CN101276744A - Coating and developing system, coating and developing method and storage medium - Google Patents
Coating and developing system, coating and developing method and storage medium Download PDFInfo
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- CN101276744A CN101276744A CNA2008100902471A CN200810090247A CN101276744A CN 101276744 A CN101276744 A CN 101276744A CN A2008100902471 A CNA2008100902471 A CN A2008100902471A CN 200810090247 A CN200810090247 A CN 200810090247A CN 101276744 A CN101276744 A CN 101276744A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/4189—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by the transport system
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67178—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers vertical arrangement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67196—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the transfer chamber
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/31—From computer integrated manufacturing till monitoring
- G05B2219/31002—Computer controlled agv conveys workpieces between buffer and cell
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Abstract
A coating and developing system includes processing blocks S 2 to S 4 of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing b locks are arranged longitudinally between a carrier block S 1 and an interface block S 6 . The number of processing blocks like the processing blocks S 2 to S 4 arranged between the carrier block S 1 and the interface block S 6 is adjusted to adjust the throughput of the coating and developing system. thus a coating and developing system capable of achieving a desired throughput can be easily designed and manufactured.
Description
Technical field
The present invention relates to that a kind of coating of for example semiconductor wafer and LCD substrate substrates such as (liquid crystal display glass substrates) being carried out resist liquid is handled, coating developing device and the method and the storage medium of the development treatment after the exposure etc.
Background technology
In the manufacturing process of semiconductor element and LCD substrate, utilize the technology that is known as photoetching substrate to be implemented to form the processing of resist figure.This technology is implemented by a series of operation, that is, for example on semiconductor wafer substrates such as (to call wafer in the following text), apply resist liquid and, use Etching mask that this resist film is exposed at the surface of this wafer formation liquid film, carry out development treatment then, thus the figure that obtains expecting.
This processing generally is to use the resist figure formation device that is connected exposure device in the coating developing device of the coating of carrying out resist liquid and development to carry out, but, in order further to increase the processing speed of coating developing device, in patent documentation 1, propose to have a kind of structure, promptly, the zone of the module after configuration is used for taking in the zone of the preceding module of exposure-processed and is used for taking in exposure-processed along the vertical direction, the conveyance unit is set in each zone, thereby the load that alleviates the conveyance unit improves the disposal ability of coating developing device to improve conveyance efficient with this.
As shown in figure 10, this device is provided with the developing block B1 that is used for carrying out development treatment in mutual stacked mode, B2, be used for carrying out the coating piece B4 that the coating of resist liquid is handled, be used for before and after the coating of resist liquid, forming respectively the antireflection film formation piece B3 of antireflection film, B5, in each piece B1～B5, be equipped with: be used for carrying out the coating of development treatment and resist liquid and handle, the liquid handling part that the liquid of the liquid medicine coating processing of antireflection film formation usefulness etc. is handled, multilayer is arranged shelf (shelf) unit of the processing unit of the processing of carrying out described liquid processing front and back, the conveyance unit A1～A5 of conveyance wafer W between each one of liquid handling part and shelf unit, and possess between each piece B1～B5 the special use handing-over arm of handing-over wafer W.Described liquid handling part for example possesses 3 liquid processing units, and, described processing unit is prepared the device of required kind and number according to the liquid number of processing units, according to the processing of being carried out, by alleviating the burden of each conveyance unit A1～A5, handing-over arm, thereby improve the disposal ability of whole device.
In this coating developing device, can guarantee for example disposal ability about 180/hr, but, sometimes according to target processing, desired disposal ability is also different, sometimes also require to realize the device of the high throughput about a kind of 200/hr～250/hr of the disposal ability that surpasses existing apparatus, and and the so high disposal ability of failed call.
Herein, in said apparatus, in order to improve disposal ability, it is to increase the liquid processing unit be located among developing block B1, B2 and the coating piece B4 and the number of processing unit that a kind of mode is arranged, but, if adopt this structure, so, the burden of conveyance unit A1～A5 will increase, therefore, finally cause the conveyance disposal ability to descend, the result is difficult to improve the disposal ability of whole device.In addition, as mentioned above, if adopt increase and decrease to be located at the structure that device quantity among each piece B1～B5 etc. adapts to desired disposal ability, so, owing to the device fixed amount of assembling according to disposal ability, therefore, must come the different diversified device of manufacturing installation quantity, increase thereby cause designing and making required homework burden according to user's requirement.
In addition, also having a kind of method is the stacked number that increases each piece such as developing block B1, B2, increases described liquid processing unit and number of processing units, still, if described stacked number increases, so, the conveyance zone of handing-over arm of carrying out wafer W handing-over between each piece is elongated in vertical direction, and, owing to also increase with the handing-over number of times of interblock, therefore, the burden of this handing-over arm increases, and is difficult to improve the disposal ability of whole device.In addition, in order to adapt to the change of disposal ability, according to disposal ability, the stacked quantity of piece becomes and has nothing in common with each other, and therefore, the conveyance zone of handing-over arm is different, and the result must make diversified device, therefore, is difficult to alleviate the operation burden of design etc.
Patent documentation 1: TOHKEMY 2006-203075 communique
Summary of the invention
The present invention In view of the foregoing proposes, and it is a kind of in coating developing device that its purpose is to provide, the technology that can carry out Design of device and manufacturing at an easy rate according to desired disposal ability.
For this reason, coating developing device of the present invention is characterised in that: utilize coated film to form and form the coated film that comprises resist film with units chunk on the substrate of being moved into by carrier in the carrier block, then, via the interface piece with this substrate transferring to exposure device, utilize development treatment to carry out development treatment and it is handover to described carrier block with the substrate of units chunk after to the exposure of returning via described interface piece, and, form with units chunk and development treatment in described coated film and to include in units chunk: be used for the liquid processing module of liquid medicine coating on substrate, the heating module of heated substrates, the refrigerating module of cooling base, and the substrate transferring unit that the units chunk of conveyance substrate is used between these modules, wherein
Described coating developing device comprises: treatment bench, be arranged between carrier block and the interface piece, form the processing block more than at least 2 of the same structure that constitutes with a plurality of units chunk of units chunk with units chunk and development treatment for the stacked coated film that comprises, with carrier block one side as the place ahead, piece one side in interface is as the rear, along the front and back of the substrate transferring route towards the interface piece connect described these processing blocks and form from carrier block;
The junction group, in order between the stacked units chunk of described processing block, to carry out the handing-over of substrate, described the place ahead one side in processing block is corresponding with each units chunk and establish, and is equipped with multilayer to carry out the junction of substrate delivery/reception by the substrate transferring unit of each units chunk;
The handing-over arm is used for carrying out substrate delivery/reception with respect to each junction of described junction group, is arranged in the described processing block in the mode of lifting freely;
The junction is used in input and output, is used between described carrier block and processing block, perhaps carries out the handing-over of substrate between adjacent processing block, constitutes one of described junction group, utilizes described handing-over arm to carry out the handing-over of substrate; With
Special-purpose straight-through conveyance unit is arranged in the described processing block, the input and output of this processing block with the junction and and the input and output of the processing block of the rear adjacency of this processing block with conveyance substrate between the junction.
