between the input impedance of the impedance of the equiva lent impedance of predetermined plasma chamber, described each variable impedance element and matching network, calculate the equiva lent impedance of described plasma chamber;
The input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of the RF generator that gets access to, according to the equiva lent impedance of output impedance of described RF generator and described plasma chamber, the impedance of described each variable impedance element during the computing impedance coupling;
The difference of the impedance of the impedance of described each variable impedance element and described current each variable impedance element is calculated each adjustment amount during according to impedance matching, according to described each adjustment amount the impedance of described current each variable impedance element is adjusted.
As seen, adopt the technical scheme of the embodiment of the invention, controller is according to the equiva lent impedance of the impedance computation plasma chamber of the current input impedance of matching network and current each variable impedance element; Then, equiva lent impedance according to the plasma chamber that calculates, the impedance of each variable impedance element during the computing impedance coupling, and then the difference of the impedance of the impedance of each variable impedance element and current each variable impedance element during according to impedance matching calculates adjustment amount, adjusts the impedance of each variable impedance element according to the adjustment amount that calculates.Compared with prior art, the adjustment amount in the described scheme of the embodiment of the invention draws by calculating accurately, so can finish impedance matching fast.
Description of drawings
Fig. 1 forms structural representation for existing radio frequency automatic impedance matcher.
Fig. 2 is the flow chart of radio frequency automatic impedance matching method embodiment of the present invention.
Fig. 3 is the topological structure of matching network in the embodiment of the invention and the electrical characteristic schematic diagram of variable impedance element.
Fig. 4 is the composition structural representation of radio frequency automatic impedance matcher embodiment of the present invention.
Fig. 5 is the composition structural representation of the controller among the radio frequency automatic impedance matcher embodiment of the present invention.
Embodiment
For solving problems of the prior art, a kind of new radio frequency automatic impedance matching method is proposed, that is: according to the equiva lent impedance of the current plasma chamber of impedance computation of the current input impedance of matching network as can be known and current each variable impedance element in the embodiment of the invention; Then, equiva lent impedance according to the plasma chamber that calculates, calculate the impedance of each variable impedance element when impedance matching, and then the difference of the impedance of the impedance of each variable impedance element during according to impedance matching and current each variable impedance element calculates adjustment amount, adjusts the impedance of each variable impedance element according to the adjustment amount that calculates.
For making purpose of the present invention, technical scheme and advantage clearer, below with reference to the accompanying drawing embodiment that develops simultaneously, the present invention is described in further detail.
Fig. 2 is the flow chart of radio frequency automatic impedance matching method embodiment of the present invention.Because generally, the number of the variable impedance element in the matching network is 2, so be 2 to be that example describes with the variable impedance element number in the present embodiment.These two variable impedance elements can be variable capacitance or variable inductance.As shown in Figure 2, may further comprise the steps:
Step 201: controller obtains the impedance of current variable impedance element in the matching network and the current input impedance of matching network.
Wherein, the current input impedance of matching network can be detected according to prior art by transducer shown in Figure 1 and obtain, and sends to controller.The impedance of variable impedance element can be obtained by following dual mode:
Because the controller that uses in the radio frequency automatic impedance matcher is generally digitial controller, as single-chip microcomputer or digital signal processor (DSP, Digital Signal Processor) etc., and the characteristics of digitial controller be the information of previous moment are as can be known.In present embodiment, that is to say that controller can be known the impedance of the variable impedance element of previous moment.Like this, controller can calculate the adjustment amount of the variable impedance element of current time according to prior art.That is, the error signal between the constant output impedance of the RF generator that controller goes out according to sensor and the input impedance of matching network calculates the adjustment amount of the variable impedance element in the matching network according to predetermined way.Then, the impedance of the variable impedance element of adjustment amount that utilization calculates and known previous moment obtains the impedance of current variable impedance element by addition calculation.Need to prove, when controller started first, the initial value of controller can be set to 0, correspondingly, the initial value of two variable impedance elements also is set to 0, conforms to the impedance of actual variable impedance element with the impedance of the current variable impedance element that guarantees to preserve in the controller.Because the number of hypothesis variable impedance element is 2 in the present embodiment, be respectively Z so can suppose the impedance of the current variable impedance element that calculates in this step
1And Z
2
Perhaps, also can not adopt aforesaid way, but on two variable impedance elements, install a transducer respectively additional, be used to detect the impedance of current variable impedance element, and send to controller.Like this, controller does not need to calculate according to adjustment amount, can obtain the impedance of current variable impedance element, i.e. Z yet
1And Z
2
Step 202: controller is according to the modeling relation between the equiva lent impedance of the impedance of the input impedance of predetermined matching network, variable impedance element and plasma chamber, the equiva lent impedance of calculating plasma chamber.
