CN101476107A - Vacuum arc ion film coating technology for non-arc spot - Google Patents
Vacuum arc ion film coating technology for non-arc spot Download PDFInfo
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- CN101476107A CN101476107A CNA2008100000025A CN200810000002A CN101476107A CN 101476107 A CN101476107 A CN 101476107A CN A2008100000025 A CNA2008100000025 A CN A2008100000025A CN 200810000002 A CN200810000002 A CN 200810000002A CN 101476107 A CN101476107 A CN 101476107A
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- vacuum
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- 238000005516 engineering process Methods 0.000 title claims description 6
- 239000007888 film coating Substances 0.000 title abstract description 5
- 238000009501 film coating Methods 0.000 title abstract description 5
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000000576 coating method Methods 0.000 claims abstract description 8
- 239000000463 material Substances 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 6
- 239000007788 liquid Substances 0.000 claims abstract 2
- 238000007747 plating Methods 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 9
- 239000012528 membrane Substances 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000007789 gas Substances 0.000 claims description 4
- 238000007733 ion plating Methods 0.000 claims description 4
- 238000009504 vacuum film coating Methods 0.000 claims description 3
- 238000009835 boiling Methods 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910000831 Steel Inorganic materials 0.000 claims 3
- 239000010959 steel Substances 0.000 claims 3
- 241000237970 Conus <genus> Species 0.000 abstract 3
- 230000008016 vaporization Effects 0.000 abstract 2
- 238000001771 vacuum deposition Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 3
- 239000010406 cathode material Substances 0.000 description 2
- 238000000280 densification Methods 0.000 description 2
- 238000010891 electric arc Methods 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 206010037660 Pyrexia Diseases 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000009533 lab test Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The invention provides a conus vacuum arc ion film coating technique. A conus vacuum arc plasma body vaporizing ionization source is installed in a vacuum coating chamber with a vacuum degree of 10-10 -3 Pa, the inner wall of the chamber is used as the anode of the conus vacuum arc, or an auxiliary anode which is connected with the inner wall of the chamber can be specially provided in the vacuum chamber, both of them can be used as the anode together, or the connection is not needed for the inner wall is not used as the anode, the cylindrical cathode of the circular section of the vaporizing ionization source is a coating material supply source for providing metallic vapour plasma bodies without liquid drop and with high ionization degree and high density, and the plasma bodies are irradiated to the workpieces opposite to the cathode for applying negative bias to the workpieces, therefore, ion film coating process in compliance with ion coating standard can be realized.
Description
Technical field
The present invention uses the filtered cathode vacuum arc membrane technique of the vacuum arc plasma evaporation ionization source of no arc spot as the supply source of plating material, characteristics in view of this type of evaporating and ionizing source, can plate out the high-quality rete of dripless, densification, again owing on workpiece, apply negative bias voltage, make rete and workpiece bonding force splendid, therefore strictness is said, the invention belongs to the vacuum arc technical field of plasma, but is mainly used in physical vapor deposition (PVD) plated film field.
Background technology
The present invention is the achievement that the long-pending practice for many years of our company is constantly brought forth new ideas, and in company's laboratory test of many times success, prepares the expansion scale and is applied to plant-scale coating system.Home and abroad patent retrieval through relevant this type of technology and adjacent technology belongs to similar technical field though show following patent for example, and actual content and ultimate principle and the present invention are also inequality.
Domestic patent Δ CN 03178688
Vacuum arc deposition equipment
Applicant: the contriver of Nishin Denki Co., Ltd: go into a damp man of virtue and ability etc.
This invention is provided with a plurality of negative electrodes, but and the shield portions negative electrode, open a certain negative electrode reaches the rete of the multiple different cathode materials of plating, but all belongs to cold cathode the arc spot is arranged, has the vacuum arc deposition equipment of particle drop.Fundamentally different with no arc spot of the present invention.