Said herein " processing block of same structure " is meant, the coated film that possesses identical type forms with units chunk and development treatment units chunk, the quantity of these units chunk is identical, and described coated film forms with units chunk and development treatment identical with the structure of units chunk.
Herein, described coating developing device preferably is equipped with the unit that is used for controlling described substrate transferring unit and straight-through conveyance unit and handing-over arm, make that substrate directly is handover to the input and output that apply film formed processing block from carrier block uses the junction, perhaps utilize the straight-through conveyance unit of the processing block of the place ahead one side to join, utilize handing-over arm and substrate transferring unit that substrate is formed to the coated film in this processing block with the junction conveyance from described input and output and use units chunk, the junction is used in substrate transferring to the input and output of this processing block after coated film formed, then, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or rear one side, use the junction conveyance to the interface piece from these input and output substrate, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or this processing block and rear one side, substrate after the exposure-processed is used the junction from interface piece conveyance to the input and output of the processing block that carries out development treatment, utilize handing-over arm and substrate transferring unit with substrate from described input and output with the development treatment units chunk of junction conveyance to this processing block.
Coating developing method of the present invention is characterised in that: utilize coated film to form and form the coated film that comprises resist film with units chunk on the substrate of being moved into by carrier in the carrier block, then, via interface piece conveyance to exposure device, utilize development treatment to carry out development treatment and it is handover to described carrier block with the substrate of units chunk after to the exposure of returning via described interface piece, wherein
Described coating developing device has treatment bench: be arranged between carrier block and the interface piece, form the processing block more than at least 2 of the same structure that constitutes with a plurality of units chunk of units chunk with units chunk and development treatment for the stacked coated film that comprises, with carrier block one side as the place ahead, piece one side in interface is as the rear, along the front and back of the substrate transferring route towards the interface piece connect described these processing blocks and form from carrier block
Substrate directly is handover to the input and output that apply film formed processing block from carrier block uses the junction, perhaps utilize the straight-through conveyance unit of the processing block of the place ahead one side to join, utilize handing-over arm and substrate transferring unit that substrate is formed to the coated film in this processing block with the junction conveyance from described input and output and use units chunk, the junction is used in substrate transferring to the input and output of this processing block after coated film formed, then, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or rear one side, use the junction conveyance to the interface piece from these input and output substrate, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or this processing block and rear one side, substrate after the exposure-processed is used the junction from interface piece conveyance to the input and output of the processing block that carries out development treatment, utilize handing-over arm and substrate transferring unit with substrate from described input and output with the development treatment units chunk of junction conveyance to this processing block.
In addition, storage medium of the present invention is characterised in that: it preserves the computer program that coating developing device uses, described coating developing device forms the coated film that comprises resist film at the substrate that receives from carrier block, and to the exposure after substrate carry out development treatment, described programming steps group is to move above-mentioned coating developing method.
According to the present invention, prepare the processing block of same structure, adjust the processing speed of coating developing device by the number of the processing block between carrier block and interface piece, arranged of increase and decrease, therefore, can easily carry out Design of device and manufacturing according to desired disposal ability.
Description of drawings
Fig. 1 is the plane graph of the execution mode of coating developing device involved in the present invention.
Fig. 2 is the stereogram of described coating developing device.
Fig. 3 is the sidepiece profile of described coating developing device.
Fig. 4 is the stereogram of the units chunk of COT1 layer in the described coating developing device.
Fig. 5 is the plane graph of the units chunk of described COT1 layer.
Fig. 6 is the stereogram of the units chunk of DEV1 layer in the described coating developing device.
Fig. 7 is the side view that is used for illustrating the conveyance path of wafer W in the described coating developing device.
Fig. 8 is the side view of other execution mode in the described coating developing device.
Fig. 9 is the side view that is used for illustrating the conveyance path of the wafer W in the described coating developing device.
Figure 10 is the side view of the coating developing device of prior art.
Symbol description
The W semiconductor wafer
20 carriers
The S1 carrier block
S2 first processing block
S3 second processing block
S4 the 3rd processing block
S5 joins piece
S6 interface piece
The S7 exposure device
A11～A33 principal arm
The C transfer arm
The D1 first handing-over arm
The D2 second handing-over arm
G1～G3, G11～G31 shuttle arm
F interface arm
100 control parts
Embodiment
At first, with reference to the accompanying drawings the related resist figure of the execution mode of coating developing device of the present invention being formed device describes.Fig. 1 is the plane graph of an execution mode of described device, and Fig. 2 is its approximate three-dimensional map, and Fig. 3 is its summary lateral view.This device comprises: carrier block S1, treatment bench S10, handing-over piece S5, interface piece S6 and exposure device S7, with carrier block S1 as the place ahead one side, with interface piece S6 as rear one side, carrier block S1, treatment bench S10, handing-over piece S5, interface piece S6 and exposure device S7 form a line along fore-and-aft direction, and interconnect.
Described carrier block S1 is used for moving into taking out of closed and taking in for example 13 pieces as the carrier 20 of the wafer W of substrate, is provided with in this carrier block S1: can put a plurality of described carriers 20 mounting table 21, observe the switch portion 22 on the wall that is arranged on the place ahead and constitute the transfer arm C that can from carrier 20, take out the handing-over unit of wafer W from this mounting table 21 via switch portion 22.This transfer arm C with can free advance and retreat, free lifting, the mode that rotates freely, move freely along the orientation of carrier 20 around vertical axis constitute, with the handing-over module TRS10 of the first processing block S2 described later with join the handing-over of carrying out wafer W between the module TRS11.
Rear one side of carrier block S1 is connected with treatment bench S10.This treatment bench S10 is along the conveyance route of the wafer W towards interface piece S6 one side from carrier block S1 one side, interconnect the processing block of 2 above same structures and constitute at fore-and-aft direction, in this example, the first processing block S2, the second treatment bench S3, the 3rd processing block S4 interconnect and establish.The processing block that constitutes described treatment bench S10 is suitably selected its number according to desired disposal ability.
Because adopting in the same way, these processing blocks S2～S4 constitutes, therefore, if with the first processing block S2 is that example describes, then this processing block S2 is surrounded by framework 24 around it, and vertically be arranged with a plurality of for example 3 units chunk B11～B13 and constitute, in this example, one side is divided into successively from the below: as development treatment layer (DEV1) B11 of development treatment with units chunk, as being used for forming antireflection film cambium layer (BCT1 layer) B12 of the units chunk of antireflection film in the lower floor of resist film, as coating processing layer (COT1 layer) B13 of the units chunk that is used for forming resist film, and divide these DEV1 layers B11 respectively, BCT1 layer B12, COT1 layer B13.Described BCT1 layer B12 and COT1 layer B13 are equivalent to coated film formation units chunk.