In the present embodiment, can be according to the electrical characteristic of the topological structure and the variable impedance element of matching network, modeling obtains the modeling relation between the equiva lent impedance of the impedance of input impedance, variable impedance element of matching network and plasma chamber, i.e. functional relation expression formula.That is to say, according to the also series relationship between the equiva lent impedance of each variable impedance element and plasma chamber, and variable impedance element is information such as variable inductance or variable capacitance, the functional relation expression formula between the equiva lent impedance of can the derive impedance that draws the input impedance about matching network, variable impedance element and plasma chamber.Shown in formula one:
Z
in＝f(Z
1，Z
2，Z
chamber) (1)
Wherein, Z
1And Z
2Represent the impedance of current two variable impedance elements respectively; Z
ChamberThe equiva lent impedance of expression plasma chamber; Z
InThe input impedance of expression matching network.
Need to prove, only be an overall expression formula shown in the formula (1), and in actual applications, the concrete manifestation mode of this expression formula need be determined according to the topological structure of matching network and the electrical characteristic of variable impedance element.
According to the introduction in the step 201 as can be known, Z
1, Z
2And Z
InAll be that controller can be known, so in this step, controller can directly calculate Z according to formula (2)
Chamber:
Z
chamber＝g(Z
in，Z
1，Z
2) (2)
That is, with Z
1, Z
2And Z
InAs datum, by formula (2) ask unknown number Z
Chamber
Step 203: controller is the input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of the RF generator that gets access to, according to the equiva lent impedance of output impedance of RF generator and plasma chamber, the impedance of variable impedance element during the computing impedance coupling.
Since during impedance matching, the input impedance Z of matching network
InOutput impedance Z with the RF generator
OutEquate.So, in this step, can calculate Z in step 202
ChamberThe basis on, be taken in the formula (3) impedance of two variable impedance elements when obtaining impedance matching
With
Compare with formula (1), in the formula (3) with Z
InValue Z
OutReplace, find the solution the impedance of two corresponding in this case variable impedance elements, two impedances that variable impedance element need the be arranged to when result who obtains is impedance matching.
In this step, the output impedance of the RF generator that controller gets access to can be obtained by sensor shown in Figure 1, and sends to controller.
Step 204: the difference of the impedance of the variable impedance element of controller during according to impedance matching and the impedance of current variable impedance element is calculated adjustment amount, adjusts the impedance of current variable impedance element according to this adjustment amount.
In this step, the impedance of two variable impedance elements during controller computing impedance coupling
With
Impedance Z with current two variable impedance elements
1, Z
2Between difference, and calculate adjustment amount according to this difference according to prior art.Calculate after the adjustment amount, controller sends it to the drive unit in the actuator shown in Figure 1, is gone to adjust the impedance of two variable impedance elements according to this adjustment amount by drive unit.Identical in specific implementation and the prior art, repeat no more.
Computational process shown in Figure 2 can be exemplified below:
The electrical characteristic of supposing the topological structure of matching network and variable impedance element as shown in Figure 3, two variable impedance elements are respectively variable capacitance C1 and C2, wherein, variable impedance element C2 connects with the equiva lent impedance of plasma chamber, and is in parallel with variable impedance element C1 after variable impedance element C2 connects with the equiva lent impedance of plasma chamber.So, those skilled in the art can derive at an easy rate and draw, the input impedance Z of matching network
In, variable impedance element C1 and C2 impedance Z 1 and Z2, and the equiva lent impedance Z of plasma chamber
ChamberBetween the functional relation expression formula be:
Z
in＝Z1*(Z2+Z
chamber)/(Z1+Z2+Z
chamber) (4)
Because Z1, Z2 and Z
InAll can get access to, so in the subsequent process, can calculate Z according to mode shown in the formula (5)
Chamber:
Z
chamber＝Z
in*Z1/(Z1-Z
in)-Z2 (5)
Afterwards, use the output impedance Z of the RF generator that gets access to
OutThe input impedance of matching network during as impedance matching, the impedance of variable impedance element during the computing impedance coupling
With
As shown in Equation (6):
Because
With
Be imaginary number, so, can calculate two unknown numbers according to formula (6)
With
In the subsequent process, calculate
With Z
1, Z
2Between difference, and calculate adjustment amount according to this difference, repeat no more.
After finishing flow process shown in Figure 2, the controller wait enters next control cycle, and repeats each step shown in Figure 2 in next control cycle, till predefined requirement is satisfied in the input impedance of matching network.Such as, the error between the output impedance of the input impedance of matching network and RF generator then stops control less than a certain threshold value.Generally, adopt the technical scheme of the embodiment of the invention,, can make the input impedance of matching network satisfy predefined requirement after the flow process promptly shown in Figure 2 through a control cycle.Wherein, when controller enters next control cycle can set in advance, such as, can predesignate after the every calculating of controller finishes an adjustment amount and sends to drive unit, promptly enter next control cycle; Perhaps, also may be prescribed as whenever, then enter next control cycle through behind one section fixing duration.In a word, specific implementation is not limit.
