CN101487985A - Alignment mark search system used for photo-etching equipment and its alignment mark search method - Google Patents

Alignment mark search system used for photo-etching equipment and its alignment mark search method Download PDF

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Publication number
CN101487985A
CN101487985A CNA2009100463089A CN200910046308A CN101487985A CN 101487985 A CN101487985 A CN 101487985A CN A2009100463089 A CNA2009100463089 A CN A2009100463089A CN 200910046308 A CN200910046308 A CN 200910046308A CN 101487985 A CN101487985 A CN 101487985A
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alignment mark
light intensity
picture
search system
datum plate
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CN101487985B (en
Inventor
王海江
程鹏
李运锋
唐文力
陈振飞
刘强
宋海军
韦学志
胡明辉
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Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
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Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
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Abstract

The invention provides an alignment mark search system applied to a lithography device and a search method thereof. The system comprises an optical imaging system, a signal conditioning system and a master control system, wherein, the optical imaging system obtains the image of a datum plate and outputs a first light intensity signal, the signal conditioning system receives the first light intensity signal, adopts a digital potentiometer controller to realize bidirectional voltage regulation and outputs light intensity data, the master control system adjusts the position of the datum plate according to the light intensity data. The alignment mark search system of the invention contributes to accurately obtaining corresponding position information concerning reference marks of machines, carrying out demarcation and correction on machine constants relative to machine mark positions rapidly, shortening correction time of the machine constants after complete installation of the machines and improving efficiency of the complete machines after restoring to normal operation.

Description

The alignment mark search system and the alignment mark searching method thereof that are used for lithographic equipment
Technical field
The invention relates to a kind of alignment mark search system and align search method thereof, and particularly relevant for a kind of alignment mark search system and alignment mark searching method thereof that is used for lithographic equipment.
Background technology
Litho machine belongs to the class key equipment on the processing line of chip manufacturing, and its principle is utilized projection lens exactly, by lighting source irradiation mask plate, and with the pattern on the mask, the appointed positions to silicon chip of exposing.Because the needs of technology, manufacturing has certain functional chip, need carry out the exposure of multilayer on same chip, has certain position relation between layer and the layer line bar, and this position relation requires very strict, and this need guarantee by the alignment mark search system.For silicon chip alignment mark search system, its principle is, use is different from the lighting source of exposure light source and is different from the optical detection apparatus of projection lens, and the process that accurately detects the position of alignment mark on work stage reference mark or the silicon chip when optical detection apparatus is called the process of aligning.
When having only alignment mark in the sensing range (also being capture range) of optical detection apparatus, just can aim at, if alignment mark outside the capture range of optical detection apparatus, will cause the failure of the process of aiming at.
So need the searching method of a cover alignment mark before aiming at, the Position Approximate that finds mark that can be rough, thus when making in the capture range that is marked at aligning, aim at again, to obtain accurate mark position, finish alignment procedures.
In the course of work of litho machine reality, 2 following scenes need be used the mark search procedure.
The one, after the first installation of optical detection module, because optical detection module installation site deviation (with respect to the position of work stage) or optical detection inside modules optical element installation deviation, can cause optical imagery module observation device observed result and optical detection apparatus testing result inconsistent, so that can't determine the actual location of mark by the observed result of its observation device, need again the position of mark to be demarcated.
The 2nd, system is owing to the reason of safeguarding, sometimes need work stage is shifted out normal operation position, and when again work stage being moved back into normal operation position, variation has taken place in work stage and motherboard relative position, cause the position of zero reference mark on the work stage that variation has taken place, be that variation has taken place the system machine constant, so also need again demarcation to be searched in the position of mark.
Use by means of charge-coupled device (CCD) (CCD) and display in the existing lithographic equipment, be used for the monitoring of manual alignment and video, the direct extraction unit of its principle divides mark imaging signal to be incorporated on the CCD, and on display, form marking image, by underlined imaging method whether on the range estimation display, determine mark position.Mainly being operating as of this method: the Position Approximate of pre-estimating mark, set the mark hunting zone, straight line travelling workpiece platform position at a slow speed, while artificial visually examine's display, when on the display underlined flashing the time, on existing mobile alignment, adopt the method travelling workpiece platform of stepping again, after display shows that complete being marked as looks like, note the position of work stage this moment.Be not marked as picture if display is seen,,, utilize said method to continue to seek in other position with changing the mobile alignment of work stage.
