CN101101446A

CN101101446A - Photoresist coater carrying disc for preventing static assembly

Info

Publication number: CN101101446A
Application number: CNA2006101005652A
Authority: CN
Inventors: 郑瑞忠; 张谦圣
Original assignee: Prime View International Co Ltd
Current assignee: Prime View International Co Ltd
Priority date: 2006-07-03
Filing date: 2006-07-03
Publication date: 2008-01-09
Anticipated expiration: 2026-07-03
Also published as: CN100592208C

Abstract

The invention is a photoresist coater carrying disc able to prevent static congregation, comprising a tray and a fixed base fixed with the tray, where the tray and the fixed base are both conductors, and they form electric conduction between them, and the fixed base is connected with drive mechanism on the coater through a rotary shaft which is conductor, and driven by the drive mechanism, the drive mechanism has earthing establishment; thus, a static discharge path forms between the tray, fixed base, rotary shaft and earthing establishment of the drive mechanism, and when vacuum absorbed glass substrate on the tray completes photoresist coating, large amounts of static generated when the glass substrate instantly departs from the tray surface is released quickly through the static discharge path into the earth so as to be able to avoid static congregation from damaging the glass substrate.

Description

Prevent the photoresist coating machine carrier of static focus

Technical field

The invention belongs to a kind of device that is applied to the glass substrate manufacture process, especially refer to a kind of photoresist coating machine carrier that prevents static focus, when this coating machine carrier can avoid glass substrate and coating machine carrier to break away from, the static that is produced when being broken away from moment injures, to guarantee the yield of glass substrate.

Background technology

LCD screen has frivolous and advantage that do not take up space, at present significantly replaces traditional cathode ray tube screen and is widely used among the various occasions.

The core parts of LCD screen are glass substrate, in the manufacture process of liquid crystal panel, must on glass substrate, carry out manufacture of semiconductor to make thin film transistor (TFT) and circuit, gold-tinted manufacture process wherein promptly is a coating layer of even photoresist on glass substrate, then in subsequent step, cooperate photomask on photoresist layer, to form circuit pattern, so that can carry out subsequent step such as exposure imaging.

Please refer to Fig. 5, the mode of coating photoresist is to carry out the coating of photoresist by a photoresist coating machine on glass substrate at present, and this coating machine includes a motor (not shown), a vacuum pump (not shown), a rotating shaft 90 and a vacuum cup 91; This rotating shaft 90 is to be rotated by the motor transmission; This vacuum cup 91 is fixedly arranged in the rotating shaft, and is connected so that can produce pull of vacuum with vacuum pump.

During the coating photoresist, put a glass substrate 92 earlier in the vacuum cup end face, and drip photoresist liquid in glass substrate 92 centers, then start vacuum pump, make vacuum cup that glass substrate is produced pull of vacuum, then starter motor makes vacuum cup 91 together with glass substrate 92 rotations, and the photoresist liquid of center then is subjected to centrifugal action and radially outward diffuses to whole glass substrate 92 surfaces.

Yet, when the step of coating photoresist is finished and glass substrate 92 broken away from moment of vacuum cups 91, vacuum cup 91 surfaces reach generation at 15-16 kilovolt (Kilovolt, KV) high-pressure electrostatic, and the circuit on the damage glass substrate 92, gently then local impaired, then will cause scrapping of glass substrate 92 when serious, thereby reduce the yield of glass substrate 92.

The inventor damages the shortcoming of original circuit on the glass substrate according to the vacuum cup static electricity gathered of existing glass substrate photoresist coating machine, improves its not enough and disappearance, and then invents out a kind of photoresist coating machine carrier that prevents static focus.

Summary of the invention

The object of the present invention is to provide a kind of photoresist coating machine carrier that prevents static focus, this photoresist coating machine carrier can smooth and easy ground connection and is avoided static electricity gathered, make glass substrate not be subjected to the static injury when breaking away from the photoresist coating machine and scrap, to improve the yield of glass substrate.