ΔCN?02160651
Vacuum arc vapor deposition method and device
By arc-over evaporation cathode material, form magnetic filter by a plurality of magnet, magnetic deflection field is arranged in the magnetic filter, to get rid of molten drop, simultaneously that plasma body is intrafascicular ion is delivered to jet hole, enter the ion deposition chamber with film forming in substrate.This invention all has drop, and is obviously different with the present invention.
Foreign patent Δ US 6692624
Vacuum coater
Applicant: International Technology Exchange, Inc.
Contriver: A.Y.Kolpakov etc.
This patent negative electrode is for what consume, and anode is simultaneously as vacuum chamber, and the tubular chamber's inwall around the arc-over post has rib-like sawtooth sheet, enters the film-coating workpiece district to stop the macrobead molten drop, makes arc column deflection by the magnetic field that is provided with, and more drops are got rid of.As seen significantly different with dripless of the present invention.
ΔUS?6391164
Employing has the hot anodic vacuum arc deposition of on-consumable film
Though this invention also is a vacuum arc deposition, what adopt is non-hectic fever anode, emtting cathode macrobead material on negative electrode.Significantly different with the present invention.
ΔUS?4620913
The arc vapor deposition method and apparatus
Applicant: Multi-Arc Vacuum Systems, Inc.
Contriver: Clark Bergman
In the arc vapor deposition coating process, keep cathodic arc spot, indoor supplementary anode and vacuum-chamber wall have potential difference.This patent of invention cold cathode exactly has the electric arc of arc spot, becomes obvious contrast with the present invention, and obviously be connected no potential difference with vacuum-chamber wall obviously different with no arc spot of the present invention and indoor supplementary anode or supplementary anode.
ΔUS?4551221
The vacuum arc plasma device
Application number: 640554
Contriver: Ivan I.Axenov etc.
The device of this patent of invention comprises can consume negative electrode, with its end face as working face, adopt sheath, be with spiral winding outward, the axial magnetic field that produces, with control electric arc, whole process also is to belong to the cold cathode arc of arc spot plasma discharge is arranged, so significantly different with no arc spot vacuum arc of the present invention.
Summary of the invention
The present invention relates to not have the filtered cathode vacuum arc membrane technique of arc spot, in order to overcome the shortcoming that the drop emission is arranged in the vacuum cathode arc ion plating membrane technique that the arc spot is arranged commonly used at present, the present invention adopts the supply source of the vacuum arc plasma evaporation ionization source of no arc spot as the plating material, it is indoor to be configured in vacuum plating, use oil diffusion pump+lobe pump+rotary-vane pump and form the oil-free exhausting system, to the vacuum film coating chamber exhaust, so that vacuum tightness reaches 10-10
-3The Pa scope.
Adopt big galvanic current arc power, generally can reach 2000A, as vacuum arc plasma discharge power supply, negative electrode connects the cylinder negative electrode of circular cross section, and anode connects the vacuum chamber inwall, also can be in vacuum chamber an ad hoc ring-type supplementary anode.
After the energising, strengthen electric current gradually, when making current density reach the magnitude of arc-over, between cathode and anode, form the vacuum arc plasma discharge, no arc spot on the negative electrode section, the workpiece on the dripless that is produced, high ionization degree, high-density metal vapor plasma directive negative electrode opposite, and on workpiece, apply negative bias voltage, this just makes the positive ion in the metallic plasma, be equivalent to plating material positive ion, attracted by negative bias voltage, bang to workpiece surface rapidly, realized meeting the ion film plating process of ion plating definition.Be fit to the metal of present technique, it is good being higher than 1500 ° of K with boiling point, as Zr, Ni, Cr, Ti etc.
In order to change the vacuum internal ambience, multiple gases can be set, as Ar, or O
2, or N
2, or C
2H
2, or air etc. and mixed gas thereof, and through the under meter metering, the feed-in vacuum chamber, the metal ion that produces with this evaporating and ionizing source forms reactive vapour deposition, and the realization response ion film plating is as ZrN, ZrCN, TiN, TiCN, TiAlN, CrN etc. form densification, dripless, the strong high-quality rete of bonding force.
