CN100470376C - High resolution ratio micro optical device parallel direct-writing producing method and producing system - Google Patents
High resolution ratio micro optical device parallel direct-writing producing method and producing system Download PDFInfo
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- CN100470376C CN100470376C CNB2007100346601A CN200710034660A CN100470376C CN 100470376 C CN100470376 C CN 100470376C CN B2007100346601 A CNB2007100346601 A CN B2007100346601A CN 200710034660 A CN200710034660 A CN 200710034660A CN 100470376 C CN100470376 C CN 100470376C
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Abstract
The invention discloses a high resolution micro optical device parallel direct write making method and system, adopting electric addressing spatial light modulator, implements light intensity modulation by computer control and adopts time fractionizing method to expand dynamic range of exposure, and implement light intensity modulation fractionization and obtains high resolution photoetching exposure of exposure dosage and spatial positions; it adopts a high reduction power optical system based on combination of Fourier transform lens and objective to make the smallest characteristic size of the made micro optical device reach micron and submicron levels. And it uses the pattern splicing technique to make large-sized micro optical devices. And it has inherent parallel characteristic by adopting a method of making surface exposure on patterns one by one, largely increasing making rate and accuracy of micro optical devices and reducing production cost and the device structure is simple and reliable.
Description
Technical field
The present invention relates to micro-optical device and make the field, be specifically related to a kind of high resolving power parallel direct-writing producing method of micro-optical device.
Background technology
The laser direct-writing technology be along with the development of large scale integrated circuit in 20th century the mid-80 propose, though historical and not very long, obtained significant progress.In the early 1990s, laser direct writing system begins to be widely used in the making of micro-optical device, has improved the performance of micro-optical device greatly, for applying of micro-optic technology laid a good foundation.
Existing comparatively ripe laser direct writing system mostly is the pointwise exposure type, and it directly writes focal spot size is micron order, and the minimum feature size that can realize also can only reach micron order.Because the Gaussian distribution characteristic of laser beam cross-section light intensity makes that the micro-optical device surface ratio that processes is more coarse.Moreover the representative value of its trace interval is that writing speed is generally about 10mm/s about 1 μ m, and the exposure of finishing a 10mm disk needs 1～2 hour, and writing speed is very slow.In addition, though excimer laser ablation method, laser deposition and etching method can be included into laser direct-writing series, resolution was lower when the former made optical device, and latter's complex manufacturing technology, cost are higher, and the two all is not widely used.
Summary of the invention
Technical matters to be solved by this invention is the defective that overcomes above-mentioned prior art, a kind of employing face Exposure mode of exposing of figure one by one is provided, make it have inherent parallel characteristics, the manufacturing speed and the precision of micro-optical device have been improved greatly, shorten the production cycle, characteristic dimension can reach micron and sub-micrometer scale, and device structure is simple and reliable, the high resolving power micro optical device parallel direct-writing producing method that production cost is low.
For solving the problems of the technologies described above, the present invention adopts following technical proposals.
High resolving power micro optical device parallel direct-writing producing method of the present invention, it is characterized in that it is with electrical addressing spatial light modulator, link to each other with computing machine by lead, by computing machine input and control figure signal, the vertical directive electrical addressing spatial light modulator of parallel beam, electrical addressing spatial light modulator carries out intensity modulation to light beam, and adopt the time close classification that intensity modulation is segmented, modulated light beam is through the high-precision demagnification rate optical system of Fourier transform lens and object lens combination, the GTG figure final minification that shows on the electrical addressing spatial light modulator is imaged on the substrate that scribbles photoresist that places on the two-dimentional precision displacement platform, on-chip photoresist coating is exposed, by moving two-dimentional precision displacement platform, and switch display graphics on the electrical addressing spatial light modulator synchronously by computer control, mode with splicing is exposed to the monoblock substrate, again substrate is comprised development, photoetching treatment operations such as cleaning and post bake.
