CN100547329C - The drying device of large-area substrates and method - Google Patents
The drying device of large-area substrates and method Download PDFInfo
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- CN100547329C CN100547329C CNB2007101047344A CN200710104734A CN100547329C CN 100547329 C CN100547329 C CN 100547329C CN B2007101047344 A CNB2007101047344 A CN B2007101047344A CN 200710104734 A CN200710104734 A CN 200710104734A CN 100547329 C CN100547329 C CN 100547329C
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- area substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- General Physics & Mathematics (AREA)
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- Microelectronics & Electronic Packaging (AREA)
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Abstract
The present invention relates to large-area substrates drying device and method, large-area substrates drying device provided by the present invention comprises: by the jet drying air large-area substrates of being transferred is carried out dry air knife; Mist removing portion vertically equably sprays identical with the dry air that is fed to described air knife or have the dry air of lower dew point being used on large-area substrates, and its projected area is greater than the projected area of described air knife.And large-area substrates drying means provided by the present invention comprises step: the dry air that utilizes air knife to spray carries out dry large-area substrates to needs and carries out primary drying; Vertical equably jet drying air on than the bigger area of described air knife projected area and remove the mist of large-area substrates.Large-area substrates drying device provided by the present invention and method be not even use super dry air, by the contact area and the time of contact that increase dry air and substrate removing mist from substrate yet.
Description
Technical field
The present invention relates to a kind of drying device and method of large-area substrates, relate in particular to and need not to use super dry air and large-area substrates is carried out dry large-area substrates drying device and method.
Background technology
Usually, existing large-area substrates drying device adopts and utilizes air knife (Air Knife) to spray purge drying air (CDA:Clean Dry Air) and the mode of removing large-area substrates moisture to large-area substrates.
For the efficient that improves this drying mode once proposed to use the mode of the higher air of aridity, its particular content is in order to improve the higher air drying efficiency of aridity special hothouse to be set.
The aforesaid way number of being disclosed is put down in writing by the Korean Patent of " 10-2004-0089071 ", describes this mode below in detail.
Fig. 1 is the schematic diagram of existing drying device, has used the part imaginary line among the figure in order to represent internal structure.The high speed drying device is located in the clean environment.In the accompanying drawing, residual liquid remove chamber 1 and with this residual liquid remove the adjacent super hothouse 2 in chamber 1 be located in the side body 3 (chain-dotted line).Outside housing 4 (chain-dotted line) side body 3 in space 5 surrounds.Be used to transfer the handover roller 6 that is cleaned object P and be communicated with interior side body 3, outside housing 4, residual liquid removing chamber 1 and super hothouse 2.
The object P that is cleaned that utilizes non-volatile liquid or volatile liquid to clean transfers along the direction of arrow by transferring roller 6, and be admitted to residual liquid and remove in the chamber 1 by being located at opening (omitting diagram) in the outside housing 4 and the interior side body 3, the size of described opening is set to make and is cleaned object P and passes through.Transferring roller 6 supported plate S supports also can rotate.Handover roller 6 also can be arranged to clip and be cleaned object P and relative up and down form.
In this residual liquid removing chamber 1, remove residual liquid from being cleaned object P surface by injection air.As shown in the figure, residual liquid is removed chamber 1 is used for injection air in the upper/lower location arrangements air nozzle 7.Purifying air is fed in the surge tank 8 by high-performance filter (omit diagram), and fills this surge tank 8 and be sent to corresponding up and down air nozzle 7 equably.Become complicated for fear of accompanying drawing, show the situation that next group air nozzle 7 only is set, but also can multi-staged air nozzle 7 be set along transfer direction shown in the arrow.
The air nozzle 7 that residual liquid is removed chamber 1 tilts towards moving into a mouthful direction (omitting diagram) in the vertical plane, to produce the flow direction air opposite with the transfer direction that is cleaned object P.The heeling condition of air nozzle 7 can influence greatly from being cleaned object P surface removes the effect of liquid.The angle of inclination of removing liquid by experimental verification repeatedly most effectively is about 15 degree.
