CN103901623A - Heat effect control device used for catadioptric projection objective lens - Google Patents
Heat effect control device used for catadioptric projection objective lens Download PDFInfo
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- CN103901623A CN103901623A CN201210581990.3A CN201210581990A CN103901623A CN 103901623 A CN103901623 A CN 103901623A CN 201210581990 A CN201210581990 A CN 201210581990A CN 103901623 A CN103901623 A CN 103901623A
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- thermal effect
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Abstract
A heat effect control device used for a catadioptric projection objective lens comprises a heat effect correction light beam generation device, a reflector and a light blocking sheet. The numerical aperture of correction light beams emitted by the heat effect correction light beam generation device is consistent with the object space numerical aperture of the projection objective lens. The correction light beams are incident to a first lens of a front group of the projection objective lens; and on the lens, the positions and the shapes of the correction light beams are in symmetric distribution with respect to the X axis with and are not overlapped with the positions and shapes of effective imaging light beams through a mask, so that light energy on the lens is allowed to be in symmetric distribution, the deformation, due to heat effect, of the surface of the lens is also in symmetric distribution, the correction light beams are blocked by the light blocking sheet so as to enable the correction light beams not to be incident to a reflector group of the projection objective lens.
Description
Technical field
The present invention relates to field of lithography, relate in particular to the thermal effect control device for the refraction-reflection projection objective of lithographic equipment.
Background technology
Along with improving constantly of projection objective resolution, also more and more stricter to the requirement of aberration control.General projection objective control aberration mainly relies on adjusts moving element position, and this method can only be controlled low order aberration, for higher order aberratons particularly because the asymmetric formula higher order aberratons that thermal effect causes is helpless.
Article Thermal aberration control for low k1 lithography(Proc. Of SPIE Vol.6520 1-11 in SPIE) in propose one and utilize infrared radiating light to be radiated to treat on prism sheet, to offset due to non-rotating symmetric illumination, as 2 grades of illuminations, the astigmatism of generation.For high NA projection objective, light illumination mode can have the multiple light illumination modes such as tradition, annular, secondary, level Four.The thermal effect situation of every kind of light illumination mode generation is different, and wherein secondary illumination, near light beam centralized lighting pupil in two symmetrical territories, circular cell, will produce thermic astigmatism in image planes like this.Adopt a kind of infrared radiation generation device, produce the symmetrical infrared radiating light of two bundles and be radiated near pupil, direction is vertical with secondary field of illumination, and the field of illumination of pupil location is Rotational Symmetry like this, can effectively proofread and correct the astigmatism of position of focal plane.But this method is only applicable to full refraction type projection objective system, for refraction-reflection projection objective inapplicable.
A kind of refraction-reflection projection objective has been proposed in US Patent No. 20100172019, numerical aperture exceedes 0.85, image space 26*5.5mm, adopting from axle visual field. the hot spot of incident beam on front arrangement of mirrors sheet is only distributed in the first half or the Lower Half of eyeglass, so just cause eyeglass the first half and the latter half energy distribution inequality, be easy to cause the Asymmetrical deformation of lens surface, produce coma in image planes.
For high NA projection objective, the requirement of proofreading and correct for picture element is more and more higher, thermal effect is the major reason that causes that under projection objective duty, picture element changes, if can effectively control thermal effect just can effectively reduce object lens under duty picture element change, and owing to need not adjusting moving element, also save eyeglass and adjusted the time, improved productive rate.But existing thermal effect alignment technique, only for full refraction type projection objective, is proofreaied and correct light beam incoming position near pupil.The face type that incident beam may have influence on follow-up eyeglass distributes.
Summary of the invention
In order to address the above problem, the present invention proposes a kind of thermal effect control device for refraction-reflection projection objective, described thermal effect control device comprises thermal effect correction beam generated device, catoptron and light barrier, the numerical aperture of the correction light beam of thermal effect correction beam generated device outgoing is consistent with projection objective object space numerical aperture, proofread and correct first eyeglass of front group that light beam is incident to projection objective, on this eyeglass, proofread and correct the position of light beam, the position of effective imaging beam of shape and process mask, shape is symmetrical about X-axis, and it is not overlapping mutually, luminous energy on described eyeglass is symmetric, described lens surface is because the deformation that thermal effect produces is also symmetric state, described correction light beam is stopped by light barrier, and be not incident in the catoptron group of projection objective.
Wherein, described thermal effect correction beam generated device comprises light source cell, even smooth unit, TU Trunk Unit.
Wherein, described light source cell comprises light source and condenser group, and described light source comprises luminescence unit and lamp house.
