CN101429641A - Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating - Google Patents

Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating Download PDF

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Publication number
CN101429641A
CN101429641A CNA2008101479179A CN200810147917A CN101429641A CN 101429641 A CN101429641 A CN 101429641A CN A2008101479179 A CNA2008101479179 A CN A2008101479179A CN 200810147917 A CN200810147917 A CN 200810147917A CN 101429641 A CN101429641 A CN 101429641A
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CN
China
Prior art keywords
chromium nitride
nanometer film
film
nitride
nanometer
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Pending
Application number
CNA2008101479179A
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Chinese (zh)
Inventor
黄政树
陈维熹
黄海基
徐健
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Chengdu Minjie Manufacturing Engineering Co Ltd
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Chengdu Minjie Manufacturing Engineering Co Ltd
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Publication date
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Priority to CNA2008101479179A priority Critical patent/CN101429641A/en
Publication of CN101429641A publication Critical patent/CN101429641A/en
Pending legal-status Critical Current

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  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

The invention provides a chromium nitride and titanium aluminium nitride hard multilayer nanometer film coating which consists of multiple layers of nanometer films. The components of the coating comprise chromium nitride and titanium aluminium nitride; the thickness of a single layer of nanometer film is 10 to 200 nanometers; the thickness of the coating is 1 to 7 micrometers; and the single layer of nanometer film can be a chromium nitride nanometer film, a chromium nitride-titanium aluminium nitride mixture nanometer film, or a titanium aluminium nitride nanometer film. The coating is formed by alternate combination of chromium nitride nanometer films and titanium aluminium nitride nanometer films, or alternate combination of chromium nitride nanometer films, chromium nitride-titanium aluminium nitride mixture nanometer films and titanium aluminium nitride nanometer films, wherein the particle size of chromium nitride and titanium aluminium nitride is less than 10 nanometers. The coating has high hardness, low friction coefficient and good toughness, and is mainly used on the surfaces of tools and mechanical parts.

Description

Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating
Technical field
The present invention relates to a kind of coating of substrate surface, particularly relate to a kind of chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating that is used for instrument and machinery part surface.
Background technology
As everyone knows, be that the physical gas phase deposition technology of representative has been used decades in industry with titanium nitride (TiN), improved the performance of tool and mould significantly, over past ten years, extend again and expanded multiple film composition.Titanium carbonitride (TiCN) for example), TiAlN (AlTiN), TiAlN (TiAlN) or titanium nitride-TiAlN (TiN-AlTiN) etc.The natural characteristics of their each tool materials itself, as AlTiN hardness height, and high temperature resistant, but frictional coefficient is bigger, poor toughness; TiN-AlTiN hardness is higher, and frictional coefficient is big, and high thermal resistance is relatively poor.
Summary of the invention
The objective of the invention is to overcome above-mentioned weak point, a kind of hardness height, good toughness are provided, frictional coefficient is little, and resistant to elevated temperatures chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating.
Chromium nitride of the present invention (CrN), TiAlN (AlTiN) hard multi-layer nano-film coating are the multi-layer nano-film coatings that is combined by the individual layer nanometer film, and coated component comprises chromium nitride and TiAlN, and the granularity of chromium nitride, TiAlN is less than 10 nanometers.Wherein, the atomic ratio of titanium and aluminium is a titanium in the TiAlN: aluminium=1:1~3.The thickness of individual layer nanometer film is 10~200 nanometers, and coat-thickness is 1~7 micron.The individual layer nanometer film is chromium nitride nanometer film, TiAlN nanometer film and chromium nitride-TiAlN mixture nanometer film.Coating is formed by chromium nitride nanometer film and TiAlN nanometer film alternate combinations, or form by chromium nitride nanometer film, chromium nitride-TiAlN mixture nanometer film, TiAlN nanometer film alternate combinations, the chromium nitride nanometer film is that bottom, chromium nitride-TiAlN mixture nanometer film are between chromium nitride nanometer film and TiAlN nanometer film.The blending ratio of chromium nitride and TiAlN is chromium nitride: TiAlN=1:1~2 by weight in chromium nitride-TiAlN mixture nanometer film.The thickness of coating requires to decide according to workpiece required hardness and heatproof, the thickness of each individual layer nanometer film in the coating, and requiring according to workpiece can be identical, also can be different.
The advantage of chromium nitride of the present invention, titanium nitride aluminum hard multi-layer nano-film coating is the hardness height, be HV2000~4000, and good toughness, maximum operation (service) temperature is 800 ℃, have good binding intensity with base material, be mainly used in metal-cutting machine tool, mould and the mechanical component easy to wear.
Tool is stopped embodiment
Embodiment 1:
1) coated component CrN and AlTiN (Ti:Al=1:1) (granularity 5~10nm),
2) individual layer nanometer film CrN nanometer film and AlTiN nanometer film (thickness 10~20nm),
3) coating is that above-mentioned two kinds of individual layer nanometer film alternate combinations form, and bottom is the CrN nanometer film, and the top layer is the AlTiN nanometer film, coat-thickness 1.5 ± 0.5 μ.
Above-mentioned coating adopts cathode arc and magnetron sputtering ionic coating equipment with Cr, two kinds of targets of AlTi to implement.
Embodiment 2:
1) coated component CrN and AlTiN (Ti:Al=1:2) (granularity 5~10nm),
2) individual layer nanometer film CrN nanometer film and AlTiN nanometer film (thickness 40~60nm),
3) coating is that above-mentioned two kinds of individual layer nanometer film replace be combined into, and bottom is the CrN nanometer film, and the top layer is the AlTiN nanometer film, coat-thickness 3 ± 0.5 μ.
Above-mentioned coating adopts cathode arc and magnetron sputtering ionic coating equipment with Cr, two kinds of targets of AlTi to implement.
Embodiment 3:
1) coated component CrN and AlTiN (Ti:Al=1:3) (granularity 5~10nm),
2) individual layer nanometer film CrN nanometer film
CrN-AlTiN mixture nanometer film (TiN:AlTiN=1:1),
The AlTiN nanometer film
(thickness is 80~100nm),
3) coating be above-mentioned three kinds of individual layer nanometer film to replace the be combined into bottom be the CrN nanometer film, the top layer is the AlTiN nanometer film, coat-thickness 5 ± 0.5 μ.
Above-mentioned coating adopts cathode arc and magnetron sputtering ionic coating equipment with Cr, two kinds of targets of AlTi to implement.
Embodiment 4:
1) coated component CrN and AlTiN (Ti:Al=1:3) (granularity 5~10nm),
2) individual layer nanometer film CrN nanometer film (thickness 40~60nm),
The AlTiN nanometer film (thickness 80~100nm),
3) coating be above-mentioned two kinds of individual layer nanometer film to replace the be combined into bottom be the CrN nanometer film, the top layer is the AlTiN nanometer film, coat-thickness 4 ± 0.5 μ.
Above-mentioned coating adopts cathode arc and magnetron sputtering ionic coating equipment with Cr, two kinds of targets of AlTi to implement.
Embodiment 5:
1 coated component CrN, 1TiN (Ti:Al=1:2) (granularity 5~10nm),
2) individual layer nanometer film CrN nanometer film (thickness 20~40nm),
AlTiN nanometer film (thickness 100~140),
CrN-AlTiN mixture nanometer film (chromium nitride: TiAlN=1:2)
(thickness 180~200),
3) coating be above-mentioned two kinds of individual layer nanometer film to replace the be combined into bottom be the CrN nanometer film, the top layer is the AlTiN nanometer film, coat-thickness 6.5 ± 0.5 μ.
Above-mentioned coating adopts cathode arc and magnetron sputtering ionic coating equipment with Cr, two kinds of targets of AlTi to implement.

