CN102335879A - Dry ice particle spray rinsing device and use method thereof - Google Patents
Dry ice particle spray rinsing device and use method thereof Download PDFInfo
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- CN102335879A CN102335879A CN2011102931837A CN201110293183A CN102335879A CN 102335879 A CN102335879 A CN 102335879A CN 2011102931837 A CN2011102931837 A CN 2011102931837A CN 201110293183 A CN201110293183 A CN 201110293183A CN 102335879 A CN102335879 A CN 102335879A
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Abstract
The invention discloses a dry ice particle spray rinsing device and a use method thereof. The dry ice particle spray rinsing device comprises a dry ice spray rinsing nozzle and a dry air nozzle, wherein the dry ice spray rinsing nozzle passes through the inside of the dry air nozzle, and the dry air nozzle is provided with a connection hole used to be connected with an external high-pressure dry air source. The use method comprises the following steps of: firstly, connecting the dry ice spray rinsing nozzle with a high-pressure carbon dioxide gas source, and connecting the dry air nozzle with the external high-pressure dry air source; then, regulating the high-pressure dry air source to 1-3 standard atmospheric pressures, outputting one dry air airflow beam, and injecting the dry air airflow beam to the surface of a cleaned object; and finally, cleaning the cleaned object by a dry ice spray rinsing nozzle. In the dry ice particle spray rinsing device, dry air forms a dry air isolation layer, so that steam in the air can not contact the cleaned surface, the phenomenon that steam in the air is condensed on the cleaned surface to form an icing layer can be avoided, the dry ice particle jet flow can be sprayed to the cleaned surface, and cleaning cleanliness and efficiency can be improved.
Description
Technical field
The present invention relates to dry ice particle jet cleaning technical field, relate in particular to a kind of dry ice particle cleaning system and method for using thereof that is used to clean precision optics, electronic unit surface.
Background technology
Dry ice particle jet cleaning technology is mainly used in cleans the accurate optics and the surface of electronic unit; This method utilization particle diameter is at a high speed accomplished the cleaning to surface to be cleaned at the dry ice particle jet of 1-500 micron; Relate to the dry ice particle spraying system like United States Patent (USP) 5765578 soft metal of optical component surfaces is cleaned and polishing; United States Patent (USP) 6099396 relates to spraying dry ice particle cleaning of objects surface, and United States Patent (USP) 5766368 relates to dry ice blasting particulate Dry ice cleaning integrated circuit (IC) device.This cleaning method has can effectively remove the lip-deep inorganic and organic pollution of accurate device, and injured surface does not consume high-quality pure water, has advantages such as high-efficiency environment friendly energy-conservation.
The subject matter that dry ice particle jet cleaning technology exists at present is; When the dry ice particle jet that temperature is very low contacts surface to be cleaned with carbon dioxide gas stream; The temperature of surface to be cleaned can be reduced to below the zero degrees celsius; The steam that contains in the ambient air can freeze at surface to be cleaned, forms a layers of ice.This layers of ice will stop the dry ice particle jet action in lip-deep pollutant, and cleaning performance is descended greatly.
Summary of the invention
To above-mentioned prior art, the technical problem that the present invention will solve provides a kind of dry ice particle cleaning system and method for using of avoiding airborne steam formation layers of ice to stop the continuation of dry ice particle jet that material is cleaned.
In order to solve the problems of the technologies described above; The present invention adopts following technical scheme: a kind of dry ice particle cleaning system; Comprise the dry ice jet nozzle; Also comprise the dry gas nozzle, said dry ice jet nozzle from the dry gas nozzle interior pass and both jet directions consistent, the dry gas nozzle is provided with and is used for the connecting hole that links to each other with the external high pressure dry gas source.
As preferably, said dry ice jet nozzle is connected with high-pressure carbon dioxide cylinder through gas pipeline, and said high-pressure carbon dioxide cylinder is provided with valve.