The method of this mark search because the CCD light path installs and exist deviation, causes CCD directly to observe the position of mark easily, and is bigger with the deviation of actual aligned position, might exceed the scope of aim detecting, causes aiming at failure.This mark searching method need be by means of range estimation in addition, and means are relatively backward, if the hunting zone is not chosen, the hunting zone need be increased, and consuming time long, efficiency ratio is lower, and is not easy to realize robotization.
So provide a kind of automatical and efficient searcher of alignment mark accurately and mark searching method also to be very important.
In addition, be mostly the signal gain control mode of integrator mode at present for the control mode of photosignal gain.Figure 1 shows that prior art adopts the signal gain control synoptic diagram of integrator mode.The signal gain control of this integrator mode can realize the function of automatic gain, and its composition has three parts, is variable gain amplifier 1, signal effective value testing circuit 2 and integrator 3, and this form exists limitation.When the control end of variable gain amplifier 1 is controlled by the output of integrator 3, integrator 3 working stages have integral process and discharge process, than discharge process, integral process is slow, is used to realize the stepless control that gains, because the principle of integration, make that the output valve of integrator 3 is ascending processes, this has just determined that also gain can only be a folk prescription to adjusting, and the discharge process time of integrator 3 is short, is used for to the integrator zero clearing.In practical work process, state after integrator 3 original states and the zero clearing is consistent, promptly corresponding the maximum state of gain, when starting automatic gain, integrator 3 is adjusted the gain of signal according to the size (having unmarked) of actual light electric signal, gain is begun toward little adjustment by maximal value, when the satisfied setting of signal output requires, stop integration, gain has temporarily locked, the process of aiming at is to finish in time very short behind gain locking, because gain locking is not the locking of complete meaning, because the existence of circuit leakage current, make integrator 3 understand self-discharges slowly, this also makes gain slowly get back to original state, gain becomes initial maximal value, such result is, it is to be in state of saturation that the signal of auto gain link is exported most of the time, no matter whether detect and do not detect mark, so also can't utilize the output of its signal to realize the automatic search of this mark, and the adjusting of its signal gain can only can not be provided with and regulate flexibly from big gain to little gain-adjusted.
Summary of the invention
For addressing the above problem, the present invention proposes a kind of alignment mark search system and alignment mark searching method thereof that is used for lithographic equipment.
The alignment mark search system that is used for lithographic equipment that the present invention proposes comprises: optical imaging system obtains the picture of datum plate, and exports first light intensity signal; The signal condition system receives described first light intensity signal, realizes bi-directional voltage adjusting, output intensity data by digital control of Electric potentials equipment; Master control system according to described light intensity data, is adjusted described datum plate position.
The alignment mark search system that the present invention proposes comprises that described optical imaging system comprises: lighting module provides light source; The optical imagery module is introduced described light source, obtains the picture of described datum plate, and first light intensity signal of output picture.
The alignment mark search system that the present invention proposes comprises, described signal condition system comprises: photosignal conditioning unit, receive described first light intensity signal, and adjust by gain, export second light intensity signal; The light intensity data collecting unit receives described second light intensity signal, the output intensity data.
The alignment mark search system that the present invention proposes comprises that described photosignal conditioning unit comprises: photelectric receiver receives described first light intensity signal; Bandpass filter electrically connects with described photelectric receiver; Adjustable automatic gain amplifier, its input end and described bandpass filter electrically connect, and its output terminal and backfeed loop input end electrically connect, and it adjusts signal input part and described backfeed loop output terminal electrically connects.
The alignment mark search system that the present invention proposes comprises that described backfeed loop comprises: effective value detecting unit and digital control of Electric potentials equipment; The input end of described effective value detecting unit and described adjustable automatic gain amplifier output terminal electrically connect; Described digital control of Electric potentials equipment comprises digital regulation resistance controller and digital regulation resistance gain controller, and the input end of digital regulation resistance controller and the electric connection of described effective value detecting unit output terminal; The input end of described digital regulation resistance gain controller and described digital regulation resistance controller output end electrically connect, and its output terminal and described adjustable automatic gain amplifier electrically connect.