And, the direction of advance of nozzle 7 being arranged to and being cleaned object P is perpendicular, change angle then gradually in horizontal plane it is tilted with respect to direction of advance, the angle of inclination in this horizontal plane also can influence the removing effect of cleaning fluid, and the most effective range of tilt angles is 25～45 degree.
Existing air capacity of carrying out removing moisture usefulness air port (slit) in the dry drying device according to hot blast needs 1.5～3Nm for each air port
3About/min, but 7 at this nozzle needs 0.2Nm
3Air capacity about/min can fully be removed cleaning fluid.
Mouthful size of moving into that this residual liquid is removed chamber 1 must strictly form according to the size that is cleaned object P.This is because need improve the intrusion that leak tightness stops extraneous gas as far as possible, to guarantee inner pure air district (zone).
Arrange that in the corner up and down of two sides of housing being used for housing 4 laterally sucks the outlet 9 that residual liquids are removed the conduit of the air of finishing using chambers 1 with space 5 between the interior side body 3, the conduit that extends from these outlets 9 is connected on the suction pump of outside.When exhaust is carried out in space 5, make the internal pressure in space 5 take out of side, prevent that thus the humid air of finishing using from invading in the super hothouse 2 greater than moving into side.
In the super hothouse 2 nozzle 7 is set also, this nozzle 7 clips and is cleaned object P and is oppositely arranged up and down.Super dry dry air is by super dry generating means supply, for example small-sized (compact) dried-air drier of making by Japanese Kyowa Kako Co., Ltd. (omitting diagram) supply, and to change in order releasing the pressure and vacuum tank T to be set, dry air is fed to dry air inlet 10 by conduit from described vacuum tank T, and is stored the dry air that is fed to nozzle 7 is become evenly.For the super hothouse 2 of the intrusion that prevents extraneous gas forms the hermetically-sealed construction that can cut off extraneous gas, and the dry air of the super drying of spraying from nozzle 7 keeps constant voltage, forms indoor super dry environment with this.
Remove chamber 1 from residual liquid and be shifted into being cleaned the dry air that object P is exposed to the super drying of spraying from nozzle 7 this super dry environment.
Though nozzle 7 is arranged to a pair ofly among the figure at the upper and lower in the handover path that is cleaned object P, also can be arranged to nozzle 7 multistage as required.
These nozzles 7 are perpendicular with the transfer direction that is cleaned object P.If with respect to vertical run-off the straight a little, just cause the air balance in the super hothouse 2 destroyed, and cause extraneous gas to be invaded and can not keep super dry environment.
In this super hothouse 2, can be cleaned object P with a small amount of dry air drying at short notice.Super dry dry air dew-point temperature under atmospheric pressure is about-80 ℃, and this moment, water content was about 0.5ppm.The value of this water content can be equal to mutually with the water content of high-purity nitrogen (purity is 99.9999%).
Each nozzle 7 uses 0.2～0.3Nm
3The dry air of the super drying of/min can obtain satisfied effect.Existing use slit carries out dry drying device according to hot blast, and dry required air capacity is too much owing to carrying out, and is therefore also impracticable.
The side of taking out of of super hothouse 2 is arranged ion generator 12 on the space 5 between side body 4 and the interior side body 3 outside.When being cleaned object P and spraying super dry dry air, because the friction that is cleaned between object P and the air causes being cleaned the surperficial generation of object P static, the described ion generator 12 this static that is used for neutralizing.
As mentioned above, existing large-area substrates drying device need be provided with outside housing 4 and interior side body 3 in order to constitute super hothouse 2, and needs special blast pipe.
Therefore, the existence of super hothouse 2 makes design become complicated and causes the equipment unit price to rise, and owing to will safeguard in narrow space, therefore has the problem that is difficult to safeguard.
