CN101090128A - LED array microdisplay device and manufacturing method - Google Patents
LED array microdisplay device and manufacturing method Download PDFInfo
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Abstract
This invention relates to a high brightness microdisplay component and its process method, in which, the device includes: an upper elctrode, a transmission layer, a reflection layer, a chip, a lower electrode, an upper protection layer and a diaphragm, and the method includes: A, preparing a metal film and a protection layer on the transmission layer and the chip, B, preparing an upper isolation groove and the upper eelctrode, C, preparing the diaphragm, D, preparing a lower isolation groove, E, preparing the lower electrode, packaging, preparing lead and finishing the preparation, which applies an inorganic active LED chip to prepare a microdisplay device to get it simple, solid and quick response and overcome the shortcoming of short life time and low drive current of organic light emitting elements.
Description
Technical field: the invention belongs to luminous Display Technique field, relate to a kind of miniscope spare, specifically a kind of high brightness AlGaInP-LED micro-display device and manufacture method.
Background technology: in recent years, along with the development of electronic industry, the micro-display device development rapidly.Common miniature display system is based on LCD (LCD) or Organic Light Emitting Diode (OLED) technology.But liquid crystal display usually needs an exterior lighting light source, makes complex structure; Organic Light Emitting Diode (OLED) is subjected to the drive current restriction can not obtain higher output intensity, and the life-span is lower.
Summary of the invention: the purpose of this invention is to provide a kind of AlGaInP-LED micro-display device and manufacture method.
The structure of micro-display device of the present invention comprises shown in Fig. 1～5: top electrode 1, photic zone 4, luminescent layer 5, reflector 6, substrate 7, bottom electrode 9, last protective layer 10, diaphragm 11.
Being followed successively by luminescent layer 5, photic zone 4 above the reflector 6, is substrate 7 below the reflector 6.Top electrode 1 is arranged on photic zone 4, and top electrode 1 is bar shaped, and each bar shaped top electrode 1 is parallel to each other.Isolated groove 2 on having on luminescent layer 5 and the photic zone 4 vertically, laterally interlocking, last isolated groove 2 is divided into vertical and horizontal arranged rectangular shape or square with luminescent layer 5 and photic zone 4.In last isolated groove 2, diaphragm 11 is arranged, diaphragm 11 is divided into two rectangles or square transparent area 3 with top electrode 1 again with each vertical and horizontal arranged rectangular shape or square photic zone 4, these transparent areas 3 also are that vertical and horizontal are arranged, and constitute two-dimensional array.On transparent area 3, top electrode 1, diaphragm 11, be coated with protective layer 10.
Have isolated groove 8 down on the substrate 7 below reflector 6, following isolated groove 8 is divided into the list structure that is arranged in parallel with substrate 7, is bottom electrode 9 on the substrate 7 of each list structure.Bottom electrode 9 is vertical with top electrode 1 antarafacial on direction.
The course of work of AlGaInP-LED micro-display device of the present invention is that the electric current utmost point 1 from power on injects, and flows out from bottom electrode 9, forms electric field in device, makes positive negative carrier at the luminescent layer recombination luminescence.Wherein part light is upward through photic zone 4, penetrates from transparent area 3, protective layer 10; Part light arrives reflector 6 downwards, and luminescent layer 5, photic zone 4 are passed in layer 6 reflection that are reflected, and penetrate from transparent area 3.Because the principle of luminosity of this luminescent device is the charge carrier recombination luminescence in the p-n junction, has the nonlinear characteristic of diode current voltage, luminosity also has nonlinear characteristic with the size of injection current.The present invention is bright dark by circuit control phase primitive element, realizes luminous demonstration.
High brightness micro-display device of the present invention is made by the series of process step.
One, on luminescent layer and substrate, prepares metallic film
(A). the host material that the present invention uses is luminescence chip, and used luminescence chip is made of photic zone 4, luminescent layer 5, reflector 6 and substrate 7, shown in Fig. 6 (a).By evaporation or sputtering technology, on the photic zone 4 of luminescence chip and substrate 7, respectively prepare the layer of metal film, shown in Fig. 6 (b).
(B). get rid of one deck glue on the metallic film surface of substrate 7 and make protective layer, to protect this metallic film injury-free.
Two, isolated groove and preparation top electrode in the formation
(C). be coated with one deck photoresist on the metal film on photic zone 4 surfaces, select suitable etching condition according to the character and the thickness of glue, photoetching forms the photoresist figure of isolated groove.
(D). use the corresponding metal corrosive liquid that not protected metallic film is eroded, expose photic zone 4, as Fig. 6 (c).