The alignment mark search system that the present invention proposes comprises that described effective value detecting unit is converted to effective value with the Dynamic Signal of output.
The alignment mark search system that the present invention proposes comprises that described digital regulation resistance controller comprises storer, and yield value is remembered.
The alignment mark search system that the present invention proposes comprises the acquiescence yield value that described digital regulation resistance controller can recover to be provided with.
The alignment mark search system that the present invention proposes comprises described digital regulation resistance controller judges whether the effective value of described effective value detecting unit output reaches preset value.
The alignment mark search system that the present invention proposes comprises that described digital regulation resistance gain controller comprises digital regulation resistance.
The alignment mark search system that the present invention proposes comprises, but the output voltage values of described digital regulation resistance controller bidirectional modulation digital regulation resistance.
The alignment mark search system that the present invention proposes comprises that described digital regulation resistance gain controller sends gain command according to the output voltage values of described digital regulation resistance.
The alignment mark search system that the present invention proposes comprises that described adjustable automatic gain amplifier receives described gain command, realizes gain.
The alignment mark search system that the present invention proposes comprises that described datum plate comprises grid type reference mark.
The alignment mark search system that the present invention proposes comprises that what the described light intensity data of described master control system foundation was judged described datum plate similarly is the picture that does not comprise described grid type reference mark.
The alignment mark search system that the present invention proposes comprises that described light intensity data was greater than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark.
The alignment mark search system that the present invention proposes comprises that described system largest light intensity value is the signal maximum under the current gain value of described digital regulation resistance.
The alignment mark search system that the present invention proposes comprises that the current gain value of described digital regulation resistance obtains for using the dichotomy convergence.
The alignment mark search system that the present invention proposes comprises, calculates the maximal value of the pairing position data of described light intensity data and the difference of minimum value.
The alignment mark search system that the present invention proposes comprises, when described difference greater than described mark width 2/3 the time, it is to have found whole mark that described master control system is judged.
The alignment mark search system that the present invention proposes comprises, calculates the maximal value of the pairing position data of described light intensity data and the average of minimum value, as the accurate position data of described mark.
The alignment mark search system that the present invention proposes comprises that described light intensity data was less than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate does not comprise the picture of described grid type reference mark.
The alignment mark search system that the present invention proposes comprises that when described master control system judged that the picture of described datum plate does not comprise the picture of described grid type reference mark, described master control system was adjusted described datum plate position, imaging once more.
The alignment mark search system that the present invention proposes comprises, when described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark, stops to adjust described datum plate position.
The alignment mark search system that the present invention proposes comprises that the parts of images information of the picture of described datum plate is extracted out and is sent to the CCD module, and shows on display.
The alignment mark search system that the present invention proposes comprises that described lighting module is a laser instrument.
The alignment mark searching method that is used for lithographic equipment that the present invention proposes comprises: use optical imaging system, obtain the picture of datum plate, and export first light intensity signal; Use the signal condition system, receive described first light intensity signal, realize bidirectional pressure regulating, output intensity data by the digital regulation resistance controller; Use master control system,, adjust described datum plate position according to described light intensity data.
The alignment mark searching method that the present invention proposes comprises that also described datum plate comprises grid type reference mark.
The alignment mark searching method that the present invention proposes comprises that also what the described light intensity data of described master control system foundation was judged described datum plate similarly is the picture that does not comprise described grid type reference mark.
The alignment mark searching method that the present invention proposes comprises that also described light intensity data was greater than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark.
The alignment mark searching method that the present invention proposes comprises that also described system largest light intensity value is the signal maximum under the current gain value of described digital regulation resistance.
The alignment mark searching method that the present invention proposes comprises that also the current gain value of described digital regulation resistance obtains for using the dichotomy convergence.
The alignment mark searching method that the present invention proposes also comprises, calculates the maximal value of the pairing position data of described light intensity data and the difference of minimum value.