These each units chunk B11, B12, B13 adopt respectively in the same way and to constitute, and possess the pre-treatment that is used for to the liquid processing module of wafer W coating liquid coating, is used for carrying out the processing in described liquid processing module, carried out and reprocessing various processing modules, be used between described liquid processing module and various processing module, carrying out the principal arm A11～A13 as the substrate transferring unit of units chunk special use of the handing-over of wafer W.
And, as Fig. 1 and shown in Figure 3, within processing block S2 and zone carrier block S1 adjacency, be provided with the shelf unit U11 of handing-over usefulness in the position that transfer arm C and each principal arm A11～A13 can enter.Be provided with the junction that for example is used for carrying out the wafer W handing-over between each units chunk B11～B13 and other units chunk in this shelf unit U11, shelf unit U11 is equivalent to possess the junction group of multilayer junction.
In addition, in processing block S2, be provided with in the position of each junction that can enter shelf unit U11 freely to advance and retreat and the mode of free lifting and the handing-over arm D1 that constitutes, utilize this handing-over arm D1, the handing-over of wafer W is carried out in each junction in being located at shelf unit U11, joins wafer W between other units chunk.
Next, be example at first, and the structure of described units chunk B11～B13 described according to Fig. 4 and Fig. 5 with COT1 layer B13 (to call " COT1 layer " in the following text).In the substantial middle of this COT1 layer, form the conveyance region R 1 of wafer W along vertical (length direction) (Y direction among Fig. 4, Fig. 5) of COT1 layer.In the both sides of this conveyance region R 1 of seeing from carrier block S1 one side, one side from the place ahead (carrier block S1 one side), one side towards the rear is provided with the coating handling part 31 that is used for applying resist liquid on the right side.
A plurality of for example 2 liquid processing module COT11, COT12 of this coating handling part 31 are incorporated in the inside of general container handling 30 to face the mode of conveyance region R 1 respectively under the state of arranging along the Y direction.Each coating module COT11, COT12 supply with as the resist liquid that applies liquid to the wafer W that for example is absorbed and fixed on the rotary chuck by level from general liquid nozzle, simultaneously, by making wafer W rotation make resist liquid spread all over the whole surface of wafer W, like this at the surface applied resist liquid of wafer W.Described container handling 30 is possessing conveyance mouth 33A, the 33B of wafer W with each coating module COT11, position that COT12 is corresponding, wafer W by separately conveyance mouth 33A, 33B and between coating module COT11, the COT12 of correspondence and principal arm A13 by conveyance.
In addition, opposite one side in the conveyance region R 1 of this coating handling part 31 is provided with the shelf unit U12 that for example is provided with processing module in the modes of 2 layers * 3 row, is provided with in the figure to be used for being implemented in the pre-treatment of the processing of being carried out in the coating handling part 31 and the various processing modules of reprocessing.Comprise in the above-mentioned various processing module: the wafer W after the coating of resist liquid is carried out heat treated, carry out the heating refrigerating module LHP of cooling processing then; With the temperature-regulating module CPL of wafer W temperature adjustment to set point of temperature; And peripheral exposure device WEE etc.
Described heating refrigerating module LHP comprises: for example be used for putting in the above and the heating plate 34 of heated chip W and the coldplate 35 of dual-purpose carrying arm, use a kind of handing-over that utilizes coldplate 35 between principal arm A13 and heating plate 34, to carry out wafer W, that is, use a kind of device that heating module and refrigerating module is contained in this structure in the device.Moreover, also can replace this heating refrigerating module LHP, heating module and refrigerating module are as module and being assembled among the shelf unit U12 independently respectively.In addition, use the device that for example possesses the coldplate that is cooled off by water-cooled as temperature-regulating module CPL.
As shown in Figure 4, each modules such as these heating refrigerating module LHP and temperature-regulating module CPL are incorporated in respectively in the container handling 36, move into and take out of mouthfuls 37 at the wafer that is formed with on the face of conveyance region R 1 of each container handling 36.In the shelf unit U11 of COT1 layer, be provided with handing-over module TRS13 in the position that handing-over arm D1 can enter as the junction.This handing-over module TRS13 setting on the handing-over platform is used for keeping for example 3 teats of the wafer W back side one side and constitutes.This teat joins arm D1 or principal arm A13 with respect to this teat lifting according to handing-over arm D1 and principal arm A13 the mode of disturbing not taking place and establishing, so constitute the structure of carrying out the wafer W handing-over between handing-over module TRS13 and handing-over arm D1 or principal arm A13.Below, the handing-over module that forms junction of the present invention is according to constituting with the same mode of this handing-over module TRS13, and the handing-over arm is according to constituting with the same mode of handing-over arm D1.
Next principal arm A13 is described.This principal arm A13 adopts all modules (placing the place of wafer W) in this COT1 layer, for example carry out the mode of wafer handing-over between each processing module of handing-over module TRS13, the shelf unit U12 of coating module COT11, COT12, shelf unit U11 and constitute, therefore, its adopt can advance and retreat freely, lifting freely, the mode rotating freely, move freely along Y direction around vertical axis and constitute.
As Fig. 4 and shown in Figure 5, this principal arm A13 possesses and is used for two keeping arms 51,52 of the back side one side peripheral areas of supporting wafer W, and these keeping arms 51,52 constitute in modes separate on base station 53 and advance and retreat freely.In addition, base station 53 is to be set on the conveyance matrix 55 around the mode that vertical axis rotates freely by rotating mechanism 54.56 is the guide rails 56 that extend along vertical (the Y direction among Fig. 1) of conveyance region R 1 among the figure, and 57 is lifting guide rails among the figure, described conveyance matrix 55 with along this lifting with guide rail 57 freely the mode of lifting constitute.In addition, described lifting is slipped into the below of (insertion) guide rail 56 with the bottom of guide rail 57 and is stuck fixingly, and lifting is laterally moved along guide rail 56 with guide rail 57, so conveyance matrix 55 can laterally move in conveyance region R 1.Herein, in order not disturb with keeping arm 51,52 when carrying out the handing-over of wafer W with respect to each processing module of shelf unit U12, lifting is being arranged on the conveyance matrix 55 with the position of the position deviation of keeping arm 51,52 advance and retreat with guide rail 57.
Moreover, if the units chunk to other is carried out simple explanation, then described BCT1 layer B12 (hereinafter referred to as " BCT1 layer ") is according to constituting with the same mode of COT1 layer, outfit is set as the liquid processing module supplies with the coating liquid that antireflection film forms usefulness to wafer W, and be used for forming a plurality of for example antireflection film formation portions of 2 antireflection film formation module BCT of antireflection film, in shelf unit U12, be equipped with: upload the wafer W after putting antireflection film and forming and it is carried out heat treated at heating plate, utilize coldplate to be maintained fixed then and carry out the heating refrigerating module LHP of cooling processing; Be used for temperature-regulating module CPL that wafer W is adjusted to set point of temperature etc.In addition, in shelf unit U11, be provided with handing-over module TRS12 as the junction and in the position that handing-over arm D1 can enter, module in being arranged on these shelf units U11, U12 and antireflection film form between the module BCT, utilize principal arm A12 to carry out the handing-over of wafer W.
