CN101000409A - Variable multi-power projection optical system - Google Patents
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- CN101000409A CN101000409A CN 200610148747 CN200610148747A CN101000409A CN 101000409 A CN101000409 A CN 101000409A CN 200610148747 CN200610148747 CN 200610148747 CN 200610148747 A CN200610148747 A CN 200610148747A CN 101000409 A CN101000409 A CN 101000409A
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Abstract
A projection optical system with variable multiplying power is prepared as setting reflection prism set, positive lens set, telescopic lens set and concave-spherical reflector along light axle direction; arranging 200m set with its convex surface faced to concave-spherical reflector between telescopic lens set and said reflector, using a 200m control driving unit to drive said 200m set to move along light axle for realizing regulation of multiplying power.
Description
Technical field
The present invention relates to devices such as semiconductor lithography and photomechanical production, particularly a kind of projection optical system.
Background technology
The projection lithography technology successfully has been used for the submicron resolution integrated circuit and has made the field.In semiconductor packaging, the projection lithography technology is used for fields such as the golden projection/tin projection (bumping), silicon chip level chip scale package (WLCSP) technology of requirement low resolution (as several microns), big depth of focus, higher yields, and constantly proposes to improve the demand that improves performance for the low resolution projection objective system.
Because mask platform and work stage need be carried out step motion, scanning motion, the projection objective system of therefore big operating distance will bring great convenience for the motion positions of mask and silicon chip, transmission structure design etc.Because of present packaging technology, as the projection lithography technology of golden projection technology, the exposure dose of use is very big, can reach 3000mJ/cm usually again
2, even bigger, the consequence that causes like this is exactly that projection objective thermal effect (Lens Heating Effect) is very big, and the multiplying power drift of projection objective causes serious alignment error.Therefore, the actual process situation needs projection objective that the multiplying power adjustment capability is provided, with compensation object lens influence of thermal effect.
As shown in Figure 1, in the patent No. is US 6,879, in 383 the United States Patent (USP), disclose a kind of by 2 reflecting prism S1A, S1B, 3 simple lens L1-L3 (are followed successively by plano-convex lens, bent moon negative lens, bent moon thick lens from left to right, all convex surfaces are towards concave spherical mirror), 1 optical projection system that concave spherical mirror M forms, yet the operating distance that 5 listed most preferred embodiments of this technical scheme can be realized only reaches 7.5mm~11mm, and this operating distance proposes very harsh size restrictions to the design of practical work piece platform design, especially mask platform; The optics length overall of this optical projection system also reaches more than 1150mm~1200mm, even adopt an aspheric surface, also only can increase operating distance to 11mm, compression optics length overall is to 1150mm, and work such as this aspheric introducing also can be processed to optics, optical detection bring very big difficulty; In addition, this patent does not provide image quality yet, does not mention processibility.
Fig. 2 has shown another kind of optical projection system, corresponding application number is 200610028605.7 Chinese patent, though this optical projection system is improved the technical scheme of above-mentioned United States Patent (USP), but its operating distance also only reaches 23mm, and do not possess the multiplying power adjustment capability, so solution that neither be desirable.
Summary of the invention
The object of the present invention is to provide a kind of variable multi-power projection optical system, this system can not only increase the operating distance of projection lens of lithography machine system, for work stage and mask platform provide bigger design space, and the multiplying power drift that can provide multiplying power method of adjustment and device to cause in order to compensation object lens thermal effect, environmental impact etc.
To achieve the above object, the invention provides a kind of variable multi-power projection optical system, comprise along its optical axis direction: a reflecting prism group, by the object space reflecting prism, form as square reflecting prism, all have corresponding incident and exit plane, the object space reflecting prism plane of incidence is towards the object plane of described optical system, as the picture plane of square reflecting prism exit facet towards described optical system; A positive lens groups is made up of a plano-convex lens and a bent moon thick lens; A telephoto lens group is made up of positive lens groups and a double-concave negative lens that a concave-convex lens, biconvex lens are formed; A concave spherical mirror; The convex surface of the plano-convex lens of described positive lens groups and bent moon thick lens is all towards concave spherical mirror, wherein, comprise also between described telephoto lens group and the concave spherical mirror that becomes a doubly group, this becomes a times group is made up of a bent moon thin lens, and its convex surface is towards concave spherical mirror.
Described variable multi-power projection optical system comprises that also becomes a times accessory drive, and it drives described change and doubly organizes along optical axis direction and move, and this becomes times accessory drive and adopts traditional a motor cam mechanism or a Linear Motor Drive Mechanism.