The alignment mark searching method that the present invention proposes also comprises, when described difference greater than described mark width 2/3 the time, it is to have found whole mark that described master control system is judged.
The alignment mark searching method that the present invention proposes also comprises, calculates the maximal value of the pairing position data of described light intensity data and the average of minimum value, as the accurate position data of described mark.
The alignment mark searching method that the present invention proposes comprises that also described light intensity data was less than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate does not comprise the picture of described grid type reference mark.
The alignment mark searching method that the present invention proposes comprises that also when described master control system judged that the picture of described datum plate does not comprise the picture of described grid type reference mark, described master control system was adjusted described datum plate position, imaging once more.
The alignment mark searching method that the present invention proposes also comprises, when described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark, stops to adjust described datum plate position.
The alignment mark search system that the present invention proposes, by in the signal condition unit, adopted novel signal gain control mode, than former gain control mode, gain can realize bidirectional modulation, it is convenient, flexible to operate, and simultaneously, gain is had Memorability, except can automatic gain, can also carry out the fixed gain setting, effectively control light intensity signal and do not occurred saturatedly, make signal can be used for marking whether the judgement that is detected.Alignment mark search system of the present invention helps accurately obtaining machine datum mark relative position information, be convenient to fast machine mark position correlation machine constant be demarcated calibration, this machine constant alignment time after the shortening whole machine installation, improve the efficient that complete machine recovers operate as normal.In addition, the alignment mark searching method that on basis, is adopted based on the alignment mark search system, realize easilier at software inhouse, realize the robotization of mark search, this method is than the method that adopts CCD and display search mark, reduce operating personnel's manipulation strength, intelligent enhancing, efficient is improved.
For above-mentioned feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and conjunction with figs. are described in detail below.
Description of drawings
Figure 1 shows that prior art adopts the signal gain control synoptic diagram of integrator mode.
Figure 2 shows that total arrangement, principle of work structural representation between alignment mark search system of the present invention and the lithographic equipment.
Figure 3 shows that the synoptic diagram of the grid type reference mark of alignment mark search system of the present invention.
Figure 4 shows that reference mark position synoptic diagram on the work stage of alignment mark search system of the present invention.
Figure 5 shows that the process flow diagram of alignment mark searching method of the present invention.
Figure 6 shows that the gain choice mechanism synoptic diagram of alignment mark searching method of the present invention.
Figure 7 shows that the mark searching route synoptic diagram of alignment mark searching method of the present invention.
Fig. 8 a is depicted as by mark searching route L1 (L2, L6, L7) among Fig. 8 and carries out the mark light intensity position signalling oscillogram in when search.
Fig. 8 b is depicted as by mark searching route L3 among Fig. 8 and carries out the mark light intensity position signalling oscillogram in when search.
Fig. 8 c is depicted as by mark searching route L4 among Fig. 8 and carries out the mark light intensity position signalling oscillogram in when search.
Fig. 8 d is depicted as by mark searching route L5 among Fig. 8 and carries out the mark light intensity position signalling oscillogram in when search.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and cooperate appended graphic being described as follows.
Figure 2 shows that total arrangement, principle of work structural representation between alignment mark search system of the present invention and the lithographic equipment.As shown in Figure 2, mask platform system 4, projection lens 5, work stage 6, position measuring system 7 are the element of litho machine, and wherein projection lens 5 is as the benchmark of position, and work stage 6, position measuring system 7 are alignment mark search component units.
The alignment mark search system of the embodiment of the invention comprises following components: optical imagery module 8, CCD module and display 9, lighting module 10, light intensity data collecting unit 11, master control system 12, datum plate and reference mark 13, work stage 6, position measuring system 7, photosignal conditioning unit 14, wherein photosignal conditioning unit 14 comprises following several links again: photelectric receiver 15, bandpass filter 16, adjustable automatic gain amplifier 17, effective value detecting unit 18, digital regulation resistance controller 19, digital regulation resistance gain controller 20.