Description of drawings
Shown in Figure 1 is the schematic diagram of the filtered cathode vacuum arc membrane technique of no arc spot
1. vacuum film coating chambers wherein
2. negative bias power supply
3. workpiece
4. anode
5. vacuum arc
6. there are not arc spot, dripless, high ionization degree, high desnity metal vapor plasma
7. negative electrode
8. vacuum-chamber wall
9. vacuum chamber bleeding point
Embodiment
The present invention does not have the filtered cathode vacuum arc membrane technique of arc spot, and in our company's test repeatedly, coating effects is good, now has been designed to the coating equipment of commercial size.The vacuum arc plasma evaporation ionization source of first batch of 9 no arc spots is assemblied on the TGN-JKDD9 type ion film coating machine, after this machine puts goods on the market in batches, will progressively replace existing traditional Electroplating Production that serious environmental pollution is arranged.
Claims (5)
1. a filtered cathode vacuum arc membrane technique that does not have the arc spot is characterized in that the vacuum arc plasma evaporation ionization source with no arc spot, and as the plating material supply source of workpiece to be plated, it is placed in vacuum tightness is 10-10
-3The vacuum plating of Pa is indoor, the inwall of chamber is as the anode of no arc spot vacuum arc, also can be in vacuum chamber an ad hoc supplementary anode, this supplementary anode can be connected with chamber interior walls, jointly as anode, can not connect yet, inwall is not made anode, above-mentioned plating material supply source is as the negative electrode of no arc spot vacuum arc, this negative electrode normally has the cylindrical cathode of circular cross section, also can use the negative electrode of arbitrary shape section, also can be with the liquid cathode of containing in crucible, the dripless that the vacuum arc negative electrode of this no arc spot is produced, the high ionization degree, the workpiece on high-density metal vapor plasma directive negative electrode opposite, and apply negative bias voltage on workpiece has then realized meeting the ion plating coating process of the standard of ion plating definition.
2. according to claim 1, related workpiece to be plated is moving industrial steel band, at an indoor vacuum arc plasma evaporation ionization source that no arc spot more than 2 or 2 is set of vacuum plating, respectively to steel band positive and negative plated film, thereby the indoor realization steel band of a vacuum plating double-sided coating technology.
3. according to claim 1, related workpiece to be plated is the metalwork that is suspended on the pivoted frame, at the indoor vacuum arc plasma evaporation ionization source that 1 or many no arc spot is set of vacuum plating,, realize the even plated film of workpiece gross area to respect to the workpiece on the pivoted frame of this source revolution and rotation.
4. according to claim 1, can be Zr by the metal species of plating material, Ni, Cr, boiling points such as Ti are higher than the metal of 1500 ° of K.