As preferably, said dry gas nozzle is connected with the high pressure dry gas gas cylinder that dry gas is housed through the dry gas breather line, and high pressure dry gas gas cylinder is provided with the pressure-reducing valve of dry gas cylinder.
As preferably, described dry gas is nitrogen, inert gas or carbon dioxide.
As preferably, the purity of said dry gas is between 99% to 99.9999%.
As preferably, the axis of the axis of said dry gas nozzle and dry ice jet nozzle coincides.
A kind of method for using of dry ice particle cleaning system comprises the steps: at first the dry ice jet nozzle to be connected with the high-pressure carbon dioxide source of the gas, and the dry gas nozzle links to each other with the external high pressure dry gas source; Secondly; The axis and the angle adjustment between the cleaning of objects normal to a surface of distance between dry ice jet nozzle mouth and the cleaning of objects surface and dry ice jet nozzle mouth are arrived certain value; Adjust to 1-3 standard atmospheric pressure to the back pressure of dry gas source; The dry gas jet hole will be exported a branch of dry gas stream, spray to and be cleaned object surfaces; At last, open the high-pressure carbon dioxide gas source valve, produce a branch of dry ice particle jet beam through the dry ice jet nozzle and spray to surface to be cleaned.
As preferably, the axis of said dry gas nozzle axis and dry ice jet nozzle mouth coincides, and and the angle that is cleaned between the body surface normal be 45 degree.
As preferably, said dry ice jet nozzle mouth and the distance that is cleaned body surface are the distance of dry ice jet nozzle axis to intersection point place, cleaning of objects surface; This distance is between 10 ~ 50mm.
Compared with prior art; The present invention has following beneficial effect: through the setting of dry gas nozzle; Can provide the external high pressure dry gas to produce a dry gas separation layer, make airborne steam can not touch the surface in the cleaning, avoid airborne steam to condense in surface to be cleaned and form layers of ice at the body surface that is cleaned that the dry ice particle jet is ejected into; Thereby make the dry ice particle jet can be ejected into the surface that is cleaned, improve the cleanliness factor and the efficient of cleaning.
Description of drawings
Fig. 1 is the structural representation of the embodiment of the invention.
The specific embodiment
To combine the accompanying drawing and the specific embodiment that the present invention is done further description below.
Referring to Fig. 1; A kind of dry ice particle cleaning system; Comprise dry ice jet nozzle 1, high-pressure carbon dioxide cylinder 2, said high-pressure carbon dioxide cylinder 2 is provided with valve 3, and the high-pressure carbon dioxide gas in the high-pressure carbon dioxide cylinder 2 is sent into dry ice jet nozzle 1 through gas pipeline 4; Also comprise dry gas nozzle 6, high pressure dry gas gas cylinder 7, high pressure dry gas gas cylinder 7 be provided with pressure-reducing valve 8; Said dry ice jet nozzle 1 passes from dry gas nozzle 6 inside and both jet directions unanimities; Two gas nozzles are preferably coaxial setting; The dry gas of high pressure dry gas gas cylinder 7 is sent into dry gas nozzle 6 through dry gas breather line 9; Wherein, dry gas breather line 9 is connected with high pressure dry gas gas cylinder 7 through the connecting hole on the dry gas nozzle 6; The dry gas of present embodiment is preferably carbon dioxide, and purity is 99.999%.
In the present embodiment ito glass is given an example as the method for using that the cleaning thing carries out the dry ice particle cleaning system, comprise the steps:
1, adjust to the angle between dry ice jet nozzle 1 axis and ito glass 11 normals to a surface that are cleaned about 45 degree, the distance that intersection point place that dry ice jet nozzle 1 axis and ito glass 11 are surperficial and dry ice jet spray between the 1 mouth mouth is adjusted to the 10-50 millimeter.
