CN101008547A - Device suitable for roasting a substrate - Google Patents
Device suitable for roasting a substrate Download PDFInfo
- Publication number
- CN101008547A CN101008547A CN 200710006208 CN200710006208A CN101008547A CN 101008547 A CN101008547 A CN 101008547A CN 200710006208 CN200710006208 CN 200710006208 CN 200710006208 A CN200710006208 A CN 200710006208A CN 101008547 A CN101008547 A CN 101008547A
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- gas
- substrate
- heater
- accommodation space
- airflow guidance
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Abstract
The invention provides a device for baking one base plate, comprising a container, a heating device, and a preheating device, wherein, the container has a main body, a cover plate and a sealing device; the main body has an opening, at least one gas inlet and at least one gas outlet; the cover plate covers the opening, to form a containing space with the main body to contain the base plate; the sealing device is between the main body and the opening; the heating device is used to bake the base plate; the preheating device supplies circulated hot gas to the gas inlet, via the surface of base plate to enter into the gas outlet.
Description
[technical field]
The present invention is about a kind of device of baking one substrate; Especially, about a kind of substrate apparatus for baking of removing the photoresistance volatile matter.
[background technology]
In Thin Film Transistor-LCD (thin film transistor liquid crystal display, TFT LCD) and in the leading portion manufacture craft of colored filter (color filter), product is at gold-tinted manufacture craft (photo process) employed photoresistance (photo-resist), after coating (coating), the solvent of glass surface photoresistance (solvent) content is quite high, need insert in the baking oven action of pre-roasting (pre-bake) before exposing.In the pre-roasting heating process, glass surface can produce the organic gas volatile matter of a large amount of solvents and photoresistance, so need baking oven design gas flow system is reduced volatile matter and causes the manufacture craft subsequent affect.
Present design is to be extracted out by the exhaust of baking oven both sides (exhaust) hole, as shown in Figure 1.This substrate apparatus for baking 1 comprises a ccontaining body 11 and a cover plate 13.Ccontaining body 11 defines a chamber (chamber) 15 with cover plate 13.13 of ccontaining body 11 and cover plates have slit 17, in order to suck cold air.The sidewall of ccontaining body 11 has a plurality of steam vents 19, in order to discharge the volatilization gas that mixes with cold air.
Because of the cover plate on the chamber 15 13 there is no sealed, thermally insulated design, so the negative pressure that the slot 17 that cover plate 13 and chamber are 15 will make extraneous cold air produced by exhaust strength influences, to cause thermal shock (thermal shock) to the photoresistance volatilization gas of higher temperatures, produce unfavorable residue, be condensed in the ad-hoc location of substrate, make in the follow-up manufacture craft, the base plate glass surface is this unfavorable photoresistance residue of drippage easily, influences the running of subsequent production board; Also cause exposure bench to produce common defects (common defect); need to shut down cleaning light shield; and cause board need shut down time-based maintenance with pre-maintenance (pre-maintenance; PM) ratio is higher; have a strong impact on production capacity; (be called for short fab, fabrication) environment has to a certain degree influence to the wafer manufacturing simultaneously.
Therefore, for avoiding the thermal shock of cold air, and then make the low glass surface of photoresistance volatile matter residual, influence quality bills of materials because of causing in the negative pressure intake chamber, so industry need a kind ofly can effectively completely cut off cool ambient air, and can get rid of the technology of chamber interior organic volatile gas.
[summary of the invention]
A purpose of the present invention is to be to provide a kind of device.This device is applicable to baking one substrate.This device has comprised a container, a heater and a preheating device.Container has a body, a cover plate and a sealing device.Body has an opening, at least one gas access and at least one gas vent; Cover plate is covered in fact on the opening, defines an accommodation space jointly with ccontaining substrate with body; Sealing device is located between body and cover plate.Heater is in order to toast the substrate in the accommodation space.Preheating device provides a circulation hot gas, from least one gas access, via the surface of substrate, is directed at least one gas vent.
Sealing device of the present invention can completely cut off cool ambient air, and plans suitable gas path, takes undesirable volatilization gas in the chamber out of with clean hot-air, not only can avoid thermal shock and influences quality bills of materials, more can effectively remove organic residue.
After consulting embodiment graphic and that describe subsequently, the technical field of the invention has knows that usually the knowledgeable ought can understand essence spirit of the present invention and other goals of the invention easily, and the technology used in the present invention means and preferred embodiment.
[description of drawings]
Fig. 1 is the schematic diagram of known substrate apparatus for baking;
Fig. 2 is the schematic perspective view of one embodiment of the invention; And
Fig. 3 is that of the present invention other are implemented the schematic perspective view of aspect.