Adopt alignment mark search system shown in Figure 2, the embodiment that alignment mark is searched for is as follows:
Datum plate and reference mark 13 are as searched object, and in the embodiment of the invention, this is labeled as the grid type.Figure 3 shows that the synoptic diagram of the grid type reference mark of alignment mark search system of the present invention.Figure 4 shows that reference mark position synoptic diagram on the work stage of alignment mark search system of the present invention.Mark with respect to the work stage position as shown in Figure 4, datum plate and reference mark 13 are in the edge of work stage 6.
In the embodiment of the invention, lighting module 10 adopts laser instrument to provide light source for the mark search system.
Optical imagery module 8 imaging device that serves as a mark is realized introducing light source, and makes and be marked as picture, and wherein part marking image information is extracted out, delivers on CCD module and the display 9, and image-forming information is also by photelectric receiver 15 receptions simultaneously.When optical imagery module 8 detects datum plate and reference mark 13, utilize optical diffraction and principle of interference, the light signal of optics output is more intense, corresponding photosignal is more intense, if signal is too strong, need output be adjusted in the scope of customer requirements by the automatic gain adjustment.Light signal is strong when being underlined, when unmarked a little less than the light signal.
The signal of optical imagery module 8 outputs, will be through photosignal conditioning unit 14, described photosignal conditioning unit 14 is made up of photelectric receiver 15, bandpass filter 16, adjustable automatic gain amplifier 17, effective value detecting unit 18, digital regulation resistance controller 19, digital regulation resistance gain controller 20.
The system that makes can utilize the position of this mark, carries out alignment scanning.
Adjustable automatic gain amplifier 17 is realized the enlarging function of signal (whether reflection detects the photosignal of mark), and enlargement factor can be controlled by its outside.The novel signal gain control mode that the control mode of adjustable automatic gain is used.Effective value detecting unit 18 will be exported Dynamic Signal and transform effective value, can be used for judging the amplitude size of Dynamic Signal.In digital regulation resistance gain controller 20 links, comprise digital regulation resistance, and internal resistance segments, can come the size of controlling resistance by the outside, export different control voltage by the size that changes resistance value, control adjustable automatic gain amplifier 17 gains, it is highly stable to gain.Digital regulation resistance controller 19 receives the information of the effective value of output signal, deciding the control of digital regulation resistance to export into voltage according to this information is to transfer to big direction, still to little direction adjustment, promptly can carry out two-way adjustment, and inner have the function of the memory of gain control, can write down the positional information of the resistance of potentiometer.
This plurality of units has constituted backfeed loop, final effect is the output of signal to be adjusted to the scope of setting, as long as configure suitable yield value, the output that can guarantee signal saturated phenomenon can not occur, this signal can directly be used for carrying out the search of mark, is used for judging whether to detect mark.
Signal after the conditioning is converted into data by light intensity data collecting unit 11 with signal, and data are directly passed to master control system 12, so that master control system 12 is judged according to data result.
Figure 5 shows that the process flow diagram of alignment mark searching method of the present invention.The alignment mark search system that is proposed owing to used the mode of digital regulation resistance ride gain, can realize that the automatic gain in the alignment scanning process is regulated, and can also be used for the function of search of mark simultaneously.
(1) before carrying out the mark search, need learn, determine current gain value, and be recorded in the signal maximum Smax under this gain situation of use yield value;
Under this novel gain controlled condition, the method for alignment mark search is as follows:
(2) can determine mark position according to the installation site, this position is not to be worth very accurately;
(3) consider installation deviation, determine the border of mark search;
(4) path of planning mark search;
(5) select wherein path planning, the travelling workpiece platform is searched for;
(6) write down the position of work stage and corresponding light intensity simultaneously;
(7) light intensity value is judged;
(8) if light intensity value greater than 2/3 o'clock of Smax, think and find mark, but the also uncertain center of whether finding mark; If less than 2/3 o'clock of Smax, think that this path do not find mark, return step (5);
(9) if light intensity value, then calculates the maximal value and the minimum difference of the pairing position data of these light intensity values greater than 2/3 of Smax;
(10) if during 2/3 width of difference greater than flag, can think to have found whole mark, otherwise return step (5);
(11) if during 2/3 width of difference greater than flag, then calculate the maximal value and the minimum value average of the pairing position data of these light intensity values, the search of mark has been realized in the accurate position that serves as a mark;
The system that makes can utilize the position of this mark, carries out alignment scanning.