Described time close classification is:
(1). the single exposure time T is subdivided into the individual interval delta T of M (M is a time segmentation multiple, for more than or equal to 2 integer), Δ T=T/M;
(2). show that by the different pixels of computer control the time of predetermined GTG value is t
1, and t
1Be the integral multiple of Δ T, i.e. t
1=m * Δ T; M is a time segmentation number, and m is more than or equal to 1, smaller or equal to the integer of M;
(3). show that by the different pixels of computer control the time of 0 GTG value is t
2, and t
2=(M-m) * Δ T;
The intensity modulation multiple increases M doubly, and the GTG value that is equivalent to the spatial light modulator demonstration is expanded M doubly.
The high-precision demagnification rate optical system of described Fourier transform lens and object lens combination, the focal distance f of selection Fourier transform lens
1, object lens focal distance f
2, spatial light modulator between the Fourier transform lens apart from d
1And spatial filter between the object lens apart from d
2, the lateral magnification β that obtains optical system is 0.01～0.1, realizes the high-precision demagnification rate requirement of optical system, makes the minimum feature size of made micro-optical device reach micron and sub-micrometer scale, lateral magnification β is calculated as follows
Method of the present invention comprises following concrete steps:
(1). according to the position requirement mutually that will make micro-optical device, converse the exposure intensity of each point on the substrate; According to the beam intensity in the optical system, further determine time shutter T; By the fineness requirement of the profile that will make micro-optical device, determine time segmentation multiple M again; Determine the modulation GTG value of each pixel on the spatial light modulator and time segmentation number m by the exposure intensity of each point, m is more than or equal to 1, smaller or equal to the integer of M;
(2). the figure in the computing machine generates software and generates series plot automatically according to the micro-optical device type of required making and the correlation parameter of optical system, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator successively, described spatial light modulator is the transmission-type electrical addressing spatial light modulator;
(3). the light that light source sends becomes parallel beam behind the beam-expanding collimation device, vertical directive transmission-type electrical addressing spatial light modulator;
(4). spatial light modulator carries out intensity modulated and time segmentation modulation to light beam;
(5). see through the modulated beam of light of spatial light modulator, behind Fourier transform lens, spatial filter and object lens, final minification images on the substrate, and on-chip photoresist coating is exposed;
(6). move two-dimentional precision displacement platform, and switch display graphics on the spatial light modulator synchronously, the monoblock substrate is exposed in the mode of splicing by computer control;
(7). substrate is comprised photoetching treatment operations such as development, cleaning and post bake.
Method of the present invention comprises following concrete steps:
(1). according to the position requirement mutually that will make micro-optical device, converse the exposure intensity of each point on the substrate; According to the beam intensity in the optical system, further determine time shutter T; By the fineness requirement of the profile that will make micro-optical device, determine time segmentation multiple M again; Determine the modulation GTG value of each pixel on the spatial light modulator and time segmentation number m by the exposure intensity of each point, m is more than or equal to 1, smaller or equal to the integer of M;
(2). the figure in the computing machine generates software and generates series plot automatically according to the micro-optical device type of required making and the correlation parameter of optical system, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator successively, described spatial light modulator is the reflection-type electrical addressing spatial light modulator;
(3). the light that light source sends becomes parallel beam behind the beam-expanding collimation device, the directive beam splitter is by vertical directive reflection-type electrical addressing spatial light modulator behind the beam splitter reflection;
(4). spatial light modulator carries out intensity modulated and time segmentation modulation to light beam;
(5). by the modulated beam of light of spatial light modulator reflection, behind beam splitter, Fourier transform lens, spatial filter and object lens, final minification images on the substrate, and on-chip photoresist coating is exposed;
(6). move two-dimentional precision displacement platform, and switch display graphics on the spatial light modulator synchronously, the monoblock substrate is exposed in the mode of splicing by computer control;
(7). substrate is comprised photoetching treatment operations such as development, cleaning and post bake.
The present invention realizes the micro optical device parallel direct-writing manufacturing system of said method, it is characterized in that it comprises electrical addressing spatial light modulator, Fourier transform lens, spatial filter, object lens and the two-dimentional precision displacement platform of the light vertical irradiation that is sent by light source that is arranged in order in the following order on optical axis, also comprise and be provided with the computing machine that figure generates software in the machine, spatial filter places on the back focal plane of Fourier transform lens, and spatial light modulator is connected with the display video expansion delivery outlet of computing machine by lead.