In above-mentioned variable multi-power projection optical system, doubly to organize along optical axis direction when moving when described change away from the direction of concave spherical mirror, the multiplying power of system increases; Doubly organize along optical axis direction when moving near the direction of concave spherical mirror when described change, the multiplying power of system reduces.
In above-mentioned variable multi-power projection optical system, imaging optical path is to constitute folded optical path and imaging by concave spherical mirror.
In above-mentioned variable multi-power projection optical system, the surface type of all optics constituent elements is sphere and plane.
In above-mentioned variable multi-power projection optical system, the bent moon thick lens of described positive lens groups adopts the optical material of high index of refraction and high abbe number.
In above-mentioned variable multi-power projection optical system, the bent moon thin lens that described change is doubly organized is the big little at interval long-focus lens of surface radius.
In above-mentioned variable multi-power projection optical system, the material of the bent moon thin lens that described change is doubly organized is selected the optical material of low-refraction and low abbe number, preferably, can select fused quartz or quartz glass.
In above-mentioned variable multi-power projection optical system, also be provided with an aperture diaphragm with the place of coincidence, concave spherical mirror position, the position that described change is doubly organized is arranged near the concave spherical mirror, promptly is positioned near the aperture diaphragm.
In above-mentioned variable multi-power projection optical system, the reflecting prism except that concave spherical mirror and all its back focuses of combination of lenses mirror group are positioned at described aperture diaphragm center, promptly form the two telecentric beam paths in object space and picture side.
The present invention makes it compared with prior art owing to adopted above-mentioned technical scheme, has following advantage and good effect:
1. its operating distance of variable power projection objective lens optical system of the present invention reaches 31mm, for the design of work stage and mask platform provides bigger size degree of freedom;
2. variable multi-power projection optical system of the present invention, its optics length overall has been reduced to 703mm, has reduced the volume of optical system greatly;
3. variable multi-power projection optical system of the present invention possesses the ability that multiplying power is adjusted, and setting range reaches 136ppm, also can guarantee the image quality of this optical system before and after becoming doubly.
Description of drawings
The concrete structure of variable multi-power projection optical system of the present invention is provided by following embodiment and accompanying drawing.
Fig. 1 is a kind of optical system configuration composition of prior art;
Fig. 2 is the another kind of optical system configuration composition of prior art;
Fig. 3 is the structural drawing of variable multi-power projection optical system of the present invention;
Fig. 4 is the one-piece construction synoptic diagram of litho machine of the present invention system;
Fig. 5 is the partial structurtes synoptic diagram of a multiplying power adjustment embodiment of the present invention;
Fig. 6 is the partial structurtes synoptic diagram of another multiplying power adjustment embodiment of the present invention;
Fig. 7 is that a multiplying power of the present invention is 1 transport function synoptic diagram;
Fig. 8 is the transport function synoptic diagram after a multiplying power of the present invention increases;
Fig. 9 is the transport function synoptic diagram after a multiplying power of the present invention reduces;
Figure 10 is the scale map of exposure field size of the present invention.
Embodiment
Below in conjunction with the drawings and specific embodiments, variable multi-power projection optical system of the present invention is described in more detail.
As shown in Figure 3, variable multi-power projection optical system of the present invention is made up of three parts, and first comprises object space reflecting prism L11, as square reflecting prism L12, plano-convex lens L2 and bent moon thick lens L3; Second portion comprises concave-convex lens L4, biconvex lens L5 and biconcave lens L6; Third part comprises change times constituent element L7 and concave spherical mirror L8.Wherein, the convex surface of the plano-convex lens L2 of first and bent moon thick lens L3 is all towards concave spherical mirror L8, the plane of incidence of the object space reflecting prism L11 of first is the plane, its object plane (mask platform) towards projection optical system, the exit facet of picture side reflecting prism L12 also is the plane, and it is towards the picture plane (work stage) of projection optical system.In addition, third part comprises that also one becomes times accessory drive (figure does not show), moves along optical axis direction in order to drive a change times constituent element L7.
The first of this variable multi-power projection optical system has positive focal power, its lens constituent element adopts the optical material of the different trades mark to make respectively, wherein, bent moon thick lens L3 adopts the optical material of high index of refraction and high abbe number, its effect is to be used on the one hand the aberration of corrective system, is used for the curvature of the image of corrective system on the other hand.The little axial spacing of reservation is the high-order spherical aberration for corrective system in the middle of plano-convex lens L2 and the bent moon thick lens L3.The lens constituent element of entire first portion can be realized the correction of aberration, spherical aberration, astigmatism, the curvature of field.
