CN101476107B - Vacuum arc ion film coating technology for non-arc spot - Google Patents
Vacuum arc ion film coating technology for non-arc spot Download PDFInfo
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- CN101476107B CN101476107B CN2008100000025A CN200810000002A CN101476107B CN 101476107 B CN101476107 B CN 101476107B CN 2008100000025 A CN2008100000025 A CN 2008100000025A CN 200810000002 A CN200810000002 A CN 200810000002A CN 101476107 B CN101476107 B CN 101476107B
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- arc
- vacuum
- spot
- cathode
- plating
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- 238000005516 engineering process Methods 0.000 title claims description 6
- 239000007888 film coating Substances 0.000 title abstract description 4
- 238000009501 film coating Methods 0.000 title abstract description 4
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000000576 coating method Methods 0.000 claims abstract description 6
- 239000011248 coating agent Substances 0.000 claims abstract description 5
- 239000007788 liquid Substances 0.000 claims abstract 2
- 238000007747 plating Methods 0.000 claims description 15
- 239000012528 membrane Substances 0.000 claims description 11
- 238000001704 evaporation Methods 0.000 claims description 10
- 230000008020 evaporation Effects 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 4
- 238000007733 ion plating Methods 0.000 claims description 3
- 238000009504 vacuum film coating Methods 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims 3
- 239000010959 steel Substances 0.000 claims 3
- 230000001131 transforming effect Effects 0.000 claims 1
- 238000010891 electric arc Methods 0.000 abstract description 6
- 241000237970 Conus <genus> Species 0.000 abstract 2
- 238000010438 heat treatment Methods 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 230000008016 vaporization Effects 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Abstract
The invention provides a conus vacuum arc ion film coating technique. A conus vacuum arc plasma body vaporizing ionization source is installed in a vacuum coating chamber with a vacuum degree of 10-10<-3> Pa. A large direct current arc power source is configured with the current about 2000A. After energization, under the condition of heating by the large current, a cathode region is converted from a cold cathode electric arc with spots to a thermionic cathode diffuse type electric arc without spots, and metallic vapour plasma bodies without liquid drops and with high ionization degree and high density are generated and irradiated to workpieces opposite to the cathode, thereby realizing ion coating film.
Description
Technical field
The present invention is the filtered cathode vacuum arc film of applying the supply source of expecting as plating without the vacuum arc plasma evaporation ionization source of arc spot
methodcharacteristics in view of this type of evaporating and ionizing source, can plate out the high-quality rete of dripless, densification, again owing to applying negative bias voltage on workpiece, make rete and workpiece bonding force splendid, therefore strictly say, the invention belongs to the vacuum arc technical field of plasma, but be mainly used in physical vapor deposition (PVD) plated film field.
background technology
The present invention is the long-pending achievement that practice is constantly brought forth new ideas for many years of our company,, in company's laboratory test of many times success, prepares the expansion scale and is applied to plant-scale coating system.Through the home and abroad patent retrieval of relevant this type of technology and adjacent technology, though show that for example following patent belongs to similar technical field, actual content and ultimate principle and the present invention are not identical.
Domestic patent Δ CN 03178688
Vacuum electric arc deposition equipment
Applicant: the contriver of Nishin Denki Co., Ltd: enter a damp man of virtue and ability and wait this invention to be provided with a plurality of negative electrodes, but and shield portions negative electrode, open a certain negative electrode, reach the rete of the multiple different cathode materials of plating, but all belong to the Vacuum electric arc deposition equipment that cold cathode has the arc spot, the particle drop is arranged.From of the present invention fundamentally different without the arc spot.
ΔCN 02160651
Vacuum arc vapor deposition method and device
By arc-over evaporation cathode material, form magnetic filter by a plurality of magnet, magnetic deflection field is arranged in magnetic filter, to get rid of molten drop, by plasma body, intrafascicular ion is delivered to jet hole simultaneously, enter the ion deposition chamber with film forming in substrate.This invention all has drop, obviously different from the present invention.
Foreign patent Δ US 6692624
Vacuum coater
Applicant: Internat ional Technology Exchange, Inc.
Contriver: A.Y.Ko lpakov etc.
This patent negative electrode is for what consume, and anode is simultaneously as vacuum chamber, and the tubular chamber's inwall around the arc-over post, have rib-like sawtooth sheet, to stop the macrobead molten drop, enters the film-coating workpiece district, by the magnetic field arranged, makes arc column deflection, and more drops are got rid of.Dripless visible and of the present invention is significantly different.
ΔUS 6391164
Employing is with the vacuum arc deposition film of the hot anode of on-consumable
Although this invention is also vacuum arc deposition, what adopt is non-chargeable heat anode, emtting cathode macrobead material on negative electrode.Significantly different from the present invention.
ΔUS 4620913
The arc vapor deposition method and apparatus
Applicant: Multi-Arc Vacuum Systems, Inc.