Based on said method, provide a kind of radio frequency automatic impedance matcher in the embodiment of the invention simultaneously.Fig. 4 is the composition structural representation of radio frequency automatic impedance matcher embodiment of the present invention.As shown in Figure 4, this automatic impedance matcher comprises: first sensor 401, controller 402 and actuator 403; Wherein:
Wherein, can further comprise in the controller 402: acquiring unit 4021, first computing unit 4022, second computing unit 4023 and transmitting element 4024.As shown in Figure 5, Fig. 5 forms structural representation for the controller among the radio frequency automatic impedance matcher embodiment of the present invention 402.Wherein:
Acquiring unit 4021, the impedance that is used for obtaining the current variable impedance element of matching network, and reception is from the input impedance of the matching network of first sensor 401 and the output impedance of RF generator;
First computing unit 4022 is used for according to the modeling relation between the input impedance of the impedance of the equiva lent impedance of predetermined plasma chamber and variable impedance element and matching network, the equiva lent impedance of calculating plasma chamber; And the input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of RF generator, according to the equiva lent impedance of output impedance of RF generator and plasma chamber, the impedance of the variable impedance element during the computing impedance coupling;
Second computing unit 4023, the difference of the impedance of the variable impedance element when being used for according to impedance matching and the impedance of current variable impedance element is calculated adjustment amount;
Transmitting element 4024 is used for described adjustment amount is sent to actuator 403.
Except that above-mentioned each part, can further include in the radio frequency automatic impedance matcher of the embodiment of the invention: second transducer 404 is used to measure the impedance of current variable impedance element, and sends to the acquiring unit 4021 in the controller 402.That is to say that controller 402 can calculate the impedance of current variable impedance element by adjustment amount, but directly receive impedance from the current variable impedance element of second transducer 404.
Above-mentioned variable impedance element is variable capacitance or variable inductance; Generally, the number of variable impedance element is 2.When the number of variable impedance element is 2, can a transducer that be used to detect its current impedance all be set for each variable impedance element.That is to say that second transducer of being mentioned in the embodiment of the invention 404 can be for a plurality of.
Need to prove that above embodiment only is used to illustrate, and is not limited to technical scheme of the present invention.Such as, the fixed frequency of the RF generator in the embodiment of the invention and output impedance are not limited in 13.56MHz and 50 Ω; The topological structure of matching network can be arbitrary forms such as L type or inverted L shape.
In a word, adopt the technical scheme of the embodiment of the invention, because the modeling relation between the equiva lent impedance of the input impedance that adjustment amount can be by matching network, the impedance of variable impedance element and plasma chamber, and the relation between the input impedance of the output impedance of RF generator and matching network calculates during impedance matching, rather than as in the prior art, the described scheme of the embodiment of the invention only provides an adjustment trend, so can realize coupling with fast speeds; And the described scheme of the embodiment of the invention realizes simple, and algorithm complex depends on the electrical characteristic of the topological structure and the variable impedance element of matching network fully.
In sum, more than be preferred embodiment of the present invention only, be not to be used to limit protection scope of the present invention.Within the spirit and principles in the present invention all, any modification of being done, be equal to replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (8)
1, a kind of radio frequency automatic impedance matcher is characterized in that, this radio frequency automatic impedance matcher comprises: first sensor, controller and actuator;
Described first sensor is used to detect the input impedance of matching network and the output impedance of radio frequency generator, and sends to described controller;
Described controller, be used for obtaining the impedance of current each variable impedance element of matching network, and receive the input impedance of the described matching network that described first sensor sends, according to the relation of the modeling between the input impedance of the impedance of the equiva lent impedance of predetermined plasma chamber, described each variable impedance element and described matching network, calculate the equiva lent impedance of described plasma chamber; And the input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of the RF generator that is received from described first sensor, according to the equiva lent impedance of output impedance of described RF generator and described plasma chamber, the impedance of each variable impedance element during the computing impedance coupling; The difference of the impedance of the impedance of each variable impedance element and described current each variable impedance element is calculated each adjustment amount during according to described impedance matching, and described each adjustment amount is sent to described actuator;
Described actuator is used for according to being received from each adjustment amount of described controller, the impedance of each variable impedance element when the impedance of described current each variable impedance element is adjusted into described impedance matching.