In addition, as Fig. 1, Fig. 3 and shown in Figure 6, DEV1 layer B11 (hereinafter referred to as " DEV1 layer ") constitutes in 3 layers * 3 modes that are listed as except that shelf unit U12 and is provided with the shuttle arm G1, all the other all constitute according to the mode identical substantially with above-mentioned COT1 layer, be provided with bilayer as the liquid processing module and be used for supplying with as the developer solution of coating liquid and carrying out the development treatment portion 32 of development treatment, 2 visualization module DEV11, DEV12 for example are set in 1 layer of this development treatment portion 32 to wafer W.In shelf unit U12, comprise: the heating module PEB that is known as post-exposure bake (post exposure baking) module etc. that the wafer W after the exposure is carried out heat treated; Be used for wafer W being adjusted to after the processing in this heating module PEB the refrigerating module COL of set point of temperature; Be used for moisture is splashed and the wafer W after the development treatment carried out curing after being known as of heat treated the heating module POST of (post baking) module etc.; Be used for temperature-regulating module CPL that wafer W is adjusted to after the processing in this heating module POST set point of temperature etc.Described antireflection film formation portion constitutes according to the mode identical substantially with coating handling part 31 with development treatment portion 32.
In shelf unit U11, be provided with as the junction be used for and carrier block S1 between carry out the handing-over of wafer W handing-over module TRS10, handing-over module TRS11, wherein, handing-over module TRS10 is used as the handing-over module of shuttle arm G1 described later special use, is equivalent to input and output and uses the junction.Between module in being arranged at shelf unit U11, U12 and visualization module DEV11, the DEV12, utilize principal arm A11 to carry out the handing-over of wafer W.
Next, utilize Fig. 6 that described shuttle arm G1 is described.This shuttle arm G1 is the straight-through conveyance unit of special use of conveyance wafer W between the input and output usefulness junction TRS2 of the second processing block S3 that the input and output usefulness junction TRS10 of this first processing block S2 is connected with rear one side described later and this first processing block S2.
As shown in Figure 6, the neighboring area of the back side one side of this shuttle arm G1 supporting wafer W, and possessing along 1 keeping arm 61 of base station 62 advance and retreat, described base station 62 is set on the conveyance matrix 64 in the mode that centers on vertical axis by rotating mechanism 63 and rotate freely.Described conveyance matrix 64 is for example on the top of shelf unit U12, and on the support unit of establishing 66 and the face that conveyance region R 1 is faced mutually along this shelf unit U12 vertical (Y direction among Fig. 6), can be along at the guide rail 65 of the longitudinal extension setting of conveyance region R 1 and constitute to the described mode that vertically moves, like this, between the handing-over module TRS20 of the connection device TRS10 of this first processing block S2 and the adjacent second processing block S3, carry out the conveyance of wafer W.
In addition, it is surrounded the described second processing block S3 by framework 25 on every side, and same with the first processing block S2, by the stacked development treatment layer of one side (DEV2 layer) B21, antireflection film cambium layer (BCT2 layer) B22, three units chunk B21 of coating processing layer (COT2 layer) B23～B23 constitute from the below.These DEV2 layers B21 (to call " DEV2 layer " in the following text), BCT2 layer B22 (to call " BCT2 layer " in the following text), COT2 layer B23 (to call " COT2 layer " in the following text) are respectively according to constituting with the same mode of DEV1 layer, BCT1 layer, the COT1 layer of the first processing block S2.
Promptly, the place ahead one side in the second processing block S3 and shelf unit U21 is set with the first processing block S2 adjacent areas, it forms and is equipped with multilayer to be used for carrying out between units chunk in this processing block S3 and the units chunk junction group of the junction of wafer W handing-over, and principal arm A21～A23 of each units chunk B21～B23 and handing-over arm D2 can enter each junction of described shelf unit U21.
In the COT2 layer, at the handing-over module TRS23 of 2 coating module COT and shelf unit U21 and be located between the various modules among the shelf unit U22, utilize principal arm A23 to carry out the conveyance of wafer W, in the BCT2 layer, form the handing-over module TRS22 of module BCT and shelf unit U21 and be located between the various modules among the shelf unit U22 at 2 antireflection films, utilize principal arm A22 to carry out the conveyance of wafer W, in the DEV2 layer, handing-over module TRS20 at 2 visualization module DEV and shelf unit U21, TRS21 and being located between the various modules among the shelf unit U22 utilizes principal arm A21 to carry out the conveyance of wafer W.
Herein, the handing-over module TRS20 of described shelf unit U21 forms the junction of using the junction as the input and output of the shuttle arm G2 special use of leading directly to the conveyance unit, utilization is located at the shuttle arm G2 among this second processing block S3, carries out the conveyance of wafer W between the handing-over module TRS30 of the 3rd processing block S4 that the handing-over module TRS20 of this processing block S3 is connected with rear one side of described later and this processing block S3.
And, it is surrounded described the 3rd processing block S4 by framework 26 on every side, and same with the first processing block S2, by the stacked development treatment layer of one side (DEV3 layer) B31, antireflection film cambium layer (BCT3 layer) B32, three units chunk B31 of coating processing layer (COT3 layer) B33～B33 constitute from the below.These DEV3 layers B31 (to call " DEV3 layer " in the following text), BCT3 layer B32 (to call " BCT3 layer " in the following text), COT3 layer B33 (to call " COT3 layer " in the following text) are respectively according to constituting with the same mode of DEV1 layer, BCT1 layer, the COT1 layer of the first processing block S2.
Promptly, the place ahead one side in the 3rd processing block S4 and be provided with shelf unit U31 with the second processing block S3 adjacent areas, its forms the junction group be equipped with multilayer to be used for carrying out between units chunk in this processing block S4 and the units chunk junction of wafer W handing-over, and principal arm A31～A33 of each units chunk B31～B33 and handing-over arm D3 can enter each junction of described shelf unit U31.
In the COT3 layer, at the handing-over module TRS33 of 2 coating module COT and shelf unit U31 and be located between the various modules among the shelf unit U32, utilize principal arm A33 to carry out the conveyance of wafer W, in the BCT3 layer, form the handing-over module TRS32 of module BCT and shelf unit U31 and be located between the various modules among the shelf unit U32 at 2 antireflection films, utilize principal arm A32 to carry out the conveyance of wafer W, in the DEV3 layer, handing-over module TRS30 at 2 visualization module DEV and shelf unit U31, TRS31 and being located between the various modules among the shelf unit U32 utilizes principal arm A31 to carry out the conveyance of wafer W.