5. according to claim 1, in the filtered cathode vacuum arc membrane process of no arc spot, the atmosphere of vacuum film coating chamber can be Ar, or N
2, or O
2, or C
2H
2Etc. multiple gases, or its mixed gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100000025A CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100000025A CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101476107A true CN101476107A (en) | 2009-07-08 |
| CN101476107B CN101476107B (en) | 2013-12-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100000025A Expired - Fee Related CN101476107B (en) | 2008-01-02 | 2008-01-02 | Vacuum arc ion film coating technology for non-arc spot |
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|---|---|
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101654769B (en) * | 2009-08-26 | 2011-01-05 | 杭州泛亚卫浴股份有限公司 | Vacuum ion plating method |
| CN102869183A (en) * | 2011-07-08 | 2013-01-09 | 王殿儒 | Method for obtaining ionized metal vapor |
| CN103681192A (en) * | 2012-09-17 | 2014-03-26 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma etching method and silicon shallow trench isolation method |
| CN104651782A (en) * | 2013-11-18 | 2015-05-27 | 北京中科三环高技术股份有限公司 | Magnet surface treatment method and sintered neodymium-iron-boron magnet |
| CN105316628A (en) * | 2014-07-11 | 2016-02-10 | 丰田自动车株式会社 | Film forming device |
| CN108085640A (en) * | 2017-10-31 | 2018-05-29 | 东莞市汇成真空科技有限公司 | Large tank inner wall plated film vacuum cathode arc coating machine |
| CN114318249A (en) * | 2021-12-30 | 2022-04-12 | 广东鼎泰高科技术股份有限公司 | Droplet-free plasma coating arc source structure, coating system and coating method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043961A (en) * | 1989-08-21 | 1990-07-18 | 机械电子工业部北京机械工业自动化研究所 | Magnetic control arc ion plating method |
| CN2525100Y (en) * | 2001-04-20 | 2002-12-11 | 北京长城钛金公司 | New cathode electric arc ion film coating device |
-
2008
- 2008-01-02 CN CN2008100000025A patent/CN101476107B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1043961A (en) * | 1989-08-21 | 1990-07-18 | 机械电子工业部北京机械工业自动化研究所 | Magnetic control arc ion plating method |
| CN2525100Y (en) * | 2001-04-20 | 2002-12-11 | 北京长城钛金公司 | New cathode electric arc ion film coating device |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101654769B (en) * | 2009-08-26 | 2011-01-05 | 杭州泛亚卫浴股份有限公司 | Vacuum ion plating method |
| CN102869183A (en) * | 2011-07-08 | 2013-01-09 | 王殿儒 | Method for obtaining ionized metal vapor |
| CN103681192A (en) * | 2012-09-17 | 2014-03-26 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Plasma etching method and silicon shallow trench isolation method |
| CN103681192B (en) * | 2012-09-17 | 2017-10-13 | 北京北方华创微电子装备有限公司 | A kind of method for etching plasma and silicon shallow trench isolation method |
| CN104651782A (en) * | 2013-11-18 | 2015-05-27 | 北京中科三环高技术股份有限公司 | Magnet surface treatment method and sintered neodymium-iron-boron magnet |
| CN104651782B (en) * | 2013-11-18 | 2018-08-31 | 北京中科三环高技术股份有限公司 | Magnet surface processing method and Sintered NdFeB magnet |
| CN105316628A (en) * | 2014-07-11 | 2016-02-10 | 丰田自动车株式会社 | Film forming device |
| CN105316628B (en) * | 2014-07-11 | 2018-02-02 | 丰田自动车株式会社 | Film formation device |
| CN108085640A (en) * | 2017-10-31 | 2018-05-29 | 东莞市汇成真空科技有限公司 | Large tank inner wall plated film vacuum cathode arc coating machine |
| CN114318249A (en) * | 2021-12-30 | 2022-04-12 | 广东鼎泰高科技术股份有限公司 | Droplet-free plasma coating arc source structure, coating system and coating method |
| CN114318249B (en) * | 2021-12-30 | 2023-11-17 | 广东鼎泰高科技术股份有限公司 | Non-drop plasma coating arc source structure, coating system and coating method |
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| Publication number | Publication date |
|---|---|
| CN101476107B (en) | 2013-12-11 |
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Addressee: Jin Youmin Document name: Notification of Publication of the Application for Invention |
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Effective date of registration: 20131206 Address after: 810007 Qinghai Xining bearing Titanium Industry Co., Ltd., 6 Jin Xin Road, Qinghai, China Patentee after: Qinghai Supower Titanium Co., Ltd. Address before: 100086, No. 48 West Third Ring Road, Beijing, 3-3B Patentee before: Wang Dianru |
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Address after: 810007 Qinghai province Xining No. 6 Jin Xin road Qinghai shaped titanium industry Co. Ltd Patentee after: Qinghai Juneng titanium industry Limited by Share Ltd Address before: 810007 Qinghai province Xining No. 6 Jin Xin road Qinghai shaped titanium industry Co. Ltd Patentee before: Qinghai Supower Titanium Co., Ltd. |
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