CN100468667C - Semiconductor chip and lead-out wire welding, packaging ceramic welding mold - Google Patents

Semiconductor chip and lead-out wire welding, packaging ceramic welding mold Download PDF

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Publication number
CN100468667C
CN100468667C CNB2006100411305A CN200610041130A CN100468667C CN 100468667 C CN100468667 C CN 100468667C CN B2006100411305 A CNB2006100411305 A CN B2006100411305A CN 200610041130 A CN200610041130 A CN 200610041130A CN 100468667 C CN100468667 C CN 100468667C
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China
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boron nitride
powder
lead
out wire
weld
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Expired - Fee Related
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CNB2006100411305A
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Chinese (zh)
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CN1909201A (en
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许行彪
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Abstract

The invention relates to an improvement on the welding and packing ceramic mould between semi-conductor and lead-out wire, wherein it is characterized in that: it coats boron nitride on the surface of shaped/sintered silicon or silicon nitride at 51-100wt%, and the boron nitride at 0-49wt%. And the obtained welding module can be used in 600-950Deg. C high-temperature welding and packing. And the product will not deform in long time at high temperature, and the glass package will not adhere with glass.

Description

A kind ofly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire
Technical field
The present invention is to the follow-up improvement application of the Chinese patent 200410071751.9 of the previous application of applicant, relates in particular to a kind of long service life, especially the ceramic welding mold that encapsulates applicable to glass bulb.
Background technology
The applicant is in Chinese patent 200410071751.9, a kind of electron trade semiconductor device for example diode, triode, bridge heap etc. are disclosed, chip and lead-out wire welding, encapsulating mould, medium-term and long-term graphite or the metal solder mould that uses of the relative industry of this mould has very big progress, for welding and the Plastic Package of temperature requirement at 300-500 ℃, have good result of use, prolong useful life greatly, and solder yield improves greatly.Yet find in actual use,, glass bulb and the mould phenomenon that bonds mutually still can occur, can cause the glass bulb breakage when unloading and scrap the higher for example 600-950 of temperature requirement ℃ glass bulb encapsulation.Therefore still having is worth improved place.
Summary of the invention
The objective of the invention is to overcome the deficiency of above-mentioned prior art, provide a kind of package temperature that is applicable to higher, especially the semiconductor chip of glass bulb encapsulation and lead-out wire welding, packaging ceramic welding mold.
The object of the invention realizes that main the improvement is to select to adopt metallic silicon power or Sialon or silicon nitride powder to make main material, is mixed to rare boron nitride; Or adopt all-metal silica flour or Sialon or silicon nitride powder molding sintering, again at forming and sintering mould surface-coated boron nitride, by blending and/or surface-coated boron nitride, thereby solve the technical barrier of glass bulb sticking to mould in welding, the encapsulation process, realized the object of the invention.Specifically, semiconductor chip of the present invention and lead-out wire welding, packaging ceramic welding mold, form through mold pressing, sintering by ceramic powder, it is characterized in that said ceramic powder is metallic silicon or Sialon or the silicon nitride of 51-100wt%, the boron nitride of 0-49wt%, and/or the forming and sintering rear surface applies boron nitride.
The present invention is by a large amount of tests, acquisition is added boron nitride powder in metallic silicon power or Sialon or silicon nitride powder raw material, or at sintering mold surface-coated boron nitride, make ceramic welding mold can effectively resist the erosion bonding of high-temperature fusion encapsulation glass bulb, overcome the ceramic welding mold of before having applied for a patent and be used for glass bulb and encapsulate dissatisfactory defective.
For prolonging the useful life of welding mould, reduce and reduce useful life because of use causes coating shedding, the present invention adds boron nitride powder to mix mold pressing in the material, wherein is more preferably except that being mixed with boron nitride and sprays or brush boron nitride again in the sintering rear surface.The adding of boron nitride, test shows the raising along with package temperature, the boron nitride used in amounts increases, for example package temperature is 650 ℃, the boron nitride addition can promptly have better effects between 15-30wt%, and package temperature is more than 800 ℃ the time, and the boron nitride addition is increased to then better effects if of 40-49wt%.