Wherein, described luminescence unit is mercury lamp, xenon lamp or halogen tungsten lamp, and described lamp house is ellipsoidal mirror.
Wherein, the end of described ellipsoidal mirror is a plane mirror.
Wherein, described condenser group is positive light coke mirror group, comprises an attenuator.
Wherein, described even smooth unit is quartz pushrod.
Wherein, the distance between convergent point and the incident end face of quartz pushrod of light beam after described light focusing unit optically focused is less than 8mm.
Wherein, described even smooth unit is the quartz pushrod that incident end face is combined with microlens array.
Wherein, the distance between convergent point and the plane of incidence of microlens array of light beam after described light focusing unit optically focused is less than 5mm.
Wherein, described light source cell comprises tunable laser sources and expands unit, described in expand laser beam unit being sent by LASER Light Source and carry out beam-expanding collimation.
Wherein, described even smooth unit comprises microlens array.
Wherein, described catoptron is rectangle eyeglass.
Wherein, described light barrier is arranged between front group of lens combination and catoptron group of described projection objective.
Wherein, described light barrier, for absorption correction light beam, avoids producing parasitic light.
Light spot shape according to the correction light beam of thermal effect control device of the present invention on front group of the first eyeglass is with identical by be incident on light spot shape on the first eyeglass through mask face, position is about X-axis symmetry, now the luminous energy on the first eyeglass of object lens is symmetric, because group before eyeglass adopts double gauss structure, effective imaging beam and thermal effect correction light beam by mask are symmetric position on same eyeglass, and there is not the phenomenon of juxtaposition, like this on every a slice eyeglass of front group, thermal effect is proofreaied and correct light beam can effectively change the distribution situation of luminous energy on eyeglass, lens surface is because the deformation that thermal effect produces is symmetric state, this just greatly reduces the eyeglass causing owing to throwing light on from the axle visual field eyeglass asymmetry deformation that inequality causes of being heated, reduce focal plane coma, and can not affect the distribution situation of effective imaging beam or introduce parasitic light.
Owing to also having placed a light barrier between first mirror group and catoptron group, stop thermal effect to proofread and correct light beam and incided catoptron rear surface and cause catoptron deformation.
The thermal effect alignment technique that the present invention proposes is for the refraction-reflection projection objective with two catoptrons, and the correction light beam producing by optical devices, is incident on front group, and before only changing, the face type of arrangement of mirrors sheet distributes, and eyeglass below is not affected.
Brief description of the drawings
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Figure 1 shows that the structural representation that thermal effect control device according to the present invention is combined with refraction-reflection projection objective;
Figure 2 shows that the structural representation of thermal effect correction beam generated device according to an embodiment of the present invention;
Figure 3 shows that according to the structural representation of the even smooth unit of another embodiment of the present invention;
Figure 4 shows that the structural representation of proofreading and correct beam generated device according to the thermal effect of another embodiment of the present invention.
Embodiment
Describe specific embodiments of the invention in detail below in conjunction with accompanying drawing.
Figure 1 shows that the structural representation that thermal effect control device according to the present invention is combined with refraction-reflection projection objective 100, wherein refraction-reflection projection objective 100 comprise front group 101, catoptron group 102 and rear group 103, wherein before group be class double gauss structure; Thermal effect control device comprises that thermal effect proofreaies and correct beam generated device 200(containing light source, illuminator), catoptron 300 and light barrier 400, catoptron 300 is for proofreading and correct Beam rotation 90 and spend and incide front group 101 of refraction-reflection projection objective 100 being proofreaied and correct thermal effect that beam generated device 200 produces by thermal effect.
Figure 2 shows that the structural representation of thermal effect correction beam generated device according to an embodiment of the present invention.In the present embodiment, thermal effect is proofreaied and correct beam generated device 200 and is comprised light source 210, condenser group 220, quartz pushrod 230, relay lens group 240 and outlet 250, and wherein condenser group 220, quartz pushrod 230 and relay lens group 240 have formed the illuminator that thermal effect is proofreaied and correct beam generated device.In the present embodiment, light source comprises luminescence unit 211 and lamp house 212, luminescence unit 211 can adopt mercury lamp or xenon lamp or the halogen tungsten lamp with certain energy, lamp house 212 can be an ellipsoidal mirror, preferably its end is a plane mirror, it is the combination that preferred lamp house 212 is plane mirror and ellipsoidal mirror, luminescence unit is positioned in a focus of ellipsoidal reflector, the light sending from luminescence unit, after ellipsoidal reflector and plane mirror, converges in another focus of ellipsoid.Condenser group 220 comprises 4-6 sheet optical mirror slip, for positive light coke mirror group, its role is to the light beam that is focused at ellipsoid position of focal plane to converge at a certain angle the porch of quartz pushrod 230, condenser group 220 preferably includes an attenuator 221, to proofread and correct beam energy by attenuator control thermal effect; Quartz pushrod 230 plays even light action in the present embodiment, the light beam that sees through light focusing unit converges near quartz pushrod entrance, and quartz pushrod entrance is outside light beam convergent point, and its distance is preferably less than 8mm, light beam is multiple reflections in quartz pushrod, can well realize even light effect; Relay lens group 240 comprises 6-12 sheet eyeglass, its role is to incide on catoptron 300 through exporting 250 with certain numerical aperture and shape through the uniform beam of quartz pushrod outgoing.