2, radio frequency automatic impedance matcher according to claim 1 is characterized in that, further comprises in the described controller: acquiring unit, first computing unit, second computing unit and transmitting element;
Described acquiring unit, the impedance that is used for obtaining current each variable impedance element of matching network, and reception is from the input impedance of the matching network of first sensor and the output impedance of RF generator;
Described first computing unit is used for the modeling relation between the input impedance of the impedance of the equiva lent impedance according to predetermined plasma chamber, described each variable impedance element and described matching network, calculates the equiva lent impedance of described plasma chamber; And the input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of described RF generator, according to the equiva lent impedance of output impedance of described RF generator and described plasma chamber, the impedance of each variable impedance element during the computing impedance coupling;
Described second computing unit, the difference of the impedance of the impedance of each variable impedance element and described current each variable impedance element is calculated each adjustment amount when being used for according to described impedance matching;
Described transmitting element is used for described each adjustment amount is sent to described actuator.
3, radio frequency automatic impedance matcher according to claim 2 is characterized in that, described first sensor is further used for, and detects the transmission parameter on the RF transmission line, for described controller provides impedance matching control required input variable;
Further comprise in the described controller: the 3rd computing unit; Described acquiring unit obtains that the impedance of current each variable impedance element is in the matching network: described the 3rd computing unit is according to the input variable that is received from described first sensor, calculate the adjustment amount of described each variable impedance element, and utilize the impedance and the described adjustment amount of each variable impedance element of the previous moment of preserving in advance, calculate the impedance of described current each variable impedance element, and the impedance of described current each variable impedance element is sent to described acquiring unit.
4, radio frequency automatic impedance matcher according to claim 2 is characterized in that, further comprises in this radio frequency automatic impedance matcher: second transducer;
Described acquiring unit obtains that the impedance of current each variable impedance element is in the matching network: the impedance of described current each variable impedance element of described second sensor, and send to described acquiring unit.
5, a kind of radio frequency automatic impedance matching method is characterized in that, this method comprises:
Controller obtains the impedance of current each variable impedance element in the matching network and the input impedance of described matching network; According to the relation of the modeling between the input impedance of the impedance of the equiva lent impedance of predetermined plasma chamber, described each variable impedance element and matching network, calculate the equiva lent impedance of described plasma chamber;
The input impedance of the matching network in the described modeling relation during as impedance matching with the output impedance of the RF generator that gets access to, according to the equiva lent impedance of output impedance of described RF generator and described plasma chamber, the impedance of described each variable impedance element during the computing impedance coupling;
The difference of the impedance of the impedance of described each variable impedance element and described current each variable impedance element is calculated each adjustment amount during according to impedance matching, according to described each adjustment amount the impedance of described current each variable impedance element is adjusted.
6, radio frequency automatic impedance matching method according to claim 5, it is characterized in that described predetermined modeling is closed and is: the functional relation expression formula that obtains according to the electrical characteristic modeling of the topological structure of described matching network and described each variable impedance element.
7, radio frequency automatic impedance matching method according to claim 5 is characterized in that, describedly obtains that the impedance of current each variable impedance element comprises in the matching network:
Controller calculates the adjustment amount of described each variable impedance element, and utilizes the impedance and the described adjustment amount of described each variable impedance element of the previous moment of preserving in advance, the impedance of calculating described current each variable impedance element.
8, radio frequency automatic impedance matching method according to claim 5 is characterized in that, describedly obtains that the impedance of current each variable impedance element comprises in the matching network:
Obtain the impedance of current each variable impedance element by the sensor that is installed on described each variable impedance element, and send to described controller.
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| CN101861035A (en) * | 2010-04-21 | 2010-10-13 | 清华大学 | Automatic impedance matching method and matching system of electrodeless lamp power supply |
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| US6392210B1 (en) * | 1999-12-31 | 2002-05-21 | Russell F. Jewett | Methods and apparatus for RF power process operations with automatic input power control |
| US20030030504A1 (en) * | 2001-08-10 | 2003-02-13 | Telefonaktiebolaget Lm Ericsson | Tunable impedance matching circuit for RF power amplifier |
| JP4975291B2 (en) * | 2004-11-09 | 2012-07-11 | 株式会社ダイヘン | Impedance matching device |
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| CN108012401A (en) * | 2016-10-28 | 2018-05-08 | 北京北方华创微电子装备有限公司 | RF impedance matching process, adaptation and semiconductor processing device |
| CN108365832A (en) * | 2017-01-26 | 2018-08-03 | 瑞昱半导体股份有限公司 | The integrated circuit of impedance matching circuit and application impedance matching circuit |
| CN107944179A (en) * | 2017-12-07 | 2018-04-20 | 中国航空工业集团公司西安航空计算技术研究所 | A kind of onboard computer power system stability Design method |
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