CN100492175C - Projection optic system - Google Patents

Projection optic system Download PDF

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CN100492175C
CN100492175C CN 200610028605 CN200610028605A CN100492175C CN 100492175 C CN100492175 C CN 100492175C CN 200610028605 CN200610028605 CN 200610028605 CN 200610028605 A CN200610028605 A CN 200610028605A CN 100492175 C CN100492175 C CN 100492175C
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lens
plane
optical system
mirror
projection optical
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CN 200610028605
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Chinese (zh)
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CN1877454A (en
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刘国淦
蔡燕民
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上海微电子装备有限公司
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70225Catadioptric systems, i.e. documents describing optical design aspect details
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/14Optical objectives specially designed for the purposes specified below for use with infra-red or ultra-violet radiation
    • G02B13/143Optical objectives specially designed for the purposes specified below for use with infra-red or ultra-violet radiation for use with ultra-violet radiation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B13/00Optical objectives specially designed for the purposes specified below
    • G02B13/24Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G02B13/26Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
    • G02B17/00Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08Catadioptric systems
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52Details
    • G03B27/522Projection optics

Abstract

一种投影光学系统,其特征在于,所述光学系统包括:一个光轴;一个凹面球面反射镜;一对棱镜,每一个棱镜都具有相应的第一和第二平面,第二平面与第一平正透镜的平面按照与光轴相反的方向紧密接触,而第一平面则分别朝向物方平面和像方平面;一个正透镜组,由一个平凸透镜和一个弯月透镜组成,凸面朝向反射镜;一个望远透镜组,由一个凹凸透镜,一个双凸透镜和一个双凹透镜组成;一个凹面反射镜,凹面朝向物方;本发明可以增加光刻机投影光学系统的工作距离,为工件台和掩模台提供较大的设计空间,另外可以进一步减小设备的体积。 A projection optical system, wherein said optical system comprises: an optical axis; a concave spherical mirror; a pair of prisms, each prism having a respective first and second plane, the second plane and the first Pingzheng plane in intimate contact lens according to a direction opposite to the optical axis, respectively, and the first plane is a plane facing the object side and the image plane side; one positive lens group, a plano-convex lens and a meniscus lens composed of a convex surface directed toward the mirror; a telephoto lens group consists of a convex lens, a biconvex lens and a biconcave lens composition; a concave mirror, a concave surface facing the object side; the present invention can increase the working distance of the projection optical lithography system, the workpiece stage and the mask station provides a larger design space, the volume of additional equipment can be further reduced.

Description

一种投影光学系统 A projection optical system

所属纟支术领域 Si support of ordinary skill in surgery

本发明属于集成电路制造工艺中的光刻技术,特别是关于一种投影光学系统。 The present invention pertains to integrated circuit fabrication process, a photolithography technique, and particularly to a projection optical system.

背景技术 Background technique

随着集成电路的不断发展,晶体管的最小线宽不断缩小。 With the continuous development of integrated circuits, minimum line width of the transistor shrinking. 先进CMOS工艺中晶体管栅极的长度已小于O. 1微米。 The length of the gate of the transistor in advanced CMOS processes have been less than O. 1 micron. 特征线宽的不断缩小导致了芯片集成度的大幅度提高,但也给光学光刻工艺带来了巨大的挑战。 The shrinking feature size has led to substantial increase in chip integration, but it also brings great challenges to the optical lithography process.

为了得到更小的线宽,人们也在尝试采用电子束光刻、X光光刻和离子束光刻等其他光学光刻的替代方法,但因成本、速度以及掩模版制造上的困难, 目前还都难以和光学光刻方法相抗衡,在所有的实际大生产中都仍然采用光学光刻的方法。 In order to obtain a smaller line width, it is also trying to use electron beam lithography, X-ray lithography and ion-beam lithography alternative to other optical lithography, but the costs, speed, and reticle manufacturing difficulties, current and also difficult to compete optical lithography methods, optical lithography methods are still used in all practical large-scale production.