Catoptron 300 for by proofread and correct from the thermal effect that exports 250 outgoing Beam rotation 90 degree incide refraction-reflection projection objective 100 the first eyeglass of group 101.The numerical aperture of proofreading and correct light beam is consistent with projection objective object space numerical aperture, error is no more than 10%, now the light spot shape on the first eyeglass is with identical by be incident on light spot shape on the first eyeglass through mask face, its position is symmetrical about X-axis (perpendicular to optical axis direction) with the effective imaging beam position through mask, and not overlapping mutually.Adopt class double gauss structure due to front group 101, in the time proofreading and correct light beam successively by front group of each eyeglass, the position on each eyeglass all and the effective imaging beam that passes through mask be also symmetric.
According to another embodiment of the present invention, be with the difference of a upper embodiment, adopt structure 2301 that microlens array 232 as shown in Figure 3 combines with quartz pushrod 231 as even smooth unit, microlens array and quartz pushrod acting in conjunction in this even smooth unit, play better even light effect, wherein microlens array 232 is positioned at quartz pushrod 231 leading portions, its location optimization apart from light beam in light focusing unit post-concentration point 5mm.
According to another embodiment of the present invention, adopt thermal effect as shown in Figure 4 to proofread and correct beam generated device and replaced the thermal effect shown in Fig. 2 to proofread and correct beam generated device.Wherein light source has adopted the adjustable LASER Light Source of luminous energy 501, and illuminator comprises and expands unit 502, even smooth unit 503 and relay lens group 504.Expand unit 502 and comprise 1-3 sheet optical mirror slip, for by the laser beam enlarging heavy caliber being sent by light source 501, and with nearly collimated light outgoing.Even smooth unit 503 can comprise one to two microlens array, is uniformly distributed by the light beam light intensity that expands unit outgoing for making.Relay lens group 504 comprises 6-12 sheet eyeglass, for the uniform beam through even smooth unit is incided to catoptron with certain numerical aperture and shape.
In the present embodiment, catoptron 300 adopts rectangle eyeglass, and diaphragm is positioned near catoptron.Catoptron 300 is proofreaied and correct Beam rotation 90 by the thermal effect by the outgoing of relay lens group and is spent, and incides on the front group of projection objective first eyeglass.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (15)
1. the thermal effect control device for refraction-reflection projection objective, described thermal effect control device comprises thermal effect correction beam generated device, catoptron and light barrier, the numerical aperture of the correction light beam of thermal effect correction beam generated device outgoing is consistent with projection objective object space numerical aperture, proofread and correct first eyeglass of front group that light beam is incident to projection objective, on this eyeglass, proofread and correct the position of light beam, the position of effective imaging beam of shape and process mask, shape is symmetrical about X-axis, and it is not overlapping mutually, luminous energy on described eyeglass is symmetric, described lens surface is because the deformation that thermal effect produces is also symmetric state, described correction light beam is stopped by light barrier, and be not incident in the catoptron group of projection objective.
2. thermal effect control device according to claim 1, wherein, described thermal effect is proofreaied and correct beam generated device and is comprised light source cell, even smooth unit, TU Trunk Unit.
3. thermal effect control device according to claim 2, wherein, described light source cell comprises light source and condenser group, described light source comprises luminescence unit and lamp house.
4. thermal effect control device according to claim 3, wherein, described luminescence unit is mercury lamp, xenon lamp or halogen tungsten lamp, described lamp house is ellipsoidal mirror.
5. thermal effect control device according to claim 4, wherein, the end of described ellipsoidal mirror is a plane mirror.
6. according to the thermal effect control device one of claim 3-5 Suo Shu, wherein, described condenser group is positive light coke mirror group, comprises an attenuator.
7. thermal effect control device according to claim 2, wherein, described even smooth unit is quartz pushrod.
