CN101339369B - PS plate retouching paste - Google Patents
PS plate retouching paste Download PDFInfo
- Publication number
- CN101339369B CN101339369B CN2008100633598A CN200810063359A CN101339369B CN 101339369 B CN101339369 B CN 101339369B CN 2008100633598 A CN2008100633598 A CN 2008100633598A CN 200810063359 A CN200810063359 A CN 200810063359A CN 101339369 B CN101339369 B CN 101339369B
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- CN
- China
- Prior art keywords
- percent
- retouching
- version
- edition
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 claims abstract description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 10
- -1 alcohol amine Chemical class 0.000 claims abstract description 8
- 239000003960 organic solvent Substances 0.000 claims abstract description 8
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 20
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 15
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 claims description 10
- 239000006210 lotion Substances 0.000 claims description 8
- 235000011187 glycerol Nutrition 0.000 claims description 7
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 claims description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 claims description 6
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 claims description 6
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 claims description 5
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 claims description 5
- 239000002904 solvent Substances 0.000 claims description 4
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 claims description 3
- 239000012965 benzophenone Substances 0.000 claims description 3
- 239000000975 dye Substances 0.000 claims description 3
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical compound C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 claims description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 abstract 4
- 239000011505 plaster Substances 0.000 abstract 3
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000000443 aerosol Substances 0.000 abstract 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011538 cleaning material Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000003205 fragrance Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 230000001988 toxicity Effects 0.000 description 1
- 231100000419 toxicity Toxicity 0.000 description 1
Abstract
The invention relates to a PS edition retouching plaster, wherein, the plaster body is prepared by the following materials according to a weight percentage: 50 percent to 70 percent of organic solvent, 10 percent to 25 percent of aerosol silica, 8 percent to 25 percent of glycerol, 1 percent to 2 percent of hydrofluoric acid, and 0.1 percent to 1 percent of alcohol amine, wherein, the weight concentration of the hydrofluoric acid per se is 40 percent to 45 percent. The PS edition retouching plaster of the invention can effectively dissolve the photosensitive coating of the PS edition, lead the residual photosensitive coating to be completely removed; can completely remove dirty spots or Fehling boundary marks on layout, thus having good detergency ability; and meanwhile, can prevent the oxide layer of edition base from being deeply corroded, therefore, the edition base is not damaged, places which are retouched are difficult for dirty spots to be pasted on, and printing quality is not influenced.
Description
Technical field: the present invention relates to a kind of cleaning material of halftone screen plate, particularly the retouching paste of PS version.
Background technology: the PS version of printing usefulness may have dirty point or film edge tracking mark at printing down, the back space of a whole page that develops, and needs to remove with cleaning material.Present retouching paste acidity is all bigger, it generally is the oxide layer surface that utilizes organic solvent dissolution light sensitive layer, acidic materials etched plate base, light sensitive layer is come off fully, though remove dirty more thorough, but the corrosion of oxide layer is more serious, destroy the performance of version base, removed and easilier in the dirty position use be stained with dirty point, influenced the quality of printed matter.
Summary of the invention: at the deficiencies in the prior art, it is good to the invention provides a kind of detergency ability, does not damage the PS version retouching paste of version base.
Lotion of the present invention is made by the material of following percentage by weight,
Organic solvent 50-70%, gasoloid silica 1 0-25%, glycerine 8-25%, hydrofluorite 1-2%, hydramine 0.1-1%, wherein the weight concentration of hydrofluorite itself is 40-45%.
The light sensitive layer of PS version can be effectively dissolved in the present invention, and residual light sensitive layer is thoroughly come off, can remove dirty point or film edge tracking mark on the space of a whole page fully, detergency ability is good, the oxide layer that can prevent the version base is simultaneously corroded by the degree of depth, do not damage the version base, the place of colour-separation drafting also is difficult for being stained with dirty point, can not influence printing quality.
In fact, also can contain micro-essence and dyestuff in the lotion, can improve smell, and make lotion have color, be beneficial to colour-separation drafting.