Herein, the handing-over module TRS30 of described shelf unit U31 forms the junction of using the junction as the input and output of the shuttle arm G3 special use of leading directly to the conveyance unit, utilization is located at the shuttle arm G3 among the 3rd processing block S4, carries out the conveyance of wafer W between the handing-over module TRS40 of the handing-over module TRS30 of this processing block S4 and handing-over piece S5 described later.
Described handing-over piece S5 possesses the interface that is used for carrying out the wafer W handing-over between the 3rd processing block S4 and interface piece S6 described later and uses the junction, and in this example, described junction is made of the handing-over module TRS40 that the shuttle arm G3 of the 3rd processing block S4 can enter.
On the other hand, the inside one side at handing-over piece S5 is connected with exposure device S7 by interface piece S6.In the piece S6 of interface, be provided with advance and retreat freely, lifting freely, the interface arm F that constitutes around the mode of vertical axis rotation freely, be used for joining wafer W with respect to the handing-over module TRS40 of described handing-over piece S5 and exposure device S7.
Above-mentioned resist figure forms that device possesses by the project management of the conveyance flow process (conveyance route) of the project management of carrying out each processing module, wafer W, the computer of drive controlling of processing, principal arm A11～A13, A21～A23, A32～A33, transfer arm C, handing-over arm D1～D3, shuttle arm G1～G3, interface arm F in each processing module and the control part 100 that constitutes.This control part 100 has the program preservation portion that for example is made up of computer program, the program that in store for example software with step (order) group constitutes in program preservation portion, to implement the effect that whole resist figure forms device, i.e. the processing in each processing module of formation regulation resist figure and the conveyance of wafer W etc. on wafer W.These program Be Controlled portions 100 read out, and control so whole resist figure forms the effect Be Controlled portion 100 of device.Moreover, be stored in the program preservation portion under the state of this program in being incorporated in storage mediums such as floppy disk, hard disk, CD, magneto optical disk, storage card for example.
Below, with reference to Fig. 7, be example with the situation that on first antireflection film, forms resist film, the conveyance route that forms the wafer W in the device at above-mentioned this resist figure is described.The conveyance of wafer W is by the scheme of control part 100 according to conveyance flow process (conveyance route), and control principal arm A11～A13, A21～A23, A32～A33, transfer arm C, handing-over arm D1～D3, shuttle arm G1～G3, interface arm F carry out.
At first, the conveyance route to the wafer W before the exposure-processed describes.Moved into wafer W in the carrier 20 the carrier block S1 are passed to shelf unit U11 by transfer arm C handing-over module TRS10 from the outside.Then, from here by difference conveyance to the first processing block S2, the second processing block S3, the 3rd processing block S3.
At first, the situation of conveyance to the first processing block S2 is described, that is, the wafer of handing-over module TRS10, is received by the principal arm 12 of BCT1 layer by conveyance best friend connection module TRS12 from here by handing-over arm D1.Then, in the BCT1 layer, the route of handing-over module TRS12 that utilizes principal arm A12 and form module BCT → heating module LHP → shelf unit U11 according to temperature-regulating module CPL → antireflection film is by conveyance, and forms antireflection film on the surface of wafer W.
Then, the wafer W of handing-over module TRS12 by conveyance best friend connection module TRS13, utilizes principal arm A13 to be received by the COT1 layer by handing-over arm D1 from here.Then, in the COT1 layer, utilize principal arm A13 and according to the route of temperature-regulating module CPL → coating module COT → heating module LHP → peripheral exposure device WEE → handing-over module TRS13 by conveyance, and on antireflection film, form resist film.
Then, the wafer of handing-over module TRS13 by handing-over arm D1 by conveyance best friend connection module TRS10, from here according to the route of shuttle arm G1 → handing-over module TRS20 → shuttle arm G2 → handing-over module TRS30 → shuttle arm G3 → handing-over module TRS40 by conveyance.The wafer W of described handing-over module TRS40 by transfer arm F by conveyance to exposure device S7, the exposure-processed that the professional etiquette of going forward side by side is fixed.
In addition, situation for conveyance to the second processing block S3, the wafer W of handing-over module TRS10 is passed through shuttle arm G1 by conveyance best friend connection module TRS20, from here according to the route of the principal arm A22 → BCT2 layer of handing-over arm D2 → handing-over module TRS22 → BCT2 layer by conveyance, form antireflection film on the surface of wafer W herein.The conveyance and the BCT1 layer of the wafer W in the BCT2 layer are same.
Then, wafer W by conveyance,, forms resist film on the surface of antireflection film according to the route of the principal arm A23 → COT2 layer of principal arm A22 → handing-over module TRS22 → handing-over arm D2 → handing-over module TRS23 → COT2 layer herein.The conveyance and the COT1 layer of the wafer W in the COT2 layer are same.
Then, wafer W according to the route of principal arm A23 → handing-over module TRS23 → handing-over arm D2 → handing-over module TRS20 → shuttle arm G2 → handing-over module TRS30 → shuttle arm G3 → handing-over module TRS40 → interface arm F → exposure device S7 by conveyance, the exposure-processed that the professional etiquette of going forward side by side is fixed.
And, situation for conveyance to the three processing block S4, the wafer W of handing-over module TRS10 in the route of shuttle arm G1 → handing-over module TRS20 → shuttle arm G2 → handing-over module TRS30 by conveyance, from here according to the route of the principal arm A32 → BCT3 layer of handing-over arm D3 → handing-over module TRS32 → BCT3 layer by conveyance, form antireflection film on the surface of wafer W herein.Wafer W conveyance and BCT1 layer in the BCT3 layer are same.
Then, wafer W by conveyance,, forms resist film on the surface of antireflection film according to the route of principal arm A32 → handing-over module TRS32 → handing-over arm D3 → handing-over module TRS33 → COT3 layer principal arm A33 → COT3 layer herein.The conveyance and the COT1 layer of the wafer W in the COT3 layer are same.
Then, wafer W according to the route of principal arm A33 → handing-over module TRS33 → handing-over arm D3 → handing-over module TRS30 → shuttle arm G3 → handing-over module TRS40 → interface arm F → exposure device S7 by conveyance, the exposure-processed that the professional etiquette of going forward side by side is fixed.
Next the conveyance route to the wafer W after the exposure-processed describes.At first, the situation of carrying out development treatment in the first processing block S2 is described, promptly, by conveyance best friend connection module TRS40, the route of process shuttle arm G3 → handing-over module TRS30 → shuttle arm G2 → handing-over module TRS20 → shuttle arm G1 is by the handing-over module TRS10 of conveyance to the first processing block S2 from here by interface arm F for wafer W after the exposure-processed.Then,, and received by the DEV1 layer by principal arm A11 from here by conveyance best friend connection module TRS11 by handing-over arm D1.
In the DEV1 layer, according to the route of the handing-over module TRS11 of heating module PEB → refrigerating module COL → visualization module DEV → heating module POST → temperature-regulating module CPL → shelf unit U11 by conveyance, the development treatment that the professional etiquette of going forward side by side is fixed.So the wafer W that has been implemented development treatment is returned in the original carrier 20 that is put in carrier block S1 by transfer arm C via described handing-over module TRS11.