Described electrical addressing spatial light modulator is the transmission-type electrical addressing spatial light modulator, is being provided with light source and the beam-expanding collimation device that is arranged in order on the optical axis before the transmission-type electrical addressing spatial light modulator.
Described electrical addressing spatial light modulator is the reflection-type electrical addressing spatial light modulator, described optical axis is divided into the primary optic axis line and second optical axis, the reflection-type electrical addressing spatial light modulator, Fourier transform lens, spatial filter, object lens and two-dimentional precision displacement platform are arranged in order on the primary optic axis line by above order, between reflection-type electrical addressing spatial light modulator and Fourier transform lens, be provided with beam splitter, on second optical axis, be provided with the light source and the beam-expanding collimation device that are arranged in order, the primary optic axis line and second optical axis intersect vertically at the beam splitter place, and the angle of the normal of beam splitter and two optical axis is 45 °.
Described light source is a ultraviolet source, or the He-Cd laser instrument.
The present invention adopts electrical addressing spatial light modulator, and the display video expansion delivery outlet by lead and computing machine is connected, and by computer control and input modulating signal, the light beam of vertical irradiation is carried out intensity modulated, to form high-quality GTG figure.Utilize high-precision demagnification rate optical system again, micro-optical device is carried out the face exposure, and each point exposure intensity digital quantization is controlled on the plane of exposure based on Fourier transform lens and object lens combination.
High-precision demagnification rate optical system based on Fourier transform lens and object lens combination, the focal length, spatial light modulator of suitably selecting focal length, the object lens of Fourier transform lens to the distance between the Fourier transform lens, spatial filter to the distance between the object lens, can realize the high-precision demagnification rate requirement of optical system, make the minimum feature size of made micro-optical device reach micron and sub-micrometer scale.Derive through theory, the lateral magnification of optical system is as can be known:
In the following formula, f
1Be the focal length of Fourier transform lens, f
2Be the focal length of object lens, d
1Be that spatial light modulator is to the distance between the Fourier transform lens, d
2Be that spatial filter is to the distance between the object lens.Be to reduce the size of optical system, allow d
1＜＜f
1Suitably select f
1, f
2, d
1, d
2Numerical value, can realize the high-precision demagnification rate requirement of optical system.Such as making f
1=500mm, f
2=5mm, d
1=30mm, d
2=5mm, β=0.01 as can be known as calculated, promptly the convergent-divergent multiplying power of optical system is 100: 1; And for example make f
1=185mm, f
2=4.64mm, d
1=18.5mm, d
2=6mm, β=0.025 as can be known as calculated, promptly the convergent-divergent multiplying power of optical system is 40: 1.The size of the general single pixel of spatial light modulator is 20 μ m～30 μ m, after 40 times of this optical system final minification, the size of its picture is 0.5 μ m～0.75 μ m, so this parallel direct-writing method can be made the micro-optical device that minimum feature size reaches micron and sub-micrometer scale.
The present invention makes the large scale micro-optical device with connecting method.Generally speaking, the area of single exposure is 0.1mm
2～1mm
2The order of magnitude for the micro-optical device with large-size, needs through multiexposure, multiple exposure.Utilize the graphic joining technology, by moving two-dimentional precision displacement platform, and switch display graphics on the spatial light modulator synchronously, in the mode of splicing the monoblock substrate is exposed, thereby make large-sized micro-optical device by computer control.
The face exposure intensity of micro-optical device of the present invention distributes, can think original figure and the formed result of point spread function generation convolution effect on the spatial light modulator, this point spread function has been described the optical characteristics of micro optical device parallel direct-writing manufacturing system.Because convolution has the effect of filtering, level and smooth fine structure, so this method can obtain very smooth surface smoothness.On the other hand, also just because of this convolution effect, overcome " black grid " effect of spatial light modulator preferably.
