CN101078694A - 用于形成高分辨率图像的系统 - Google Patents
用于形成高分辨率图像的系统 Download PDFInfo
- Publication number
- CN101078694A CN101078694A CNA2007101047043A CN200710104704A CN101078694A CN 101078694 A CN101078694 A CN 101078694A CN A2007101047043 A CNA2007101047043 A CN A2007101047043A CN 200710104704 A CN200710104704 A CN 200710104704A CN 101078694 A CN101078694 A CN 101078694A
- Authority
- CN
- China
- Prior art keywords
- optical channel
- optical
- workpiece
- image
- image collection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 230000003287 optical effect Effects 0.000 claims abstract description 69
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 21
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- 238000005286 illumination Methods 0.000 claims description 20
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/226—Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2446—Position sensitive detectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24578—Spatial variables, e.g. position, distance
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/31749—Focused ion beam
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Microscoopes, Condenser (AREA)
- Sampling And Sample Adjustment (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
Claims (20)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/419,811 | 2006-05-23 | ||
US11/419,811 US7351966B1 (en) | 2006-05-23 | 2006-05-23 | High-resolution optical channel for non-destructive navigation and processing of integrated circuits |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101078694A true CN101078694A (zh) | 2007-11-28 |
CN101078694B CN101078694B (zh) | 2012-02-29 |
Family
ID=38850033
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007101047043A Expired - Fee Related CN101078694B (zh) | 2006-05-23 | 2007-04-24 | 用于形成高分辨率图像的系统 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7351966B1 (zh) |
JP (1) | JP2007316072A (zh) |
CN (1) | CN101078694B (zh) |
TW (1) | TWI406316B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103376269A (zh) * | 2012-04-20 | 2013-10-30 | 雅马哈发动机株式会社 | 印刷电路板的检查装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7961397B2 (en) * | 2008-08-29 | 2011-06-14 | Omniprobe, Inc | Single-channel optical processing system for energetic-beam microscopes |
US8781219B2 (en) | 2008-10-12 | 2014-07-15 | Fei Company | High accuracy beam placement for local area navigation |
CN102246258B (zh) * | 2008-10-12 | 2015-09-02 | Fei公司 | 用于局部区域导航的高精确度射束放置 |
US8054558B2 (en) * | 2009-02-11 | 2011-11-08 | Omniprobe, Inc. | Multiple magnification optical system with single objective lens |
DE102009017693A1 (de) | 2009-04-15 | 2010-05-20 | Innovent E.V. Technologieentwicklung | Verfahren zum Veredeln von Holz |
JP5860044B2 (ja) * | 2010-07-08 | 2016-02-16 | エフ・イ−・アイ・カンパニー | 視覚画像化および赤外画像化を行なう荷電粒子ビーム処理システム |
US8440969B2 (en) | 2010-08-02 | 2013-05-14 | Omniprobe, Inc. | Method and apparatus for acquiring simultaneous and overlapping optical and charged particle beam images |
JP5922125B2 (ja) | 2010-08-31 | 2016-05-24 | エフ・イ−・アイ・カンパニー | 低質量種と高質量種の両方を含むイオン源を使用した誘導および試料処理 |
JP6108684B2 (ja) * | 2011-06-08 | 2017-04-05 | エフ・イ−・アイ・カンパニー | 局所領域ナビゲーション用の高精度ビーム配置 |
CN111442908B (zh) * | 2020-04-23 | 2022-04-12 | 中国建筑材料科学研究总院有限公司 | 检测光纤传像元件的可见光透过率与均匀度的装置及方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55117388A (en) * | 1979-03-05 | 1980-09-09 | Hitachi Ltd | Scanning electronic microscope or its similar device |
US4929041A (en) * | 1989-01-09 | 1990-05-29 | Johnston Pump/General Valve, Inc. | Cathodoluminescence system for use in a scanning electron microscope including means for controlling optical fiber aperture |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
US6373070B1 (en) * | 1999-10-12 | 2002-04-16 | Fei Company | Method apparatus for a coaxial optical microscope with focused ion beam |
US6621275B2 (en) * | 2001-11-28 | 2003-09-16 | Optonics Inc. | Time resolved non-invasive diagnostics system |
EP1630862B1 (en) * | 2003-05-30 | 2016-01-13 | Ebara Corporation | Sample inspection device and method, and device manufacturing method using the sample inspection device and method |
WO2005116577A1 (ja) * | 2004-05-28 | 2005-12-08 | Nikon Corporation | 結像光学系の調整方法、結像装置、位置ずれ検出装置、マ-ク識別装置及びエッジ位置検出装置 |
-
2006
- 2006-05-23 US US11/419,811 patent/US7351966B1/en not_active Expired - Fee Related
-
2007
- 2007-04-24 CN CN2007101047043A patent/CN101078694B/zh not_active Expired - Fee Related
- 2007-05-16 TW TW096117487A patent/TWI406316B/zh not_active IP Right Cessation
- 2007-05-22 JP JP2007135032A patent/JP2007316072A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103376269A (zh) * | 2012-04-20 | 2013-10-30 | 雅马哈发动机株式会社 | 印刷电路板的检查装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2007316072A (ja) | 2007-12-06 |
TWI406316B (zh) | 2013-08-21 |
US7351966B1 (en) | 2008-04-01 |
TW200805419A (en) | 2008-01-16 |
US20080067369A1 (en) | 2008-03-20 |
CN101078694B (zh) | 2012-02-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20171113 Address after: Grand Cayman, Cayman Islands Patentee after: GLOBALFOUNDRIES INC. Address before: American New York Patentee before: Core USA second LLC Effective date of registration: 20171113 Address after: American New York Patentee after: Core USA second LLC Address before: New York grams of Armand Patentee before: International Business Machines Corp. |
|
TR01 | Transfer of patent right | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120229 |
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CF01 | Termination of patent right due to non-payment of annual fee |