CN100504530C - 背光模块的清洗装置及清洗方法 - Google Patents
背光模块的清洗装置及清洗方法 Download PDFInfo
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- CN100504530C CN100504530C CNB200510132046XA CN200510132046A CN100504530C CN 100504530 C CN100504530 C CN 100504530C CN B200510132046X A CNB200510132046X A CN B200510132046XA CN 200510132046 A CN200510132046 A CN 200510132046A CN 100504530 C CN100504530 C CN 100504530C
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- backlight module
- nozzle
- cleaning device
- module
- cleaning
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- Cleaning By Liquid Or Steam (AREA)
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNB200510132046XA CN100504530C (zh) | 2005-12-21 | 2005-12-21 | 背光模块的清洗装置及清洗方法 |
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CNB200510132046XA CN100504530C (zh) | 2005-12-21 | 2005-12-21 | 背光模块的清洗装置及清洗方法 |
Publications (2)
Publication Number | Publication Date |
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CN1987582A CN1987582A (zh) | 2007-06-27 |
CN100504530C true CN100504530C (zh) | 2009-06-24 |
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CNB200510132046XA Active CN100504530C (zh) | 2005-12-21 | 2005-12-21 | 背光模块的清洗装置及清洗方法 |
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CN (1) | CN100504530C (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN105629530B (zh) * | 2016-01-19 | 2020-01-24 | 京东方科技集团股份有限公司 | 清洗装置及其使用方法 |
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CN1987582A (zh) | 2007-06-27 |
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C06 | Publication | ||
PB01 | Publication | ||
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SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: CHI LIN TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: QILING PHOTOELECTRIC CO., LTD. Effective date: 20130830 |
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C41 | Transfer of patent application or patent right or utility model | ||
C56 | Change in the name or address of the patentee | ||
CP01 | Change in the name or title of a patent holder |
Address after: Kaohsiung City, Taiwan, China Patentee after: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE Patentee after: CHI LIN OPTRONICS Corp. Address before: Kaohsiung City, Taiwan, China Patentee before: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE Patentee before: Chi Lin Technology Co.,Ltd. |
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TR01 | Transfer of patent right |
Effective date of registration: 20130830 Address after: Kaohsiung City, Taiwan, China Patentee after: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE Patentee after: Chi Lin Technology Co.,Ltd. Address before: Kaohsiung City, Taiwan, China Patentee before: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE Patentee before: CHI LIN OPTRONICS Corp. |