在光学光刻领域,半导体前道工艺由于投影光刻技术的不断进步而按照ITRS(International Technology Roadmap For Semiconductors, 国际半导体4支术发展路线图)的指引不断向更精细线条推进,目前芯片关键尺寸已能达到90nm〜65nm的光刻分辨能力。 In optical lithography, a semiconductor process due to the front-projection lithography technology continues to progress in accordance with the ITRS (International Technology Roadmap For Semiconductors, international semiconductor roadmap surgery 4) is advanced continuously guidelines finer lines, the current chip critical dimension We have been able to achieve the resolving power 90nm~65nm of lithography. 在半导体后道工艺领域,比如硅片级芯片尺度封装、凸块封装工艺,投影光刻技术已经成为产品的主流技术,而且未来更大尺寸硅片的引入将更能体现投影光刻技术的优势。 In the process, after the semiconductor field, such as wafer level chip scale package, the bump encapsulation process, projection lithography technology has become the mainstream technology products, and the future introduction of larger wafers will better reflect the advantages of projection lithography . 用于封装工艺的投影光刻技术,其光学系统需要有微米级的光刻分辨能力、适合厚胶工艺的大焦深,而且其高产率、低成本也是重要的竟争力。 Projection lithography techniques for packaging process, the optical resolution capability of the lithographic systems require micron-thick rubber deep for large focal process, and its high yield, low cost competitiveness is also important.

目前比较经典的投影光学系统设计可以参照美国专利第20040125352号(以下简称352专利),该专利的光学结构示意图可参照图1,图l所示的系统包括凹球面反射镜,系统的孔径光阑位于该反射镜上,它和前面三块密接透镜组成共轴球面系统。 Currently more classic design of the projection optical system can be referred to U.S. Pat. No. 20040125352 (hereinafter referred to as the 352 patent), which patent is a schematic optical structure can be referred to FIG. 1, the system shown in Figure l comprises a concave spherical mirror aperture stop, the system It disposed on the mirror, and it is in close contact lenses in front of three coaxial spherical system. 把孔径光阑设置于球面反射镜的主要好处在于,入射到球面反射镜的光路和反射的光路完全对称,这样垂轴像差,如彗差、畸变和倍率色差为零,另外采用反射镜还节省一半的透镜,可以折叠光路,有利于降低投影系统的成本。 The main benefit of the aperture stop disposed on the spherical mirror that the light path and the path of the reflected light incident on the spherical mirror is fully symmetrical, so that the vertical axis aberrations, such as coma, distortion and chromatic aberration of magnification is zero, additional use of a mirror also saving half of the lens, the light path can be folded, help to reduce the cost of the projection system.

在352专利中,利用反射棱镜A和B将物面和像面分置于投影物镜光轴的两侧,可以为掩模(Reticle)和硅片(wafer)留出安装空间,但是这样把物面和像面分开将导致光学系统中心有30%左右的区域不可用,相当于物方视场中心与像方视场中心到投影物镜光轴有相当大的偏离,这样对于像差校正十分不利。 In the 352 patent, by using the A and B reflecting prism object plane and the image plane of the projection objective on separate sides of the optical axis, the mounting space may be left as a mask (Reticle) and silicon (the wafer), but this was the surface and the image plane of the optical system separately from the center will result in about 30% of the area is not available, the center of the field of view corresponding to the object side and the image center of the field of view in the optical axis of the projection objective has a relatively large deviation, so for very unfavorable aberration correction .

一般光学系统希望有较大的工作距离,由于掩模台和工件台需要进行步进运动、扫描运动,而采用大工作距投影光学系统将为掩模和硅片的运动定位、传输结构设计等带来很大的便利。 The optical system is generally desirable to have a large working distance, since the workpiece stage and the mask stage need stepping motion, the scanning motion, while the use of a large working distance for the projection optical system of the wafer and mask positioning motion transmission structure design great convenience.

另外352专利中的光学总长超过llOOmm,这会给整个投影物镜系统的环境控制(减振设计和温度控制等)造成较大的困难。 352 patent further optical length exceeds llOOmm, which will bring the entire projection objective environmental control system (damping design and temperature control, etc.) caused greater difficulties. 发明内容 SUMMARY

本发明提供一种光学投影系统克服了现有技术的不足,提高了光刻机投影光学系统的工作距离,为工件台和掩模台提供较大的设计空间。 The present invention provides an optical projection system overcomes the deficiencies of the prior art, to improve the working distance of the projection optical lithography system, designed to provide a larger space for the workpiece stage and the mask stage.

