CN101363881B - Method for testing resistance - Google Patents
Method for testing resistance Download PDFInfo
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- CN101363881B CN101363881B CN2007100446934A CN200710044693A CN101363881B CN 101363881 B CN101363881 B CN 101363881B CN 2007100446934 A CN2007100446934 A CN 2007100446934A CN 200710044693 A CN200710044693 A CN 200710044693A CN 101363881 B CN101363881 B CN 101363881B
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Abstract
By the resistance measurement method in the prior art, the measured resistance is the sum of a contact resistance and a structure resistance, and the structure resistance has a large error when the contact resistance is non-negligible relative to the structure resistance. The invention provides a resistance measurement method, which can precisely measure the contact resistance, and then obtain a precise value of the structure resistance by the contact resistance and the measured resistance, thereby greatly reducing the resistance measurement error and improving the measurement precision.
Description
Technical field
The present invention relates to a kind of method of testing, particularly a kind of method for testing resistance.
Background technology
Electronic product, particularly integrated circuit manufacture process in, often need test resistance.The method for testing resistance of prior art has two kinds of two ends method for testing resistance and three end method for testing resistance usually.
The two ends method for testing resistance uses two ends test structure as shown in Figure 1, and said two ends test structure comprises resistance 13 and lays respectively at the first test lead 11 and tail test lead 12 at resistance 13 two ends.Apply voltage at first test lead 11 with tail test lead 12 through probe, measure the current value between two test leads, perhaps between two test leads, apply measuring current, and measure the voltage difference of two test leads through the probe pen.
Through Ohm law, R=U/I can obtain the resistance value of the resistance 13 of 12 of said first test lead 11 and tail test leads.
But there is following problem in said two ends method for testing resistance:
As shown in Figure 2, what detect through probe in the actual test process is to be added in the probe 14 of first test lead and to be added in magnitude of voltage and the current value between two probes between the probe 15 of tail test lead 12.
Therefore; As shown in Figure 3; Through the measured measuring resistance Rm0 of two ends resistance test method is the resistance of 15 of probe 14 and probes, and this resistance R m0 is made up of with the first contact resistance Rc01 of first test lead 11 and the tail contact resistance Rc02 of probe 15 and tail test lead 12 structural resistance Rs0 intrinsic between first test lead 11 and the tail test lead 12 and probe 14.
When contact resistance Rc01 and contact resistance Rc02 were negligible, then measured measuring resistance Rm0 was approximately equal to the intrinsic resistance of 12 of first test lead 11 and tail test leads, i.e. structural resistance Rs0.
But in the actual measuring process, contact resistance resistance size is compared with the structural resistance resistance of measured resistance and can not ignore often.
Therefore, adopting the resistance value of the measured measured resistance of two-point resistance measurement method is not the structural resistance resistance value of real measurand, but the resistance value of the resistance value of the structural resistance of this measurand and contact resistance and.
Because contact resistance can't record exactly, therefore, the resistance of the structural resistance of described measured resistance also can't accurately record.
And because the probe during each test is different with the contact situation of test lead; The contact resistance that for example probe pricks that the depth at test lead is different, probe crooked that cause and the contact area of test lead do not cause on an equal basis is different, makes each actual resistance value that records to fluctuate within the specific limits.
Particularly in the wafer level testing electrical property of high-precision integrated circuit, usually use probe to survey, because the resistance of integrated circuit is less relatively, therefore, (probe contact resistance PCR) can not ignore contact resistance of probe often.At this moment, the contact situation of the probe on the probe has directly influenced precision of test result.
Obtain the structural resistance of accurate measured resistance if desired, then need extraly record the resistance value that probe and test lead get contact resistance.
To this situation, prior art has proposed a kind of three end resistance test methods again to obtain the resistance value of contact resistance.
Said three end method for testing resistance use one or three end test structures to measure.As shown in Figure 4, said three end test structures comprise the first test lead A and the 3rd test lead C that is positioned at the measured resistance two ends, and be positioned at measured resistance middle part the second test lead B.
Said three end method for testing resistance comprise following steps:
Step 1: on the first test lead A and the second test lead B, use above-mentioned two ends resistance test method to survey the resistance of the first test lead A and the second test lead B through probe.In like manner, the measured first test resistance Rm1 be structural resistance Rs1 and the probe 21 and the first test lead A between the first test lead A and the second test lead B contact resistance Rc1 and the probe 22 and the second test lead B contact resistance Rc2 with.