And, because therefore the dry large-area substrates of the super dry air of existing large-area substrates drying device utilization makes the technology cost increase.
Summary of the invention
The present invention proposes in order to solve aforesaid problem, and its purpose is to provide a kind of large-area substrates drying device and method of the mist (mist) that does not use super dry air also can remove to remain on the large-area substrates.
And another purpose of the present invention is to provide a kind of easy formation dew-point temperature to be lower than the large-area substrates drying device and the method for outside hothouse.
To achieve these goals, large-area substrates drying device provided by the present invention comprises: by the jet drying device large-area substrates of being transferred is carried out dry air knife; Mist removing portion vertically sprays identical with the dry air that is fed to described air knife or have the dry air of lower dew point being used on large-area substrates, and its projected area is greater than the projected area of described air knife.
And large-area substrates drying means provided by the present invention comprises step: the dry air that utilizes air knife to spray carries out dry large-area substrates to needs and carries out primary drying; Vertical equably jet drying air on than the bigger area of described air knife projected area and remove the mist of large-area substrates.
Description of drawings
Fig. 1 is existing large-area substrates drying device schematic diagram;
The large-area substrates drying device schematic diagram that Fig. 2 is provided for the foundation embodiment of the invention;
Fig. 3 is the construction profile of Fig. 2;
The construction profile of the large-area substrates drying device that Fig. 4 is provided for foundation another embodiment of the present invention.
Main symbol description: 10 is air knife, and 20 are handover portion, and 30 is mist removing portion; 31 is jet, and 32 is the next door.
The specific embodiment
Below, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
＜embodiment 1 〉
The large-area substrates drying device schematic diagram that Fig. 2 is provided for the foundation embodiment of the invention, Fig. 3 are the construction profile of Fig. 2.
As shown in Figures 2 and 3, according to the large-area substrates drying device that the preferred embodiment of the present invention provided, comprise: air knife 10, this air knife 10 be respectively to substrate S upper surface and the lower surface jet drying air transferred by handover portion 20, thereby substrate S is carried out primary drying; Mist removing portion 30, this mist removing portion 30 be to the vertical equably jet drying air in the surface on the whole of the substrate S that carries out primary drying by described air knife 10, thereby remove the mist (mist) on the substrate S that carries out primary drying.
Described mist removing portion 30 be four jiaos box-like, and the bottom surface is provided with even size, the dry air jet 31 that evenly is provided with at interval, large-area substrates S is spaced apart about 1 to 3mm with the bottom surface that is provided with dry air jet 31.
Further describe structure and effect below according to large-area substrates drying device provided by the present invention.
At first, cross arts demand such as cleaning to the air knife 10 sidesway warp let-offs by handover portion 20 and carry out dry large-area substrates S.
At this moment, air knife 10 setting that is fixed is to spray purge drying air (CDA) respectively to large-area substrates S upper surface and the lower surface transferred by handover portion 20.
Described air knife 10 is the air jet systems with single slit, and the dew point of the purge drying air that sprays by this air knife 10 is about-40 ℃.
Remain in large-area substrates S upper surface and lower surface parts such as cleaning fluid since the expulsion pressure of the purge drying air that sprayed of described air knife 10 and low dew point be eliminated.
That is, blow out the moisture that remains on the substrate S according to the expulsion pressure of purge drying air and carry out drying, be discharged to the outside and part moisture is comprised in the purge drying air.
But, as mentioned above by air knife 10 carry out dry large-area substrates S go up exist perusal with about 10 to 50 μ m left and right sides particle diameters less than cleaning fluid particle mist (mist).
This mist can produce watermark on large-area substrates S.
Carry out drying and exist the large-area substrates S of mist to be transplanted on the bottom of mist removing portion 30 by handover portion by above-mentioned air knife 10.