为实现该发明目的,本发明提供了一种投影光学系统,其特征在于,所述光学系统包括: 一个光轴; 一个凹面球面反射镜; 一组具有正光焦度的透镜组,与所述凹面球面反射镜间隔一定的距离。 For the purpose of this invention, the present invention provides a projection optical system, wherein said optical system comprises: an optical axis; a concave spherical mirror; a group of lenses having positive refractive power, the concave surface spherical reflector spaced a certain distance. 所述透镜组按照离反射镜从远 The lens group according to far away from the mirror

到近的距离排列,包括: 一对棱镜,每一个棱镜都具有相应的第一和第二平面,两个第一平面则分别朝向物方平面和像方平面; 一个正透镜組,由一个平凸透镜和一个弯月透镜组成,所述平凸透镜的平面与所述棱镜的第二平面紧贴,凸面朝向反射镜; 一个望远透镜组,由一个凹凸透镜, 一个双凸透镜组成的正透镜和一个双凹负透镜组成,并按照离反射镜从远到近的距离排列。 To near distance arrangement, comprising: a pair of prisms, each prism having a respective first and second plane, respectively two first planar plane facing the object side and the image plane side; one positive lens group, consisting of a flat composed of a convex lens and a meniscus lens, a plano-convex lens and a second plane close to the prism, a convex surface facing the mirror; a telephoto lens group consists of a convex lens, a biconvex lens and a positive lens component a biconcave negative lens, and in the arrangement from far to near distance from the mirror. 其中,所述两个反射棱镜产生的像散、畸变、倍率色差用来与后面组元的像差进行匹配设计。 Wherein said two reflecting prism generated astigmatism, distortion, chromatic aberration of magnification for matching the design of the back of the aberration component. 所述弯月透镜采用高折射率和高色散的玻璃。 The meniscus lens glass of a high refractive index and high dispersion. 所述光学系统的所有的光学透镜的表面均为球面。 All surfaces of the optical lens of the optical system are spherical. 所述光学系统的物方与像方均为远心光路。 The optical system on the object side and the image side are telecentric beam path.

本发明的有益效果是:本发明的投影光学系统其光学总长限制在比较小的数值,本发明的投影光学系统的光学长度由现有的1130mm减小到780mm, 另外工作距离由现有技术的7.5mm增加到23mm。 Advantageous effects of the present invention is that: the projection optical system of the present invention is that the overall optical length is limited to a relatively small value, the optical length of the projection optical system of the present invention is reduced by a conventional 780mm to 1130mm, additional working distance from the prior art 7.5mm increased to 23mm.

本发明的这两点优势为凸块(Bumping )光刻机的工件台和掩^t台的结构设计提供了足够的运动预留空间,并且缩小了整个投影光学系统的体积。 These two advantages of the present invention is a bump (Bumping) structural design of the lithography machine workpiece table and mask table ^ t provide sufficient headroom motion and reducing the volume of the entire projection optical system. 由于本发明的光学总长比较小的特点为投影光学系统的环境控制设计提供了便利,并可以降低成本。 It provides a convenient optical length since the present invention is characterized by a relatively small environmental control design of the projection optical system, and the cost can be reduced. 附图说明 BRIEF DESCRIPTION

图l是现有的光学系统结构示意图; 图2是本发明的一个实施例的光学系统结构图; 图3是本发明的另一个实施例的光学系统结构图; 图4是本发明的光刻系统的整体结构示意图。 Figure l is a schematic view of a conventional optical system; FIG. 2 of the present invention is a configuration diagram of an optical system of the embodiment; FIG. 3 is an optical system structural view of another embodiment of the present invention; FIG. 4 is a lithography of the present invention a schematic view of the overall configuration of the system. 具体实施方式下面结合附图和具体实施例,对本发明作更为详细的解释: DETAILED DESCRIPTION The following embodiments in conjunction with the accompanying drawings and specific embodiments, the present invention will be explained in more detail:

本发明涉及一种基于Wynne-Dyson结构的光学系统,其特征在于在传纟克Wynne-Dyson光学系统的基础上,插入另夕|、一个正负焦距的望远透镜组,用来减小整个光学系统的长度和增加光学系统的工作距离。 The present invention relates to an optical system based on the structure of Wynne-Dyson, characterized in that the transmission on the basis of Si g of Wynne-Dyson optical system, the other insertion Xi |, a negative focal length telephoto lens group, to reduce the overall and increasing the length of the optical system of the optical system of the working distance.