[specific embodiment]
A preferred embodiment of the present invention is to disclose a kind of device that is applicable to baking one substrate as shown in Figure 2, and Fig. 2 is the schematic diagram of embodiment for this reason.Substrate has a surface, and substrate is including (but not limited to) a colored filter (color filter) or at least one wafer.Usually be coated with photoresist on the substrate, this photoresist can contain the diluent with solvent composition.
This device 2 has comprised a container 21, a heater 23, a preheating device 25 and a filter 27.Wherein, substrate 20 is arranged in the container 21.
First airflow guidance device 225 and one second airflow guidance device 227 are divided into the outside of two side 223, first airflow guidance device 225 has an air inlet (figure does not show) and a plurality of little openings (figure does not show), and second airflow guidance device 227 has an outlet port 228 and a plurality of little openings.The air inlet of first airflow guidance device 225 is connected with the recyclegas outlet 253 of preheating device 25, and a plurality of little openings then are connected with gas access 219; In addition, a plurality of little opening of second airflow guidance device 227 is connected with gas vent 221, from the circulation hot gas that gas vent 221 flows in second airflow guidance device 227, then discharges through outlet port 228.Hereat, the little opening number of first airflow guidance device 225 is same as the number of gas access 219, and the little opening number of second airflow guidance device 227 is same as the number of gas vent 221, is preferable selection.The shape of first airflow guidance device 225 and second airflow guidance device 227 is not limit, and in this embodiment, both are all the hollow rectangle body.
The preheating device 25 that this case is alleged can be an independent component, or be one with the element of the existing combination of elements of this case, its main purpose is to receive the thermal source that heater 23 is provided, preparation is with the usefulness of the gas lift temperature in the accommodation space.Shown in figure, preheating device 25 is adjacent in three side areas, below of heater 23, and it has recyclegas inlet 251, one recyclegas outlet 253 and one airflow duct 255.The recyclegas inlet 251 of preheating device 25 and recyclegas outlet 253 lay respectively at two ends of airflow duct 255, recyclegas outlet 253 is communicated with first airflow guidance device 225, ambient atmos self-loopa gas access 251 flows into airflow duct 255, heat conduction by heater 23, to form a circulation hot gas, circulation hot gas causes the cycling hot conductance in the accommodation space 229 of body 211 by recyclegas outlet 253 through first airflow guidance device 225 and these gas accesses 219; The cycling hot air-flow is through the surface of substrate 20, with accommodation space 229 in escaping gas mix mutually, mixed gas can be directed to these gas vents 221, again the amount discharge container 21 via the outlet port 228 of second guiding device 227.The recyclegas that filter 27 is located at preheating device 25 251 places that enter the mouth enter the circulation hot gas of accommodation space 229 in order to filtration, guarantee the cleaning of gas, avoid impurity to enter accommodation space 229 and pollute the environment of making.
Owing to when the cover plate 213 of accommodation space 229 seals with the joint of body 211, just can establish the gas flow scope in the accommodation space 229.When bleeding, to there be negative pressure to form in the accommodation space 229, therefore the present invention in heater 23 (for example hot rolled plate) below in abutting connection with preheating device 25, utilize heater 23 existing temperature that the gas in the airflow duct 255 of preheating device 25 is heated, again circulation hot gas is provided into accommodation space 229; If complement filter device 27 again; in the time of can making exhaust; the circulation hot gas that accommodation space 229 suctions are heated through heater 23; need not other power consumption; and it is extremely clean; also can not make to produce thermal shocks in the accommodation space 229, effectively reduce undesirable volatile matters in the accommodation space 229 concentration, avoid exposure bench to produce common defects, reduce and shut down repair rate, and then promote substrate production quality and speed.
The shape of first airflow guidance device and second airflow guidance device is not exceeded with above-mentioned example, and in the same manner, the airflow duct shape of preheating device also should be not limited.For example, the configuration of first airflow guidance device 31, second airflow guidance device 33 and airflow duct 35 can be designed to form as shown in Figure 3.What is more, the also non-imperative of the setting of first airflow guidance device and second airflow guidance device, if directly the recyclegas outlet of preheating device is connected with the gas access, or circulation hot gas is directly discharged by gas vent, and do not need guiding via second airflow guidance device, also design for selecting.
Element of the above embodiment of the present invention and aspect thereof be the usefulness for illustrating only, and the embodiment that any known techniques person can spread to all can use device of the present invention, to reduce the volatile matter in the accommodation space and to avoid substrate to attach impurity.For example, this device can comprise a plurality of preheating devices, with different forms be arranged at the outer of body or in, enter the thermal shock that wherein causes to lower cool exterior air, and increase the efficient of discharging volatile matter.The above embodiments only are used for exemplifying enforcement aspect of the present invention, and explain technical characterictic of the present invention, are not to be used for limiting category of the present invention.Any be familiar with this technical characterictic person can unlabored change or the arrangement of the isotropism scope that all belongs to the present invention and advocated, interest field of the present invention should be as the criterion with claim.
