CN100475855C - 聚合反应用的引发剂体系中的芳基亚磺酸盐 - Google Patents

聚合反应用的引发剂体系中的芳基亚磺酸盐 Download PDF

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Publication number
CN100475855C
CN100475855C CNB2004800279921A CN200480027992A CN100475855C CN 100475855 C CN100475855 C CN 100475855C CN B2004800279921 A CNB2004800279921 A CN B2004800279921A CN 200480027992 A CN200480027992 A CN 200480027992A CN 100475855 C CN100475855 C CN 100475855C
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group
aryl
electron
alkyl
positively charged
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Expired - Fee Related
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Chinese (zh)
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CN1860134A (zh
Inventor
拉伊迪普·S·卡尔古特卡尔
迈克尔·C·帕拉佐托
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00—Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C07C313/02—Sulfinic acids; Derivatives thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/20—Protective coatings for natural or artificial teeth, e.g. sealings, dye coatings or varnish
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/30—Compositions for temporarily or permanently fixing teeth or palates, e.g. primers for dental adhesives
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
    • A61K6/00—Preparations for dentistry
    • A61K6/80—Preparations for artificial teeth, for filling teeth or for capping teeth
    • A61K6/884—Preparations for artificial teeth, for filling teeth or for capping teeth comprising natural or synthetic resins
    • A61K6/891—Compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C313/00—Sulfinic acids; Sulfenic acids; Halides, esters or anhydrides thereof; Amides of sulfinic or sulfenic acids, i.e. compounds having singly-bound oxygen atoms of sulfinic or sulfenic groups replaced by nitrogen atoms, not being part of nitro or nitroso groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur

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  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Oral & Maxillofacial Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Epidemiology (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Plastic & Reconstructive Surgery (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
CNB2004800279921A 2003-09-26 2004-08-05 聚合反应用的引发剂体系中的芳基亚磺酸盐 Expired - Fee Related CN100475855C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/672,762 US7030169B2 (en) 2003-09-26 2003-09-26 Arylsulfinate salts in initiator systems for polymeric reactions
US10/672,762 2003-09-26

Publications (2)

Publication Number Publication Date
CN1860134A CN1860134A (zh) 2006-11-08
CN100475855C true CN100475855C (zh) 2009-04-08

Family

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Family Applications (1)

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CNB2004800279921A Expired - Fee Related CN100475855C (zh) 2003-09-26 2004-08-05 聚合反应用的引发剂体系中的芳基亚磺酸盐

Country Status (8)

Country Link
US (2) US7030169B2 (OSRAM)
EP (1) EP1668038B1 (OSRAM)
JP (1) JP4607882B2 (OSRAM)
KR (1) KR101128189B1 (OSRAM)
CN (1) CN100475855C (OSRAM)
AT (1) ATE508142T1 (OSRAM)
DE (1) DE602004032554D1 (OSRAM)
WO (1) WO2005035590A1 (OSRAM)

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US7250452B2 (en) * 2003-09-26 2007-07-31 3M Innovative Properties Company Dental compositions and methods with arylsulfinate salts
US7026367B2 (en) * 2003-09-26 2006-04-11 3M Innovative Properties Company Photoiniators having triarylsulfonium and arylsulfinate ions
US7064152B2 (en) * 2003-09-26 2006-06-20 3M Innovative Properties Company Arylsulfinate salts in photoinitiator systems for polymerization reactions
WO2008015878A1 (fr) * 2006-08-03 2008-02-07 Konica Minolta Medical & Graphic, Inc. Matériau de plaque lithographique photosensible
CN101323650B (zh) * 2007-06-13 2010-11-03 中国石油天然气股份有限公司 一种烯烃聚合催化剂及其制备方法和应用
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WO2009135677A1 (en) * 2008-05-08 2009-11-12 Dentsply Detrey Gmbh Radical polymerisation initiators for light-curable dental materials
US8034851B1 (en) * 2008-11-25 2011-10-11 Henkel Corporation Anaerobic cure systems for an anaerobic curable compositions, and anaerobic curable compositions containing same
EP2368919A1 (de) * 2010-03-25 2011-09-28 Universität des Saarlandes Nanopartikuläre Photoinitiatoren
CA2978556C (en) * 2015-03-02 2022-02-15 Graphene 3D Lab Inc. Thermoplastic composites comprising water-soluble peo graft polymers useful for 3-dimensional additive manufacturing
CN107427414B (zh) * 2015-03-31 2021-07-02 三井化学株式会社 牙科材料用聚合性单体、组合物、粘接性牙科材料及试剂盒
DE102015217418A1 (de) 2015-09-11 2017-03-16 Mühlbauer Technology Gmbh Radikalisch polymerisierbares Dentalmaterial
EP3308765B1 (de) 2016-10-17 2022-07-13 Mühlbauer Technology GmbH Radikalisch polymerisierbare verbindung
JP2020513054A (ja) * 2017-04-10 2020-04-30 サイモン フレーザー 大学Ｓｉｍｏｎ Ｆｒａｓｅｒ Ｕｎｉｖｅｒｓｉｔｙ ポリフェニレン、並びにこれらの製造方法及び使用
EP3501837A1 (en) * 2017-12-21 2019-06-26 Université de Haute Alsace Thermal amplification of free radical polymerization induced by red to near-infrared irradiation
CN111196819B (zh) * 2018-11-16 2023-03-28 中国科学院上海药物研究所 一类d-a-d型苯并吡嗪类化合物及制备方法和应用
CN113621098B (zh) * 2020-05-09 2022-11-04 中国石油天然气股份有限公司 丙烯聚合催化剂、丙烯聚合催化剂体系及其制备与应用
CN113060707A (zh) * 2021-03-16 2021-07-02 成都中建材光电材料有限公司 一种碲化镉废弃组件的回收方法

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Publication number Publication date
JP4607882B2 (ja) 2011-01-05
KR20060099518A (ko) 2006-09-19
ATE508142T1 (de) 2011-05-15
KR101128189B1 (ko) 2012-03-23
EP1668038B1 (en) 2011-05-04
US7329692B2 (en) 2008-02-12
CN1860134A (zh) 2006-11-08
US7030169B2 (en) 2006-04-18
DE602004032554D1 (de) 2011-06-16
EP1668038A1 (en) 2006-06-14
JP2007506834A (ja) 2007-03-22
US20050070622A1 (en) 2005-03-31
US20060111462A1 (en) 2006-05-25
WO2005035590A1 (en) 2005-04-21

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