2, open the pressure-reducing valve 8 of the high pressure dry gas gas cylinder 7 that the high pressure dry gas is housed; Pressure-reducing valve 8 back pressures are adjusted to 1-3 standard atmospheric pressure; Dry gas nozzle 6 will produce a branch of dry gas stream 10 at this moment, spray to the surface that is cleaned ito glass 11.
3, open the valve 3 of high-pressure carbon dioxide gas bottle 2, dry ice jet nozzle 1 will produce a branch of dry ice particle jet beam 5 at this moment, spray to the surface that is cleaned ito glass 11.
4, ito glass 11 scavenging period that cleans point is 30-60 second.After having cleaned this point, move the position of dry ice jet nozzle 1, or change the position that is cleaned ito glass 11, make dry ice particle jet beam 5 and dry gas stream 10 spray to another point to be cleaned on ito glass 11 surfaces.
5, carry out step 4 repeatedly, till last all points that need clean in ito glass 11 surfaces all are cleaned once.
Claims (9)
1. dry ice particle cleaning system; Comprise the dry ice jet nozzle; It is characterized in that: also comprise the dry gas nozzle; Said dry ice jet nozzle from the dry gas nozzle interior pass and both jet directions consistent, the dry gas nozzle is provided with and is used for the connecting hole that links to each other with the external high pressure dry gas source.
2. a kind of dry ice particle cleaning system according to claim 1 is characterized in that: said dry ice jet nozzle is connected with high-pressure carbon dioxide cylinder through gas pipeline, and said high-pressure carbon dioxide cylinder is provided with valve.
3. a kind of dry ice particle cleaning system according to claim 1 and 2; It is characterized in that: said dry gas nozzle is connected with the high pressure dry gas gas cylinder that dry gas is housed through the dry gas breather line, and high pressure dry gas gas cylinder is provided with the pressure-reducing valve of dry gas cylinder.
4. a kind of dry ice particle cleaning system according to claim 3 is characterized in that: described dry gas is nitrogen, inert gas or carbon dioxide.
5. a kind of dry ice particle cleaning system according to claim 4, it is characterized in that: the purity of said dry gas is between 99% to 99.9999%.
6. a kind of dry ice particle cleaning system according to claim 1 is characterized in that: the axis of the axis of said dry gas nozzle and dry ice jet nozzle coincides.
7. the method for using of the said dry ice particle cleaning system of claim 1 is characterized in that, comprises the steps: at first the dry ice jet nozzle to be connected with the high-pressure carbon dioxide source of the gas, and the dry gas nozzle links to each other with the external high pressure dry gas source; Secondly; The axis and the angle adjustment between the cleaning of objects normal to a surface of distance between dry ice jet nozzle mouth and the cleaning of objects surface and dry ice jet nozzle mouth are arrived certain value; Adjust to 1-3 standard atmospheric pressure to the back pressure of high pressure dry gas source; The dry gas jet hole will be exported a branch of dry gas stream, spray to and be cleaned object surfaces; At last, open the high-pressure carbon dioxide gas source valve, produce a branch of dry ice particle jet beam through the dry ice jet nozzle and spray to surface to be cleaned.
8. according to the method for using of the said dry ice particle cleaning system of claim 7, it is characterized in that: the axis of said dry gas nozzle axis and dry ice jet nozzle mouth coincides, and and to be cleaned angle between the body surface normal be 45 degree.