Claims (15)
1. a device is applicable to baking one substrate, and this device comprises:
One container has;
One body, this body have an opening, at least one gas access and at least one gas vent;
One cover plate is covered in fact on this opening, defines an accommodation space jointly with this body, with ccontaining this substrate;
One sealing device is located between this body and this cover plate;
One heater is in order to toast the substrate in this accommodation space; And
One preheating device forms a circulation hot gas, certainly at least one gas access of this body, via the surface of this substrate, be directed to this at least one gas vent.
2. device according to claim 1 is characterized in that, more comprises a filter, and wherein this preheating device has recyclegas inlet, and this filter is located at the recyclegas porch of this preheating device.
3. device according to claim 1 is characterized in that this heater is located at outside this accommodation space, and this preheating device is in abutting connection with this heater.
4. device according to claim 1 is characterized in that this heater is located at the below of this body, and this preheating device is arranged at a side of this heater, and this preheating device is by this heater heating, so that this circulation hot gas to be provided.
5. device according to claim 1 is characterized in that this heater is located at the below of this body, and this body has a heated portion, and this heater toasts the substrate in this accommodation space by this heated portion.
6. device according to claim 1 is characterized in that this body has two sidewalls, and this at least one gas access is formed at respectively on this two sidewall with this at least one gas vent.
7. device according to claim 1 is characterized in that, this container has one first airflow guidance device, in abutting connection with this at least one gas access.
8. device according to claim 7 is characterized in that, this preheating device has a circulation heat outlet, and this circulation heat outlet is connected in this first airflow guidance device.
9. device according to claim 8 is characterized in that, this container has one second airflow guidance device, in abutting connection with this at least one gas vent.
10. device according to claim 9 is characterized in that, this second airflow guidance device has an outlet port.
11. device according to claim 1 is characterized in that, this container has one first airflow guidance device, in abutting connection with this at least one gas vent.
12. device according to claim 11 is characterized in that, this container has one second airflow guidance device, and this second airflow guidance device is in abutting connection with this at least one gas vent and have an outlet port.
13. device according to claim 1 is characterized in that, the sealing device comprises a sealing.
14. device according to claim 1 is characterized in that, this substrate comprises a colored filter.
15. device according to claim 1 is characterized in that, this substrate has at least one wafer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007100062084A CN101008547B (en) | 2007-01-30 | 2007-01-30 | Device suitable for roasting a substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007100062084A CN101008547B (en) | 2007-01-30 | 2007-01-30 | Device suitable for roasting a substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101008547A true CN101008547A (en) | 2007-08-01 |
| CN101008547B CN101008547B (en) | 2010-04-14 |
Family
ID=38697086
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100062084A Expired - Fee Related CN101008547B (en) | 2007-01-30 | 2007-01-30 | Device suitable for roasting a substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN101008547B (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100538580C (en) * | 2007-09-11 | 2009-09-09 | 陈业宁 | A kind of temperature control box dedicated for electronic element packaging |
| CN104460072A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Substrate baking device |
| CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
| CN105244302A (en) * | 2015-10-28 | 2016-01-13 | 武汉华星光电技术有限公司 | Substrate baking device |
| CN105759572A (en) * | 2016-03-07 | 2016-07-13 | 武汉华星光电技术有限公司 | Air flow direction adjusting system |
| CN105895524A (en) * | 2016-05-17 | 2016-08-24 | 成都京东方光电科技有限公司 | Hot plate heating apparatus and control method |
| CN106154601A (en) * | 2016-07-04 | 2016-11-23 | 武汉华星光电技术有限公司 | Apparatus for baking and method for exhausting thereof |
| CN106783684A (en) * | 2016-12-19 | 2017-05-31 | 惠科股份有限公司 | Substrate toasts board and its baking operational method |
