JPH06331932A - Projection optical device - Google Patents

Abstract

PURPOSE:To correct the projection power with simple constitution through easy operation by arranging an afocal power correction optical system consisting of plural lenses between a projection optical system and a negative and between the projection optical system and a substrate, and relatively changing the positions of the lenses and varying the projection power. CONSTITUTION:The power correction optical system 24 consists of the concave cylinder lens 40 and convex cylinder lens 42. The power is adjusted by moving the concave cylinder lens 40' toward the mask negative 10. Here, luminous flux is made incident at height h42' higher than the height h42 of the convex cylinder lens 42 and then travels closer to an optical axis 16 than the power of the convex cylinder lens 42 to reach a position of height h26' higher than height h26 on the substrate 26. Consequently, the power is corrected within a range wherein image forming power is increased on the substrate 26. The same effect is obtained even when the convex cylinder lens 42 is moved. Further, when the concave cylinder lens 40 and convex cylinder lens 42 are replaced with each other, the power is corrected within a range wherein the image formation power is decreased.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection optical apparatus and a projection exposure apparatus which have a projection magnification in the vicinity of unity magnification and which can finely adjust the projection magnification.

[0002]

2. Description of the Related Art In recent years, flat panel type display devices using liquid crystal have become popular. The substrate material of this flat panel display device is usually glass. Due to internal stress at the time of molding, the thermal expansion of the glass substrate material returns to the original temperature environment and does not return to the original dimensions accurately. In the manufacture of an active matrix type liquid crystal substrate or color filter, one substrate material is exposed several times, but if the exposure is repeated at the same magnification, the exposed patterns will not overlap as designed. Further, the mask, which is the original plate, is also thermally expanded because the chrome forming the pattern absorbs ultraviolet rays.

In order to correct these thermal expansions, it is conceivable to change the object-image distance of the exposure optical system to change the projection magnification, but it is difficult to adjust the object-image distance of the exposure optical system due to the structure. . Further, since many exposure optical systems are telecentric on both the object side and the image side, magnification correction cannot be performed by adjusting the object-image distance. As another conventional technique, a transparent flat plate is curvedly inserted into a projection optical system of an exposure apparatus, and the degree of bending is changed to change the magnification. this is,
Although the optical components used are simple, when the magnification is adjusted by a small amount as in an exposure apparatus, it is necessary to finely adjust the amount of curvature of the flat plate. This fine adjustment requires a special technique and is not preferable for implementation in the manufacturing process.

[0004]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a projection optical apparatus capable of performing minute magnification correction, which is difficult with a conventional exposure apparatus, with a simple structure and easy operation.

[0005]

The present invention is a projection optical apparatus having a projection optical system for forming an image of an original plate on a substrate, and at least one of the projection optical system and the original plate and the projection optical system and the substrate. The projection optical device is characterized in that an afocal magnification correction optical system including two lenses is arranged and the projection magnification can be changed by relatively changing the position of the lens.

The present invention also provides a projection optical apparatus having a projection optical system for forming an image of an original plate on a substrate, at least one of which is provided between the projection optical system and the original plate and between the projection optical system and the substrate. Arranged a magnification correction optical system slightly shifted from the afocal condition consisting of two lenses,
The projection optical apparatus is characterized in that the projection magnification of the magnification correction optical system can be changed within a range including reduction, equal magnification, and enlargement by changing the lens position.

Further, according to the present invention, the above projection optical device is used to perform arcuate exposure using a good image area on the circumference of the ring of the rotationally symmetric optical system to move the original plate and the substrate. By doing so, the projection exposure apparatus is characterized in that the magnification is changed in the direction perpendicular to the moving direction of the exposure apparatus which performs exposure over a wide area.

[0008]

According to the present invention, for example, between the exposure device and the substrate, a convex lens and a concave lens that almost cancels its action are arranged. For simplicity, it is assumed that a plano-convex lens and a plano-concave lens made of the same material face each other with their spheres facing each other at a distance of 0. Normally, the exposure apparatus is telecentric on the substrate side, so the chief ray that determines the magnification is not deflected by the magnification correction optical system. That is, the magnification is the same as when there is no correction optical system.