Beneficial effect of the present invention is:
(1). adopting one by one, the graph exposure mode makes it have inherent parallel characteristics, exposure area is equivalent to the workload that pointwise exposure type laser direct writing system just can be finished in tens of minutes each time, can improve straight writing rate greatly, shorten the production cycle, cut down finished cost, device structure is simple and reliable;
(2). adopt the projection optical system of high-precision demagnification rate, select the spatial light modulator of pixel dimension little (is 20 μ m such as the pixel spacing) can make the minimum feature size of the micro-optical device of being processed reach micron even sub-micrometer scale;
(3). the high contrast features of spatial light modulator, the dynamic range of employing time close classification extended exposure amount, the segmentation of realization intensity modulation, obtain the high resolving power quantified controlling of exposure dose, and reduce micro-optical device deep processing error, can produce high-performance micro-optical device hyperfine labyrinth, continuous profile;
(4). utilize the graphic joining technology, can make large-sized micro-optical device;
(5). the required electrical addressing spatial light modulator of this method is shiploads of merchandiseization at present, other device buy or the cost of development all lower, can realize the cheap of parallel direct-writing equipment.
Description of drawings
Fig. 1 is the manufacturing system synoptic diagram of the embodiment of the invention 1;
Fig. 2 is the manufacturing system synoptic diagram of the embodiment of the invention 2;
Fig. 3 is a system of the present invention control flow synoptic diagram.
Embodiment
Below in conjunction with embodiment and contrast accompanying drawing the present invention is described in further details.
Embodiment 1:
As shown in Figure 1, this micro optical device parallel direct-writing manufacturing system comprises light source 1, beam-expanding collimation device 2, transmission-type electrical addressing spatial light modulator 3, Fourier transform lens 4, spatial filter 5, object lens 6 and the two-dimentional precision displacement platform 7 that is arranged in order in the following order on optical axis 10.Also comprise and be provided with the computing machine 9 that figure generates software in the machine, spatial filter 5 places on the back focal plane of Fourier transform lens 4, spatial light modulator 3 is connected with the display video expansion delivery outlet of computing machine 9 by lead, and by computing machine 9 control and tablet pattern signals.Light source 1 is a ultraviolet source, also can be the He-Cd laser instrument.Two dimension precision displacement platform 7 links to each other with computing machine 9, and two-dimentional precision displacement platform 7 also can be by another computer control.The substrate 8 that scribbles photoresist during work places on the two-dimentional precision displacement platform 7.
Select corresponding systematic parameter to be: single exposure time T=0.05 second, time segmentation multiple M=10, time interval Δ T=0.005 second then, as seen adopt the time close classification to realize the intensity modulation segmentation, make the intensity modulation multiple increase 10 times, the GTG value that is equivalent to spatial light modulator 3 demonstrations is expanded 10 times; Make the focal distance f of Fourier transform lens 4
1The focal distance f of=185mm, object lens 6
2=4.64mm, spatial light modulator 3 between the Fourier transform lens 4 apart from d
1=18.5mm, spatial filter 5 between the object lens 6 apart from d
2=6mm, β=0.025 as can be known as calculated, promptly the convergent-divergent multiplying power of this optical system is 40: 1, and spatial light modulator adopts transmission type lcd device LCD, and model is SVGA1.
Utilize above-mentioned micro optical device parallel direct-writing manufacturing system, the parallel direct-writing producing method of making the high resolving power micro-optical device is:
(1). according to the position requirement mutually of micro-optical device, converse the exposure intensity of each point on the substrate 8, determine the modulation GTG value and the time segmentation number m of each pixel on the transmission-type electrical addressing spatial light modulator 3 by the exposure intensity of each point; According to certain any exposure intensity and the beam intensity in the optical system on the substrate 8, determine that corresponding pixel on the spatial light modulator 3 shows the time t of predetermined GTG value
1=0.015 second, and time interval Δ T=0.005 second, so the time of this pixel segmentation number m=3; Then this pixel shows the time t of 0 GTG value
2=(M-m) * Δ T=(10-3) * 0.005=0.035 second.Have a few all by handling on the substrate 8 with quadrat method.
