CN101209542A - 抛光液传输设备 - Google Patents
抛光液传输设备 Download PDFInfo
- Publication number
- CN101209542A CN101209542A CNA2006101488164A CN200610148816A CN101209542A CN 101209542 A CN101209542 A CN 101209542A CN A2006101488164 A CNA2006101488164 A CN A2006101488164A CN 200610148816 A CN200610148816 A CN 200610148816A CN 101209542 A CN101209542 A CN 101209542A
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- Prior art keywords
- polishing fluid
- polishing
- transmission pipeline
- transmission
- pipeline
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- Grinding-Machine Dressing And Accessory Apparatuses (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN200610148816A CN101209542B (zh) | 2006-12-28 | 2006-12-28 | 抛光液传输设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN200610148816A CN101209542B (zh) | 2006-12-28 | 2006-12-28 | 抛光液传输设备 |
Publications (2)
Publication Number | Publication Date |
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CN101209542A true CN101209542A (zh) | 2008-07-02 |
CN101209542B CN101209542B (zh) | 2010-05-19 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN200610148816A Expired - Fee Related CN101209542B (zh) | 2006-12-28 | 2006-12-28 | 抛光液传输设备 |
Country Status (1)
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CN (1) | CN101209542B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102335877A (zh) * | 2011-10-11 | 2012-02-01 | 清华大学 | 抛光液输送装置 |
US8297830B2 (en) | 2009-03-04 | 2012-10-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Slurry system for semiconductor fabrication |
CN104029130A (zh) * | 2014-06-06 | 2014-09-10 | 中国科学院长春光学精密机械与物理研究所 | 一种智能抛光液供给循环装置 |
CN104896303A (zh) * | 2015-06-11 | 2015-09-09 | 湖南拓奇新创科技股份有限公司 | 一种抛光辅料自动排放装置 |
CN106051461A (zh) * | 2015-04-01 | 2016-10-26 | 迪尔公司 | 流体循环系统 |
CN106926138A (zh) * | 2017-03-23 | 2017-07-07 | 大连理工大学 | 一种抛光液性能连续实时调控装置 |
CN107052992A (zh) * | 2016-11-16 | 2017-08-18 | 吉林大学 | 一种抛光液在线调配内供给抛光机床 |
CN107520759A (zh) * | 2016-06-21 | 2017-12-29 | 上海新昇半导体科技有限公司 | 一种抛光液供应系统及方法 |
CN110014371A (zh) * | 2018-01-08 | 2019-07-16 | 爱思开矽得荣株式会社 | 浆料冷却设备和具有该浆料冷却设备的浆料供给系统 |
CN113578082A (zh) * | 2020-04-30 | 2021-11-02 | 信纮科技股份有限公司 | 化学液体稀释系统 |
CN114699941A (zh) * | 2022-03-14 | 2022-07-05 | 长鑫存储技术有限公司 | 一种液体混合装置、供给系统及供给方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100393204B1 (ko) * | 2000-05-16 | 2003-07-31 | 삼성전자주식회사 | 씨엠피용 슬러리의 공급 방법 및 장치 |
JP3789296B2 (ja) * | 2000-11-17 | 2006-06-21 | リオン株式会社 | 研磨液の製造装置 |
JP4456308B2 (ja) * | 2001-12-05 | 2010-04-28 | 富士通マイクロエレクトロニクス株式会社 | 薬液供給装置 |
CN100482416C (zh) * | 2005-03-15 | 2009-04-29 | 联华电子股份有限公司 | 化学机械研磨机台的研磨液供应设备与研磨液混合方法 |
-
2006
- 2006-12-28 CN CN200610148816A patent/CN101209542B/zh not_active Expired - Fee Related
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8297830B2 (en) | 2009-03-04 | 2012-10-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Slurry system for semiconductor fabrication |
CN101823234B (zh) * | 2009-03-04 | 2013-02-20 | 台湾积体电路制造股份有限公司 | 研磨液供给系统及化学机械研磨站的研磨液混合物供给法 |
CN102335877A (zh) * | 2011-10-11 | 2012-02-01 | 清华大学 | 抛光液输送装置 |
CN104029130A (zh) * | 2014-06-06 | 2014-09-10 | 中国科学院长春光学精密机械与物理研究所 | 一种智能抛光液供给循环装置 |
CN106051461A (zh) * | 2015-04-01 | 2016-10-26 | 迪尔公司 | 流体循环系统 |
CN104896303A (zh) * | 2015-06-11 | 2015-09-09 | 湖南拓奇新创科技股份有限公司 | 一种抛光辅料自动排放装置 |
CN104896303B (zh) * | 2015-06-11 | 2017-04-12 | 湖南拓奇新创科技股份有限公司 | 一种抛光辅料自动排放装置 |
CN107520759A (zh) * | 2016-06-21 | 2017-12-29 | 上海新昇半导体科技有限公司 | 一种抛光液供应系统及方法 |
CN107052992A (zh) * | 2016-11-16 | 2017-08-18 | 吉林大学 | 一种抛光液在线调配内供给抛光机床 |
CN106926138A (zh) * | 2017-03-23 | 2017-07-07 | 大连理工大学 | 一种抛光液性能连续实时调控装置 |
CN106926138B (zh) * | 2017-03-23 | 2019-02-12 | 大连理工大学 | 一种抛光液性能连续实时调控装置 |
CN110014371A (zh) * | 2018-01-08 | 2019-07-16 | 爱思开矽得荣株式会社 | 浆料冷却设备和具有该浆料冷却设备的浆料供给系统 |
CN110014371B (zh) * | 2018-01-08 | 2021-11-30 | 爱思开矽得荣株式会社 | 浆料冷却设备和具有该浆料冷却设备的浆料供给系统 |
US11253970B2 (en) | 2018-01-08 | 2022-02-22 | Sk Siltron Co., Ltd. | Slurry cooling device and slurry supply system having the same |
CN113578082A (zh) * | 2020-04-30 | 2021-11-02 | 信纮科技股份有限公司 | 化学液体稀释系统 |
CN114699941A (zh) * | 2022-03-14 | 2022-07-05 | 长鑫存储技术有限公司 | 一种液体混合装置、供给系统及供给方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101209542B (zh) | 2010-05-19 |
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C06 | Publication | ||
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING |
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Effective date of registration: 20111117 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Co-patentee after: Semiconductor Manufacturing International (Beijing) Corporation Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Address before: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee before: Semiconductor Manufacturing International (Shanghai) Corporation |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100519 Termination date: 20181228 |