Described mist removing portion 30 is hexahedron structures that the bottom surface is provided with the jet 31 of a plurality of even sizes, evenly sprays the identical purge drying air of the purge drying air with being fed to air knife 10 that flows into from the outside to the bottom surface.
Described jet 31 is set to compare jet drying air on wideer area with described air knife 10 more than two row with respect to the direction of advance of large-area substrates S at least.
At this moment, the dry air that mist removing portion 30 is sprayed can use the air identical with the dry air that is fed to described air knife 10, also can use the lower dry air of dew-point temperature.
Produce eddy current by spraying between the described mist removing of this dry air portion 30 and the large-area substrates S, thereby make mist become littler particle and be easy to the air purge that is dried.
The size of described jet 31 is relevant with expulsion pressure with quantity, and its expulsion pressure relation can be represented with mathematical expression 1.
[mathematical expression 1]
P1＞P2＞P3
Described P1 is the purge drying air pressure that is supplied to mist removing portion 30, and P2 is the dry air pressure in the mist removing portion 30, and P3 is the dry air pressure that sprays by described jet 31.
For when satisfying above-mentioned pressure condition, make from mist removing portion 30 and produce eddy current by the dry air that jet 31 sprays, the pressure between mist removing portion 30 and the substrate S should be greater than circumferential pressure.
For this reason, jet 31 gross areas of mist removing portion 30 are greater than the slit area between mist removing portion 30 and the substrate S, utilize mathematical expression 2 these relations of expression.
[mathematical expression 2]
Hπr
2＞Ld
In the described mathematical expression 2, H represents to be located at jet 31 quantity of mist removing portion 30, and r represents the radius of its jet 31, and L represents the bottom surface girth of mist removing portion 30, and d represents the spacing between substrate S and mist removing portion 30 bottom surfaces.
As mentioned above, dry air is ejected on the large-area substrates S by bigger area, and the slit area that the dry air that is sprayed outwards flows out is less than the entire area of this jet 31.
It is elongated and produce eddy current by the time in the dry air of described mist removing portion 30 supplies that the structure of above-mentioned mist removing portion 30 and the pressure condition of dry air are exposed at the large-area substrates S that is transferred, thus the purge drying air purge that the mist of large-area substrates S is sprayed by mist removing portion 30.
＜embodiment 2 〉
The construction profile of the large-area substrates drying device that Fig. 4 is provided for foundation another embodiment of the present invention.
As shown in Figure 4, the large-area substrates drying device that another embodiment of the present invention provided also comprises from the bottom edge of mist removing portion 30 to next door 32 that downside prolongs.
Described next door 32 is played and is made dry air be detained the effect of the scheduled time in hothouse.
At this moment, the spacings of described next door 32 ends and large-area substrates S are preferably 1 to 3mm.If this be since described next door 32 and large-area substrates S spacing in 1mm, then large-area substrates S move or vibrations may cause large-area substrates S impaired; And if more than 3mm, then can reduce drying efficiency.
When large-area substrates S passed through the hothouse bottom that is made of the next door 32 that surrounds dry air, dry air can contact large-area substrates S all surfaces, thereby can be with the bone dries such as cleaning fluid of mist state.
Injected dry air is surrounded by described next door 32 and is not easy outside outflow, thereby circulates in the hothouse that is formed by next door 32.According to this circulation, eddy current amount and eddy current degree further strengthen, and can further improve drying efficiency thus.
Described embodiment 2 also satisfies among the embodiment 1 mathematical expression 1 of record and the pressure condition of mathematical expression 2, and just the d of mathematical expression 2 represents distance between the terminal and large-area substrates S in described next door 32 among the embodiment 2.
As mentioned above, large-area substrates drying device provided by the present invention and method, under the situation of not using super dry air also to need not to use the equipment of dividing hothouse, the mist that remains in large-area substrates also can bone dry.
Though utilize the specific preferred embodiment explanation above and illustrate the present invention, but the present invention is not limited to the foregoing description, and the people with common knowledge in field can carry out various modifications and changes under the present invention not breaking away from the scope of the inventive concept.