(E). select corresponding corrosive liquid corrosion photic zone 4 according to the photic zone material, protected portions does not erode until luminescent layer 5, as Fig. 6 (d).
(F). select corresponding corrosive liquid corrosion luminescent layer 5 according to the luminescent layer material, protected portions does not erode, and exposes reflector 6.So far finished the making of isolated groove 2, as Fig. 6 (e).
(G). the lip-deep photoresists of photic zone 4 are removed, and whirl coating is once more in the above used the reticle of electrode 1 and is carried out photoetching then.The metallic film of not protected by photoresist is eroded, remove photoresist at last, left metallic film is top electrode 1, as Fig. 6 (f).
Three, preparation diaphragm
(H). select a kind of opaque photoresist to do the diaphragm material, it is coated in upper surface, make it be filled in isolated groove 2 and cover transparent area 3 and top electrode 1, carry out photoetching, finish the structure fabrication of diaphragm 11, as Fig. 6 (g) with the reticle of diaphragm.
Make protective layer 10 at upper surface, structures such as protection top electrode 1 and diaphragm 11;
Four, isolated groove is made down
(I). remove the protective layer of the metallic film lower surface of substrate 7, after photoresist was got rid of on the metallic film surface, the reticle of isolated groove 8 was carried out photoetching under using, and the metallic film that will do not protected by photoresist with corresponding corrosive liquid erodes, as Fig. 6 (h).
(J). select corresponding corrosive liquid corrosion substrate according to substrate material, the protected portions corrosion does not form isolated groove 8 down, as Fig. 6 (i) to the reflector 6.
Five, bottom electrode preparation
(K). remove the photoresist of the metallic film lower surface of substrate 7,, corrode the metal film of not protected, produce bottom electrode 9, as Fig. 6 (j) by glue with corrosive liquid at lower surface whirl coating and carry out photoetching once more with the bottom electrode reticle.
(L). select suitable method for packing, the design encapsulating structure is made circuit lead, selects the respective material packaged chip for use, finishes element manufacturing.
The present invention has adopted inorganic active illuminating diode chip for backlight unit to prepare micro-display device, and is simple in structure, firm, response is fast; Adopt the inorganic light-emitting diode chip material to prepare micro-display device, it is short and drive current is low and limit the problem of light output intensity to have overcome organic light-emitting device life period, thereby provides a kind of self-luminous, volume is little, low in energy consumption and based on micro-display device of high brightness luminescent chip and preparation method thereof.
Description of drawings:
The vertical view of Fig. 1 micro-display device structure of the present invention.Among the figure, the 1st, top electrode, 3 transparent areas, 11 diaphragms.
The upward view of Fig. 2 micro-display device structure of the present invention.Among the figure, the 7th, substrate, 8 times isolated grooves, 9 bottom electrodes.
Fig. 3 micro-display device manufacturing process of the present invention is finished the front view (along top electrode 1 direction) of G step.Among the figure, the 2nd, last isolated groove 2,4 photic zones, 5 luminescent layers, 6 reflector.
Fig. 4 micro-display device front view of the present invention (along top electrode 1 direction).Among the figure, 10 is protective layer.
The left view of Fig. 5 micro-display device structure of the present invention (along bottom electrode 9 directions).Among the figure, 8 are following isolated groove.
The making flow chart of Fig. 6 micro-display device of the present invention.
Fig. 7 specific embodiments front view (along top electrode 1 direction).Among the figure, 12 is upper limiting layer, and 13 is active layer, and 14 is lower limit layer.
Embodiment:
The luminescence chip that the present invention adopts is for being the high brightness luminescent chip of luminescent layer with AlGaInP, photic zone 4 materials are p-GaP, p-represents acceptor doping, luminescent layer 5 is formed by three layers: upper limiting layer 12, active layer 13, lower limit layer 14, upper limiting layer is the p-AlGaInP material, active layer is the undoped-AlGaInP material, undoped-represents involuntary doping, lower limit layer is the n-AlGaInP material, n-represents donor doping, reflector 6 materials are AlGaAs/GaAs, and substrate 7 is the n-GaAs material, as shown in Figure 7.
The preparation process of above-mentioned micro-display device is as follows:
(A). the two sides at the AlGaInP luminescence chip prepares metallic film, and the preparation method is thermal evaporation, electron beam evaporation, direct current sputtering, magnetron sputtering or radio frequency sputtering.The material of metallic film is Au, Al, Cr etc., and film thickness is 100nm-2000nm, as Fig. 6 (b).
(B). apply layer protective layer on the metallic film of substrate 7, the used material of protective layer is photoresist, silicon dioxide, silicon nitride or other organic materials, and metallic film is not damaged when carrying out other steps.