In addition, for the situation of in the second processing block S3, carrying out development treatment, wafer W after the exposure-processed is passed through interface arm F by conveyance best friend connection module TRS40, route according to shuttle arm G3 → handing-over module TRS30 → shuttle arm G2 → handing-over module TRS20 → handing-over arm D2 → handing-over module TRS21 is received by the DEV2 layer by principal arm A21 by conveyance from here.In the DEV2 layer, according to the DEV1 layer in same route by the module of conveyance to regulation, the development treatment of stipulating then.Wafer W after the development treatment, and is returned in the original carrier 20 that is put in carrier block S1 by transfer arm C by conveyance from here according to the route of handing-over module TRS21 → handing-over arm D2 → handing-over module TRS20 → shuttle arm G1 → handing-over module TRS10.
In addition, for the situation of in the 3rd processing block S4, carrying out development treatment, wafer W after the exposure-processed is passed through interface arm F by conveyance best friend connection module TRS40, route according to shuttle arm G3 → handing-over module TRS30 → handing-over arm D3 → handing-over module TRS31 is received by the DEV3 layer by principal arm A31 by conveyance from here.In the DEV3 layer, according to the DEV1 layer in same route by the module of conveyance to regulation, the development treatment of stipulating then.Wafer W after the development treatment, and is returned in the original carrier 20 that is put in carrier block S1 by transfer arm C by conveyance from here according to the route of handing-over module TRS31 → handing-over arm D3 → handing-over module TRS30 → shuttle arm G2 → handing-over module TRS20 → shuttle arm G1 → handing-over module TRS10.
Form in the device at above-mentioned this resist figure, come design apparatus according to disposal ability easily, and can be easy to tackle desired disposal ability.Promptly, constitute treatment bench by the processing block that connects a plurality of same structures, so, requiring under the high situation of disposal ability, increasing the quantity of processing block, requiring under the not high situation of disposal ability, reduce the quantity of processing block, therefore number by adjusting described continuous processing block, can tackle the change of disposal ability to guarantee desired disposal ability with being easy to.
Like this, according to desired disposal ability, compare with the number of increase and decrease liquid processing module etc. or the situation that increases and decreases the number of stacked units chunk, because of not changing the design of processing block itself, so whole Design of device becomes easy, simultaneously, by making identical processing block, the manufacturing that then is used for the device that can tackle also becomes easy.
At this moment, 2 liquid processing modules of assembling and constitute in each units chunk of processing block with the various processing modules of the corresponding number of number of this liquid processing module, compare with the original processing block that is equipped with 3 liquid processing modules, though the disposal ability in processing block descends, but, realized the miniaturization of processing block.Its purpose is the expansion of device volume is controlled at minimum degree, and tackles desired disposal ability neatly, with a processing block miniaturization, and the processing block of connection and the corresponding number of disposal ability, like this, not only guaranteed disposal ability, simultaneously the also excessive expansion of anti-locking apparatus.
In said structure, when conveyance wafer W in the processing block of handling, wafer W conveyance to input and output must be used the junction, and from here to each units chunk conveyance wafer W of this processing block.Therefore, even if under the situation that a plurality of processing blocks link to each other, also work out the conveyance program easily.Promptly, in each processing block S2～S4, wafer W from carrier block S1, be passed to form and be used for carrying out coated film and form the handing-over module TRS10 (TRS20, TRS30) of the input and output of the processing block S2 (S3, S4) that handles with the junction, and be passed to BCT1 layer (BCT2 layer, BCT3 layer) as basic point, in each processing block S2～S4 by conveyance to COT1 layer (COT2 layer, COT3 layer), and form resist film.
Then, the wafer W that forms resist film is returned the handing-over module TRS10 (TRS20, TRS30) that the junction is used in the input and output that constitute each processing block S2～S4 once more, and passes through shuttle arm G1～G3 from here by conveyance best friend connection module TRS40.For the wafer W after the exposure-processed, be returned the handing-over module TRS10 (TRS20, TRS30) of the input and output of the processing block S2 (S3, S4) that constitute to implement development treatment by shuttle arm G1～G3 with the junction, and from here conveyance to DEV1 layer (DEV2 layer, DEV3 layer).
As mentioned above, in each processing block S2～S4, when between carrier block S1 or interface piece S6, carrying out the handing-over of wafer W, must be to input and output with junction (handing-over module TRS10, TRS20, TRS30) conveyance wafer W, and as the regulation units chunk conveyance of basic point to each processing block S2～S4.Each processing block S2～S4 is identical structure, and the conveyance path of the wafer W in each processing block is also identical.
Therefore, in each processing block S2～S4, the wafer W conveyance is slightly different according to utilizing which kind of shuttle arm G1～G3 with the conveyance route of junction (handing-over module TRS10, TRS20, TRS30) to input and output, but, because it is identical with the conveyance route in each processing block S2～S4 after the junction conveyance wafer W to described input and output, therefore, work out the conveyance program easily.In addition and since by conveyance to each processing block S2～S4, therefore separate processing the in each processing block S2～S4, from this point, also work out the conveyance program easily.And, and the processing block that adjoins each other between the handing-over of wafer W carry out with the junction by described input and output, these input and output with the junction only shuttle arm G1～G3 can enter, irrelevant with other the principal arm of processing block, and can and other the input and output of processing block carry out the handing-over of wafer W between with the junction, therefore, from this point, also work out the conveyance program easily.
Then, use Fig. 8 and Fig. 9 that other execution mode of the present invention is described.The device of present embodiment and the difference of said apparatus are, one side also is provided with shuttle arm G11～G31 on the upper strata of each processing block S2～S4, the handing-over module TRS14～TRS34 of this shuttle arm G11～G31 special use is set in each processing block S2～S4, simultaneously, the handing-over module TRS41 of shuttle arm G31 and the handing-over arm E that carries out the wafer W handing-over between this handing-over module TRS41 and handing-over module TRS40 also are set in handing-over piece S5.Described handing-over module TRS14～TRS34 carries out the handing-over of wafer W by handing-over arm D1～D3 of each processing block S2～S4 respectively, and described handing-over arm and above-mentioned handing-over arm D1～D3 are same, with freely advance and retreat, lifting freely mode constitute.In this example, shuttle arm G11～G31 is equivalent to straight-through conveyance unit, and the handing-over module TRS14～TRS34 of shuttle arm G11～G31 special use is equivalent to input and output and uses the junction.