Second portion constitutes the optical texture of a telephoto lens, and the principal feature of this class optical texture is the length overall that can reduce optical system effectively, the clear aperture of compression optical element, can realize thus long back work distance from.The effect of the negative lens constituent element biconcave lens L6 of second portion, on the one hand be to produce negative spherical aberration and the negative-appearing image that a large amount of positive spherical aberrations is used to compensate front positive lens constituent element to loose, on the other hand because projection objective system of the present invention adopts the wideband light source illumination, if all chromatism of position are all compensated by first, must increase the thickness of lens so, do Compensation Design by the biconcave lens L6 of second portion so the solution of the present invention is a large amount of aberration.
Third part is mainly formed by becoming times constituent element L7 and concave spherical mirror L8, on concave spherical mirror L8, aperture diaphragm is set, form complete symmetrical structure, obtain-1 times optical system, design simultaneously guarantees that the combined focal of first, second portion and change times constituent element L7 is positioned at this aperture diaphragm center, promptly forms the design of two core structures far away.Wherein become the bent moon thin lens that times constituent element L7 adopts long-focus, lens material is selected the optical material of low-refraction and low abbe number, material such as fused quartz or quartz glass for example, and will become a times constituent element L7 and be arranged near the concave spherical mirror L8.Because it is all bigger to become 2 surface radius of times constituent element L7, the aberration contribution of introducing is an a small amount of, and a change times constituent element L7 is positioned near the concave spherical mirror L8, promptly be positioned near the aperture diaphragm, therefore when change times constituent element L7 carries out the position adjustment under the driving of change times accessory drive, the additional aberrations of introducing can be ignored, and both provides the ability of adjusting multiplying power to reach, and does not introduce the purpose of additional aberrations again.
Table 1 has been listed the design data of the variable multi-power projection optical system of the present invention's one specific embodiment, according to the data on one hurdle of thickness in the table 1 as can be known, the operating distance of this variable multi-power projection optical system is 31.227mm, and the optics length overall is 702.723mm (about 703mm).
Below in conjunction with Fig. 4, Fig. 5 and Fig. 6 specify variable multi-power projection optical system when the exposure the multiplying power adjustment and the assurance of image quality.Fig. 4 is the one-piece construction synoptic diagram of variable power projection lithography system of the present invention, this etching system comprises that illuminator 1 forms needed illuminating bundle, light beam projects on the mask 2 that is placed on the mask platform 3, figure on the mask 2 is projected on the gluing silicon chip 5 that is placed on the worktable 6 by variable multi-power projection optical system 4 of the present invention, thereby finished a projection imaging process.When being used to expose, become times constituent element L7 by become times accessory drive 7 along optical axis direction away from or move near the direction of concave spherical mirror L8, adjust the multiplying power drift that multiplying power causes with compensation object lens thermal effect, environmental impact etc.When preferred operation wavelength is 360nm, 365nm and 370nm (be i line near 10nm bandwidth), according to the simulation analysis of professional optical design software CODE_V as can be known, its image quality is: wave aberration (root-mean-square value) is 10.5nm, and transport function MTF as shown in Figure 7.
Referring to Fig. 5, when becoming times constituent element L7 when the driving lower edge optical axis direction that becomes times accessory drive 7 moves 2mm away from concave spherical mirror L8, system's multiplying power can increase 68ppm, and when promptly a change times constituent element L7 was in this position, total enlargement ratio of optical system of the present invention was 1+68ppm.Simulation analysis by optical design software CODE_V as can be known, its image quality is: wave aberration (root-mean-square value) is 15nm, and transport function MTF is as shown in Figure 8.
Referring to Fig. 6, when becoming times constituent element L7 when the driving lower edge optical axis direction that becomes times accessory drive 7 moves 2mm near concave spherical mirror L8, system's multiplying power can reduce 68ppm, and when promptly a change times constituent element L7 was in this position, total enlargement ratio of optical system of the present invention was 1-68ppm.Simulation analysis by optical design software CODE_V as can be known, its image quality is: wave aberration (root-mean-square value) is 15nm, and transport function MTF is as shown in Figure 9.