However, if the convex lens and the concave lens are spaced from each other, for example, if the convex lens is on the exposure device side, the principal ray incident on the convex lens is incident on the concave lens as a convergent ray. Due to the distance, the chief ray is incident on the concave lens at a position more than the optical axis. Since the declination effect of the lens on the light beam is almost proportional to the height from the optical axis, the exit angle from the magnification correction optical system becomes a convergent light minutely. The height of the chief ray on the substrate changes due to the change in height and the change in inclination of this ray. This is the same as changing the magnification. It is not desirable for the exposure apparatus to change the inclination of the emitted light beam and deviate from the telecentric state, but since the amount of magnification correction of an ordinary liquid crystal exposure apparatus is as small as 0.01% or less, this inclination of the light beam is practically ignored. Fit in as much as you can.

An embodiment of the present invention will be described below with reference to the drawings.

[0011]

[First Embodiment] The projection exposure apparatus of the first embodiment is a bow-shaped scanner for scanning a bow-shaped projected image, and performs magnification correction by changing the projection magnification only by one of enlargement and reduction. As shown in FIG. 1, the projection exposure apparatus 1 includes a light source 2, a condenser lens 4 for condensing a light beam from the light source 2, a bow diaphragm 6, and a relay for forming an image of the bow diaphragm 6 on a mask original plate 10. Lens 8, the mask original plate 1
0, and the first reflecting mirror 12 is arranged on the first optical axis 14. On the second optical axis 16 which is the reflection optical axis of the reflecting mirror 12, there is arranged a projection lens 22 through which the light flux that has once passed is reflected by the second reflecting mirror 20 and passes again. Further, the first magnification correction optical system 24 and the photosensitive substrate 26 are arranged on the third optical axis 17 which is the reflection optical axis of the third reflecting mirror 23. Mask original plate 10 and substrate 26
Is a direction that is at the same time orthogonal to the first optical axis 14 and the third optical axis 17, and is a concave cylinder lens 40 and a convex cylinder lens 42 that form a first magnification correction optical system 24 described later.
It is movable in arrow directions 30 and 32 that coincide with the direction of the cylinder axis.

The first magnification correction optical system 24 includes a concave cylinder lens 40 and a convex cylinder lens 4 as shown in FIG.
The optical data is as follows: f40 = −5000 mm f41 = + 5000 mm d1 = 0 to several tens of mm d2 = + 200 mm In the first magnification correction optical system 24, the chief ray R incident on the substrate 26 becomes a telecentric optical system. 3, the light enters the concave cylinder lens 40 in parallel with the third optical axis 17 as shown by the solid line. It should be noted that, in the drawing, in order to clearly show the configuration of the lens, it is described that d1 is several mm. Assuming that this incident height is h ₄₀ , the chief ray R is the third power due to the negative power of the concave cylinder lens 40.
Moving in a direction away from the optical axis 17, the convex cylinder lens 42
Incident on the position of height h ₄₂ of the convex cylinder lens 4
As a result of the step 2, the laser beam advances toward the third optical axis 17 and reaches the position of height h ₂₆ on the substrate 26. Here, it is also possible to select the focal length of the concave cylinder lens 42 so that the main light flux R is vertically incident on the substrate 26 and a telecentric optical system is established.

To adjust the magnification, the concave cylinder lens 40 'is
As shown by the dotted line in FIG. 3, the mask is moved to the left, that is, in the direction toward the mask original plate 10. By doing so, the light enters the h ₄₂ ′ higher than the height h ₄₂ of the convex cylinder lens 42, then advances toward the optical axis 16 due to the power of the convex cylinder lens 42, and the height h on the substrate 26 increases.
_A height h ₂₆ 'higher than ₂₆ is reached. As a result, the magnification is corrected in the range where the imaging magnification on the substrate 26 is enlarged. The same applies when the convex cylinder lens 42 is moved. In this embodiment, if the concave cylinder lens and the convex cylinder lens are interchanged, magnification correction will be performed within a range in which the imaging magnification is reduced.

