CN101206181B - 检测晶圆边缘洗边效果的装置及方法 - Google Patents
检测晶圆边缘洗边效果的装置及方法 Download PDFInfo
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- CN101206181B CN101206181B CN200610147802A CN200610147802A CN101206181B CN 101206181 B CN101206181 B CN 101206181B CN 200610147802 A CN200610147802 A CN 200610147802A CN 200610147802 A CN200610147802 A CN 200610147802A CN 101206181 B CN101206181 B CN 101206181B
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CN200610147802A CN101206181B (zh) | 2006-12-22 | 2006-12-22 | 检测晶圆边缘洗边效果的装置及方法 |
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CN200610147802A CN101206181B (zh) | 2006-12-22 | 2006-12-22 | 检测晶圆边缘洗边效果的装置及方法 |
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CN101206181A CN101206181A (zh) | 2008-06-25 |
CN101206181B true CN101206181B (zh) | 2010-05-19 |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102865841B (zh) * | 2012-09-17 | 2016-01-27 | 上海华力微电子有限公司 | 晶圆边缘度量与检测工具的厚度检测稳定性检测方法 |
CN103646867B (zh) * | 2013-11-29 | 2016-04-06 | 上海华力微电子有限公司 | 改善晶圆剥落缺陷的方法 |
CN103715115B (zh) * | 2013-12-31 | 2018-11-09 | 上海集成电路研发中心有限公司 | 去边检测装置及检测方法 |
CN106486417B (zh) * | 2015-09-02 | 2019-07-23 | 无锡华润上华科技有限公司 | 提升晶边良率的方法 |
CN108573886B (zh) * | 2017-03-08 | 2020-11-27 | 中芯国际集成电路制造(上海)有限公司 | 晶边偏移检测方法及系统、机台 |
CN110610880A (zh) * | 2019-09-30 | 2019-12-24 | 上海华力集成电路制造有限公司 | 晶圆洗边侦测装置和方法 |
CN111564382A (zh) * | 2020-04-08 | 2020-08-21 | 中国科学院微电子研究所 | 晶圆检测装置及检测方法 |
CN116936398B (zh) * | 2023-09-18 | 2023-11-24 | 粤芯半导体技术股份有限公司 | 晶圆的洗边结果检测方法、装置、设备以及存储介质 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2002015977A (ja) * | 2000-06-29 | 2002-01-18 | Kyocera Corp | 基板ホルダー |
JP2002072448A (ja) * | 2000-08-30 | 2002-03-12 | Fujitsu Ltd | 反射型マスク検査装置および反射型マスク検査方法 |
JP2002151462A (ja) * | 2000-11-09 | 2002-05-24 | Fujitsu Ltd | ウエットエッチング終点検出方法及び装置並びにウエットエッチング方法 |
CN1833308A (zh) * | 2001-12-17 | 2006-09-13 | 赛博光学半导体公司 | 半导体晶片载体映射传感器 |
US20060250609A1 (en) * | 2005-05-06 | 2006-11-09 | Kla-Tencor Technologies Corp. | Wafer edge inspection |
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2006
- 2006-12-22 CN CN200610147802A patent/CN101206181B/zh not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002015977A (ja) * | 2000-06-29 | 2002-01-18 | Kyocera Corp | 基板ホルダー |
JP2002072448A (ja) * | 2000-08-30 | 2002-03-12 | Fujitsu Ltd | 反射型マスク検査装置および反射型マスク検査方法 |
JP2002151462A (ja) * | 2000-11-09 | 2002-05-24 | Fujitsu Ltd | ウエットエッチング終点検出方法及び装置並びにウエットエッチング方法 |
CN1833308A (zh) * | 2001-12-17 | 2006-09-13 | 赛博光学半导体公司 | 半导体晶片载体映射传感器 |
US20060250609A1 (en) * | 2005-05-06 | 2006-11-09 | Kla-Tencor Technologies Corp. | Wafer edge inspection |
Non-Patent Citations (6)
Title |
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Alexander E.Braun.晶圆边缘的检测.集成电路应用 5.2006,(5),33-35. |
Alexander E.Braun.晶圆边缘的检测.集成电路应用 5.2006,(5),33-35. * |
Alexander E.Braun.晶圆边缘缺陷的系统探测与分类.集成电路应用 Z1.2007,(Z1),47. |
Alexander E.Braun.晶圆边缘缺陷的系统探测与分类.集成电路应用 Z1.2007,(Z1),47. * |
尹燕萍等.镜面无损检测系统.半导体光电21 6.2000,21(6),425-427. |
尹燕萍等.镜面无损检测系统.半导体光电21 6.2000,21(6),425-427. * |
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