In sum, large-area substrates drying device provided by the present invention and method, even do not use super dry air, but by the contact area and the time of contact that increase dry air and substrate also removing mist from substrate.
And,, therefore can reduce equipment cost and maintenance cost and more economically because large-area substrates drying device provided by the present invention and method are not used super dry air.
Claims (14)
1, a kind of large-area substrates drying device comprises:
By the jet drying air large-area substrates of being transferred is carried out dry air knife;
Mist removing portion vertically equably sprays identical with the dry air that is fed to described air knife or have the dry air of lower dew point being used on large-area substrates, and its projected area is greater than the projected area of described air knife.
2, large-area substrates drying device according to claim 1 is characterized in that described mist removing portion comprises even layouts and a plurality of jets of uniform size that are set to two row with respect to the transfer direction of large-area substrates at least in the bottom surface.
3, large-area substrates drying device according to claim 2 is characterized in that described mist removing portion satisfies the pressure condition of following mathematical expression 1,
Mathematical expression 1
P1＞P2＞P3
Described P1 is the dry air pressure that is fed to mist removing portion, and P2 is the dry air pressure in the mist removing portion, and P3 is the dry air pressure by the jet injection of mist removing portion.
4,, it is characterized in that the bottom surface that is provided with described jet of described mist removing portion and kept 1mm to 3mm by spacing between the large-area substrates of transferring according to claim 2 or 3 described large-area substrates drying devices.
5, large-area substrates drying device according to claim 4 is characterized in that the spacing between described mist removing portion and the large-area substrates and the entire area of jet satisfy following mathematical expression 2,
Mathematical expression 2
Hπr
2＞Ld
Described H is provided in a side of the jet quantity of mist removing portion, and r is the radius of this jet, and L is the bottom surface girth of mist removing portion, and d is the spacing between large-area substrates and the mist removing portion bottom surface.
6, large-area substrates drying device according to claim 2 is characterized in that described mist removing portion also comprises to surround the dry air that is ejected into its bottom surface sections and dry hothouse is carried out on the large-area substrates surface.
7, large-area substrates drying device according to claim 6 is characterized in that described hothouse is made of the next door that each edge from described mist removing portion bottom surface prolongs downwards.
8, large-area substrates drying device according to claim 7 is characterized in that described hothouse and is kept 1mm to 3mm by the spacing between the large-area substrates of transferring.
9, large-area substrates drying device according to claim 8 is characterized in that the jet entire area satisfies following mathematical expression 3 with respect to the spacing between described hothouse and the large-area substrates,
Mathematical expression 3
Hπr
2＞Ld′
Described H is provided in a side of the jet quantity of mist removing portion, and r is the radius of this jet, and L is the bottom surface girth of hothouse, and d ' is the spacing between large-area substrates and the hothouse bottom surface.
10, a kind of large-area substrates drying means comprises step:
(a) dry air that utilizes air knife and sprayed carries out dry large-area substrates to needs and carries out primary drying;
(b) vertical equably jet drying air and remove the mist of large-area substrates on than the bigger area of described air knife projected area.
11, large-area substrates drying means according to claim 10 is characterized in that in described (b) step utilizing transfer direction with respect to large-area substrates to be set to the even layouts of two row and jet of uniform size at least and sprays identical with the dry air that is fed to described air knife or have the dry air of lower dew point.
12, large-area substrates drying means according to claim 11 is characterized in that satisfying following mathematical expression 4 to the jet area of described large-area substrates supply dry air and the slit area between its jet position and the large-area substrates,
Mathematical expression 4
Asup＞Aexh
Described Asup is the area summation of jet, and Aexh is the slit area summation between the residing plane of large-area substrates and jet.