(2). the figure in the computing machine 9 generates software according to the micro-optical device type of required making and the correlation parameter of optical system, generates series plot automatically, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator 3 successively;
(3). the light that light source 1 sends becomes parallel beam behind beam-expanding collimation device 2, vertical directive spatial light modulator 3;
(4). 3 pairs of light beams of spatial light modulator carry out intensity modulated and time segmentation modulation;
(5). see through the modulated beam of light of spatial light modulator 3, behind Fourier transform lens 4, spatial filter 5 and object lens 6, final minification images on the substrate 8, and the photoresist coating on the substrate 8 is exposed;
(6). move two-dimentional precision displacement platform 7, and by the synchronous display graphics that switches on the spatial light modulator 3 of computing machine 9 controls, when every switching on the spatial light modulator 3 shows a width of cloth figure, the command adapted thereto that two dimension precision displacement platform 7 provides according to computing machine 9, carry out the translation motion of x, y two directions, and the displacement signal that obtains to measuring unit according to x, y, form closed-loop control, make two-dimentional precision displacement platform move to next suitable position 7 within a short period of time, then the photoresist to a fritter area exposes.And so forth, successively the series plot that shows on the spatial light modulator 3 is recorded in the diverse location of photoresist, thereby monoblock substrate 8 is exposed in the mode of splicing.Correlation parameter according to generating each parts in series plot, spatial light modulator 3 itself and the system can obtain two-dimentional precision stage 7 at x, the each displacement of y two directions.The control flow of system as shown in Figure 3.
(7). to substrate 8 develop, processing such as cleaning and post bake.
As shown in Figure 3, system of the present invention control flow is as follows, and after powering on, System self-test if each subsystem work is undesired, just shows error message on computing machine 9, and system quits work.After each subsystem work was normal, computing machine preestablished the groundwork parameter of each subsystem.The micro-optical device type and the requirement of Zhi Zuoing as required is provided with the correlation parameter of micro-optical device.Simultaneously substrate 8 is carried out pre-service, on substrate 8, implement exposure processing procedures in early stage such as coating photoresist and oven dry.Figure generates software according to the micro-optical device type of required making and the correlation parameter of optical system in the computing machine 9, generates series plot automatically, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator (SLM) 3 successively.When every switching on the spatial light modulator 3 shows a width of cloth figure, the command adapted thereto that two dimension precision displacement platform 7 provides according to computing machine 9, carry out the translation motion of x, y two directions, and the displacement signal that obtains to measuring unit according to x, y, form closed-loop control, make two-dimentional precision displacement platform move to next suitable position 7 within a short period of time, then the photoresist to a fritter area exposes, and by the 9 timing controlled time shutter of computing machine.And so forth, successively the series plot that shows on the spatial light modulator 3 is recorded in the diverse location of photoresist.Correlation parameter according to generating each parts in series plot, spatial light modulator 3 itself and the system can obtain two-dimentional precision displacement platform 7 at x, the each displacement of y two directions, thereby in the mode of splicing monoblock substrate 8 be exposed.After exposure is finished, to substrate 8 develop, exposure post-processed processes such as cleaning and post bake.
Embodiment 2:
As shown in Figure 2, this micro optical device parallel direct-writing manufacturing system, comprise the reflection-type electrical addressing spatial light modulator 3 that on primary optic axis line 12, is arranged in order in the following order, beam splitter 11, Fourier transform lens 4, spatial filter 5, object lens 6 and two-dimentional precision displacement platform 7, also be included in light source 1 and beam-expanding collimation device 2 on second optical axis 13, also comprise and be provided with the computing machine 9 that figure generates software in the machine, the primary optic axis line 12 and second optical axis 13 intersect vertically at beam splitter 11 places, the angle of the normal of beam splitter 11 and two optical axis is 45 °, spatial filter 5 places on the back focal plane of Fourier transform lens 4, spatial light modulator 3 is connected with the display video expansion delivery outlet of computing machine 9 by lead, and by computing machine 9 control and tablet pattern signals.Light source 1 is a ultraviolet source, also can be the He-Cd laser instrument.Two dimension precision displacement platform 7 links to each other with computing machine 9, and two-dimentional precision displacement platform 7 also can be by another computer control.The substrate 8 that scribbles photoresist during work places on the two-dimentional precision displacement platform 7.