The relationship between the focal length of the concave cylinder lens 40 and the magnification correction amount when the concave cylinder lens 40 moves by 0.5 mm is shown in the graph of FIG. The relationship between the amount of movement of the concave cylinder lens 40 and the amount of magnification correction is shown in the graph of FIG.

[0015]

[Second Embodiment] A projection exposure apparatus according to the second embodiment is shown in FIG. 6, but the same components as those of the projection exposure apparatus according to the first embodiment are designated by the same reference numerals and their description is omitted. To do. In the projection exposure apparatus of the second embodiment, the second magnification correction optical system 1 for reduction is provided behind (below) the original plate 10 on the optical axis 14.
00 is arranged in front of (above) the substrate 26 on the optical axis 16.
A third magnification correction optical system 130 for enlargement is arranged in.

The second magnification correction optical system 100 has the same components as the first magnification correction optical system 24 of the first embodiment, and the arrangement thereof is opposite to that of the first magnification correction optical system 24. Third
The magnification correction optical system 130 has the same configuration as the first magnification correction optical system 24 of the first embodiment. Second magnification correction optical system 10
0 means that the concave cylinder lens 103 is moved in the direction of the substrate 26, and as a result, the imaging magnification on the substrate 26 is reduced and the magnification is corrected. Similarly to the first embodiment, the third magnification correction optical system 130 moves the concave cylinder lens 104 in the direction of the mask original plate 10, so that the image formation magnification on the substrate 26 is enlarged and the magnification correction is performed. Is done.

[0017]

[Third Embodiment] A projection exposure apparatus according to the third embodiment includes a first magnification correction optical system 24 of the first embodiment as shown in FIG.
This is replaced with a fourth magnification correction optical system 210 composed of one convex cylindrical lens 200, 202 and two concave cylindrical lenses 204, 206.

In the projection exposure apparatus of the third embodiment, 2
Set the concave cylindrical lenses 204 and 206 to the arrow 23.
By moving in the direction 0, 232, the substrate 26
It is possible to perform magnification correction by enlarging or reducing the imaging magnification above.

[0019]

[Fourth Embodiment] As shown in FIG. 8, the projection exposure apparatus of the fourth embodiment includes a fourth magnification correction optical system 210 of the third embodiment.
It is replaced with a fifth magnification correction optical system 306 including two convex cylindrical lenses 300 and 302 and a concave cylindrical lens 304 arranged between them. The concave cylindrical lens 304 has a refractive index of 1.5 and a radius of curvature of 2500 mm.

In the projection exposure apparatus of the fourth embodiment, the concave cylindrical lens 304 is moved in the direction of the arrow 330 to reduce the image forming magnification on the substrate 26 and correct the magnification. In the first embodiment, the magnification is corrected by only changing the magnification by either increasing or reducing the projection magnification, whereas in the fourth embodiment, the concave cylindrical lens satisfies the afocal condition at the center of the adjustment range. is doing.

The optical data of the fourth magnification correction optical system of the fourth embodiment are f11 = -5000 mm (moving lens) f12 = + 5010 mm d1 = + 10 mm ± δ (adjustment range) d2 = + 200 mm.

[0022]

[Fifth Embodiment] The projection optical apparatus of the fifth embodiment is an optical system capable of enlarging / reducing magnification correction, that is, enlarging / reducing magnification correction is possible only by moving a moving lens. The optical data of the magnification correction optical system are as follows. f11 = −5000 mm (moving lens) f12 = + 4771.4 mm d1 = + 10 mm ± δ (adjustment range) d2 = + 200 mm The relationship between the moving amount and the magnification change of the concave cylindrical lens of the fifth embodiment is shown in FIG. In the first embodiment, f12 is selected so as to be a telecentric optical system,
In FIG. 3, if f12 is determined so that h40 = h26 at the reference interval approximately in the center of the magnification correction adjustment range, enlargement and reduction can be performed by adjusting a set of magnification correction optical systems.