13, according to claim 10 or 11 described large-area substrates drying means, it is characterized in that in described (b) step constituting and surround the hothouse that the dry air that is sprayed makes the large-area substrates surface that its contact transferred, and, remove mist from large-area substrates through this hothouse bottom by making the dry air in this hothouse produce eddy current and circulation.
14, large-area substrates drying means according to claim 13 is characterized in that the slit area satisfies following mathematical expression 5 between the jet area of described hothouse supply dry air and this hothouse bottom surface and large-area substrates,
Mathematical expression 5
Asup＞Aexh′
Described Asup is the area summation of jet, and Aexh ' is the slit area summation between the plane of large-area substrates and hothouse bottom surface.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060049410A KR100819714B1 (en) | 2006-06-01 | 2006-06-01 | Dry apparatus for large area substrate and method thereof |
| KR1020060049410 | 2006-06-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101082466A CN101082466A (en) | 2007-12-05 |
| CN100547329C true CN100547329C (en) | 2009-10-07 |
Family
ID=38912160
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2007101047344A Expired - Fee Related CN100547329C (en) | 2006-06-01 | 2007-04-25 | The drying device of large-area substrates and method |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100819714B1 (en) |
| CN (1) | CN100547329C (en) |
| TW (1) | TWI327636B (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103017500A (en) * | 2012-12-04 | 2013-04-03 | 彩虹（佛山）平板显示有限公司 | Drying process of cleaning machine for cover plate glass |
| CN103472610B (en) * | 2013-08-23 | 2016-03-09 | 京东方科技集团股份有限公司 | A kind of substrate drying device and basal plate cleaning system |
| CN103712428B (en) * | 2013-12-16 | 2016-02-03 | 京东方科技集团股份有限公司 | A kind of drying device |
| KR102300625B1 (en) * | 2014-10-24 | 2021-09-09 | 세메스 주식회사 | Apparatus for drying semiconductor packages |
| KR101685119B1 (en) | 2014-11-17 | 2016-12-09 | 함순자 | Electric Fan |
| CN109237865B (en) * | 2018-08-31 | 2020-04-14 | 贵州华旭光电技术有限公司 | Liquid crystal display screen substrate drying device |
| CN112255242A (en) * | 2020-08-24 | 2021-01-22 | 重庆神华薄膜太阳能科技有限公司 | Surface defect detection system and detection method |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH08179700A (en) * | 1994-12-27 | 1996-07-12 | Toshiba Electron Eng Corp | Drying device for thin sheet substrate for display device and drying method using the same |
| JP3918401B2 (en) | 1999-05-31 | 2007-05-23 | 株式会社日立ハイテクノロジーズ | Substrate drying apparatus, drying method, and substrate manufacturing method |
| JP2002022359A (en) | 2000-07-07 | 2002-01-23 | Matsushita Electric Ind Co Ltd | Substrate dryer |
| KR100566406B1 (en) * | 2003-10-01 | 2006-03-31 | 세메스 주식회사 | Apparatus and method for drying a substrates used in manufacturing flat panel display devices |
| JP2005150266A (en) | 2003-11-13 | 2005-06-09 | Pioneer Plasma Display Corp | Manufacturing method of plasma display panel and plasma display device and display panel processor |
| KR20060000936A (en) * | 2004-06-30 | 2006-01-06 | 엘지.필립스 엘시디 주식회사 | Apparatus and method cleaning of substartes |
-
2006
- 2006-06-01 KR KR1020060049410A patent/KR100819714B1/en not_active IP Right Cessation
-
2007
- 2007-04-25 CN CNB2007101047344A patent/CN100547329C/en not_active Expired - Fee Related
- 2007-05-23 TW TW096118394A patent/TWI327636B/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TWI327636B (en) | 2010-07-21 |
| KR100819714B1 (en) | 2008-04-07 |
| TW200811408A (en) | 2008-03-01 |
| CN101082466A (en) | 2007-12-05 |
| KR20070115250A (en) | 2007-12-05 |
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