8. thermal effect control device according to claim 7, wherein, the distance between convergent point and the incident end face of quartz pushrod of light beam after described light focusing unit optically focused is less than 8mm.
9. according to the thermal effect control device one of claim 2 or 8 Suo Shu, wherein, described even smooth unit is the quartz pushrod that incident end face is combined with microlens array.
10. thermal effect control device according to claim 9, wherein, the distance between convergent point and the plane of incidence of microlens array of light beam after described light focusing unit optically focused is less than 5mm.
11. thermal effect control device according to claim 2, wherein, described light source cell comprises tunable laser sources and expands unit, described in expand laser beam unit being sent by LASER Light Source and carry out beam-expanding collimation.
12. thermal effect control device according to claim 11, wherein, described even smooth unit comprises microlens array.
13. thermal effect control device according to claim 12, wherein, described catoptron is rectangle eyeglass.
14. thermal effect control device according to claim 1, wherein, described light barrier is arranged between front group of lens combination and catoptron group of described projection objective.
15. according to the thermal effect control device one of claim 1 or 14 Suo Shu, and wherein, described light barrier, for absorption correction light beam, avoids producing parasitic light.
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| CN201210581990.3A CN103901623B (en) | 2012-12-28 | 2012-12-28 | A kind of heat effect for refraction-reflection projection objective controls device |
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| CN201210581990.3A CN103901623B (en) | 2012-12-28 | 2012-12-28 | A kind of heat effect for refraction-reflection projection objective controls device |
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| CN103901623B CN103901623B (en) | 2016-08-24 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807410A (en) * | 2014-12-31 | 2016-07-27 | 上海微电子装备有限公司 | Catadioptric projection objective lens based on high numerical aperture |
| CN107209353A (en) * | 2015-01-23 | 2017-09-26 | 三星电子株式会社 | Mirror-lens system and image capture apparatus |
| CN108345179A (en) * | 2017-01-25 | 2018-07-31 | 上海微电子装备（集团）股份有限公司 | A kind of exposure sources and exposure method |
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| US5493351A (en) * | 1992-11-30 | 1996-02-20 | Sanyo Electric Co., Ltd. | Liquid crystal projector |
| US5636000A (en) * | 1994-06-30 | 1997-06-03 | Nikon Corporation | Projection optical system and projection exposure apparatus using the same |
| US20050136346A1 (en) * | 2003-12-23 | 2005-06-23 | Asml Netherlands B.V. | Optimized correction of wafer thermal deformations in a lithographic process |
| CN101000409A (en) * | 2006-12-30 | 2007-07-18 | 上海微电子装备有限公司 | Variable multi-power projection optical system |
| CN101231378A (en) * | 2007-12-21 | 2008-07-30 | 上海微电子装备有限公司 | Complete refraction type projection optical system |
| CN101290389A (en) * | 2008-05-20 | 2008-10-22 | 上海微电子装备有限公司 | All-refraction type projection optical system |
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2012
- 2012-12-28 CN CN201210581990.3A patent/CN103901623B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US5493351A (en) * | 1992-11-30 | 1996-02-20 | Sanyo Electric Co., Ltd. | Liquid crystal projector |
| US5636000A (en) * | 1994-06-30 | 1997-06-03 | Nikon Corporation | Projection optical system and projection exposure apparatus using the same |
| US20050136346A1 (en) * | 2003-12-23 | 2005-06-23 | Asml Netherlands B.V. | Optimized correction of wafer thermal deformations in a lithographic process |
| CN101000409A (en) * | 2006-12-30 | 2007-07-18 | 上海微电子装备有限公司 | Variable multi-power projection optical system |
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| CN101290389A (en) * | 2008-05-20 | 2008-10-22 | 上海微电子装备有限公司 | All-refraction type projection optical system |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105807410A (en) * | 2014-12-31 | 2016-07-27 | 上海微电子装备有限公司 | Catadioptric projection objective lens based on high numerical aperture |
| CN105807410B (en) * | 2014-12-31 | 2018-11-09 | 上海微电子装备（集团）股份有限公司 | A kind of refraction-reflection projection objective based on high-NA |
| CN107209353A (en) * | 2015-01-23 | 2017-09-26 | 三星电子株式会社 | Mirror-lens system and image capture apparatus |
| CN108345179A (en) * | 2017-01-25 | 2018-07-31 | 上海微电子装备（集团）股份有限公司 | A kind of exposure sources and exposure method |
| CN108345179B (en) * | 2017-01-25 | 2019-08-23 | 上海微电子装备（集团）股份有限公司 | A kind of exposure sources and exposure method |
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| CN103901623B (en) | 2016-08-24 |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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