Step 2: on the second test lead B and the 3rd test lead C, use above-mentioned two ends resistance test method to survey the resistance of the second test lead B and the 3rd test lead C through probe.In like manner, the measured second test resistance Rm2 be structural resistance Rs2 and the probe 22 and the second test lead B between the second test lead B and the 3rd test lead C contact resistance Rc2 and probe 23 and the 3rd test lead C contact resistance Rc3 with.
Step 3: on the first test lead A and the 3rd test lead C, use above-mentioned two ends resistance test method to survey the resistance of the 3rd test lead A and the 3rd test lead C through probe.In like manner, measured the 3rd test resistance Rm3 be structural resistance Rs and the probe 21 and the first test lead A between the first test lead A and the 3rd test lead C contact resistance Rc1 and probe 23 and the 3rd test lead C contact resistance Rc3 with.
In sum: Rm1=Rc1+Rs1+Rc2;
Rm2＝Rc2+Rs2+Rc3；
Rm3＝Rc1+Rs+Rc3；
Again because the resistance between the first test lead A and the 3rd test lead C is to be in series by the resistance between the resistance between the first test lead A and the second test lead B and the 3rd test lead C and the second test lead B, so Rs=Rs1+Rs2.
In the contact resistance method of testing of prior art, think that Rc1, Rc2 and Rc3 are identical, represent Rc1=Rc2=Rc3=Rc with the contact resistance Rc of a test lead and probe.
In this case
Rm1+Rm2-Rm3＝(Rc1+Rs1+Rc2)+(Rc2+Rs2+Rc3)-(Rc1+Rs+Rc3)＝(Rc1+Rc2+Rc2+Rc3-Rc1-Rc3)＝2Rc
So, can obtain, contact resistance Rc is (Rm1+Rm2-Rm3)/2.
Pass through, contact deducts corresponding contact resistance with measuring resistance, can record the approximate value of corresponding construction resistance again.
But in the actual measurement, each contact resistance is also inequality; Particularly in the test of the wafer level of integrated circuit; Because it is high that the degree of accuracy of the resistance test of integrated circuit requires, thus the difference between the contact resistance cannot ignore, in case the hypothesis that each contact resistance of employing as the same equates; There are the error of an increasing in each contact resistance surveyed and the resistance of structural resistance, have seriously lowered the accuracy of resistance test.
Summary of the invention
For testing contact resistance accurately; Simultaneously also can be through the contact resistance of measuring probe to test structure; Thereby detect the quality of probe contact indirectly and can further obtain the structural resistance of measured resistance, the invention provides a kind of method of measuring resistance.
According to a first aspect of the invention; A kind of method for testing resistance; The test structure of its use comprises first test lead, second test lead, the 3rd test lead and measured resistance; Wherein said first test lead is positioned at the said second test lead both sides with said the 3rd test lead and is connected with said measured resistance, and said second test lead also is connected with said measured resistance, it is characterized in that said method for testing resistance comprises following steps:
A. making the electric current of second test lead to the, three test leads is 0A;
B. calculate the contact resistance of said second test lead.
Use the present invention can accurately test out the contact resistance that test lead and voltage or electric current apply end, wherein, said voltage or electric current apply end and comprise probe, and then obtain the structural resistance of measured resistance, thereby improve the precision of resistance measurement.
Description of drawings
Fig. 1 is the two ends test structure synoptic diagram of prior art;
Fig. 2 is the use synoptic diagram of the use two ends test structure of prior art;
Fig. 3 is the synoptic diagram that the resistance of the two ends test structure of prior art constitutes;
Fig. 4 is three end test structure synoptic diagram according to a specific embodiment of the present invention;
Fig. 5 is the synoptic diagram of three end resistance test method step 1 of prior art;
Fig. 6 is the synoptic diagram that three end resistance test method step 1 institute measuring resistances of prior art constitute;
Fig. 7 is the synoptic diagram of three end resistance test method step 2 of prior art;
Fig. 8 is the synoptic diagram that three end resistance test method step 2 institute measuring resistances of prior art constitute;
Fig. 9 is the synoptic diagram of three end resistance test method step 3 of prior art;
Figure 10 is the synoptic diagram that three end resistance test method step 3 institute measuring resistances of prior art constitute;
Figure 11 be according to specific embodiment according to the present invention use the synoptic diagram of three end test structures;
Figure 12 applies the synoptic diagram of probe for according to the measuring resistance of a specific embodiment of the present invention the time;
Figure 13 is the synoptic diagram according to the measuring resistance method of a specific embodiment of the present invention;
Figure 14 is the synoptic diagram according to the measuring resistance method of an end ground connection of a specific embodiment of the present invention;
Figure 15 is the synoptic diagram according to the method for the measuring resistance of a specific embodiment of the present invention;
Figure 16 is the five terminal test structure according to a specific embodiment of the present invention;
Figure 17 is the synoptic diagram that applies probe according to the five terminal test structure of a specific embodiment of the present invention.
