CN101011814A - Method and apparatus for processing transparent conductive glass surface by dry ice particle spraying technique - Google Patents

Method and apparatus for processing transparent conductive glass surface by dry ice particle spraying technique Download PDF

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Publication number
CN101011814A
CN101011814A CN 200710048293 CN200710048293A CN101011814A CN 101011814 A CN101011814 A CN 101011814A CN 200710048293 CN200710048293 CN 200710048293 CN 200710048293 A CN200710048293 A CN 200710048293A CN 101011814 A CN101011814 A CN 101011814A
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China
Prior art keywords
carbon dioxide
dry ice
transparent conductive
ice particle
nozzle
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CN 200710048293
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Chinese (zh)
Inventor
李军建
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University of Electronic Science and Technology of China
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University of Electronic Science and Technology of China
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Priority to CN 200710048293 priority Critical patent/CN101011814A/en
Publication of CN101011814A publication Critical patent/CN101011814A/en
Pending legal-status Critical Current

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Abstract

The method of ice particle injection treating transparent electric conductive glass surface uses carbon dioxide ice with radius ranging from several millimeter and 100 millimeter in certain speed, injection angle and distance to spray the transparent glass surface to complete the polishing and cleaning of the transparent electric conductive thin film. It comprises high pressure carbon dioxide gas bottle, air transmission air pipe, gas flow control valve, nozzle connector, nozzle and its angel adjuster, through linkage to connect with the working platform and the gas recovery device. It can improve the surface treatment quality free from water or small quantity of water. It can save water source, reduce the discharge of exhaust water and goods, recover the generated carbon dioxide to reduce contamination to the environment.