9. according to the method for using of claim 7 or 8 said dry ice particle cleaning systems, it is characterized in that: said dry ice jet nozzle mouth and the distance that is cleaned body surface are the distance of dry ice jet nozzle axis to intersection point place, cleaning of objects surface; This distance is between 10 ~ 50mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102931837A CN102335879A (en) | 2011-09-30 | 2011-09-30 | Dry ice particle spray rinsing device and use method thereof |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011102931837A CN102335879A (en) | 2011-09-30 | 2011-09-30 | Dry ice particle spray rinsing device and use method thereof |
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| CN102335879A true CN102335879A (en) | 2012-02-01 |
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| CN2011102931837A Pending CN102335879A (en) | 2011-09-30 | 2011-09-30 | Dry ice particle spray rinsing device and use method thereof |
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Cited By (8)
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| CN105765336A (en) * | 2013-11-25 | 2016-07-13 | Geesco有限公司 | Complex cleaning system for heat exchanger |
| CN108393310A (en) * | 2018-03-16 | 2018-08-14 | 山西昌德大成科技有限公司 | The system and its application method of rotary regenerative air preheater are cleaned using dry ice particles |
| CN108573855A (en) * | 2018-04-08 | 2018-09-25 | 苏州珮凯科技有限公司 | The Al/Al of the TD/DRM techniques of 8 cun of wafer thin film manufacture process of semiconductor2O3The regeneration method of part |
| CN108672352A (en) * | 2018-04-08 | 2018-10-19 | 苏州珮凯科技有限公司 | The Ti material parts regeneration methods of the TiN techniques of 8 cun of wafer manufacture thin film manufacture process of semiconductor |
| CN109107997A (en) * | 2018-09-30 | 2019-01-01 | 上海钥熠电子科技有限公司 | The OLED vapor deposition Dry ice cleaning device and its technique of baffle |
| CN109262469A (en) * | 2018-10-30 | 2019-01-25 | 华侨大学 | A kind of method of dry ice Jet Polishing hard brittle material |
| CN110369403A (en) * | 2019-07-15 | 2019-10-25 | 儒众智能科技（苏州）有限公司 | Dry ice cleaning nozzle, dry ice cleaner and anti-secondary pollution dry ice cleaning method |
| CN112893328A (en) * | 2021-01-29 | 2021-06-04 | 厦门大学 | Method for cleaning alkali metal residues and application thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105765336A (en) * | 2013-11-25 | 2016-07-13 | Geesco有限公司 | Complex cleaning system for heat exchanger |
| CN108393310A (en) * | 2018-03-16 | 2018-08-14 | 山西昌德大成科技有限公司 | The system and its application method of rotary regenerative air preheater are cleaned using dry ice particles |
| CN108393310B (en) * | 2018-03-16 | 2020-07-07 | 山西昌德大成科技有限公司 | System for cleaning rotary air preheater by using dry ice particles and using method thereof |
| CN108573855A (en) * | 2018-04-08 | 2018-09-25 | 苏州珮凯科技有限公司 | The Al/Al of the TD/DRM techniques of 8 cun of wafer thin film manufacture process of semiconductor2O3The regeneration method of part |
| CN108672352A (en) * | 2018-04-08 | 2018-10-19 | 苏州珮凯科技有限公司 | The Ti material parts regeneration methods of the TiN techniques of 8 cun of wafer manufacture thin film manufacture process of semiconductor |
| CN108573855B (en) * | 2018-04-08 | 2021-01-01 | 苏州珮凯科技有限公司 | Al/Al of TD/DRM process for semiconductor 8-inch wafer film process2O3Method for regenerating a component |
| CN109107997A (en) * | 2018-09-30 | 2019-01-01 | 上海钥熠电子科技有限公司 | The OLED vapor deposition Dry ice cleaning device and its technique of baffle |
| CN109262469A (en) * | 2018-10-30 | 2019-01-25 | 华侨大学 | A kind of method of dry ice Jet Polishing hard brittle material |
| CN110369403A (en) * | 2019-07-15 | 2019-10-25 | 儒众智能科技（苏州）有限公司 | Dry ice cleaning nozzle, dry ice cleaner and anti-secondary pollution dry ice cleaning method |
| CN110369403B (en) * | 2019-07-15 | 2024-02-13 | 儒众智能科技（苏州）有限公司 | Dry ice cleaning nozzle, dry ice cleaning machine and secondary pollution prevention dry ice cleaning method |
| CN112893328A (en) * | 2021-01-29 | 2021-06-04 | 厦门大学 | Method for cleaning alkali metal residues and application thereof |
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Application publication date: 20120201 |