Claims (3)

1, a kind of chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating, it is the multilayer film coating that combines by unitary film, coated component comprises TiAlN, it is characterized in that unitary film is the individual layer nanometer film, its thickness is 10~200 nanometers, coat-thickness is 1~7 micron, the individual layer nanometer film is the chromium nitride nanometer film, TiAlN nanometer film and chromium nitride-TiAlN mixture nanometer film, coating is formed by chromium nitride nanometer film and TiAlN nanometer film alternate combinations, or by the chromium nitride nanometer film, chromium nitride-TiAlN mixture nanometer film, TiAlN nanometer film alternate combinations forms, wherein chromium nitride, the granularity of TiAlN is less than 10 nanometers.
2,, it is characterized in that the blending ratio of chromium nitride and TiAlN is chromium nitride: TiAlN=1:1~2 by weight in chromium nitride-TiAlN mixture nanometer film as claim 1 ' described chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating.
3,, it is characterized in that the atomic ratio of titanium and aluminium is a titanium in the TiAlN: aluminium=1:1~3 as claim 1 ' described chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating.
CNA2008101479179A 2008-12-19 2008-12-19 Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating Pending CN101429641A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CNA2008101479179A CN101429641A (en) 2008-12-19 2008-12-19 Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CNA2008101479179A CN101429641A (en) 2008-12-19 2008-12-19 Chromium nitride, titanium nitride aluminum hard multi-layer nano-film coating

Publications (1)

Publication Number Publication Date
CN101429641A true CN101429641A (en) 2009-05-13

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104818453A (en) * 2015-04-17 2015-08-05 北京机械工业自动化研究所 Erosion-resisting hydrophobic material and preparation method thereof
CN104818454A (en) * 2015-04-17 2015-08-05 北京机械工业自动化研究所 High-temperature resistant hydrophobic material and preparation method thereof
CN106756785A (en) * 2016-12-29 2017-05-31 西安交通大学青岛研究院 A kind of multiple elements design nanometer hard coat and preparation method thereof
CN109207937A (en) * 2018-07-20 2019-01-15 福建浦汇科技发展有限公司 A kind of surface treatment method and its coating of casting aluminum rotor apparatus
CN112575291A (en) * 2020-11-26 2021-03-30 苏州德耐纳米科技有限公司 Chromium nitride and titanium aluminum nitride hard multilayer nano-film coating
CN114481024A (en) * 2021-12-29 2022-05-13 江苏佳搏实业发展集团有限公司 High-performance aluminum alloy die ceramic coating and preparation method thereof

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104818453A (en) * 2015-04-17 2015-08-05 北京机械工业自动化研究所 Erosion-resisting hydrophobic material and preparation method thereof
CN104818454A (en) * 2015-04-17 2015-08-05 北京机械工业自动化研究所 High-temperature resistant hydrophobic material and preparation method thereof
CN106756785A (en) * 2016-12-29 2017-05-31 西安交通大学青岛研究院 A kind of multiple elements design nanometer hard coat and preparation method thereof
CN109207937A (en) * 2018-07-20 2019-01-15 福建浦汇科技发展有限公司 A kind of surface treatment method and its coating of casting aluminum rotor apparatus
CN112575291A (en) * 2020-11-26 2021-03-30 苏州德耐纳米科技有限公司 Chromium nitride and titanium aluminum nitride hard multilayer nano-film coating
CN114481024A (en) * 2021-12-29 2022-05-13 江苏佳搏实业发展集团有限公司 High-performance aluminum alloy die ceramic coating and preparation method thereof

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Open date: 20090513