本发明采用放大倍率为-1的完全对称的光学设计,轴向像差可以完全4氐消,主要采用凹面反射镜和一个正光焦度的镜组组成,凹面镜产生的正场曲可以抵消前面正透镜组产生的负场曲;反射镜使成像光路两次经过正透镜组光学元件,这样光学元件就会两次参与成像,相当于光学元件的数量减少了一倍,可以减小系统总的光学元件数和系统总的光学长度。 The present invention uses a fully symmetrical magnification optical design -1, 4 Di axial aberration can completely eliminate, mainly concave reflector and a positive power lens group, and positive curvature of field in front of the concave mirror can be offset generated negative curvature of field generated by the positive lens group; mirrors of the imaging optical path via two positive lens group of the optical element, so that the two will be involved in the imaging optical element, corresponding to the number of optical elements with less than half, of the overall system can be reduced the total number of optical elements and the optical length of the system.

首先请参阅图2,图2是本发明的一个实施例的光学系统结构图。 Referring first to FIG. 2, FIG. 2 is an optical system structural view of one embodiment of the present invention. 图2的实施例是一个物像面合一的光学系统,即其物面和像面重合在同一平面上, 图2中的第一透镜组元L1设计为一个平板,在该平板后具有两个正透镜组元, 即正透镜组元L2和弯月透镜组元L3,构成第一部分。 FIG Example 2 is a composition image plane of the optical system of the unity, i.e., it coincides with the object plane and the image plane on the same plane, in FIG. 2 of the first lens group L1 designed as a plate element, after the plate has two a positive lens component, i.e., a positive lens component L2 and a meniscus lens component L3, constituting the first portion. 第二部分望远透镜组由沿光路顺次由两块正透镜组元,正透镜组元L4和正透镜组元L5 ,以及一块负透镜组元L6构成。 A second portion of a telephoto lens group sequentially along the light path from the two positive lens component, a positive lens component L4 and L5 of the positive lens component, and a negative lens L6 constituting component. 第三部分是一块凹面反射镜L7。 The third part is a concave mirror L7.