Embodiment
The test structure that method for testing resistance of the present invention uses comprises the test structure of first test lead, second test lead, the 3rd test lead and measured resistance; Wherein said first test lead is positioned at the said second test lead both sides with said the 3rd test lead and is connected with said measured resistance; And said second test lead is positioned in the middle of first test lead and the 3rd test lead, and is connected with said measured resistance.
Embodiment 1: present embodiment adopts three end test structures of prior art to describe; Shown in figure 11; At the measured resistance two ends, there is first test lead 31 to be connected with measured resistance respectively, between said first test lead 31 and said the 3rd test lead 33 with the 3rd test lead 33; One second test lead 32 is set, and said second test lead 32 is connected with measured resistance.
Shown in Figure 12ly be to use said three end test structures to apply the synoptic diagram that probe is tested.Guarantee that for effective the contact resistance of each test lead and each probe is constant; Present embodiment adopts probe to test; Said probe applies one first probe 34 at first test lead 31, applies one second probe 35 at second test lead 32, applies one the 3rd probe 36 at the 3rd test lead 33.
As one embodiment of the present of invention, the synoptic diagram that is to use three end method for testing resistance of the present invention to carry out the contact resistance test shown in Figure 13.
The method for testing resistance of present embodiment comprises following steps:
A. force between second test lead 32 and the 3rd test lead 33 electric current promptly first electric current I 1 promptly apply the 0A electric current for 0A at said the 3rd test lead 33;
Wherein apply on the path that 0A electric current purpose is assurance second test lead to the three test leads and do not have current path at the 3rd test lead.
Because existing tester table is for example pacified the board of prompt logical sequence 4072 series; The function that applies 0 electric current at certain test lead promptly is provided, therefore can have used existing test machine for example to pacify prompt logical sequence 4072 serial boards apply 0A at the 3rd test lead through connecting line and test probe electric current.And test machine is fed back through measuring, and its Automatic Network Matching has guaranteed output accuracy.The 3rd test lead applies its error magnitude of 0A and is far smaller than in second measuring current that test lead adds, thereby does not influence the calculating of final resistance
B. said first test lead is connected a predetermined potential, apply predetermined second electric current I 2 at second test lead 35;
C. measure the magnitude of voltage V2 of second test lead 35 and the magnitude of voltage V3 of the 3rd test lead 36;
Because said first electric current I 1 is 0, and the resistance of D point and said the 3rd test lead is a finite value, so the electric potential difference of said D point and said the 3rd test lead is 0, the electromotive force that then said D is ordered is identical with the electromotive force of said the 3rd test lead;
D. calculate the resistance value of the contact resistance of second test lead 32 and second probe 35:
This contact resistance can be considered the resistance of 32 of second probe 35 and second test leads, is 0 first electric current I 1 because the 3rd test lead 36 has applied its value, so the electric current that flows to test lead from probe equals described second electric current I 2.
The magnitude of voltage of second probe 35 is measured and can be got by probe.
Again because, first electric current I 1 is 0, so the electromotive force that D is ordered equals the electromotive force of the 3rd test lead 33.
Because the voltage that said second test lead is ordered to D; Therefore; Said relatively second probe 35 of structural resistance that test lead is ordered to D and the contact resistance between said second test lead 32 are compared minimum, so can think that said second probe 35 equals the resistance value that said second probe 35 to D is ordered to the contact resistance of said second test 32.
Wherein, be connected to the interconnection structure resistance of this a bit of transition of test lead from test structure, we is defined as Ri.Because Ri is very little and fix, so we still can observe the variation of Rc through the variation of detecting R '.2) because the structural resistance Rs that records does not at last comprise Ri, therefore finally will obtain Rs removes Rc and Ri (interconnection resistance) always.So Ri can not influence the measuring accuracy of this method of testing.In order to discuss conveniently, below to discuss and ignore calculating Ri.
