CN101208378B - 具有陶瓷材料外层的耐腐蚀物件 - Google Patents
具有陶瓷材料外层的耐腐蚀物件 Download PDFInfo
- Publication number
- CN101208378B CN101208378B CN2006800212441A CN200680021244A CN101208378B CN 101208378 B CN101208378 B CN 101208378B CN 2006800212441 A CN2006800212441 A CN 2006800212441A CN 200680021244 A CN200680021244 A CN 200680021244A CN 101208378 B CN101208378 B CN 101208378B
- Authority
- CN
- China
- Prior art keywords
- refractory metal
- metal
- layer
- main element
- coating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910010293 ceramic material Inorganic materials 0.000 title claims abstract description 12
- 238000005260 corrosion Methods 0.000 title abstract description 14
- 230000007797 corrosion Effects 0.000 title abstract description 14
- 239000003870 refractory metal Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 26
- 239000007790 solid phase Substances 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 29
- 239000002184 metal Substances 0.000 claims description 29
- 238000000576 coating method Methods 0.000 claims description 24
- 239000011248 coating agent Substances 0.000 claims description 22
- 229910045601 alloy Inorganic materials 0.000 claims description 18
- 239000000956 alloy Substances 0.000 claims description 18
- 150000001875 compounds Chemical class 0.000 claims description 10
- 229910052796 boron Inorganic materials 0.000 claims description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical group [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 238000010574 gas phase reaction Methods 0.000 claims description 2
- 238000003746 solid phase reaction Methods 0.000 claims description 2
- 238000010671 solid-state reaction Methods 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 abstract description 13
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract description 13
- 239000010970 precious metal Substances 0.000 abstract description 11
- 238000002161 passivation Methods 0.000 abstract description 9
- 230000003647 oxidation Effects 0.000 abstract description 5
- 238000007254 oxidation reaction Methods 0.000 abstract description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 4
- XTDAIYZKROTZLD-UHFFFAOYSA-N boranylidynetantalum Chemical compound [Ta]#B XTDAIYZKROTZLD-UHFFFAOYSA-N 0.000 abstract description 4
- 229910052802 copper Inorganic materials 0.000 abstract description 4
- 239000010949 copper Substances 0.000 abstract description 4
- 229910052709 silver Inorganic materials 0.000 abstract description 4
- 239000004332 silver Substances 0.000 abstract description 4
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000007792 gaseous phase Substances 0.000 abstract 1
- 230000003628 erosive effect Effects 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 238000002844 melting Methods 0.000 description 9
- 230000008018 melting Effects 0.000 description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- 239000010936 titanium Substances 0.000 description 8
- 229910052719 titanium Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 229910001362 Ta alloys Inorganic materials 0.000 description 3
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 3
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- 239000010955 niobium Substances 0.000 description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241000370738 Chlorion Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- -1 chlorion etc.) Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007373 indentation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 150000003482 tantalum compounds Chemical class 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Resistance Heating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Laminated Bodies (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DKPA200500876 | 2005-06-15 | ||
DKPA200500876 | 2005-06-15 | ||
PCT/DK2006/000342 WO2006133710A1 (en) | 2005-06-15 | 2006-06-14 | A corrosion resistant object having an outer layer of a ceramic material |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101208378A CN101208378A (zh) | 2008-06-25 |
CN101208378B true CN101208378B (zh) | 2013-05-29 |
Family
ID=36739920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2006800212441A Expired - Fee Related CN101208378B (zh) | 2005-06-15 | 2006-06-14 | 具有陶瓷材料外层的耐腐蚀物件 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080311387A1 (zh) |
EP (1) | EP1896527B1 (zh) |
CN (1) | CN101208378B (zh) |
RU (1) | RU2376400C2 (zh) |
WO (1) | WO2006133710A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8431191B2 (en) | 2006-07-14 | 2013-04-30 | Tantaline A/S | Method for treating titanium objects with a surface layer of mixed tantalum and titanium oxides |
US20110027614A1 (en) * | 2008-02-28 | 2011-02-03 | Bo Gillesberg | Corrosion resistant object with alloying zone |
JP6220296B2 (ja) * | 2014-03-19 | 2017-10-25 | 日本碍子株式会社 | 耐熱性部材及びその製造方法 |
WO2018085866A2 (en) | 2016-10-25 | 2018-05-11 | Conax Technologies | Erosion/corrosion resistant barrier coating |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4039401A (en) * | 1973-10-05 | 1977-08-02 | Sumitomo Chemical Company, Limited | Aluminum production method with electrodes for aluminum reduction cells |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NO801818L (no) * | 1979-07-20 | 1981-01-21 | Conradty Nuernberg | Regenererbar, formstabil elektrode for hoeytemperaturanvendelse |
DE3866043D1 (de) * | 1987-07-23 | 1991-12-12 | Asahi Glass Co Ltd | Felderzeugungsvorrichtung. |
FR2728274B1 (fr) * | 1995-11-06 | 1997-06-13 | Gec Alsthom Neyrpic | Procede de depot sur un substrat conducteur electronique revetu d'une mince couche de ceramique, d'un revetement, et elaboration de revetements composites ceramique-metal |
JP2003268567A (ja) * | 2002-03-19 | 2003-09-25 | Hitachi Cable Ltd | 導電材被覆耐食性金属材料 |
EP1428551A1 (de) * | 2002-12-13 | 2004-06-16 | W.C. Heraeus GmbH & Co. KG | Stimulationselektrode, sowie deren Herstellung und Verwendung |
-
2006
- 2006-06-14 EP EP06753311.7A patent/EP1896527B1/en not_active Not-in-force
- 2006-06-14 RU RU2007148532/02A patent/RU2376400C2/ru not_active IP Right Cessation
- 2006-06-14 CN CN2006800212441A patent/CN101208378B/zh not_active Expired - Fee Related
- 2006-06-14 US US11/917,213 patent/US20080311387A1/en not_active Abandoned
- 2006-06-14 WO PCT/DK2006/000342 patent/WO2006133710A1/en active Application Filing
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4039401A (en) * | 1973-10-05 | 1977-08-02 | Sumitomo Chemical Company, Limited | Aluminum production method with electrodes for aluminum reduction cells |
Also Published As
Publication number | Publication date |
---|---|
US20080311387A1 (en) | 2008-12-18 |
EP1896527B1 (en) | 2017-05-24 |
CN101208378A (zh) | 2008-06-25 |
RU2007148532A (ru) | 2009-07-20 |
EP1896527A1 (en) | 2008-03-12 |
RU2376400C2 (ru) | 2009-12-20 |
WO2006133710A1 (en) | 2006-12-21 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: TANTALAIEN LTD. Free format text: FORMER OWNER: DANFOSS A/S Effective date: 20120703 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20120703 Address after: Fort Hood Applicant after: TANTALINE A/S Address before: Denmark nordburg Applicant before: Danfoss A/S Effective date of registration: 20120703 Address after: Fort Hood Applicant after: TANTALINE A/S Address before: Denmark nordburg Applicant before: Danfoss A/S |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170417 Address after: Fort Hood Patentee after: Tanta chemical vapor deposition Holding Co., Ltd. Address before: Fort Hood Patentee before: TANTALINE A/S Effective date of registration: 20170417 Address after: Fort Hood Patentee after: Tanta chemical vapor deposition Holding Co., Ltd. Address before: Fort Hood Patentee before: TANTALINE A/S |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130529 Termination date: 20190614 |