Description

Handle the method and the device of transparent conductive glass surface with dry ice particle spraying technique
Technical field
The present invention relates to particularly transparent conducting glass be polished and cleans with dry ice particle spraying technique polishing and cleaning material surface.
Technical background
The finishing method of transparent conducting glass has chemical method and mechanical polishing method at present.Chemical polishing soaks transparent conducting glass with KOH (potassium hydroxide)/isopropyl alcohol saturated solution; Mechanical polishing method fine grained Al 2O 3(aluminium oxide) powder carries out mechanical lapping to the transparent conductive film surface of glass, to reach the purpose that reduces the transparent conductive film surface roughness.
At present the cleaning method of transparent conducting glass has chemical cleaning method, two fluid ablutions, high-pressure injection superfine water ablution, hydrogeneous water cleaning method, million pure water ablutions and plasma clean method etc.
More than several ablutions need consume a large amount of water, and environment is caused severe contamination.
United States Patent (USP) 5765578 relates to particulate dry ice spraying system surface, optical component surfaces soft metal is polished and cleaning.
United States Patent (USP) 6099396 relates to spraying dry ice particle cleaning of objects surface, does not relate to the effect on polishing object surface.
United States Patent (USP) 5766368 relates to spraying microparticles Dry ice cleaning integrated circuit (IC) device.
Japan Patent JP61-15749A discloses and a kind of dry ice particle has been sprayed onto on the cleaning of objects surface as cleaning agent, washes the technology of surface attachments.
Japan Patent JP9-11131A discloses a kind of technology of cleaning with dry ice particle and surfactant.
Several above-mentioned foreign patents all are not used for polishing and cleaning to transparent conductive glass surface.Having also had some patent disclosures, to drive particle diameter with high pressure nitrogen or other gas flows be the dry ice lumps injection material surface of centimetre magnitude, carries out the cleaning surfaces processing, and dry-ice particle is of a size of a centimetre magnitude.And do not relate to the surface polishing action.
Summary of the invention
The objective of the invention is in order to improve cleaning and quality of finish transparent conducting glass, conserve water resource in process, the discharge rate of waste water and refuse in the minimizing processing, thereby the minimizing environmental pollution, the spy provides method and the device of handling transparent conductive glass surface with dry ice particle spraying technique.
The present invention is with the carbon dioxide dry ice microparticle jetting of particle diameter between several microns to 100 microns, be ejected into the body surface that the surface is coated with transparent conductive film with certain speed, certain incidence angle and incident distance, finish polishing and cleaning, particularly, finish polishing and cleaning to transparent conductive film to transparent conductive glass surface.
The formation of the dry ice particle jet among the present invention is to make the high-pressure carbon dioxide gas under the normal temperature pass through a nozzle, and through adiabatic expansion, gas temperature sharply reduces, and reaches the solidification temperature of carbon dioxide, makes it to become the dry ice particle jet.
In order to realize the above-mentioned method that transparent conductive glass surface is handled, the spy processes with following apparatus, this device is through gas transmission pipeline 2 by high-pressure carbon dioxide gas bottle 1, carbon dioxide is delivered to gas flow control valve 3, is transported to nozzle connector 4 and nozzle 5 through gas transmission pipeline 2 again.Nozzle connector 4 is connected with directions X translation stage 8 with connecting rod 7 by nozzle angle adjuster 6, and the directions X translation stage is connected with Y direction translation stage 9.Carrying transparent conducting glass 11 to be processed on the Z direction translation stage 10 forming near being provided with carbon dioxide gas recovery apparatus 13 near the Z direction translation stage 10, is seen accompanying drawing.
Wherein gas flow control valve 3 is flows of regulating carbon dioxide, with the jet velocity of change dry ice particle jet and the particle diameter of dry ice particle, obtains good polishing and cleaning performance.Nozzle 5 is made by heat-insulating material, has specific aerodynamics structure, nozzle angle adjuster 6, the angle 12 that is used to regulate jet-stream wind axis and transparent conductive glass surface.Directions X translation stage 8 and 9 combinations of Y direction translation stage make device obtain the ability that the transparent conductive glass surface with certain area is carried out the large tracts of land polishing and cleans.Z direction translation stage 10 is used to regulate the distance between nozzle 5 and transparent conducting glass to be processed 12 surfaces, and carbon dioxide gas recovery apparatus 13 is to reclaim the carbon dioxide that produces in polishing and the cleaning process.
Advantage of the present invention is polishing and the cleaning that does not need water or just can realize transparent conducting glass with a spot of water, the carbon dioxide that processing produces utilizes gas concentration unit to reclaim, reduce the discharge rate of waste water and refuse significantly, save the water source, reduce pollution environment.
Description of drawings
Accompanying drawing is an apparatus structure schematic diagram of the present invention, wherein:
The 1st, high-pressure carbon dioxide gas bottle 2 is that gas transmission pipeline 3 is that gas flow control valve 4 is that nozzle connector 5 is that nozzle 6 is that nozzle angle adjuster 7 is that connecting rod 8 is that directions X translation stage 9 is that Y direction translation stage 10 is that Z direction balance platform 11 is that transparent conducting glass 12 is the angles between nozzle axis and the transparent conductive glass surface plane.The 13rd, carbon dioxide gas recovery apparatus
The specific embodiment
Among the present invention, the pressure of high-pressure carbon dioxide gas is greater than 6MPa, and the internal orifice dimension of nozzle 5 is less than 0.7mm, and the dry ice particle diameter of generation is less than 100 microns.The dry ice particle jet and by the incident angle between the transparent conducting glass substrate be 30 to 60 the degree, the jet length of dry ice particle is 30 to 100 millimeters.
Operating procedure of the present invention is as follows:
1, will need to polish or clean the glass 11 that is coated with transparent conductive film and place on the Z direction translation stage 10, transparent conductive film faces up, and regulates Z direction translation stage 10 and makes the distance between transparent conductive glass surface and the nozzle 5 meet processing request.
2, regulating directions X translation stage 8 and Y direction translation stage 9 makes nozzle 5 be positioned at the position that begins to process.
3, regulate nozzle angle connector 6, make angle 12 between nozzle axis and transparent conducting glass 11 surface plane meet the requirement of processing.
4, open high-pressure carbon dioxide gas bottle 1, the flow control valve 3 of adjustments of gas makes from the particle diameter and the jet velocity of the dry ice particle of nozzle 5 ejections to reach processing request.
5, the translation stage 9 of the translation stage 8 of continuous mobile directions X and Y direction, polishing or cleaning to the whole working (finishing) areas of transparent conducting glass are finished in the scanning motion that nozzle 5 is carried out on the XY plane.

Claims (3)