[0023]

[Sixth Embodiment] The projection optical apparatus according to the sixth embodiment is a telecentric (three-piece) magnification correction system. The optical data of the magnification correction system of the sixth embodiment are as follows. f21 = + 5000 mm (moving lens) f22 = −2495 mm f23 = + 5000 mm d21 = 10 mm d22 = 10 mm d23 = 200 mm A ray diagram of the magnification correction system of the sixth embodiment is shown in FIG. The light beam bent in the optical axis direction by the convex cylinder lens 50 is bent in a direction away from the optical axis by the concave cylinder lens 52 and enters the convex cylinder lens 54. At this time, if the luminous flux emitted from the concave cylinder lens 52 is adjusted to be the luminous flux emitted from the front focus of the convex cylinder lens 54, the luminous flux emitted from the convex cylinder lens 54 becomes parallel to the optical axis, and the substrate Irradiation is performed at a position which is at a right angle to 26 and whose height from the optical axis is h ₂₄ (= h ₂₃ ).

In the magnification adjustment, the height position h _{24 of} light incident on the convex cylinder lens 54 is changed while satisfying the condition that the light flux incident on the convex cylinder lens 54 is a light beam emitted from the front focal point of the convex cylinder lens 54. As described above, the mutual positional relationship between the convex cylinder lenses 50 and 54 and the concave cylinder lens 52 is adjusted. FIG. 12 shows the relationship between the amount of movement and the change in magnification of the concave cylindrical lens of the sixth embodiment.

[0025]

Seventh Embodiment The magnification correction optical system of the projection optical apparatus of the seventh embodiment includes a meniscus lens as shown in FIG. The optical data of the magnification correction system of the sixth embodiment are as follows. r21 = ∞ r22 = −2500 mm r23 = −1247.5 mm r24 = −2500 mm d21 = arbitrary d22 = 10 mm ± δ (adjustment range) d23 = 15 mm Use of a meniscus lens in the magnification correction optical system of the seventh embodiment. Thus, the height of the light beam can be changed between the incident side and the exit side with only two lenses, and a telecentric optical system can be provided at the same magnification position.

[0026]

Eighth Embodiment The projection optical apparatus of the eighth embodiment has an optical system in which the combined thickness of the magnification correction optical system is not changed, as shown in FIG. r31 = + 3575.546 mm r32 = + 1496.228 mm The first lens moves.

R33 = + 1496.228 mm r34 = + 3575.545 mm d31 = 10 mm d32 = 10 mm ± δ (adjustment range) d33 = 10 mm d34 = + 200 mm The relationship between the moving amount and the magnification change of the convex cylindrical lens of the eighth embodiment is shown in FIG. Shown in.

[0028]

[Ninth Embodiment] The first to eighth embodiments relate to a projection exposure apparatus which is an arcuate scanner for scanning an arcuate projection image. The ninth embodiment relates to a reduction projection type projection exposure apparatus. The configuration of the reduction projection type projection exposure apparatus of the ninth embodiment is shown in FIG. 16, but the same components as those of the projection exposure apparatus of the first embodiment shown in FIG. The description is omitted. Although the first magnification correction optical system 23 of the first embodiment is composed of the convex cylinder lens and the concave cylinder lens, the first magnification correction optical system 1
23 is composed of a convex spherical lens and a concave spherical lens,
No scanning is required to form a two-dimensional image on the substrate 26.

In the second to eighth embodiments, the magnification correction optical system is composed of the convex cylinder lens and the concave cylinder lens, but these magnification correction optical systems are composed of the convex spherical lens and the concave spherical lens. It can also be configured.

[0030]

According to the present invention, it is possible to perform minute magnification correction of the projection optical apparatus with a simple structure and easy operation.

