CN101231458B - 灰色调掩模及图案转印方法 - Google Patents

灰色调掩模及图案转印方法 Download PDF

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Publication number
CN101231458B
CN101231458B CN2008100012732A CN200810001273A CN101231458B CN 101231458 B CN101231458 B CN 101231458B CN 2008100012732 A CN2008100012732 A CN 2008100012732A CN 200810001273 A CN200810001273 A CN 200810001273A CN 101231458 B CN101231458 B CN 101231458B
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CN2008100012732A
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Chinese (zh)
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CN101231458A (zh
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井村和久
木村泰树
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Hoya Corp
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Hoya Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Liquid Crystal (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN2008100012732A 2007-01-24 2008-01-17 灰色调掩模及图案转印方法 Expired - Fee Related CN101231458B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007014108 2007-01-24
JP2007-014108 2007-01-24
JP2007014108A JP5036328B2 (ja) 2007-01-24 2007-01-24 グレートーンマスク及びパターン転写方法

Publications (2)

Publication Number Publication Date
CN101231458A CN101231458A (zh) 2008-07-30
CN101231458B true CN101231458B (zh) 2011-09-21

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ID=39724850

Family Applications (1)

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CN2008100012732A Expired - Fee Related CN101231458B (zh) 2007-01-24 2008-01-17 灰色调掩模及图案转印方法

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JP (1) JP5036328B2 (ja)
KR (1) KR20080069923A (ja)
CN (1) CN101231458B (ja)
TW (1) TWI387845B (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5193715B2 (ja) * 2008-07-18 2013-05-08 株式会社エスケーエレクトロニクス 多階調フォトマスク
JP5319193B2 (ja) * 2008-07-28 2013-10-16 Ｈｏｙａ株式会社 液晶表示装置製造用多階調フォトマスク、液晶表示装置製造用多階調フォトマスクの製造方法及びパターン転写方法
JP2010044149A (ja) * 2008-08-11 2010-02-25 Hoya Corp 多階調フォトマスク、パターン転写方法及び多階調フォトマスクを用いた表示装置の製造方法
TWI440964B (zh) * 2009-01-27 2014-06-11 Hoya Corp 多調式光罩、多調式光罩之製造方法及圖案轉印方法
JP2010276724A (ja) * 2009-05-26 2010-12-09 Hoya Corp 多階調フォトマスク、多階調フォトマスクの製造方法、及びパターン転写方法
WO2010150355A1 (ja) * 2009-06-23 2010-12-29 Hoya株式会社 多階調フォトマスク
CN102645839B (zh) * 2011-06-15 2013-11-27 北京京东方光电科技有限公司 一种掩模板及其制造方法
JP5635577B2 (ja) * 2012-09-26 2014-12-03 Hoya株式会社 フォトマスクの製造方法、フォトマスク、パターン転写方法、及びフラットパネルディスプレイの製造方法
CN107807493B (zh) * 2017-09-28 2020-08-07 京东方科技集团股份有限公司 掩膜板和曝光设备
CN109143772B (zh) * 2018-10-10 2024-03-19 信利半导体有限公司 灰阶掩膜板
CN109188854B (zh) * 2018-10-18 2020-06-09 合肥鑫晟光电科技有限公司 掩膜板、显示基板及其制作方法、显示装置
CN109343304B (zh) * 2018-11-21 2020-04-14 惠科股份有限公司 一种用于制作主动开关的光罩和显示面板的制作方法
CN109541829B (zh) * 2018-12-19 2021-08-24 惠科股份有限公司 掩膜版、液晶面板和液晶显示装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1755520A (zh) * 2002-06-25 2006-04-05 Hoya株式会社 灰调掩模
CN1854892A (zh) * 2005-02-14 2006-11-01 株式会社瑞萨科技 光掩膜、掩膜图形的生成方法及半导体器件的制造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002189280A (ja) * 2000-12-19 2002-07-05 Hoya Corp グレートーンマスク及びその製造方法
JP3586647B2 (ja) * 2000-12-26 2004-11-10 Ｈｏｙａ株式会社 グレートーンマスク及びその製造方法
JP4858025B2 (ja) * 2006-09-08 2012-01-18 大日本印刷株式会社 階調マスク

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1755520A (zh) * 2002-06-25 2006-04-05 Hoya株式会社 灰调掩模
CN1854892A (zh) * 2005-02-14 2006-11-01 株式会社瑞萨科技 光掩膜、掩膜图形的生成方法及半导体器件的制造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JP特开平9-80740A 1997.03.28

Also Published As

Publication number Publication date
CN101231458A (zh) 2008-07-30
JP2008180897A (ja) 2008-08-07
TWI387845B (zh) 2013-03-01
KR20080069923A (ko) 2008-07-29
JP5036328B2 (ja) 2012-09-26
TW200914989A (en) 2009-04-01

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Granted publication date: 20110921

Termination date: 20140117