(C). be coated with the BP-212 positive photoresist on photic zone 4 surfaces, use the reticle of isolated groove 2 and carry out photoetching, make the figure of isolated groove 2.
(D). use the metallic film on the corrosive liquid corrosion photic zone 4, the metal film of not protected by photoresist is eroded, expose photic zone 4, as Fig. 6 (c).The Au film can adopt the mixed solution corrosion of I2 and KI, and the Cr film can adopt sulfuric acid and the corrosion of glycerol mixed solution, and Al thin film corrosive liquid can be selected watery hydrochloric acid for use.
(E). behind the figure that erodes away isolated groove 2 on the metallic film,, erode to luminescent layer 5, as Fig. 6 (d) with SPA or hydrochloric acid hydrogen peroxide mixed liquor corrosion photic zone 4.
(F). forming on the isolated groove 2, continuing to erode to reflector 6, isolated groove 2 is being completed into, as Fig. 6 (e) with acetate hydrogen peroxide hybrid corrosion corrosion luminescent layer.
(G). remove remaining photoresist with acetone.With the photoresist and the etching condition that use in the step (C), the reticle photoetching of using electrode,, prepare top electrode, as Fig. 6 (f) with corrosive liquid and the etching condition in the step (D).
(H). can use thick photoresist when making diaphragm 11, for strengthening its opacity SiO that can mix
2Nano particle is as Fig. 6 (g).
(I). the protective layer with acetone removal substrate 7 metallic film lower surfaces, be coated with the BP-212 positive photoresist at lower surface then, with the reticle photoetching of isolated groove down, erode the metallic film of not protected with corrosive liquid by photoresist.Au erosion liquid can adopt I
2With the mixed solution of KI, the Cr film can adopt sulfuric acid and the corrosion of glycerol mixed solution, and Al thin film corrosive liquid can be selected watery hydrochloric acid for use, as Fig. 6 (h).
(J) the .GaAs substrate material is selected wet etching for use, and corrosive liquid is selected the mixed liquor of aqueous citric acid solution and hydrogen peroxide for use.In this corrosive liquid, not protected GaAs eroded to the reflector 6, promptly form isolated groove 8 down, as Fig. 6 (i).
(K). during preparation bottom electrode 9,, select for use and identical corrosive liquid of step (I) and etching condition, erode away bottom electrode 9, as Fig. 6 (j) with the photoetching of bottom electrode reticle.
(L). pressure welding upper/lower electrode lead-in wire, select for use epoxy resin to do encapsulating material, the envelope shape is finished element manufacturing.
Adopt above-mentioned luminescence chip and technology, can make pixel size is 10～1000 μ m, and isolated groove is that the diaphragm width is 1～200 μ m, and electrode width is the micro-display device of 1～500 μ m.
Claims (8)
1, a kind of AlGaInP-LED micro-display device is characterized in that being made of top electrode (1), photic zone (4), luminescent layer (5), reflector (6), substrate (7), bottom electrode (9), diaphragm (11); Being followed successively by luminescent layer (5), photic zone (4) above the reflector (6), is substrate (7) below reflector (6); Bar shaped top electrode (1) parallel to each other is arranged on photic zone (4), is diaphragm (11) in the last isolated groove (2) that have in luminescent layer (5) and the photic zone (4) vertically, laterally interlocks; Diaphragm (11) is divided into rectangle or square transparent area (3) with top electrode (1) with photic zone (4), and transparent area (3) constitutes two-dimensional array; Have on the substrate (7) below the reflector (6) and the mutually perpendicular isolated groove (8) down of top electrode (1), substrate (7) is divided into the list structure that is arranged in parallel, on the substrate (7) of each list structure, bottom electrode (9) is arranged.
2, AlGaInP-LED micro-display device according to claim 1 is characterized in that transparent area (3) is of a size of 15 * 30 μ m
2, constitute 1000 * 500 two-dimensional arraies.
3, AlGaInP-LED display device according to claim 2, it is characterized in that photic zone (4) material is p-GaP, luminescent layer (5) is formed by three layers: upper limiting layer (12), active layer (13), lower limit layer (14), upper limiting layer is the p-AlGaInP material, active layer is the AlGaInP material of involuntary doping, lower limit layer is the n-AlGaInP material, and reflector (6) material is AlGaAs/GaAs, and substrate (7) material is n-GaAs.
4, AlGaInP-LED micro-display device according to claim 3 is characterized in that diaphragm (11) width is 1～200 μ m, and top electrode (1) width is 1～500 μ m, and pixel size is 10～1000 μ m.