Requirement of system design according to lithographic equipment, usually the tolerance limit of the wave aberration (root-mean-square value) of projection objective system can arrive 30nm, from above-mentioned design result as can be known, when changing in the scope of system's multiplying power at 1 ± 68ppm, wave aberration can be controlled in the 15nm, than the tolerance for aberration 30nm of projection objective little half, thereby reserved enough surpluses for work such as the optics processing of back, optical alignments.
According to foregoing change times method, when becoming times constituent element when optical axis direction moves, the multiplying power setting range reaches 68+68=136ppm, and image quality is also well guaranteed simultaneously.The numerical aperture maximum reaches 0.18, reaches 70mm (referring to table 1) as square visual field maximum, and the optical resolution of system can reach 0.5 μ m (for the semiperiod length of 1: 1 Periodic Object of dutycycle).
In addition, the surface of all optical elements of variable power projection objective lens optical system of the present invention is sphere or plane, and without any aspheric surface, this mainly is a problem of considering aspects such as optics processing, optical detection and cost, but has very big processed edge.
Referring to Figure 10, the maximum field of view of variable power projection objective lens optical system of the present invention is 70mm, because object plane, image planes are separated by reflecting prism, cause the visual field about near the 17mm of optical axis unavailable, but the field range of object space and picture side is enough to satisfy the chip encapsulation technology requirement that projection (Bumping) encapsulation litho machine is used for 44mm * 44mm exposure field size.
Table 1
Numerical aperture | Visual field, picture side | Operation wavelength | ||||||
0.18 | 70mm | 370nm、365nm、360nm | ||||||
Numbering | Surface type | Surface radius (mm) | Thickness (mm) | | Remarks | |||
0 | The object plane image planes | 31.227 | |
|||||
1 | The plane | 80 | SIO2 | Two reflecting prisms are formed | ||||
2 | The plane | 1.49 | ||||||
3 | Sphere | -2661.01 | 26.94 | FK5 | L2 | |||
4 | Sphere | -204.57 | 0.6 | |||||
5 | Sphere | -199.29 | 62.01 | F2HT | L3 | |||
6 | Sphere | -328.67 | 123.78 | |||||
7 | Sphere | -1983.139 | 31.25 | FK5 | L4 | |||
8 | Sphere | -324.336 | 0.1 | |||||
9 | Sphere | 1068.036 | 20.743 | FK5 | L5 | |||
10 | Sphere | -963.537 | 69.619 | |||||
11 | Sphere | -501.217 | 36.426 | K7HT | L6 | |||
12 | Sphere | 1213.229 | 204.15 | |||||
13 | Sphere | -578.685 | 8.845 | SIO2 | L7 | |||
14 | Sphere | -516.307 | 5.543 | |||||
15 | Sphere | -746.995 | Concave spherical mirror |
Claims (14)
1. variable multi-power projection optical system comprises along its optical axis direction:
A reflecting prism group, by the object space reflecting prism, form as square reflecting prism, all have corresponding incident and exit plane, the object space reflecting prism plane of incidence is towards the object plane of described optical system, as the picture plane of square reflecting prism exit facet towards described optical system;
A positive lens groups is made up of a plano-convex lens and a bent moon thick lens;
A telephoto lens group is made up of positive lens groups and a double-concave negative lens that a concave-convex lens, biconvex lens are formed;
A bent moon thin lens;
A concave spherical mirror;
The convex surface of the plano-convex lens of described positive lens groups and bent moon thick lens is all towards concave spherical mirror, it is characterized in that: comprise also between described telephoto lens group and the concave spherical mirror that becomes a doubly group, this becomes doubly to organize is made up of a bent moon thin lens, and its convex surface is towards concave spherical mirror.
2. variable multi-power projection optical system according to claim 1 is characterized in that: described variable multi-power projection optical system comprises that also becomes a times accessory drive, and it drives described change and doubly organizes along optical axis direction and move.
3. variable multi-power projection optical system according to claim 2 is characterized in that: described change times accessory drive adopts traditional motor cam mechanism or Linear Motor Drive Mechanism.
4. variable multi-power projection optical system according to claim 2 is characterized in that: doubly organize when optical axis direction moves away from concave spherical mirror when described change, the multiplying power of system increases.
5. variable multi-power projection optical system according to claim 2 is characterized in that: doubly organize along optical axis direction near concave spherical mirror when moving when described change, the multiplying power of system reduces.
6. variable multi-power projection optical system according to claim 1 is characterized in that: imaging optical path is to constitute folded optical path and imaging by concave spherical mirror.