Organic solvent of the present invention is used for effectively dissolving the light sensitive layer of PS version, generally can be a kind of or several potpourris in ethylene glycol ethyl ether, ethyl cellosolve acetate, butyl glycol ether, butyl glycol ether acetic acid esters, butyl acetate, Benzophenone, acetophenone, dimethyl formamide, the dimethyl sulfoxide (DMSO).
In fact, the preferred ethylene glycol ethyl ether of organic solvent, ethyl cellosolve acetate, butyl glycol ether or butyl glycol ether acetic acid esters, these alcohol ethers and ester class thereof have higher, and enough dissolubilities are arranged, toxicity and smell are also less, can be used as principal ingredient and use, add up to and occupy more than 50% of machine solvent total amount.
The dissolubility of butyl acetate, Benzophenone or acetophenone is better, but smell is bigger, generally is not recommended in vast scale use in the organic solvent.
The dissolubility of dimethyl formamide or dimethyl sulfoxide (DMSO) is fabulous, but from security consideration, adds up to and occupy the better below 20% of machine solvent total amount.
The invention is further illustrated by the following examples.
Embodiment 1: the lotion of retouching paste adopts the material of following parts by weight to make, and ethylene glycol ethyl ether 318, ethyl cellosolve acetate 318, butyl acetate 32, acetophenone 22, hydrofluorite 19, glycerine 140, diethanolamine 5, gasoloid silica 1 45, direct pink and essence are an amount of.
Above-mentioned material evenly mixes, and can make transparent body of paste, and wherein gasoloid silicon dioxide makes lotion have thixotropy, and promptly static viscosity is big, disturbance viscosity is little, is difficult for trickling, is beneficial to use and store.Hydrofluorite can dissolve the oxide layer of version base in right amount, and light sensitive layer is thoroughly come off, and glycerine then suppresses the effect of hydrofluorite, avoids the oxide layer excessive corrosion.The alcamines material is diethanolamine in the present embodiment, can prevent that the light sensitive layer that dissolves is attached to the version base again.Direct pink is a dyestuff, makes lotion have color, and essence then increases fragrance.
Embodiment 2: retouching paste adopts the material of following parts by weight evenly to mix and makes, and ethylene glycol ethyl ether 285, ethyl cellosolve acetate 285, dimethyl sulfoxide (DMSO) 60, dimethyl formamide 60, hydrofluorite 18, glycerine 142, diethanolamine 9, gasoloid silica 1 40, direct pink and essence are an amount of.
Embodiment 3: retouching paste adopts the material of following parts by weight evenly to mix and makes, and butyl glycol ether 345, butyl glycol ether acetic acid esters 345, hydrofluorite 15, glycerine 145, diethanolamine 9, gasoloid silica 1 40, direct pink and essence are an amount of.
Embodiment 4: retouching paste adopts the material of following parts by weight evenly to mix and makes, and butyl glycol ether 318, butyl glycol ether acetic acid esters 318, butyl acetate 32, acetophenone 22, hydrofluorite 19, glycerine 140, diethanolamine 5, gasoloid silica 1 45, direct pink and essence are an amount of.
Claims (5)
1. PS version retouching paste, it is characterized by: lotion is made by the material of following percentage by weight,
Organic solvent 50-70%, gasoloid silica 1 0-25%, glycerine 8-25%, hydrofluorite 1-2%, hydramine 0.1-1%, wherein the weight concentration of hydrofluorite itself is 40-45%.
2. PS version retouching paste according to claim 1 is characterized by: also contain micro-essence and dyestuff in the lotion.
3. PS version retouching paste according to claim 1 and 2 is characterized by: above-mentioned organic solvent is a kind of or several potpourris in ethylene glycol ethyl ether, ethyl cellosolve acetate, butyl glycol ether, butyl glycol ether acetic acid esters, butyl acetate, Benzophenone, acetophenone, dimethyl formamide, the dimethyl sulfoxide (DMSO).