5, AlGaInP-LED micro-display device according to claim 3, it is characterized in that electric current from power on the utmost point (1) inject, flow out from bottom electrode (9), in device, form electric field, make positive negative carrier recombination luminescence in luminescent layer (5); Wherein part light is upward through photic zone (4), penetrates from transparent area (3); Part light arrives reflector (6) downwards, and luminescent layer (5), photic zone (4) are passed in layer (6) reflection that is reflected again, penetrate from transparent area (3).
6, AlGaInP-LED micro-display device according to claim 2 is characterized in that being coated with protective layer (10) on transparent area (3), top electrode (1), diaphragm (11).
7, a kind of manufacture method of AlGaInP-LED micro-display device is characterized in that:
(1) on photic zone and substrate, prepares metallic film
(A) on the luminescence chip that constitutes by photic zone (4), luminescent layer (5), reflector (6) and substrate (7),, go up preparation layer of metal film at photic zone (4) and substrate (7) by evaporation or sputtering technology;
(B) get rid of one deck glue on the metallic film surface of substrate (7) and make protective layer;
(2) isolated groove and preparation top electrode in the formation
(C) on the metal film on photic zone (4) surface, be coated with one deck photoresist, carry out photoetching then, the photoresist figure of isolated groove in the formation;
(D) with corrosion of metals liquid not protected metal film on the photic zone (4) is eroded, expose photic zone (4), begin to take shape isolated groove (2);
(E) on the isolated groove, further corrode photic zone (4) on established, erode to luminescent layer (5) with corrosive liquid;
(F) continue further corrosion luminescent layer (5) with corrosive liquid, corrosion is completed into isolated groove (2) to exposing reflector (6);
(G) photoresist on photic zone (4) surface is removed, whirl coating is once more in the above used the reticle of electrode (1) and is carried out photoetching then; The metal film of not protected by photoresist is eroded, remove photoresist at last, left bullion film is top electrode (1);
(3) preparation diaphragm
(H) select a kind of opaque photoresist to do the diaphragm material, it is coated in upper surface, make it be filled in isolated groove (2) and cover transparent area (3) and top electrode (1), carry out photoetching, finish the structure fabrication of diaphragm (11) with the reticle of diaphragm;
(4) isolated groove is made down
(I) protective layer of the metallic film lower surface on the removal substrate (7), behind the lower surface whirl coating, the reticle of isolated groove is carried out photoetching under using, and the partial corrosion that will do not protected by photoresist with corrosion of metals liquid falls, and begins to take shape down isolated groove (8);
(J) on the following isolated groove that forms, further corrode substrate (7) with corrosive liquid, corrosion is completed into isolated groove (8) to the reflector (6);
(5), bottom electrode preparation
(K) remove the photoresist of the metallic film lower surface on the substrate (7),, corrode the metal film of not protected, produce bottom electrode (9) by glue with corrosive liquid at lower surface whirl coating and carry out photoetching once more with the bottom electrode reticle;
(L) with the method for common packaging, the design encapsulating structure is made circuit lead, finishes element manufacturing.
8, the manufacture method of AlGaInP-LED micro-display device according to claim 7 is characterized in that:
(A) be on the substrate and photic zone of luminescence chip of luminescent layer at AlGaInP, with thermal evaporation, electron beam evaporation, direct current sputtering, magnetron sputtering or RF sputtering method, the preparation material is the metal of Au, Al, Cr etc., and thickness is 100nm-2000nm;
(B) on the metallic film of substrate, apply layer of material such as photoresist, silicon dioxide, silicon nitride or organic material etc. as protective layer;
(C) with corrosive liquid corrosion not during protected metal film, Au thin film corrosive liquid I
2With the mixed solution of KI, Cr thin film corrosive liquid sulfuric acid and glycerol mixed solution, Al thin film corrosive liquid watery hydrochloric acid;
(D) with SPA or hydrochloric acid hydrogen peroxide mixed liquor corrosion photic zone;
(E) with acetate hydrogen peroxide hybrid corrosion corrosion luminescent layer;
(F) remove the BP-212 positive photoresist with acetone;
Can use thick photoresist when (G) making diaphragm, and the SiO that can mix
2Nano particle; Make protective layer on top electrode, transparent area and diaphragm, the material of protective layer is a photoresist;
(H) carry out photoetching with the BP-212 positive photoresist after, use I
2With the mixed solution corrosion Au film of KI, with sulfuric acid and glycerol mixed solution corrosion Cr film, with watery hydrochloric acid corrosion Al film;
(I) the GaAs substrate material is selected wet etching for use, and corrosive liquid is selected the mixed liquor of aqueous citric acid solution and hydrogen peroxide for use.
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