Use Fig. 9 that the conveyance route of wafer W in the above-mentioned this device is described, that is, moved into wafer W in the carrier 20 the carrier block S1 are passed to shelf unit U11 by transfer arm C handing-over module TRS10 from the outside.Then, from here by difference conveyance to the first processing block S2, the second processing block S3, the 3rd processing block S4.At first, for the situation of conveyance to the first processing block S2, the wafer W of handing-over module TRS10 according to the route of the principal arm A13 → COT1 layer → handing-over module TRS13 → handing-over arm D1 → handing-over module TRS14 → shuttle arm G11 → handing-over module TRS24 → shuttle arm G21 → handing-over module TRS34 → shuttle arm G31 → handing-over module TRS41 → handing-over arm → handing-over module TRS40 → interface arm F → exposure device S7 of the principal arm A12 → BCT1 layer → handing-over module TRS12 → handing-over arm D1 → handing-over module TRS13 → COT1 layer of handing-over arm D1 → handing-over module TRS12 → BCT1 layer by conveyance.
In addition, for the situation of conveyance to the second processing block S3, the wafer W of handing-over module TRS10 according to the route of the principal arm A23 → COT2 layer → handing-over module TRS23 → handing-over arm D2 → handing-over module TRS24 → shuttle arm G21 → handing-over module TRS34 → shuttle arm G31 → handing-over module TRS41 → handing-over arm → handing-over module TRS40 → interface arm F → exposure device S7 of the principal arm A22 → BCT2 layer → handing-over module TRS22 → handing-over arm D2 → handing-over module TRS23 → COT2 layer of shuttle arm G1 → handing-over module TRS20 → handing-over arm D2 → handing-over module TRS22 → BCT2 layer by conveyance.
In addition, for the situation of conveyance to the three processing block S4, the wafer W of handing-over module TRS10 according to the route of the principal arm A33 → COT3 layer → handing-over module TRS33 → handing-over arm D3 → handing-over module TRS34 → shuttle arm G31 → handing-over module TRS41 → handing-over arm → handing-over module TRS40 → interface arm F → exposure device S7 of the principal arm A32 → BCT3 layer → handing-over module TRS32 → handing-over arm D3 → handing-over module TRS33 → COT3 layer of shuttle arm G1 → handing-over module TRS20 → shuttle arm G2 → handing-over module TRS30 → handing-over arm D3 → handing-over module TRS32 → BCT3 layer by conveyance.The conveyance route and the said apparatus of the wafer W after the exposure-processed are same.
Form in the device at above-mentioned this resist figure, same with said apparatus, design and manufacturing installation according to disposal ability easily, and can be easy to tackle desired disposal ability, in addition, the programming of conveyance program is also easy.At the shuttle arm G11～G31 that uses the outlet to use from carrier block S1 during to interface piece S6 conveyance wafer W, at the shuttle arm G1～G3 that uses the loop to use during to carrier block S1 conveyance wafer W from interface piece S6, therefore, the burden of a shuttle arm can be alleviated, and disposal ability can be improved.
As mentioned above, in the present invention, also applicablely only form resist film and form the situation of antireflection film as the situation of coated film with on resist film.Herein, under the situation that forms antireflection film on the resist film, this antireflection film must be set form and use units chunk, still, this units chunk according to be used for the same mode of under the above-mentioned resist film units chunk of formation antireflection film and constitute.The also applicable formation resist film of the present invention with as coated film, the forming antireflection film up and down of resist film and situation, in this case, mutual stacked development treatment forms with the antireflection film above units chunk, the resist film with the formation of the antireflection film below units chunk, the resist film with units chunk, resist film formation and uses units chunk, thus the formation processing block.In the present invention, form with units chunk and development treatment units chunk if comprise coated film in processing block, so, each lamination order can freely be set.
As processing module set in shelf unit U12, U22, U32, the module of other different with above-mentioned example can be set also.In addition,, both can increase the quantity of handing-over module, the module that register is also used as this structure in junction can also be set as the junction that is arranged among shelf unit U11, U21, the U31.In shelf unit U11, U12, U21, U22, U31, U32, both can be provided with and carry out the module that hydrophobization is handled, the thickness of checking coated film and the testing fixture of checking the wafer W degreeof tortuosity also can be set.
The present invention can not only be applicable to process semiconductor wafers, the coating developing device of this substrate of the glass substrate that also applicable treatment fluid crystal display is used (LCD substrate).
Claims (4)
1. coating developing device is characterized in that:
Utilize coated film to form and on the substrate of moving into by carrier in the carrier block, form the coated film that comprises resist film with units chunk, then, via the interface piece with this substrate transferring to exposure device, utilize development treatment to carry out development treatment and it is handover to described carrier block with the substrate of units chunk after to the exposure of returning via described interface piece, and, form with units chunk and development treatment in described coated film and to include in units chunk: be used for the liquid processing module of liquid medicine coating on substrate, the heating module of heated substrates, the refrigerating module of cooling base, and the substrate transferring unit that the units chunk of conveyance substrate is used between these modules, wherein
Described coating developing device comprises:
Treatment bench, be arranged between carrier block and the interface piece, form the processing block more than at least 2 of the same structure that constitutes with a plurality of units chunk of units chunk with units chunk and development treatment for the stacked coated film that comprises, with carrier block one side as the place ahead one side, piece one side in interface is as the rear, along the front and back of the substrate transferring route towards the interface piece interconnect described these processing blocks and form from carrier block;
The junction group, in order between the stacked units chunk of described processing block, to carry out the handing-over of substrate, described the place ahead one side in processing block is corresponding with each units chunk and establish, and is equipped with multilayer to carry out the junction of substrate delivery/reception by the substrate transferring unit of each units chunk;
The handing-over arm is used for carrying out substrate delivery/reception with respect to each junction of described junction group, is arranged in the described processing block in the mode of lifting freely;
The junction is used in input and output, is used between described carrier block and processing block, perhaps carries out the handing-over of substrate between adjacent processing block, constitutes one of described junction group, utilizes described handing-over arm to carry out the handing-over of substrate; With
Special-purpose straight-through conveyance unit is arranged in the described processing block, the input and output of this processing block with the junction and and the input and output of the processing block of the rear one side adjacency of this processing block with conveyance substrate between the junction.
2. coating developing device as claimed in claim 1 is characterized in that:
The unit that is used for controlling described substrate transferring unit and straight-through conveyance unit and handing-over arm is equipped with, make that substrate directly is handover to the input and output that apply film formed processing block from carrier block uses the junction, perhaps utilize the straight-through conveyance unit of the processing block of the place ahead one side to join, utilize handing-over arm and substrate transferring unit that substrate is formed to the coated film in this processing block with the junction conveyance from described input and output and use units chunk, the junction is used in substrate transferring to the input and output of this processing block after coated film formed, then, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or rear one side, use the junction conveyance to the interface piece from these input and output substrate, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or this processing block and rear one side, substrate after the exposure-processed is used the junction from interface piece conveyance to the input and output of the processing block that carries out development treatment, utilize handing-over arm and substrate transferring unit with substrate from described input and output with the development treatment units chunk of junction conveyance to this processing block.