4. PS version retouching paste according to claim 3 is characterized by: ethylene glycol ethyl ether, ethyl cellosolve acetate, butyl glycol ether or butyl glycol ether acetic acid esters add up to and occupy more than 50% of machine solvent total amount.
5. PS version retouching paste according to claim 3 is characterized by: dimethyl formamide, dimethyl sulfoxide (DMSO) add up to and occupy below 20% of machine solvent total amount.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100633598A CN101339369B (en) | 2008-08-07 | 2008-08-07 | PS plate retouching paste |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2008100633598A CN101339369B (en) | 2008-08-07 | 2008-08-07 | PS plate retouching paste |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101339369A CN101339369A (en) | 2009-01-07 |
| CN101339369B true CN101339369B (en) | 2011-08-24 |
Family
ID=40213466
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100633598A Active CN101339369B (en) | 2008-08-07 | 2008-08-07 | PS plate retouching paste |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101339369B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102314100A (en) * | 2011-05-10 | 2012-01-11 | 刘华礼 | PS (Photoshop) version retouching paste containing dimethyl sulfate |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3619217A (en) * | 1968-10-30 | 1971-11-09 | Fmc Corp | Desensitizer for photolithographic printing plate |
| FR2098542A5 (en) * | 1970-07-20 | 1972-03-10 | Perraguin Gerard | Plates for offset reprodn - correction using a universal solvent mixt |
| CN1393490A (en) * | 2001-07-04 | 2003-01-29 | 万裕全 | Cleaning cream for PS plate |
| US6783695B1 (en) * | 1999-06-29 | 2004-08-31 | Micron Technology, Inc. | Acid blend for removing etch residue |
-
2008
- 2008-08-07 CN CN2008100633598A patent/CN101339369B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3619217A (en) * | 1968-10-30 | 1971-11-09 | Fmc Corp | Desensitizer for photolithographic printing plate |
| FR2098542A5 (en) * | 1970-07-20 | 1972-03-10 | Perraguin Gerard | Plates for offset reprodn - correction using a universal solvent mixt |
| US6783695B1 (en) * | 1999-06-29 | 2004-08-31 | Micron Technology, Inc. | Acid blend for removing etch residue |
| CN1393490A (en) * | 2001-07-04 | 2003-01-29 | 万裕全 | Cleaning cream for PS plate |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101339369A (en) | 2009-01-07 |
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| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| ASS | Succession or assignment of patent right |
Owner name: ZHEJIANG KONITA NEW MATERIALS CO., LTD. Free format text: FORMER OWNER: WENZHOU KONITA PRINTING EQUIPMENT CO., LTD. Effective date: 20120319 |
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| C41 | Transfer of patent application or patent right or utility model | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20120319 Address after: Ca Mau road Wenzhou Industrial Park Zhejiang province 325013 No. 1 Patentee after: Zhejiang Konita New Materials Co., Ltd. Address before: 325013 Mount Lu Road, Zhejiang, Wenzhou Patentee before: Wenzhou Konita Printing Equipment Co., Ltd. |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: PS plate retouching paste Effective date of registration: 20200715 Granted publication date: 20110824 Pledgee: Wenzhou minshang Bank Co.,Ltd. Pledgor: ZHEJIANG KONITA NEW MATERIALS Co.,Ltd. Registration number: Y2020330000496 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right | ||
| PC01 | Cancellation of the registration of the contract for pledge of patent right |
Date of cancellation: 20210629 Granted publication date: 20110824 Pledgee: Wenzhou minshang Bank Co.,Ltd. Pledgor: ZHEJIANG KONITA NEW MATERIALS Co.,Ltd. Registration number: Y2020330000496 |
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| PC01 | Cancellation of the registration of the contract for pledge of patent right | ||
| PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: PS revision paste Effective date of registration: 20210629 Granted publication date: 20110824 Pledgee: Wenzhou minshang Bank Co.,Ltd. Pledgor: ZHEJIANG KONITA NEW MATERIALS Co.,Ltd. Registration number: Y2021990000563 |
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| PE01 | Entry into force of the registration of the contract for pledge of patent right |