Contriver: Clark Bergman
In the arc vapor deposition coating process, maintain cathodic arc spot, indoor supplementary anode and vacuum-chamber wall have potential difference.This patent of invention cold cathode exactly has the electric arc of arc spot, becomes obvious with the present invention and contrasts, and obviously from of the present invention, without the arc spot, with indoor supplementary anode or supplementary anode, with vacuum-chamber wall, is connected without potential difference obviously different.
ΔUS 4551221
The vacuum arc plasma device
Application number: 640554
Contriver: Ivan I.Axenov etc.
The device of this patent of invention comprises can consume negative electrode, using its end face as working face, adopt sheath, be with spiral winding outward, the axial magnetic field produced, to control electric arc, whole process is also to belong to the cold cathode arc of arc spot plasma discharge is arranged, so from of the present invention significantly different without arc spot vacuum arc.
Summary of the invention
The present invention relates to the filtered cathode vacuum arc membrane technique without the arc spot, in order to overcome the shortcoming that the drop emission is arranged in the commonly used at present vacuum cathode arc ion plating membrane technique that the arc spot is arranged, the present invention adopts the supply source as the plating melt without the vacuum arc plasma evaporation ionization source of arc spot, be configured in vacuum plating indoor, application oil diffusion pump+lobe pump+sliding vane rotary pump oil-sealed rotary pump forms the oil-free exhausting system, to the vacuum film coating chamber exhaust, so that vacuum tightness reaches 10-10
-3the Pa scope.
Adopt large galvanic current arc power, generally can reach 2000A, as vacuum arc plasma discharge power supply, negative electrode connects the cylinder negative electrode of circular cross section, anodic bonding vacuum chamber inwall, also can be in vacuum chamber an ad hoc ring-type supplementary anode.
After energising, strengthen gradually electric current, while making current density reach the magnitude of arc-over, form the vacuum arc plasma discharge between cathode and anode, directly on the negative electrode section, form the evaporating area without the arc spot, cathodic area is without arc spot region of discharge.The workpiece on the dripless produced, high ionization degree, highdensity metal vapors plasma body directive negative electrode opposite, and apply negative bias voltage on workpiece, this just makes the positive ion in metallic plasma, be equivalent to plating material positive ion, attracted by negative bias voltage, bang to workpiece surface rapidly, realized meeting the ion film plating process of ion plating definition, the metal that is applicable to present technique, take boiling point higher than 1500 degree as good, as Zr, Ni, Cr, Ti etc.
In order to change the vacuum internal ambience, multiple gases can be set, as Ar, or O
2, or N
2, or C
2h
2or air etc. and mixed gas thereof, and through under meter metering, feed-in vacuum chamber, the metal ion produced with this evaporating and ionizing source forms reactive vapour deposition, the realization response ion film plating, as ZrN, ZrCN, TiCN, TiAlN, CrN etc., form densification, dripless, the strong high-quality rete of bonding force.
the accompanying drawing explanation
It shown in Fig. 1, is the schematic diagram without the filtered cathode vacuum arc membrane technique of arc spot
1. vacuum film coating chambers wherein
2. negative bias power supply
3. workpiece
4. anode
5. vacuum arc
6. without arc spot, dripless, high ionization degree, high desnity metal vapor plasma
7. negative electrode
8. vacuum-chamber wall
9. vacuum chamber bleeding point
Embodiment
The present invention is without the filtered cathode vacuum arc membrane technique of arc spot, and in our company's test repeatedly, coating effects is good, now has been designed to the coating equipment of commercial size.First batch of 9 plasma evaporation of the vacuum arc without arc spot ionization sources are assemblied on TGN-JKDD9 type ion film coating machine, after this machine puts goods on the market in batches, will progressively replace existing traditional Electroplating Production that serious environmental pollution is arranged.
Claims (5)
1. the membrane method of the filtered cathode vacuum arc without the arc spot, is characterized in that with the vacuum arc plasma evaporation ionization source without the arc spot, and as the plating material supply source of workpiece to be plated, it is placed in to vacuum tightness is 10-10
-3the vacuum plating of Pa is indoor, the inwall of chamber is as the anode without arc spot vacuum arc, also can be in vacuum chamber an ad hoc supplementary anode, this supplementary anode can be connected with chamber interior walls, jointly as anode, can not connect yet, inwall is not made anode, above-mentioned plating material supply source is as the negative electrode without arc spot vacuum arc, this negative electrode normally has the cylindrical cathode of circular cross section, also can use the negative electrode of arbitrary shape section, also can be by the liquid cathode be contained in crucible, configure large galvanic current power supply, reach 2000A, after energising, under this large current flow heats condition, make cathodic area from the spot cold cathode arc being arranged to transforming without spot hot-cathode diffused arc, the dripless produced without the vacuum arc negative electrode of arc spot, the high ionization degree, the workpiece on highdensity metallic vapor plasma body directive negative electrode opposite, and apply negative bias voltage on workpiece, realized meeting the ion film plating process of the standard of ion plating definition.