Select corresponding systematic parameter to be: single exposure time T=0.05 second, time segmentation multiple M=10, and time interval Δ T=0.005 second, as seen adopt the time close classification to realize the intensity modulation segmentation, make the intensity modulation multiple increase 10 times, the GTG value that is equivalent to the spatial light modulator demonstration is expanded 10 times; Make f
1=185mm, f
2=4.64mm, d
1=18.5mm, d
2=6mm, β=0.025 as can be known as calculated, promptly the convergent-divergent multiplying power of optical system is 40: 1.Spatial light modulator adopts digital micro-mirror device DMD, and model is XGA2.
The parallel direct-writing producing method of micro-optical device is:
(1). according to the position requirement mutually of micro-optical device, converse the exposure intensity of each point on the substrate 8, determine the modulation GTG value and the time segmentation number m of each pixel on the spatial light modulator by the exposure intensity of each point; According to certain any exposure intensity and the beam intensity in the optical system on the substrate 8, determined that corresponding pixel on the spatial light modulator 3 shows the time t of predetermined GTG value
1=0.015 second, and time interval Δ T=0.005 second, so the time of this pixel segmentation number m=3; Then this pixel shows the time t of 0 GTG value
2=(M-m) * Δ T=(10-3) * 0.005=0.035 second.Have a few all by handling on the substrate 8 with quadrat method.
(2). the figure in the computing machine 9 generates software according to the micro-optical device type of required making and the correlation parameter of optical system, generates series plot automatically, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator 3 successively;
(3). the light that light source 1 sends becomes parallel beam behind beam-expanding collimation device 2, directive beam splitter 11 is by the vertical directive spatial light modulator 3 in beam splitter 11 reflection backs;
(4). 3 pairs of light beams of spatial light modulator carry out intensity modulated and time segmentation modulation;
(5). by the modulated beam of light of spatial light modulator 3 reflections, behind beam splitter 11, Fourier transform lens 4, spatial filter 5 and object lens 6, final minification images on the substrate 8, and the photoresist coating on the substrate 8 is exposed;
(6). move two-dimentional precision displacement platform 7, and, monoblock substrate 8 is exposed in the mode of splicing by the synchronous display graphics that switches on the spatial light modulator 3 of computing machine 9 controls;
(7). to substrate 8 develop, processing such as cleaning and post bake.
Claims (5)
1, a kind of high resolving power micro optical device parallel direct-writing producing method, it is characterized in that it is with electrical addressing spatial light modulator, link to each other with computing machine by lead, by computing machine input and control figure signal, the vertical directive electrical addressing spatial light modulator of parallel beam, electrical addressing spatial light modulator carries out intensity modulation to light beam, and adopt the time close classification that intensity modulation is segmented, modulated light beam is through the high-precision demagnification rate optical system of Fourier transform lens and object lens combination, the GTG figure final minification that shows on the electrical addressing spatial light modulator is imaged on the substrate that scribbles photoresist that places on the two-dimentional precision displacement platform, on-chip photoresist coating is exposed, by moving two-dimentional precision displacement platform, and switch display graphics on the electrical addressing spatial light modulator synchronously by computer control, mode with splicing is exposed to the monoblock substrate, again substrate is comprised development, the photoetching treatment operation of cleaning and post bake; Described time close classification is:
(1). the single exposure time T is subdivided into M interval delta T, and Δ T=T/M, M are time segmentation multiple, for more than or equal to 2 integer;
(2). show that by the different pixels of computer control the time of predetermined GTG value is t
1, and t
1Be the integral multiple of AT, i.e. t
1=m * AT; M is a time segmentation number, and m is more than or equal to 1, smaller or equal to the integer of M;
(3). show that by the different pixels of computer control the time of 0 GTG value is t
2, and t
2=(M-m) * Δ T;
The intensity modulation multiple increases M doubly, and the GTG value that is equivalent to the spatial light modulator demonstration is expanded M doubly.