| CN107362953A (en) * | 2017-09-01 | 2017-11-21 | 深圳市华星光电半导体显示技术有限公司 | Photoresistance roasting plant |
| CN107561747A (en) * | 2017-10-12 | 2018-01-09 | 惠科股份有限公司 | The preliminary drying roasting device and prebake conditions system of a kind of display base plate |
| CN108227411A (en) * | 2018-01-18 | 2018-06-29 | 武汉华星光电技术有限公司 | Photoresist prebake conditions cooling system |
| CN111346478A (en) * | 2018-12-21 | 2020-06-30 | 夏泰鑫半导体(青岛)有限公司 | Exhaust module, wafer processing system and method for exhausting waste gas |
| CN113245164A (en) * | 2021-04-02 | 2021-08-13 | 深圳市世宗自动化设备有限公司 | Rapid pressure maintaining heating method and system |
| CN113953297A (en) * | 2021-11-01 | 2022-01-21 | 上海达巧康新材料科技有限公司 | Deep cleaning and renovating device and method for glass surface of photovoltaic module |
Families Citing this family (2)
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| CN103088412B (en) * | 2013-01-29 | 2015-11-18 | 杭州士兰明芯科技有限公司 | The reacting furnace of etching roasting plant |
| CN103088413B (en) * | 2013-01-29 | 2015-11-18 | 杭州士兰明芯科技有限公司 | Etching roasting plant |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000091224A (en) * | 1998-09-09 | 2000-03-31 | Tokyo Electron Ltd | Method and device for heat treatment |
| JP4625601B2 (en) * | 2001-09-28 | 2011-02-02 | 東芝モバイルディスプレイ株式会社 | Manufacturing method of liquid crystal display device |
| JP3950327B2 (en) * | 2001-11-30 | 2007-08-01 | 株式会社日立製作所 | Manufacturing method of liquid crystal display element |
| JP2003222875A (en) * | 2002-01-30 | 2003-08-08 | Toshiba Corp | Method for drying substrate, device therefor, method for manufacturing liquid crystal display element and device therefor |
| JP3853256B2 (en) * | 2002-05-28 | 2006-12-06 | 東京エレクトロン株式会社 | Substrate baking apparatus, substrate baking method, and coating film forming apparatus |
| JP2007003751A (en) * | 2005-06-23 | 2007-01-11 | Sanyo Epson Imaging Devices Corp | Method for manufacturing liquid crystal display element |
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2007
- 2007-01-30 CN CN2007100062084A patent/CN101008547B/en not_active Expired - Fee Related
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100538580C (en) * | 2007-09-11 | 2009-09-09 | 陈业宁 | A kind of temperature control box dedicated for electronic element packaging |
| CN104460072A (en) * | 2014-12-31 | 2015-03-25 | 深圳市华星光电技术有限公司 | Substrate baking device |
| CN104460072B (en) * | 2014-12-31 | 2018-01-05 | 深圳市华星光电技术有限公司 | Substrate apparatus for baking |
| CN105116570A (en) * | 2015-09-15 | 2015-12-02 | 武汉华星光电技术有限公司 | Glass substrate baking device |
| CN105244302A (en) * | 2015-10-28 | 2016-01-13 | 武汉华星光电技术有限公司 | Substrate baking device |
| CN105244302B (en) * | 2015-10-28 | 2018-10-30 | 武汉华星光电技术有限公司 | Substrate apparatus for baking |
| CN105759572A (en) * | 2016-03-07 | 2016-07-13 | 武汉华星光电技术有限公司 | Air flow direction adjusting system |
| CN105759572B (en) * | 2016-03-07 | 2019-11-26 | 武汉华星光电技术有限公司 | Air flow direction adjusts system |
| CN105895524B (en) * | 2016-05-17 | 2018-06-05 | 成都京东方光电科技有限公司 | A kind of hot plate heating unit and control method |
| CN105895524A (en) * | 2016-05-17 | 2016-08-24 | 成都京东方光电科技有限公司 | Hot plate heating apparatus and control method |
| CN106154601B (en) * | 2016-07-04 | 2019-04-30 | 武汉华星光电技术有限公司 | Apparatus for baking and its method for exhausting |
| CN106154601A (en) * | 2016-07-04 | 2016-11-23 | 武汉华星光电技术有限公司 | Apparatus for baking and method for exhausting thereof |
| WO2018113090A1 (en) * | 2016-12-19 | 2018-06-28 | 惠科股份有限公司 | Machine and method for baking substrate |
| CN106783684A (en) * | 2016-12-19 | 2017-05-31 | 惠科股份有限公司 | Substrate toasts board and its baking operational method |
| CN107362953A (en) * | 2017-09-01 | 2017-11-21 | 深圳市华星光电半导体显示技术有限公司 | Photoresistance roasting plant |
| CN107561747A (en) * | 2017-10-12 | 2018-01-09 | 惠科股份有限公司 | The preliminary drying roasting device and prebake conditions system of a kind of display base plate |
| CN108227411A (en) * | 2018-01-18 | 2018-06-29 | 武汉华星光电技术有限公司 | Photoresist prebake conditions cooling system |
| CN111346478A (en) * | 2018-12-21 | 2020-06-30 | 夏泰鑫半导体(青岛)有限公司 | Exhaust module, wafer processing system and method for exhausting waste gas |
| CN113245164A (en) * | 2021-04-02 | 2021-08-13 | 深圳市世宗自动化设备有限公司 | Rapid pressure maintaining heating method and system |
| CN113953297A (en) * | 2021-11-01 | 2022-01-21 | 上海达巧康新材料科技有限公司 | Deep cleaning and renovating device and method for glass surface of photovoltaic module |
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| CN101008547B (en) | 2010-04-14 |
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