为了能用于投影光刻机,需要将物面和像面分开一定的距离,以便为掩模和硅片的定位、测量、传输等操作预留足够的空间。 To be able to projection lithography, object plane and the image plane need to be separated by a certain distance, in order to allow sufficient space for positioning the mask and the wafer, the measurement and transmission operations. 为了解决这个问题, 本发明给出了一个如图3所示的实施例,在该实施例中将本投影光学系统的第一个透镜组元L1分成两个直角反射棱镜,即反射棱镜Lll和反射棱镜L12, 这样就可以将物面和像面完全分开而置于投影物镜光轴的两侧,两个反射棱镜产生的像散、畸变、倍率色差用来与后面组元的像差进行匹配设计。 To solve this problem, the present invention gives a shown in FIG. 3 embodiment, the first lens group in the embodiment according to the present embodiment of the projection optical system of this element L1 is divided into two right-angle reflecting prism, i.e., a reflecting prism and Lll reflecting prism L12, so that the object can be completely separated from the surface and the image plane of the projection objective and placed on both sides of the optical axis, astigmatism generated by two reflecting prism, distortion, chromatic aberration of magnification for matching the aberration component of the back design. 正透镜组元L2和反射棱镜相邻面设计成平面,这样做是为了方便与两块反射棱镜Lll、 L12的光学装校。 A positive lens component L2 and the adjacent planar surface of the reflecting prism is designed to do so is to facilitate the two reflecting prism Lll, L12 of the correction optical device. 传统的Wynne-Dyson结构光学系统的工作距离比较短, 一般在10mm之内,而且第一部分的正透镜组元L2、 L3和凹面反射镜L7之间的距离比较大(如352专利中,该距离在850mm以上),造成光学系统体积比较大。 Working distance conventional Wynne-Dyson optical system structure is relatively short, typically within 10mm of, the positive lens group and the first portion of the element L2, L7 L3 and a distance between the concave mirror is relatively large (e.g., 352 patent, the distance in the above 850mm), resulting in a relatively large volume of the optical system. 因;t匕, 本发明针对这两点不足之处,对Wynne-Dyson结构进行修改设计,使之成为可以用于封装(Bumping)投影光刻机的投影光学系统。 Result; T dagger, the present invention is directed to these two shortcomings, the structure of the Wynne-Dyson modify the design, making the projection optical system may be used for encapsulation (Bumping) projection lithography machine. 改进方案是:在第一部分和凹面反射镜L7之间增加第二部分透镜组元,对整个光学系统进行优化设计。 It is refinement: adding a second portion of the lens between the first portion and the concave reflector L7 component of the entire optical system to optimize the design. 即本发明的投影光学系统由三部分组成,第一部分由正透镜组元L2、 弯月透镜组元L3 、两个反射棱镜L11 、 L12组成,第二部分由正透镜组元L4、 正透镜组元L5、负透镜组元L6组成,凹面反射镜L7是第三部分。 I.e., the projection optical system of the present invention consists of three parts, a first part of the positive lens component L2, a meniscus lens component L3, two reflecting prism L11, L12 composition, a second component part of the positive lens L4, the positive lens group L5 of element, a negative lens component consisting of L6, L7 is the third concave mirror portion.

第一部分有正的光焦度,分别采用不同牌号的光学材料,弯月透镜组元L3采用高折射率和高色散的玻璃,其作用是一方面用来校正系统的色差,另一方面用来校正系统的像面弯曲。 A first portion having positive refractive power, using different grades of optical materials, a meniscus lens component L3 glass a high refractive index and high dispersion, the chromatic aberration correction effect is on the one hand to the system, on the other hand to the curvature correction system. 正透镜组元L2和弯月透镜组元L3中间保留小的轴向间距是为了减小系统的高级球差,整个第一部分的透镜组元可以实现色差、球差、像散、场曲的校正。 A positive lens component L2 and the intermediate meniscus lens component L3 retain small axial spacing is advanced to reduce the spherical aberration of the system, the entire first portion of the lens component can be achieved chromatic aberration, spherical aberration, astigmatism, field curvature correction .

第二部分主要由正透镜组合和负透镜组元L6组成,它构成一个望远透镜的光学结构,这类光学结构的主要特点是有效的减小光学系统的总长,压缩光学元件的通光口径,由此可以实现较长的后工作距离。 The second part is a combination of a positive lens element and a negative lens group consisting of L6, which forms a structure of the optical telephoto lens, the main features of such optical structures is effective to reduce the overall length of the optical system, the compression of the clear aperture of the optical element , which can be achieved after a long working distance.

第二部分的负透镜组元L6的作用, 一方面产生大量的正球差用于补偿前面正透镜组元的负球差和负像散,另一方面由于本发明的投影物镜系统采用宽带光源照明,如果所有的位置色差都由第一部分来补偿,那么必然增加透镜的厚度,所以本发明的方案是大量的色差由第二部分的负透镜组元L6做补偿设计。 Effect of the negative lens element L6 of the second portion of the group of, on the one hand a large amount of positive spherical aberration and negative spherical aberration for a negative front lens compensating the positive astigmatism component, on the other hand due to the projection lens system according to the present invention uses a broadband light source lighting, if all positions by the first portion to compensate for chromatic aberration, it will increase the thickness of the lens, the embodiment of the present invention is a large group of chromatic aberration by the negative lens element L6 of the second portion to make compensation design.