7. variable multi-power projection optical system according to claim 1 is characterized in that: the surface type of all optics constituent elements is sphere and plane.
8. variable multi-power projection optical system according to claim 1 is characterized in that: the bent moon thick lens of described positive lens groups adopts the optical material of high index of refraction and high abbe number.
9. variable multi-power projection optical system according to claim 1 is characterized in that: the bent moon thin lens that described change is doubly organized is the big little at interval long-focus lens of surface radius.
10. variable multi-power projection optical system according to claim 1 is characterized in that: the material of the bent moon thin lens that described change is doubly organized is selected the optical material of low-refraction and low abbe number.
11. variable multi-power projection optical system according to claim 10 is characterized in that: the material of the bent moon thin lens that described change is doubly organized is selected fused quartz or quartz glass.
12. variable multi-power projection optical system according to claim 1 is characterized in that: the aperture diaphragm of this system is arranged at concave spherical mirror and overlaps the position.
13. variable multi-power projection optical system according to claim 12 is characterized in that: the position that described change is doubly organized is arranged near the concave spherical mirror, promptly is positioned near the aperture diaphragm.
14. variable multi-power projection optical system according to claim 12 is characterized in that: the reflecting prism except that concave spherical mirror and all its back focuses of combination of lenses mirror group are positioned at described aperture diaphragm center, promptly form the two telecentric beam paths in object space and picture side.
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Cited By (8)
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CN102341738A (en) * | 2009-03-06 | 2012-02-01 | 卡尔蔡司Smt有限责任公司 | Imaging optics and projection exposure installation for microlithography with imaging optics of this type |
CN102645749A (en) * | 2012-04-21 | 2012-08-22 | 张家港鹏博光电科技有限公司 | Magnification regulating method of projection optical system |
CN103345046A (en) * | 2013-06-28 | 2013-10-09 | 中国科学院西安光学精密机械研究所 | Two-gear zoom optical system |
CN103901623A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Heat effect control device used for catadioptric projection objective lens |
CN104238092A (en) * | 2014-10-14 | 2014-12-24 | 中国科学院光电技术研究所 | Projection objective lens for desktop STEPPER photoetching machine |
CN110944162A (en) * | 2018-09-25 | 2020-03-31 | 富士胶片株式会社 | Imaging optical system, projection display device, and imaging device |
CN111031892A (en) * | 2017-08-24 | 2020-04-17 | 卡尔蔡司医疗技术股份公司 | Device for adjusting the magnification level of a zoom driven by an actuator |
CN113848685A (en) * | 2021-09-26 | 2021-12-28 | 上海度宁科技有限公司 | Exposure device and adjusting device suitable for same |
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2006
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102341738A (en) * | 2009-03-06 | 2012-02-01 | 卡尔蔡司Smt有限责任公司 | Imaging optics and projection exposure installation for microlithography with imaging optics of this type |
CN102341738B (en) * | 2009-03-06 | 2015-11-25 | 卡尔蔡司Smt有限责任公司 | Imaging optics and there is the projection exposure for micro-lithography of the type imaging optics |
CN102645749A (en) * | 2012-04-21 | 2012-08-22 | 张家港鹏博光电科技有限公司 | Magnification regulating method of projection optical system |
CN103901623A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Heat effect control device used for catadioptric projection objective lens |
CN103345046A (en) * | 2013-06-28 | 2013-10-09 | 中国科学院西安光学精密机械研究所 | Two-gear zoom optical system |
CN103345046B (en) * | 2013-06-28 | 2015-05-20 | 中国科学院西安光学精密机械研究所 | Two-gear zoom optical system |
CN104238092A (en) * | 2014-10-14 | 2014-12-24 | 中国科学院光电技术研究所 | Projection objective lens for desktop STEPPER photoetching machine |
CN111031892A (en) * | 2017-08-24 | 2020-04-17 | 卡尔蔡司医疗技术股份公司 | Device for adjusting the magnification level of a zoom driven by an actuator |
CN110944162A (en) * | 2018-09-25 | 2020-03-31 | 富士胶片株式会社 | Imaging optical system, projection display device, and imaging device |
CN110944162B (en) * | 2018-09-25 | 2022-12-02 | 富士胶片株式会社 | Imaging optical system, projection display device, and imaging device |
CN113848685A (en) * | 2021-09-26 | 2021-12-28 | 上海度宁科技有限公司 | Exposure device and adjusting device suitable for same |
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