The electric potential difference that the resistance R c2 of said second probe 35 and said second test lead 32 equals second probe 35 and D arrives D point electric current divided by second probe 35.
Because said D point electromotive force equals the electromotive force of said the 3rd probe, so the electric potential difference of second probe 35 and D equals the voltage difference=V2-V3 of 36 of said second probe 35 and said the 3rd probes.
Because said the 3rd electric current is 0, thus shown in second probe electric current of ordering to said D equal the electric current I 2 that said second probe 35 flows to said first probe 33.
So, contact resistance Rc2=(V2-V3)/I2 that said second probe 35 and said second test lead are 32.
Embodiment 2: it is that example describes that present embodiment adopts three end test structures of prior art.
Shown in Figure 15ly be to use said three end test structures to apply the synoptic diagram that probe is tested.Guarantee that for effective the contact resistance of each test lead and each probe is constant; Present embodiment adopts probe to test; Said probe applies one first probe 34 at first test lead 31, applies one second probe 35 at second test lead 32, applies one the 3rd probe 36 at the 3rd test lead 33.
As one embodiment of the present of invention, shown in Figure 15 is the another kind of synoptic diagram that uses three end method for testing resistance to carry out the contact resistance test of the present invention.
The method for testing resistance of present embodiment comprises following steps:
A1. on said the 3rd test lead, 33 apply one the 3rd electric current I 3;
B1. on said second test lead, 32 apply one the 4th voltage U 4, and on said first test lead 31, apply a tertiary voltage U3;
C1. measure through the 4th current value I 4 of said first test lead 31 and the magnitude of voltage U5 on said the 3rd test lead 33;
D1. calculate said second test lead, 32 contact resistances;
Wherein, said the 3rd current value I 3 is 0.
Because said the 3rd electric current I 3 is 0, and the resistance of D point and said the 3rd test lead 33 is a finite value, so the electric potential difference of said D point and said the 3rd test lead 33 is 0, the electromotive force that then said D is ordered is identical with the electromotive force of said the 3rd test lead 33;
The contact resistance of second test lead 32 and second probe 35 can be considered the resistance of 32 of second probe 35 and second test leads.
Because it is 0 the 3rd electric current I 3 that the 3rd test lead 33 has applied its value, so the electric current that flows to second test lead from second probe equals described the 4th electric current I 4.
The electromotive force of second probe 35 equals to be applied to the magnitude of voltage on second probe 35.
Again because, the 3rd electric current I 3 is 0, so the electromotive force that D is ordered equals the electromotive force U5 of the 3rd test lead 36.
Because said relatively second probe 35 of voltage that said second test lead is ordered to D and the contact resistance between said second test lead 32 compares minimum and lower end interconnecting construction resistance is fixed, so can think that said second probe 35 equals said second probe 35 to the contact resistance of test structure and arrives the resistance value that D is ordered.
The electric potential difference that said second probe 35 equals second probe 35 and D to the resistance R c2 of test structure divided by second probe 35 to D point electric current.
Because said D point electromotive force equals the electromotive force of said the 3rd probe, so the electric potential difference of second probe 35 and D equals the voltage difference=U4-U5 of 36 of said second probe 35 and said the 3rd probes.
Because said the 3rd electric current is 0, thus shown in second probe electric current of ordering to said D equal the electric current I 4 that said second probe 35 flows to said first probe 33.
So, contact resistance Rc2=(U4-U5)/I4 that said second probe 35 and said second test lead are 32.
In addition, the present invention also is suitable for multiport test structure (the test lead number is greater than 3) except being applicable to three above-mentioned end test structures.
Test structure shown in Figure 16 comprises the 4th test lead 51, the five test leads 52, the six test leads 53, the 7th test lead 54 and 55, five test leads of the 8th test lead.
Shown in figure 17, on the 4th test lead 51 of said test structure shown in Figure 16, apply four point probe 56, on the 5th test lead 52, apply the 5th probe 57, on the 6th test lead 53, apply the 6th probe 58.
With the 4th test lead 51, the 5th test lead 52, the 6th test lead 53 with and the resistance of 53 of the 4th test lead 51 to the 6th test leads be one or three end test structures, use the foregoing description 1 or implement the contact resistance Rc5 that 2 three end method of testings can measure said the 5th test lead 52 and the 5th probe 57.
