CN101083456B - 制造用于压电谐振器的声反射镜和制造压电谐振器的方法 - Google Patents
制造用于压电谐振器的声反射镜和制造压电谐振器的方法 Download PDFInfo
- Publication number
- CN101083456B CN101083456B CN200710092312XA CN200710092312A CN101083456B CN 101083456 B CN101083456 B CN 101083456B CN 200710092312X A CN200710092312X A CN 200710092312XA CN 200710092312 A CN200710092312 A CN 200710092312A CN 101083456 B CN101083456 B CN 101083456B
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- 238000004519 manufacturing process Methods 0.000 title abstract description 14
- 238000000034 method Methods 0.000 claims description 50
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Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/025—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks comprising an acoustic mirror
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Description
Claims (25)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE200610008721 DE102006008721B4 (de) | 2006-02-24 | 2006-02-24 | Verfahren zur Herstellung eines akustischen Spiegels für einen piezoelektrischen Resonator und Verfahren zur Herstellung eines piezoelektrischen Resonators |
DE102006008721.6 | 2006-02-24 | ||
US11/361840 | 2006-02-24 | ||
US11/361,840 US7694397B2 (en) | 2006-02-24 | 2006-02-24 | Method of manufacturing an acoustic mirror for piezoelectric resonator |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101083456A CN101083456A (zh) | 2007-12-05 |
CN101083456B true CN101083456B (zh) | 2010-10-13 |
Family
ID=38329057
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200710092312XA Expired - Fee Related CN101083456B (zh) | 2006-02-24 | 2007-02-17 | 制造用于压电谐振器的声反射镜和制造压电谐振器的方法 |
Country Status (2)
Country | Link |
---|---|
CN (1) | CN101083456B (zh) |
DE (1) | DE102006008721B4 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8597531B2 (en) | 2009-04-02 | 2013-12-03 | Infineon Technologies Ag | Method for manufacturing a device on a substrate |
KR20170141386A (ko) * | 2016-06-15 | 2017-12-26 | 삼성전기주식회사 | 탄성파 필터 장치 |
CN110168933B (zh) * | 2017-01-05 | 2021-05-18 | 华为技术有限公司 | 布拉格反射镜、谐振器、以及滤波器装置 |
US11437977B2 (en) * | 2018-12-14 | 2022-09-06 | Samsung Electro-Mechanics Co., Ltd. | Bulk-acoustic resonator and elastic wave filter device |
CN111554800B (zh) * | 2020-04-23 | 2022-07-26 | 瑞声声学科技(深圳)有限公司 | 平坦化方法 |
CN111669141B (zh) * | 2020-05-29 | 2021-11-02 | 见闻录(浙江)半导体有限公司 | 一种体声波谐振器的电极结构及制作工艺 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5771555A (en) * | 1993-11-01 | 1998-06-30 | Matsushita Electric Industrial Co., Ltd. | Method for producing an electronic component using direct bonding |
US5821833A (en) * | 1995-12-26 | 1998-10-13 | Tfr Technologies, Inc. | Stacked crystal filter device and method of making |
CN1691498A (zh) * | 2004-04-20 | 2005-11-02 | 株式会社东芝 | 薄膜压电谐振器及其制造方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19947081A1 (de) * | 1999-09-30 | 2001-04-05 | Infineon Technologies Ag | Akustischer Spiegel und Verfahren zu dessen Herstellung |
DE10200741A1 (de) * | 2002-01-11 | 2003-07-24 | Infineon Technologies Ag | Verfahren zur Herstellung einer topologieoptimierten Elektrode für einen Resonator in Dünnfilmtechnologie |
-
2006
- 2006-02-24 DE DE200610008721 patent/DE102006008721B4/de not_active Expired - Fee Related
-
2007
- 2007-02-17 CN CN200710092312XA patent/CN101083456B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5771555A (en) * | 1993-11-01 | 1998-06-30 | Matsushita Electric Industrial Co., Ltd. | Method for producing an electronic component using direct bonding |
US5821833A (en) * | 1995-12-26 | 1998-10-13 | Tfr Technologies, Inc. | Stacked crystal filter device and method of making |
CN1691498A (zh) * | 2004-04-20 | 2005-11-02 | 株式会社东芝 | 薄膜压电谐振器及其制造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE102006008721B4 (de) | 2009-12-24 |
DE102006008721A1 (de) | 2007-09-06 |
CN101083456A (zh) | 2007-12-05 |
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Owner name: KANTERISON CO., LTD. Free format text: FORMER OWNER: AVAGO TECHNOLOGIES WIRELESS IP Effective date: 20120521 |
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