2, high resolving power micro optical device parallel direct-writing producing method according to claim 1 is characterized in that the high-precision demagnification rate optical system that described Fourier transform lens and object lens make up, and selects the focal distance f of Fourier transform lens
1, object lens focal distance f
2, spatial light modulator between the Fourier transform lens apart from d
1And spatial filter between the object lens apart from d
2, the lateral magnification β that obtains optical system is 0.01～0.1, realizes the high-precision demagnification rate requirement of optical system, makes the minimum feature size of made micro-optical device reach micron and sub-micrometer scale, lateral magnification β is calculated as follows
3, high resolving power micro optical device parallel direct-writing producing method according to claim 1 and 2 is characterized in that it comprises the steps:
(1). according to the position requirement mutually that will make micro-optical device, converse the exposure intensity of each point on the substrate; According to the beam intensity in the optical system, further determine time shutter T; By the fineness requirement of the profile that will make micro-optical device, determine time segmentation multiple M again; Determine the modulation GTG value of each pixel on the spatial light modulator and time segmentation number m by the exposure intensity of each point, m is more than or equal to 1, smaller or equal to the integer of M;
(2). the figure in the computing machine generates software and generates series plot automatically according to the micro-optical device type of required making and the correlation parameter of optical system, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator successively, described spatial light modulator is the transmission-type electrical addressing spatial light modulator;
(3). the light that light source sends becomes parallel beam behind the beam-expanding collimation device, vertical directive transmission-type electrical addressing spatial light modulator;
(4). spatial light modulator carries out intensity modulated and time segmentation modulation to light beam;
(5). see through the modulated beam of light of spatial light modulator, behind Fourier transform lens, spatial filter and object lens, final minification images on the substrate, and on-chip photoresist coating is exposed;
(6). move two-dimentional precision displacement platform, and switch display graphics on the spatial light modulator synchronously, the monoblock substrate is exposed in the mode of splicing by computer control;
(7). substrate is comprised the photoetching treatment operation of development, cleaning and post bake.
4, high resolving power micro optical device parallel direct-writing producing method according to claim 1 and 2 is characterized in that:
(1). according to the position requirement mutually that will make micro-optical device, converse the exposure intensity of each point on the substrate; According to the beam intensity in the optical system, further determine time shutter T; By the fineness requirement of the profile that will make micro-optical device, determine time segmentation multiple M again; Determine the modulation GTG value of each pixel on the spatial light modulator and time segmentation number m by the exposure intensity of each point, m is more than or equal to 1, smaller or equal to the integer of M;
(2). the figure in the computing machine generates software and generates series plot automatically according to the micro-optical device type of required making and the correlation parameter of optical system, and through display video expansion delivery outlet this series plot is presented on the spatial light modulator successively, described spatial light modulator is the reflection-type electrical addressing spatial light modulator;
(3). the light that light source sends becomes parallel beam behind the beam-expanding collimation device, the directive beam splitter is by vertical directive reflection-type electrical addressing spatial light modulator behind the beam splitter reflection;
(4). spatial light modulator carries out intensity modulated and time segmentation modulation to light beam;
(5). by the modulated beam of light of spatial light modulator reflection, behind beam splitter, Fourier transform lens, spatial filter and object lens, final minification images on the substrate, and on-chip photoresist coating is exposed;
(6). move two-dimentional precision displacement platform, and switch display graphics on the spatial light modulator synchronously, the monoblock substrate is exposed in the mode of splicing by computer control;
(7). substrate is comprised the photoetching treatment operation of development, cleaning and post bake.
5, high resolving power micro optical device parallel direct-writing producing method according to claim 1 and 2 is characterized in that described electrical addressing spatial light modulator is the transmission-type electrical addressing spatial light modulator, or is the reflection-type electrical addressing spatial light modulator.
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| CN113296364B (en) * | 2020-02-24 | 2022-07-26 | 苏州苏大维格科技集团股份有限公司 | Photoetching control method, device and storage medium |
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