On the basis based on this alignment mark search system, the mark searching method that is adopted is as follows.
After whole machine installation, determine mark position according to the installation site, the study that gains earlier, concrete learning procedure is as follows.
Figure 6 shows that the gain choice mechanism synoptic diagram of alignment mark searching method of the present invention.
According to the potentiometer characteristic, gain can be G1, G2...G14, class, increase successively, gain selects to have used dichotomy, detailed process is as follows: promptly set initial maximum gain, carry out the mark search, judge whether light intensity signal is saturated, if do not have saturated, then this gains and is the gain setting value of mark search, and is saturated if signal occurs, and gain need be turned down, the intermediate gain value of getting least gain and maximum gain is as new yield value, the search of execution mark judges whether light intensity signal is saturated, if signal is saturated, gain need be turned down, the intermediate gain value of getting least gain and current gain is as new yield value, and is saturated if signal does not have, and gain need be transferred big, the intermediate gain value of getting maximum gain and current gain is as new yield value, the search of execution mark is carried out successively, finally converges to a unique current gain value.
The gain learning process, time incipient stage is long, but in case after succeeding in school, does not need later on gain to be learnt again.
Real process on searching route, is carried out the mark search for setting maximum gain G14, and it is saturated to judge whether light intensity signal occurs, and the saturated gain that then needs to reselect occurs, and on searching route, carries out the mark search again;
Set the centre position G7 of G0 and G14, on searching route, carry out the mark search, it is saturated to judge whether light intensity signal occurs, saturated if signal does not occur, and gain G 11 is then selected in the gain of reselecting in the middle of G7 and G14;
Gain setting G11 on searching route, carries out the mark search, and signal occurs saturated, and the gain of reselecting is then selected intermediate gain G9 at G11 and G7;
Gain setting G9 on searching route, carries out the mark search, and signal does not occur saturated, and the gain of reselecting is then selected intermediate gain G10 at G9 and G11;
Gain setting G10 on searching route, carries out the mark search, and signal does not occur saturated, and G10 is the last gain of selecting, and signal occurs saturated, and then G9 is the last gain of selecting; The maximal value Smax of while record mark registration signal.
After later on equipment is reinstalled again, or after mark position changes, the gain of succeeding in school is set directly.
Can determine mark position according to the installation site, this position is not to be worth very accurately.
Consider installation deviation, determine the border of mark search, and planned searching route that the scanning pattern of planning as shown in Figure 7.Figure 7 shows that the mark searching route synoptic diagram of alignment mark searching method of the present invention.
As shown in Figure 7, the path comprises L1, L2, L3, L4, L5, L6, L7.Select wherein path planning, the travelling workpiece platform is searched for, and in search procedure, writes down the position of work stage and corresponding light intensity simultaneously, obtains light intensity position signalling waveform.
Fig. 8 a is depicted as by mark searching route L1 (L2, L6, L7) among Fig. 7 and carries out the mark light intensity position signalling oscillogram in when search.Fig. 8 b is depicted as by mark searching route L3 among Fig. 7 and carries out the mark light intensity position signalling oscillogram in when search.Fig. 8 c is depicted as by mark searching route L4 among Fig. 7 and carries out the mark light intensity position signalling oscillogram in when search.Fig. 8 d is depicted as by mark searching route L5 among Fig. 7 and carries out the mark light intensity position signalling oscillogram in when search.
Shown in Fig. 8 a, 8b, 8c, 8d, path L1 wherein, L2, L3, L5, L6, the light intensity value of L7 correspondence think and do not find mark, and the light intensity value of path L4 correspondence was thought and is found mark greater than 2/3 of Smax less than 2/3 o'clock of Smax.
As not searching mark at path L1 (L2, L6, L7) as can be seen among Fig. 8 a.Shown in Fig. 8 b, Fig. 8 d, path L3, L5 search mark, but also do not search the center of mark.Shown in Fig. 8 c, path L4 searches mark, and mark center is approached in the position.