3. one kind applies developing method, it is characterized in that:
Utilize coated film to form and on the substrate of moving into by carrier in the carrier block, form the coated film that comprises resist film with units chunk, then, via interface piece conveyance to exposure device, utilize development treatment to carry out development treatment and it is handover to described carrier block with the substrate of units chunk after to the exposure of returning via described interface piece, wherein
Described coating developing device has treatment bench: be arranged between carrier block and the interface piece, form the processing block more than at least 2 of the same structure that constitutes with a plurality of units chunk of units chunk with units chunk and development treatment for the stacked coated film that comprises, with carrier block one side as the place ahead one side, piece one side in interface is as rear one side, along the front and back of the substrate transferring route towards the interface piece interconnect described these processing blocks and form from carrier block
Substrate directly is handover to the input and output that apply film formed processing block from carrier block uses the junction, perhaps utilize the straight-through conveyance unit of the processing block of the place ahead one side to join, utilize handing-over arm and substrate transferring unit that substrate is formed to the coated film in this processing block with the junction conveyance from described input and output and use units chunk, the junction is used in substrate transferring to the input and output of this processing block after coated film formed, then, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or rear one side, use the junction conveyance to the interface piece from these input and output substrate, utilize the straight-through conveyance unit of the processing block of the straight-through conveyance unit of this processing block or this processing block and rear one side, substrate after the exposure-processed is used the junction from interface piece conveyance to the input and output of the processing block that carries out development treatment, utilize handing-over arm and substrate transferring unit with substrate from described input and output with the development treatment units chunk of junction conveyance to this processing block.
4. storage medium is characterized in that:
Preserve the computer program that coating developing device uses, described coating developing device forms the coated film that comprises resist film at the substrate that receives from carrier block, and the substrate after the exposure is carried out development treatment,
Described programming steps group is with the described coating developing method of operation claim 3.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-095743 | 2007-03-30 | ||
| JP2007095743A JP4687682B2 (en) | 2007-03-30 | 2007-03-30 | Coating and developing apparatus and method, and storage medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101276744A true CN101276744A (en) | 2008-10-01 |
| CN101276744B CN101276744B (en) | 2011-08-17 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2008100902471A Active CN101276744B (en) | 2007-03-30 | 2008-03-31 | Coating and developing system, coating and developing method |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7997813B2 (en) |
| JP (1) | JP4687682B2 (en) |
| KR (1) | KR101339608B1 (en) |
| CN (1) | CN101276744B (en) |
| TW (1) | TWI364782B (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102193342A (en) * | 2010-02-15 | 2011-09-21 | 东京毅力科创株式会社 | Coating and developing apparatus and developing method |
| CN104465460A (en) * | 2010-07-09 | 2015-03-25 | 东京毅力科创株式会社 | Coating and developing apparatus and method |
| WO2023019590A1 (en) * | 2021-08-20 | 2023-02-23 | 盛美半导体设备(上海)股份有限公司 | Coating and developing device |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008258208A (en) * | 2007-03-30 | 2008-10-23 | Tokyo Electron Ltd | Coating and developing system and method thereof, and storage medium |
| JP4780808B2 (en) * | 2009-02-03 | 2011-09-28 | 東京エレクトロン株式会社 | Development processing method and development processing apparatus |
| JP5274339B2 (en) * | 2009-03-30 | 2013-08-28 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and substrate transfer method |
| EP2239789A1 (en) * | 2009-04-08 | 2010-10-13 | SAPHIRE ApS | Laminating assembly |
| JP5736687B2 (en) | 2009-10-06 | 2015-06-17 | 東京エレクトロン株式会社 | Substrate processing equipment |
| JP6243784B2 (en) * | 2014-03-31 | 2017-12-06 | 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ | Substrate processing equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100646620B1 (en) | 1999-05-06 | 2006-11-23 | 동경 엘렉트론 주식회사 | Transfer system for glass substrate |
| JP3856125B2 (en) * | 2002-05-10 | 2006-12-13 | 東京エレクトロン株式会社 | Processing method and processing apparatus |
| JP4307168B2 (en) * | 2003-07-07 | 2009-08-05 | 大日本スクリーン製造株式会社 | Substrate processing apparatus and method |
| JP4280159B2 (en) * | 2003-12-12 | 2009-06-17 | 東京エレクトロン株式会社 | Substrate processing equipment |
| JP4090986B2 (en) * | 2003-12-24 | 2008-05-28 | 東京エレクトロン株式会社 | Line width measuring method, substrate processing method, and substrate processing apparatus |
| JP4376072B2 (en) * | 2004-01-16 | 2009-12-02 | 東京エレクトロン株式会社 | Substrate processing apparatus and substrate processing method |
| JP4356936B2 (en) | 2005-01-21 | 2009-11-04 | 東京エレクトロン株式会社 | Coating and developing apparatus and method thereof |
| US7267497B2 (en) | 2005-01-21 | 2007-09-11 | Tokyo Electron Limited | Coating and developing system and coating and developing method |
| JP4459831B2 (en) * | 2005-02-01 | 2010-04-28 | 東京エレクトロン株式会社 | Coating and developing equipment |
| US7403260B2 (en) * | 2005-03-11 | 2008-07-22 | Tokyo Electron Limited | Coating and developing system |
| JP4685584B2 (en) | 2005-03-11 | 2011-05-18 | 東京エレクトロン株式会社 | Coating and developing equipment |
| JP2007294817A (en) * | 2006-04-27 | 2007-11-08 | Sokudo:Kk | Method, system, and apparatus for processing substrates |
-
2007
- 2007-03-30 JP JP2007095743A patent/JP4687682B2/en active Active
-
2008
- 2008-03-14 TW TW097109039A patent/TWI364782B/en active
- 2008-03-28 KR KR1020080028876A patent/KR101339608B1/en active IP Right Grant
- 2008-03-28 US US12/057,846 patent/US7997813B2/en active Active
- 2008-03-31 CN CN2008100902471A patent/CN101276744B/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102193342A (en) * | 2010-02-15 | 2011-09-21 | 东京毅力科创株式会社 | Coating and developing apparatus and developing method |
| CN102193342B (en) * | 2010-02-15 | 2014-07-09 | 东京毅力科创株式会社 | Coating and developing apparatus and developing method |
| CN104465460A (en) * | 2010-07-09 | 2015-03-25 | 东京毅力科创株式会社 | Coating and developing apparatus and method |
| CN104465460B (en) * | 2010-07-09 | 2017-09-08 | 东京毅力科创株式会社 | Coating and developing apparatus and coating developing method |
| WO2023019590A1 (en) * | 2021-08-20 | 2023-02-23 | 盛美半导体设备(上海)股份有限公司 | Coating and developing device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101276744B (en) | 2011-08-17 |
| JP4687682B2 (en) | 2011-05-25 |
| TWI364782B (en) | 2012-05-21 |
| KR20080089245A (en) | 2008-10-06 |
| US7997813B2 (en) | 2011-08-16 |
| KR101339608B1 (en) | 2013-12-10 |
| JP2008258209A (en) | 2008-10-23 |
| TW200903584A (en) | 2009-01-16 |
| US20080241402A1 (en) | 2008-10-02 |
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