In like manner, on the 5th test lead 52, apply the 5th probe 57, on the 6th test lead 53, apply the 6th probe 58, on the 7th test lead 54, apply the 7th probe 59; And be the contact resistance Rc6 that three end test structures can record the 6th test lead 53 and the 6th probe 58 with the 5th test lead 52, the 6th test lead 53, the 7th test lead 54.
Further; For by the two ends test structure that resistance constituted between the 5th test lead 52 and the 6th test lead 53 and this two test lead, adopt the two ends method for testing resistance of prior art to obtain a resistance measurement value Rm3 through the 5th probe 57 and the 6th probe 58.
Because this measured value Rm3 is made up of contact resistance between the structural resistance Rs3 between said the 5th test lead and said the 6th test lead and said the 5th test lead and said the 5th probe and the contact resistance between said the 6th test lead and said the 6th probe.
Therefore, Rm3=Rc6+Rc5+Rs3;
Structural resistance Rs3=Rm3-Rc6-Rc5 between said the 5th test lead and said the 6th test lead, thus the precision architecture resistance value between said the 5th test lead and said the 6th test lead obtained.
In like manner, the present invention can also extend in the test structure of a plurality of test leads, obtains their accurate structural resistance value.And be not limited only to above-mentioned three end test structures or five terminal test structure.
More than specific embodiment of the present invention is described.It will be appreciated that the present invention is not limited to above-mentioned specific implementations, those skilled in the art can make various distortion or modification within the scope of the appended claims.
Claims (8)
1. method of using a kind of test structure to come measurement structure resistance; Thereby said method comprises the contact resistance of two test leads that from the resistance measurement value, deduct measured resistance respectively and obtains the structural resistance value of said measured resistance; Wherein, The contact resistance of said two test leads records through said test structure respectively, and wherein, said test structure comprises first test lead, second test lead, the 3rd test lead and measured resistance; Wherein said first test lead and said the 3rd test lead are positioned at the said second test lead both sides; And said first test lead, second test lead and the 3rd test lead all are connected with said measured resistance, and said second test lead comprises in two test leads of said measured resistance, it is characterized in that a kind of test structure of said use comes the method for measurement structure resistance to comprise following steps:
A. making the electric current of said second test lead to the, three test leads is 0A;
B. apply one second electric current at said second test lead;
C. measure the magnitude of voltage of said second test lead and the magnitude of voltage of said the 3rd test lead;
D. according to the magnitude of voltage of said second electric current, said second test lead and the magnitude of voltage of said the 3rd test lead, calculate second contact resistance of said second test lead.
2. the method that a kind of test structure of use as claimed in claim 1 comes measurement structure resistance is characterized in that the said first test lead ground connection.
3. the method that a kind of test structure of use as claimed in claim 1 comes measurement structure resistance; It is characterized in that described test structure also comprises the 4th test lead; Said the 4th test lead is positioned at said the 3rd test lead both sides with said second test lead and said the 4th test lead also links to each other with said measured resistance, and a kind of test structure of said use comes the method for measurement structure resistance further comprising the steps of:
E. being the first new test lead with second test lead, is the second new test lead with the 3rd test lead, is the 3rd new test lead with the 4th test lead, and repeating step A calculates the 3rd contact resistance of said second test lead newly to step D;
F. use the two ends method for testing resistance to measure the resistance between said new first test lead and new second test lead;
G. according to the resistance between said second contact resistance and said the 3rd contact resistance and said new first test lead and new second test lead, calculate said first test lead and the structural resistance between new second test lead newly.
4. like any method that a kind of test structure of described use comes measurement structure resistance in the claim 1～3, it is characterized in that steps A may further comprise the steps:
The use test machine applies the electric current of 0A at the 3rd test lead through connecting line and test probe.
5. method of using a kind of test structure to come measurement structure resistance; Thereby said method comprises the contact resistance of two test leads that from the resistance measurement value, deduct measured resistance respectively and obtains the structural resistance value of said measured resistance; Wherein, The contact resistance of said two test leads records through said test structure respectively, and wherein, said test structure comprises first test lead, second test lead, the 3rd test lead and measured resistance; Wherein said first test lead and said the 3rd test lead are positioned at the said second test lead both sides; And said first test lead, second test lead and the 3rd test lead all are connected with said measured resistance, and said second test lead comprises in two test leads of said measured resistance, it is characterized in that a kind of test structure of said use comes the method for measurement structure resistance to comprise following steps:
A. making the electric current of said second test lead to the, three test leads is 0A;
B. apply one the 4th voltage at said second test lead;
C. measure through the current value of said first test lead and the magnitude of voltage between said the 3rd test lead;
D. according to said the 4th voltage, the magnitude of voltage between the current value of said first test lead and said the 3rd test lead calculates second contact resistance of said second test lead.