[Brief description of drawings]

FIG. 1 is an optical diagram of a projection exposure apparatus according to a first embodiment of the present invention.

FIG. 2 is an optical diagram of a first magnification correction optical system of the projection exposure apparatus of FIG.

3 is a luminous flux diagram of a first magnification correction optical system of the projection exposure apparatus of FIG.

4 is a graph showing a relationship between a focal length of a concave cylinder lens of the projection exposure apparatus of FIG. 1 and a magnification correction amount.

5 is a graph showing a relationship between a moving amount of a concave cylinder lens and a magnification correction amount of the projection exposure apparatus of FIG.

FIG. 6 is an optical diagram of a projection exposure apparatus according to the second embodiment of the present invention.

FIG. 7 is an optical diagram of a fourth magnification correction optical system of the projection exposure apparatus of the third embodiment of the present invention.

FIG. 8 is an optical diagram of a fifth magnification correction optical system of the projection exposure apparatus of the fourth embodiment of the present invention.

FIG. 9 is a graph showing the relationship between the amount of movement of the concave cylinder lens and the amount of magnification correction of the projection exposure apparatus of the fourth embodiment of the present invention.

FIG. 10 is a graph showing the relationship between the amount of movement of the concave cylinder lens and the amount of magnification correction of the projection exposure apparatus of the fifth embodiment of the present invention.

FIG. 11 is an optical principle diagram of a magnification correction optical system of the projection exposure apparatus of the sixth embodiment of the present invention.

FIG. 12 is a graph showing a relationship between a moving amount of a concave cylinder lens and a magnification correction amount of a projection exposure apparatus according to a sixth embodiment of the present invention.

FIG. 13 is an optical diagram of a magnification correction optical system of a projection exposure apparatus according to the seventh embodiment of the present invention.

FIG. 14 is an optical diagram of a magnification correction optical system of a projection exposure apparatus according to an eighth example of the present invention.

FIG. 15 is a graph showing the relationship between the moving amount of the convex cylinder lens and the magnification correction amount of the projection exposure apparatus of the eighth embodiment of the present invention.

FIG. 16 is an optical diagram of a projection exposure apparatus according to the ninth embodiment of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Projection exposure apparatus 2 Light source 4 Condenser lens 6 Bow stop 10 Mask original plate 10 12 1st reflecting mirror 14 1st optical axis 16 2nd optical axis 17 3rd optical axis 20 2nd reflecting mirror 22 Projection lens 24 1st magnification correction optics System 40 Concave cylinder lens 42 Convex cylinder lens 100 Second magnification correction optical system 130 Third magnification correction optical system

Claims (5)

[Claims] 1. A projection optical apparatus having a projection optical system for forming an image of an original plate on a substrate, wherein two lenses are provided at least between the projection optical system and the original plate and between the projection optical system and the substrate. A projection optical apparatus comprising: an afocal magnification correction optical system that is included therein, and a projection magnification that can be changed by relatively changing the position of the lens. 2. A projection optical apparatus having a projection optical system for forming an image of an original plate on a substrate, wherein two lenses are provided at least between the projection optical system and the original plate and between the projection optical system and the substrate. A projection magnification of the magnification correction optical system can be reduced by changing the lens position by arranging a magnification correction optical system slightly shifted from the included afocal condition and changing the projection magnification of the magnification correction optical system within a range including equal magnification and enlargement. A projection optical device characterized by being configured. 3. The projection optical apparatus according to claim 1, wherein the projection magnification can be changed by slightly breaking the afocal condition of the magnification correction optical system. 4. The magnification correction optical system includes a cylinder lens, and the imaging magnification can be changed only in one diameter direction around the optical axis. The projection optical device described. 5. A projection optical apparatus for performing arc-shaped exposure using a good image area on the circumference of an annular zone of a rotationally symmetric optical system, and for exposing a large area by moving an original plate and a substrate. 3. The projection optical apparatus according to claim 1, wherein the projection optical apparatus is configured to change the magnification in a direction perpendicular to the moving direction of the.