第二部分的正透镜组合分解成两片正透镜组成,使得一个大光焦度的正透镜变成由两个较小光焦度的正透镜组成,这样做主要是为了增大透镜折射面的半径,以便减少高级像差的贡献。 The second positive lens portion is decomposed into a combination of two positive lens, a positive lens such that a large refractive power of the positive lens becomes smaller optical power of two compositions, this is mainly to increase the refractive surface of the lens radius, in order to reduce the contribution of advanced aberration. 由于第二组透镜的引入,使得光线入射高度降低,从而减小后面凹面反射镜的口径,为降低成本、加工、装校等带来便利。 Since the introduction of the second lens group, so that the light incident height reduced, thereby reducing the diameter of the rear of the concave mirror, to reduce costs, processing, and other correction means convenience.

下表一为本发明的投影光学系统的典型设计数据 Typical design data of the projection optical system of the present invention, a table

<table>table see original document page 8</column></row> <table><table>table see original document page 9</column></row> <table> <Table> table see original document page 8 </ column> </ row> <table> <table> table see original document page 9 </ column> </ row> <table>

本发明的投影物镜系统所有光学元件的表面为球面或平面,没有非球面, 这主要是考虑加工与成本等方面的问题。 All surfaces of the optical elements of the projection lens system according to the present invention is a spherical surface or a plane, no aspherical surface, mainly considerations concerning processing and cost.

请参阅图4,图4是本发明的光刻系统的整体结构示意图。 Please refer to FIG. 4, FIG. 4 is an overall schematic structural diagram of a lithography system according to the invention. 结合图2和图4可以发现本发明中物像的位置关系,以及本发明的作用机理。 In conjunction with FIGS. 2 and 4 can be found in the positional relationship of the object image in the present invention, and the mechanism of the present invention. 图4中的光刻系统包括照明系统1产生光线,光线投射到放置在掩模台3上的掩模2上, 将掩模2上的图形通过本发明的投影光学系统4投射到放置在工作台6上的硅片5上,从而完成了一个曝光投影过程。 FIG lithography system 4 includes an illumination system 1 generates light, the light projected onto a mask placed on the mask stage 2 on 3, 2 on the mask pattern through the projection optical system 4 is projected to the present invention is placed on a 5 on the silicon wafer table 6, thereby completing a projection exposure process.

本发明的投影物镜系统的数值孔径最大达到0.18,像方视场最大达到70mm,系统的最高光学分辨率能达到0.5jam (对于1:1周期性物体的半周期长度)。 The numerical aperture of the projection lens system of the present invention, the maximum 0.18, reaches a maximum image field of view in 70mm, maximum resolution of the optical system can be achieved 0.5jam (for 1: 1 half cycle of the periodic length of the object).

本发明的投影物镜系统的最大视场为70mm,由于物面、像面是通过反射棱镜分开的,导致光轴附近15mm左右的视场不可用,但是物方和像方的视场范围足以满足凸块光刻机用于44mm x 44mm尺寸芯片封装的技术要求。 The maximum field of view of the projection lens system of the present invention is 70mm, since the object plane, the image plane is reflected by the prism separated, resulting in a field of view of about 15mm is not available near the optical axis, but the field of view on the object side and the image side sufficient projection lithography for the technical requirements of the size 44mm x 44mm chip package.

以上介绍的仅仅是基于本发明的几个较佳实施例,并不能以此来限定本发明的范围。 Described above are merely based on several preferred embodiments of the present invention, and are not intended to limit the scope of the present invention. 任何对本发明的方法作本技术领域内熟知的步骤的替换、组合、 分立,以及对本发明实施步骤作本技术领域内熟知的等同改变或替换均不超出本发明的揭露以及保护范围。 Any replacement of the step of the method of the present invention will be well known in the art, combinations, discrete, and embodiments of the present invention, the step for changed or replaced equivalents well known in the art without departing the scope of the present disclosure and invention.