1, handles the method for transparent conductive glass surface with dry ice particle spraying technique, it is characterized in that utilizing and have certain speed, the dry ice particle jet of particle diameter between several microns to 100 microns, apart from spraying, finish polishing and cleaning with certain incident angle and incident to transparent conductive film in transparent conductive glass surface.
2, the method for handling transparent conductive glass surface with dry ice particle spraying technique according to claim 1, the formation that it is characterized in that the dry ice particle jet is to make the high-pressure carbon dioxide gas of normal temperature by a nozzle, through adiabatic expansion, gas temperature sharply reduces the solidification temperature that reaches carbon dioxide, makes it to become the dry ice particle jet.
3, handle the device of transparent conductive glass surface method with dry ice particle spraying technique, it is characterized in that through gas transmission pipeline (2) carbon dioxide being delivered to gas flow control valve (3) by high-pressure carbon dioxide gas bottle (1), be transported to nozzle connector (4) and nozzle (5) through gas transmission pipeline (2) again, nozzle connector (4) is connected with directions X translation stage (8) with connecting rod (7) by nozzle angle adjuster (6), the directions X translation stage is connected with Y direction translation stage (9), Z direction translation stage (10) is gone up carrying transparent conducting glass (11) to be processed, is forming near being provided with carbon dioxide gas recovery apparatus (13) near the Z direction balance platform (10).
CN 200710048293 2007-01-19 2007-01-19 Method and apparatus for processing transparent conductive glass surface by dry ice particle spraying technique Pending CN101011814A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200710048293 CN101011814A (en) 2007-01-19 2007-01-19 Method and apparatus for processing transparent conductive glass surface by dry ice particle spraying technique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200710048293 CN101011814A (en) 2007-01-19 2007-01-19 Method and apparatus for processing transparent conductive glass surface by dry ice particle spraying technique

Publications (1)

Publication Number Publication Date
CN101011814A true CN101011814A (en) 2007-08-08

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Cited By (24)

* Cited by examiner, † Cited by third party
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CN102001046A (en) * 2010-10-20 2011-04-06 无锡富岛精工有限公司 Rotary table type automatic sand-blasting machine
CN102120313A (en) * 2010-12-09 2011-07-13 中国科学院光电技术研究所 Method for optimizing removal function of jet polishing material of polished workpiece
CN102335879A (en) * 2011-09-30 2012-02-01 电子科技大学 Dry ice particle spray rinsing device and use method thereof
CN101733708B (en) * 2009-11-26 2012-07-04 深圳光韵达光电科技股份有限公司 Method for processing pore wall of SMT laser template
CN101456164B (en) * 2007-12-14 2012-11-07 深圳市裕鼎精密工业科技有限公司 Fluid jet polishing device
CN101456163B (en) * 2007-12-14 2012-12-26 深圳市裕鼎精密工业科技有限公司 Fluid jet polishing device
CN103009247A (en) * 2007-12-14 2013-04-03 深圳市裕鼎精密工业科技有限公司 Fluid jetting and polishing process
CN104209867A (en) * 2013-08-27 2014-12-17 东旭集团有限公司 Method and system for carrying out surface treatment on glass substrate
CN104492761A (en) * 2014-12-24 2015-04-08 京东方科技集团股份有限公司 Mask cleaning device and cleaning method thereof
CN104853854A (en) * 2012-12-18 2015-08-19 浦项工科大学校产学协力团 Method for removing liquid membrane using high-speed particle beam
CN106863144A (en) * 2017-03-28 2017-06-20 铜仁中能天然气有限公司 The method and its device of a kind of laboratory quick obtaining rock core pillar
CN107876513A (en) * 2017-10-20 2018-04-06 张青竹 A kind of dry ice cleaning method
CN108057687A (en) * 2017-11-17 2018-05-22 深圳市瑞德丰精密制造有限公司 The dry ice debris removal technique of the conductive slice surface metal bits of removal
CN108554936A (en) * 2018-04-08 2018-09-21 苏州珮凯科技有限公司 The regeneration method of the quartzy parts of the E-MAX techniques of 8 cun of wafer thin film manufacture process of semiconductor
CN108772784A (en) * 2018-06-22 2018-11-09 中国石油大学(华东) Recyclable particle spraying derusting device
CN109262469A (en) * 2018-10-30 2019-01-25 华侨大学 A kind of method of dry ice Jet Polishing hard brittle material
CN109333368A (en) * 2018-10-30 2019-02-15 华侨大学 A kind of device based on dry ice Jet Polishing
CN110091256A (en) * 2019-06-12 2019-08-06 上海悦威电子设备有限公司 A kind of liquid carbon dioxide cleaning equipment
CN110465850A (en) * 2019-08-22 2019-11-19 徐州工业职业技术学院 Burr remover is used in a kind of machining
CN110744148A (en) * 2019-11-18 2020-02-04 洪新阳 Gear polishing equipment that polishing precision is high
CN112223611A (en) * 2020-09-22 2021-01-15 南通天木绝缘复合材料有限公司 Finish machining treatment machine for production and manufacturing of glass fiber reinforced plastic grating plate
CN112666340A (en) * 2020-12-01 2021-04-16 台玻悦达汽车玻璃有限公司 Detection device for glass manufacturing and use method thereof
CN112915230A (en) * 2021-01-26 2021-06-08 桂林电子科技大学 Plasma jet device and sterilization method
CN115716245A (en) * 2022-11-24 2023-02-28 北京工业大学 Polishing method for side wall of direct-injection type thin-film lithium niobate ridge waveguide