6. the method that a kind of test structure of use as claimed in claim 5 comes measurement structure resistance is characterized in that the said first test lead ground connection.
7. the method that a kind of test structure of use as claimed in claim 5 comes measurement structure resistance; It is characterized in that described test structure also comprises the 4th test lead; Said the 4th test lead is positioned at said the 3rd test lead both sides with said second test lead and said the 4th test lead also links to each other with said measured resistance, and a kind of test structure of said use comes the method for measurement structure resistance further comprising the steps of:
E. being the first new test lead with second test lead, is the second new test lead with the 3rd test lead, is the 3rd new test lead with the 4th test lead, and repeating step A calculates the 3rd contact resistance of said second test lead newly to step D;
F. use the two ends method for testing resistance to measure the resistance between said new first test lead and new second test lead;
G. according to the resistance between said second contact resistance and said the 3rd contact resistance and said new first test lead and new second test lead, calculate said first test lead and the structural resistance between new second test lead newly.
8. like any method that a kind of test structure of described use comes measurement structure resistance in the claim 5～7, it is characterized in that steps A may further comprise the steps:
The use test machine applies the electric current of 0A at the 3rd test lead through connecting line and test probe.
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| CN2007100446934A CN101363881B (en) | 2007-08-08 | 2007-08-08 | Method for testing resistance |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102110626B (en) * | 2009-12-29 | 2012-12-26 | 中芯国际集成电路制造(上海)有限公司 | Method for determining minimum measurable length of serpentine metal wires in wafer |
| CN101907657B (en) * | 2010-06-11 | 2015-08-19 | 上海华虹宏力半导体制造有限公司 | The detection method of probe resistance |
| CN101937021A (en) * | 2010-06-30 | 2011-01-05 | 上海华岭集成电路技术有限责任公司 | Online measurement method of contact resistance of probe |
| CN102207523A (en) * | 2011-03-17 | 2011-10-05 | 郑峻 | Ohm contact imitation resistor test apparatus and test method |
| CN102590630B (en) * | 2012-03-01 | 2016-12-14 | 上海华虹宏力半导体制造有限公司 | The method for testing resistance of the test probe of semiconductor parametric tester device |
| CN102890736B (en) * | 2012-09-25 | 2014-12-10 | 东南大学 | Measuring method for resistance of three-terminal resistors used for integrated circuits |
| US11016131B2 (en) | 2016-04-29 | 2021-05-25 | Hp Indigo B.V. | Monitoring circuitry |
| CN108089054B (en) * | 2016-11-22 | 2020-04-24 | 北京铁路信号有限公司 | Method for measuring contact resistance of solderless press-in connection |
| CN111796148A (en) * | 2020-07-31 | 2020-10-20 | 上海华力微电子有限公司 | Resistance test structure |
| WO2023168542A1 (en) * | 2022-03-09 | 2023-09-14 | 宁德时代新能源科技股份有限公司 | Method and device for calibrating contact resistance of battery connecting piece, and electric device |
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| US4876515A (en) * | 1987-05-08 | 1989-10-24 | The Boeing Company | Self-checking ohmmeter that checks for contact resistance of its probes |
| CN1493880A (en) * | 2003-07-16 | 2004-05-05 | 武汉大学 | Method of quick measuring power transformer winding D.C. resistance and equipment |
| US7061256B2 (en) * | 2004-07-26 | 2006-06-13 | Nec Electronics Corporation | Method and apparatus for contact resistance measurement |
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- 2007-08-08 CN CN2007100446934A patent/CN101363881B/en not_active Expired - Fee Related
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4876515A (en) * | 1987-05-08 | 1989-10-24 | The Boeing Company | Self-checking ohmmeter that checks for contact resistance of its probes |
| CN1493880A (en) * | 2003-07-16 | 2004-05-05 | 武汉大学 | Method of quick measuring power transformer winding D.C. resistance and equipment |
| US7061256B2 (en) * | 2004-07-26 | 2006-06-13 | Nec Electronics Corporation | Method and apparatus for contact resistance measurement |
Non-Patent Citations (1)
| Title |
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| JP特开2004-101275A 2004.04.02 |
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