2. related a kind of membrane method of the filtered cathode vacuum arc without the arc spot according to claim 1, workpiece to be plated is moving industrial steel band, at the indoor vacuum arc plasma evaporation ionization source arranged more than 2 or 2 without the arc spot of vacuum plating, respectively to steel band positive and negative plated film, thereby an indoor steel band double-sided coating technology that realizes of vacuum plating.
3. related a kind of membrane method of the filtered cathode vacuum arc without the arc spot according to claim 1, workpiece to be plated is the metalwork be suspended on pivoted frame, 1 or many plasma evaporation of the vacuum arc without arc spot ionization sources are set vacuum plating is indoor, to the workpiece on the pivoted frame with respect to this source revolution and rotation, realize workpiece gross area uniform coated.
4. related a kind of membrane method of the filtered cathode vacuum arc without the arc spot according to claim 1, the metal species of being expected by plating is the metal of Ti boiling point higher than 1500 ° of k.
5. related a kind of membrane method of the filtered cathode vacuum arc without the arc spot according to claim 1, in the filtered cathode vacuum arc membrane process without the arc spot, the atmosphere of vacuum film coating chamber is Ar, or N
2, or O
2, or C
2h
2gas, or its mixed gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100000025A CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100000025A CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
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| Publication Number | Publication Date |
|---|---|
| CN101476107A CN101476107A (en) | 2009-07-08 |
| CN101476107B true CN101476107B (en) | 2013-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100000025A Expired - Fee Related CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
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Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101654769B (en) * | 2009-08-26 | 2011-01-05 | 杭州泛亚卫浴股份有限公司 | Vacuum ion plating method |
| CN102869183A (en) * | 2011-07-08 | 2013-01-09 | 王殿儒 | Method for obtaining ionized metal vapor |
| CN103681192B (en) * | 2012-09-17 | 2017-10-13 | 北京北方华创微电子装备有限公司 | A kind of method for etching plasma and silicon shallow trench isolation method |
| CN104651782B (en) * | 2013-11-18 | 2018-08-31 | 北京中科三环高技术股份有限公司 | Magnet surface processing method and Sintered NdFeB magnet |
| JP6044602B2 (en) * | 2014-07-11 | 2016-12-14 | トヨタ自動車株式会社 | Deposition equipment |
| CN108085640B (en) * | 2017-10-31 | 2023-05-12 | 东莞市汇成真空科技有限公司 | Vacuum cathode arc coating machine for coating inner wall of large tank body |
| CN114318249B (en) * | 2021-12-30 | 2023-11-17 | 广东鼎泰高科技术股份有限公司 | Non-drop plasma coating arc source structure, coating system and coating method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043961A (en) * | 1989-08-21 | 1990-07-18 | 机械电子工业部北京机械工业自动化研究所 | Magnetic control arc ion plating method |
| CN2525100Y (en) * | 2001-04-20 | 2002-12-11 | 北京长城钛金公司 | New cathode electric arc ion film coating device |
-
2008
- 2008-01-02 CN CN2008100000025A patent/CN101476107B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043961A (en) * | 1989-08-21 | 1990-07-18 | 机械电子工业部北京机械工业自动化研究所 | Magnetic control arc ion plating method |
| CN2525100Y (en) * | 2001-04-20 | 2002-12-11 | 北京长城钛金公司 | New cathode electric arc ion film coating device |
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| Publication number | Publication date |
|---|---|
| CN101476107A (en) | 2009-07-08 |
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Addressee: Jin Youmin Document name: Notification of Publication of the Application for Invention |
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Owner name: WANG DIANRU Free format text: FORMER OWNER: BEIJING CHANGCHENG TI-GOLD COMPANY Effective date: 20100129 |
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Effective date of registration: 20100129 Address after: Beijing North Third Ring Road No. 48 No. 3-3 Applicant after: Wang Dianru Address before: Box 95-020, Beijing, 7 Bei'an Road, Haidian District, Beijing Applicant before: Beijing Changcheng Titanium Gold Co. |
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Owner name: QINGHAI SUPOWER TITANIUM CO., LTD. Free format text: FORMER OWNER: WANG DIANRU Effective date: 20131206 |
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Effective date of registration: 20131206 Address after: 810007 Qinghai Xining bearing Titanium Industry Co., Ltd., 6 Jin Xin Road, Qinghai, China Patentee after: Qinghai Supower Titanium Co., Ltd. Address before: 100086, No. 48 West Third Ring Road, Beijing, 3-3B Patentee before: Wang Dianru |
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| C56 | Change in the name or address of the patentee | ||
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Address after: 810007 Qinghai province Xining No. 6 Jin Xin road Qinghai shaped titanium industry Co. Ltd Patentee after: Qinghai Juneng titanium industry Limited by Share Ltd Address before: 810007 Qinghai province Xining No. 6 Jin Xin road Qinghai shaped titanium industry Co. Ltd Patentee before: Qinghai Supower Titanium Co., Ltd. |
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