The object of the present invention is achieved like this, and a kind of photoresist coating machine carrier that prevents static focus includes a pallet and the affixed holder of a pallet, wherein:

This pallet and holder are conductor, and can constitute conductivity between pallet and the holder, and holder is to be also that by one the gear train on the rotating shaft of conductor and the coating machine links again, and is subjected to its transmission, and this gear train also has the ground connection facility; Thus, to constitute an electrostatic discharged path between the ground connection facility of aforementioned pallet, holder, rotating shaft and gear train, the glass substrate of vacuum suction is finished the photoresist coating on pallet, the a large amount of static that produced when this glass substrate and tray surface moment disengaging will be released rapidly by aforementioned electrostatic discharged path and will be directed to the earth, thereby can avoid static focus that glass substrate is damaged.

Aforementioned pallet has carbonaceous material and possesses conductive characteristic.

Aforementioned pallet contains graphite and possesses conductive characteristic.

Aforementioned pallet contains metal and has electric conductivity.

The resistance of aforementioned pallet is 103-105 ohm (Ω)/square (ohms/sq).

Aforementioned this rotating shaft is formed with at least one locating slot near on the sidewall on top, this holder is fixed in the rotating shaft with removably, in the projection downward vertically of the bottom of holder one socket part is arranged, be formed with a mounting hole that supplies the rotating shaft top to stretch in the bottom, socket part, run through at the socket part sidewall and to be formed with at least one through hole, a removable latch passes through hole and stretches into locating slot.

Aforementioned pallet center is run through and is formed with a perforation, and end face is formed with a plurality of and the runners that are communicated with of perforation, and this holder center is run through and is formed with a perforation that is communicated with this perforation, thus, can make the holder perforation by the external vacuum pump of pipeline, and make the runner of pallet produce pull of vacuum.

Aforementioned a plurality of runner includes a plurality of radial flow path and a plurality of annular channel.

By above-mentioned technological means, pallet, holder and the electrostatic discharged path that rotating shaft constituted can conduct to static the ground at photoresist coating machine place smoothly, thus, in the time of can avoiding glass substrate to break away from pallet, suffer the original circuit on the electrostatic damage glass substrate, the yield of glass substrate cause glass substrate to scrap, so can improve greatly.

Description of drawings

Fig. 1: stereo appearance figure of the present invention.

Fig. 2: the present invention amplifies stereo appearance figure.

Fig. 3: side-looking partial section view of the present invention.

Fig. 4: synoptic diagram is conducted electricity in the present invention, and arrow is represented conductive path.

Fig. 5: the synoptic diagram of well known photolithography rubber coating.

Drawing reference numeral:

10 rotating shafts, 11 locating slots

20 holders, 21 perforations

221 mounting holes, 223 through holes

225 latches, 30 pallets

31 perforation, 32 radial flow path

33 annular channels, 80 platforms

90 rotating shafts, 91 vacuum cups

92 glass substrates

Embodiment

Please refer to Fig. 1 and Fig. 2, the present invention prevents that the photoresist coating machine carrier of static focus is connected with a gear train, and an external vacuum pump, and overall fixed forms a photoresist coating machine thus on a platform 80.

Please refer to Fig. 2 and Fig. 3, this photoresist coating machine carrier includes a pallet 30 and the affixed holder 20 of a pallet 30, wherein:

This pallet 30 is conductor with holder 20, and can constitute conductivity between pallet 30 and the holder, pallet 30 can have compositions such as carbonaceous material, graphite or metal thereby possess conductive characteristic, the preferably, and the resistance of pallet 30 can be 103-105 ohm (Ω)/square (ohms/sq).