Among Fig. 8 c, x1 and x2 are signal corresponding minimum position data and maximum position data during more than or equal to 2/3Smax, w is a mark width 2/3, and by calculating the maximal value and the minimum difference of the pairing position data of these light intensity values, i.e. (x2-x1), this difference satisfies 2/3 width of greater than flag, also thinks to have found whole mark.
By maximal value and the minimum value average of calculating the pairing position data of these light intensity values, the accurate position that serves as a mark, promptly x is to being (x2+x1)/2, y realizes the search of mark to being L4.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; have in the technical field under any and know the knowledgeable usually; without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking claims person of defining.

Claims (38)

1. an alignment mark search system that is used for lithographic equipment is characterized in that, comprising:
Optical imaging system obtains the picture of datum plate, and exports first light intensity signal;
The signal condition system receives described first light intensity signal, realizes bi-directional voltage adjusting, output intensity data by digital control of Electric potentials equipment;
Master control system according to described light intensity data, is adjusted described datum plate position.
2. alignment mark search system according to claim 1 is characterized in that, described optical imaging system comprises:
Lighting module provides light source;
The optical imagery module is introduced described light source, obtains the picture of described datum plate, and first light intensity signal of output picture.
3. alignment mark search system according to claim 1 is characterized in that, described signal condition system comprises:
Photosignal conditioning unit receives described first light intensity signal, adjusts by gain, exports second light intensity signal;
The light intensity data collecting unit receives described second light intensity signal, the output intensity data.
4. alignment mark search system according to claim 3 is characterized in that, described photosignal conditioning unit comprises:
Photelectric receiver receives described first light intensity signal;
Bandpass filter electrically connects with described photelectric receiver;
Adjustable automatic gain amplifier, its input end and described bandpass filter electrically connect, and its output terminal and backfeed loop input end electrically connect, and it adjusts signal input part and described backfeed loop output terminal electrically connects.
5. alignment mark search system according to claim 4 is characterized in that, described backfeed loop comprises:
Effective value detecting unit and digital control of Electric potentials equipment; The input end of described effective value detecting unit and described adjustable automatic gain amplifier output terminal electrically connect;
Described digital control of Electric potentials equipment comprises digital regulation resistance controller and digital regulation resistance gain controller, and the input end of digital regulation resistance controller and the electric connection of described effective value detecting unit output terminal; The input end of described digital regulation resistance gain controller and described digital regulation resistance controller output end electrically connect, and its output terminal and described adjustable automatic gain amplifier electrically connect.
6. alignment mark search system according to claim 5 is characterized in that, described effective value detecting unit is converted to effective value with the Dynamic Signal of output.
7. alignment mark search system according to claim 5 is characterized in that, described digital regulation resistance controller comprises storer, and yield value is remembered.
8. alignment mark search system according to claim 7 is characterized in that, the acquiescence yield value that described digital regulation resistance controller can recover to be provided with.
9. alignment mark search system according to claim 7 is characterized in that, described digital regulation resistance controller judges whether the effective value of described effective value detecting unit output reaches preset value.
10. alignment mark search system according to claim 5 is characterized in that, described digital regulation resistance gain controller comprises digital regulation resistance.
11. alignment mark search system according to claim 10 is characterized in that, but the output voltage values of described digital regulation resistance controller bidirectional modulation digital regulation resistance.
12. alignment mark search system according to claim 11 is characterized in that, described digital regulation resistance gain controller sends gain command according to the output voltage values of described digital regulation resistance.
13. alignment mark search system according to claim 12 is characterized in that, described adjustable automatic gain amplifier receives described gain command, realizes gain.
14. alignment mark search system according to claim 1 is characterized in that, described datum plate comprises grid type reference mark.
15. alignment mark search system according to claim 14 is characterized in that, what the described light intensity data of described master control system foundation was judged described datum plate similarly is the picture that does not comprise described grid type reference mark.
16. alignment mark search system according to claim 15 is characterized in that, described light intensity data was greater than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark.
17. alignment mark search system according to claim 16 is characterized in that, described system largest light intensity value is the signal maximum under the current gain value of described digital regulation resistance.
18. alignment mark search system according to claim 17 is characterized in that, the current gain value of described digital regulation resistance obtains for using the dichotomy convergence.