Claims (6)

1、一种投影光学系统,其特征在于,所述光学系统包括:一个光轴;一个凹面球面反射镜;一组具有正光焦度的透镜组,与所述凹面球面反射镜间隔一定的距离;按照离反射镜从远到近的距离排列,其特征在于该透镜组包括:一对棱镜,每一个棱镜都具有相应的第一和第二平面,两个第一平面则分别朝向物方平面和像方平面;一个正透镜组,由一个平凸透镜和一个弯月透镜组成,所述平凸透镜的平面与所述棱镜的第二平面紧贴,凸面朝向反射镜;一个望远透镜组,由一个凹凸透镜,一个双凸透镜组成的正透镜和一个双凹负透镜组成,并按照离反射镜从远到近的距离排列。 1, a projection optical system, wherein said optical system comprises: an optical axis; a concave spherical mirror; a group of lenses having positive refractive power, the concave spherical mirror with a certain distance; mirror according away from far to near distances arrangement, wherein the lens group comprises: a pair of prisms, each prism having a respective first and second plane, respectively two first plane and the plane facing the object side the image plane side; a positive lens group composed of a plano-convex lens and a meniscus lens composed of a convex lens and a plane of the flat plane of the second prism in close contact, the convex surface facing the mirror; a telephoto lens group by a meniscus lens, a positive lens of one pair of convex lens and a double concave negative lens, and in the arrangement from far to near distance from the mirror.
2、 根据权利要求1所述的投影光学系统,其特征在于:系统物方光路和像方光路是通过同一组的透镜组成像。 2, the projection optical system according to claim 1, wherein: the optical path of the system object side and the image side is an optical path through the lens of imaging the same group.
3、 根据权利要求1所述的投影光学系统,其特征在于:系统的物方和像方平面通过所述的一对棱镜分开。 3. The projection optical system according to claim 1, wherein: the object side and the image plane side of the system are separated by a pair of prisms.
4、 根据权利要求l所述的投影光学系统,其特征在于:所述弯月透镜采用高折射率和高色散的玻璃。 4. The projection optical system according to claim l, wherein: the glass meniscus lens having a high refractive index and high dispersion.
5、 根据权利要求1所述的投影光学系统,其特征在于:所述光学系统的的所有光学透镜的表面均为球面。 5. The projection optical system as claimed in claim 1, wherein: the optical system of the optical lens surfaces of all are spherical.
6、 根据权利要求1所述的投影光学系统,其特征在于:所述光学系统采用望远透镜组缩'J、系统的总长。 6. The projection optical system according to claim 1, wherein: said optical system employs a telephoto lens group shrink 'J, the overall length of the system.
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US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
DE602005003665T2 (en) 2004-05-17 2008-11-20 Carl Zeiss Smt Ag Catadioptric projection objective with between images
CN101290389B (en) 2008-05-20 2010-06-23 上海微电子装备有限公司 All-refraction type projection optical system
CN104570610B (en) * 2013-10-11 2017-02-15 上海微电子装备有限公司 Projection exposure apparatus
CN103984209B (en) * 2014-04-04 2016-08-17 中国科学院上海光学精密机械研究所 Catadioptric lithographic illumination relay lens group
US9436103B2 (en) 2014-05-19 2016-09-06 Ultratech, Inc. Wynne-Dyson projection lens with reduced susceptibility to UV damage

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1573405A (en) 2003-05-30 2005-02-02 株式会社Orc制作所 Optical projection system

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2350281C2 (en) * 1973-10-06 1982-04-01 Fa. Carl Zeiss, 7920 Heidenheim, De
JPS6021016A (en) * 1983-07-15 1985-02-02 Nitto Kogaku Kk Objective lens for optical disk
JP3448663B2 (en) * 1994-05-13 2003-09-22 株式会社ニコン Projection exposure apparatus
JPH08211294A (en) * 1995-02-02 1996-08-20 Nikon Corp Projection exposing device
JP4311905B2 (en) * 2002-02-05 2009-08-12 オリンパス株式会社 Optical system
US6879383B2 (en) * 2002-12-27 2005-04-12 Ultratech, Inc. Large-field unit-magnification projection system
US6995833B2 (en) * 2003-05-23 2006-02-07 Canon Kabushiki Kaisha Projection optical system, exposure apparatus, and device manufacturing method
US6943958B2 (en) * 2003-08-20 2005-09-13 Olympus Corporation Zoom lens system and camera using the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1573405A (en) 2003-05-30 2005-02-02 株式会社Orc制作所 Optical projection system

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