Please refer to Fig. 2 and Fig. 4, this holder 20 is by one also for the rotating shaft 10 of conductor and gear train on the coating machine link, and is subjected to its transmission, and this gear train also has the ground connection facility; Thus, to constitute an electrostatic discharged path between the ground connection facility of aforementioned pallet 30, holder 20, rotating shaft 10 and gear train, the glass substrate of vacuum suction is finished the photoresist coating on pallet 30, a large amount of static that 30 surface moments of this glass substrate and pallet were produced when breaking away from will be released rapidly by aforementioned electrostatic discharged path and will be directed to the earth, thereby can avoid static focus that glass substrate is damaged.

In addition, these pallet 30 centers run through be formed with one the perforation 31, and end face is formed with a plurality of and perforation 31 radial flow path that are communicated with 32 and annular channels 33, these holder 20 centers are run through and are formed with a perforation 21 that is communicated with this perforation 31, thus, can make holder 20 perforations 21 by external this vacuum pump of pipeline, and make the

runner

32,33 of pallet 30 produce pull of vacuum.

The preferably, this rotating shaft 10 is formed with at least one locating slot 11 near on the sidewall on top, this holder 20 is to be fixed in the rotating shaft 10 with removably, in the projection downward vertically of the bottom of holder 20 one socket part 22 is arranged, 22 bottoms are formed with a mounting hole 221 that supplies rotating shaft 10 tops to stretch in the socket part, 22 sidewalls run through and are formed with at least one through hole 223, one removable latches 225 and pass through hole and stretch into locating slot 11 with affixed rotating shaft 10 and holder 20 in the socket part.

By above-mentioned technological means, static can be conducted and be disposed to the earth smoothly in the electrostatic discharged path that pallet 30, holder 20 and rotating shaft 10 are constituted, thus, in the time of can avoiding glass substrate to break away from pallet 30, suffer the original circuit on the electrostatic damage glass substrate, cause glass substrate to scrap,, reduce the cost of glass substrate so can improve the glass substrate yield.

Claims

1. photoresist coating machine carrier that prevents static focus, include a pallet and the affixed holder of a pallet, it is characterized in that: this pallet and holder are conductor, wherein constitute conductivity between pallet and the holder, this holder can be subjected to a gear train transmission, and link with its ground structure, get rid of the path to form a static.

2. the photoresist coating machine carrier that prevents static focus as claimed in claim 1 is characterized in that: this pallet is made of carbonaceous material and is possessed electric conductivity.

3. the photoresist coating machine carrier that prevents static focus as claimed in claim 1, it is characterized in that: this pallet contains graphite and possesses electric conductivity.

4. the photoresist coating machine carrier that prevents static focus as claimed in claim 1, it is characterized in that: this pallet contains metal and possesses electric conductivity.

5. as each described photoresist coating machine carrier that prevents static focus of claim 1 to 4, it is characterized in that: the resistance of this pallet is the 103-105 ohm-sq.

6. the photoresist coating machine carrier that prevents static focus as claimed in claim 5, it is characterized in that: this holder links by a rotating shaft and gear train, this rotating shaft also is a conductor, this rotating shaft is formed with at least one locating slot near on the sidewall on top, this holder is to be fixed in the rotating shaft with removably, in the projection downward vertically of the bottom of holder one socket part is arranged, be formed with a mounting hole that supplies the rotating shaft top to stretch in the bottom, socket part, run through at the socket part sidewall and to be formed with at least one through hole, a removable latch passes through hole and stretches into locating slot.

7. the photoresist coating machine carrier that prevents static focus as claimed in claim 6, it is characterized in that: this pallet center is run through and is formed with a perforation, and end face is formed with a plurality of runners that are communicated with perforation, this holder center is run through and is formed with a perforation that is communicated with this perforation, thus, can make the holder perforation by the external vacuum pump of pipeline, and make the runner of pallet produce pull of vacuum.

8. the photoresist coating machine carrier that prevents static focus as claimed in claim 7, it is characterized in that: these a plurality of runners include a plurality of radial flow path and a plurality of annular channel.