19. alignment mark search system according to claim 16 is characterized in that, calculates the maximal value of the pairing position data of described light intensity data and the difference of minimum value.
20. alignment mark search system according to claim 19 is characterized in that, when described difference greater than described mark width 2/3 the time, it is to have found whole mark that described master control system is judged.
21. alignment mark search system according to claim 20 is characterized in that, calculates the maximal value of the pairing position data of described light intensity data and the average of minimum value, as the accurate position data of described mark.
22. alignment mark search system according to claim 15 is characterized in that, described light intensity data was less than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate does not comprise the picture of described grid type reference mark.
23. alignment mark search system according to claim 15 is characterized in that, when described master control system judged that the picture of described datum plate does not comprise the picture of described grid type reference mark, described master control system was adjusted described datum plate position, imaging once more.
24. alignment mark search system according to claim 15 is characterized in that, when described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark, stops to adjust described datum plate position.
25. alignment mark search system according to claim 1 is characterized in that, the parts of images information of the picture of described datum plate is extracted out and is sent to the CCD module, and shows on display.
26. alignment mark search system according to claim 2 is characterized in that, described lighting module is a laser instrument.
27. an alignment mark searching method that is used for lithographic equipment is characterized in that, comprising:
Use optical imaging system, obtain the picture of datum plate, and export first light intensity signal;
Use the signal condition system, receive described first light intensity signal, realize bidirectional pressure regulating, output intensity data by the digital regulation resistance controller;
Use master control system,, adjust described datum plate position according to described light intensity data.
28. alignment mark searching method according to claim 27 is characterized in that, described datum plate comprises grid type reference mark.
29. alignment mark searching method according to claim 28 is characterized in that, what the described light intensity data of described master control system foundation was judged described datum plate similarly is the picture that does not comprise described grid type reference mark.
30. alignment mark searching method according to claim 29 is characterized in that, described light intensity data was greater than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark.
31. alignment mark searching method according to claim 30 is characterized in that, described system largest light intensity value is the signal maximum under the current gain value of described digital regulation resistance.
32. alignment mark searching method according to claim 31 is characterized in that, the current gain value of described digital regulation resistance obtains for using the dichotomy convergence.
33. alignment mark searching method according to claim 30 is characterized in that, calculates the maximal value of the pairing position data of described light intensity data and the difference of minimum value.
34. alignment mark searching method according to claim 33 is characterized in that, when described difference greater than described mark width 2/3 the time, it is to have found whole mark that described master control system is judged.
35. alignment mark searching method according to claim 34 is characterized in that, calculates the maximal value of the pairing position data of described light intensity data and the average of minimum value, as the accurate position data of described mark.
36. alignment mark searching method according to claim 29 is characterized in that, described light intensity data was less than 2/3 o'clock of system's largest light intensity value, and described master control system judges that the picture of described datum plate does not comprise the picture of described grid type reference mark.
37. alignment mark searching method according to claim 29 is characterized in that, when described master control system judged that the picture of described datum plate does not comprise the picture of described grid type reference mark, described master control system was adjusted described datum plate position, imaging once more.
38. alignment mark searching method according to claim 29 is characterized in that, when described master control system judges that the picture of described datum plate comprises the picture of described grid type reference mark, stops to adjust described datum plate position.
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CN104272427B (en) * 2012-03-08 2017-05-17 迈普尔平版印刷Ip有限公司 Charged particle lithography system with alignment sensor and beam measurement sensor
US9665014B2 (en) 2012-03-08 2017-05-30 Mapper Lithography Ip B.V. Charged particle lithography system with alignment sensor and beam measurement sensor
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USRE49732E1 (en) 2012-03-08 2023-11-21 Asml Netherlands B.V. Charged particle lithography system with alignment sensor and beam measurement sensor
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CN109407480B (en) * 2018-11-26 2021-06-04 合肥芯碁微电子装备股份有限公司 Method and system for searching alignment MARK (MARK) by photoetching machine
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US11841627B2 (en) 2020-04-14 2023-12-12 Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. Display panel test method comprising the step of automatically searching for an alignment mark by obtaining position information of the display panel and display panel test device
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