Cited By (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101456164B (en) * 2007-12-14 2012-11-07 深圳市裕鼎精密工业科技有限公司 Fluid jet polishing device
CN103009247B (en) * 2007-12-14 2015-01-28 深圳市裕鼎精密工业科技有限公司 Fluid jetting and polishing process
CN103009247A (en) * 2007-12-14 2013-04-03 深圳市裕鼎精密工业科技有限公司 Fluid jetting and polishing process
CN101456163B (en) * 2007-12-14 2012-12-26 深圳市裕鼎精密工业科技有限公司 Fluid jet polishing device
CN101733708B (en) * 2009-11-26 2012-07-04 深圳光韵达光电科技股份有限公司 Method for processing pore wall of SMT laser template
CN102001046B (en) * 2010-10-20 2012-11-07 无锡富岛精工有限公司 Rotary table type automatic sand-blasting machine
CN102001046A (en) * 2010-10-20 2011-04-06 无锡富岛精工有限公司 Rotary table type automatic sand-blasting machine
CN102120313B (en) * 2010-12-09 2012-11-21 中国科学院光电技术研究所 Method for optimizing removal function of jet polishing material of polished workpiece
CN102120313A (en) * 2010-12-09 2011-07-13 中国科学院光电技术研究所 Method for optimizing removal function of jet polishing material of polished workpiece
CN102335879A (en) * 2011-09-30 2012-02-01 电子科技大学 Dry ice particle spray rinsing device and use method thereof
CN104853854A (en) * 2012-12-18 2015-08-19 浦项工科大学校产学协力团 Method for removing liquid membrane using high-speed particle beam
CN104853854B (en) * 2012-12-18 2016-08-17 浦项工科大学校产学协力团 Utilize the liquid film minimizing technology of high velocity beam
CN104209867A (en) * 2013-08-27 2014-12-17 东旭集团有限公司 Method and system for carrying out surface treatment on glass substrate
CN104492761A (en) * 2014-12-24 2015-04-08 京东方科技集团股份有限公司 Mask cleaning device and cleaning method thereof
US9636718B2 (en) 2014-12-24 2017-05-02 Boe Technology Group Co., Ltd. Mask cleaning apparatus and mask cleaning method
CN106863144A (en) * 2017-03-28 2017-06-20 铜仁中能天然气有限公司 The method and its device of a kind of laboratory quick obtaining rock core pillar
CN107876513A (en) * 2017-10-20 2018-04-06 张青竹 A kind of dry ice cleaning method
CN108057687A (en) * 2017-11-17 2018-05-22 深圳市瑞德丰精密制造有限公司 The dry ice debris removal technique of the conductive slice surface metal bits of removal
CN108554936A (en) * 2018-04-08 2018-09-21 苏州珮凯科技有限公司 The regeneration method of the quartzy parts of the E-MAX techniques of 8 cun of wafer thin film manufacture process of semiconductor
CN108772784A (en) * 2018-06-22 2018-11-09 中国石油大学(华东) Recyclable particle spraying derusting device
CN108772784B (en) * 2018-06-22 2023-09-19 中国石油大学(华东) Circulated particle sprays rust cleaning device
CN109262469A (en) * 2018-10-30 2019-01-25 华侨大学 A kind of method of dry ice Jet Polishing hard brittle material
CN109333368A (en) * 2018-10-30 2019-02-15 华侨大学 A kind of device based on dry ice Jet Polishing
CN110091256A (en) * 2019-06-12 2019-08-06 上海悦威电子设备有限公司 A kind of liquid carbon dioxide cleaning equipment
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CN110744148A (en) * 2019-11-18 2020-02-04 洪新阳 Gear polishing equipment that polishing precision is high
CN110744148B (en) * 2019-11-18 2021-01-19 浙江丰安齿轮股份有限公司 Gear polishing equipment that polishing precision is high
CN112223611A (en) * 2020-09-22 2021-01-15 南通天木绝缘复合材料有限公司 Finish machining treatment machine for production and manufacturing of glass fiber reinforced plastic grating plate
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CN115716245A (en) * 2022-11-24 2023-02-28 北京工业大学 Polishing method for side wall of direct-injection type thin-film lithium niobate ridge waveguide

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