From the economy angle, metallic silicon of the present invention or Sialon or silicon nitride, with the boron nitride proportioning can also be 60-96wt%:4-40wt%, and 70-90wt%:10-30wt%.
Simultaneously, find by test, raising along with metallic silicon power or Sialon consumption, it is big that sintering mold fragility becomes, and the mould made of simple metal silica flour especially becomes silicon nitride after nitridation sintered, fragility is very big, in use occur the nib chipping easily, cause the chipping district not use, chipping is crossed and is caused the welding mould to scrap at most.By test, add 0-30wt% as alumina powder, calcium oxide, zirconium mullite, carborundum, silicon nitride, cordierite, aluminium nitride, aluminium powder, B 2O 3, in the silicon dioxide a kind of or several, suitably reduce preceding two class material consumptions, not only can increase the toughness of sintering mold, reduce or eliminate the chipping phenomenon and take place, and can also acceleration of sintering, reduce sintering temperature, shortening sintering time.
Sintering mold surface-coated boron nitride of the present invention can be cold conditions spraying or brushing, makes surface wettability during as the mould cold conditions, sprays or brush the formation cover layer with boron nitride powder, covers die surface; Also can adopt hot spray process, thermal sprayings such as for example known plasma spraying, flame-spraying, supersonic spray coating.Test is compared, and the thermal spraying effect is better than cold coating, can keep the longer time not come off, thereby increase the service life.
The present invention can be as previous patent Extra Section binding agent for helping the ceramic powder compression molding, and described binding agent does not have exquisite especially, can adopt pottery binding agent commonly used, polyvinyl alcohol (PVA) for example, yellow starch gum, white dextrin, paper pulp etc. are for the moulding of powder provides initial adhesion.
The present invention is owing to select to adopt metallic silicon power or Sialon or silicon nitride powder to make main material, and by adding boron nitride powder, and/or the forming and sintering rear surface applies boron nitride, make gained welding mould, not only can be used for 600-950 ℃ of high-temperature soldering, encapsulation, in high temperature, use the shape that remains unchanged for a long period of time, and be used for the not sticking glass of glass bulb encapsulation, can use for a long time, and keep high rate of finished products.In addition, by adding part as alumina powder, calcium oxide, zirconium mullite, carborundum, silicon nitride, cordierite, aluminium nitride, aluminium powder, B 2O 3, in the silica a kind of or several, also effectively eliminated the generation of chipping phenomenon.
Below in conjunction with several embodiments, further specify the present invention, but the concrete parameter of embodiment not the concrete qualification to the present invention's protection.
Embodiment
Embodiment 1: metallic silicon power or Sialon 100%, add the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 2: metallic silicon power or Sialon 55%, and boron nitride powder 40%, aluminium nitride 5% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 3: metallic silicon power or Sialon65%, and boron nitride powder 30%, aluminium nitride 5% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 4: metallic silicon power or Sialon77%, and boron nitride powder 20%, aluminium nitride 3% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 5: metallic silicon power or Sialon 95%, and boron nitride powder 5% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 6: metallic silicon power 80%, boron nitride powder 10%, alumina powder 5%, calcium oxide 4%, B 2O 31%, add the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 7: metallic silicon power 85%, and boron nitride powder 10%, silica powder 5% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 8: metallic silicon power 80%, and zirconium mullite powder 14%, alumina powder 6% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at two surface spraying or brushing boron nitride powders.
Embodiment 9: metallic silicon power 70%, and boron nitride powder 10%, alumina powder 10%, zirconium mullite 10% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 10: metallic silicon power or Sialon 90%, and carborundum powder 10% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying boron nitride powder.
Embodiment 11: metallic silicon power or Sialon 80%, and carborundum powder 10%, boron nitride powder 10% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 12: metallic silicon power 70%, and silicon nitride powder 30% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying boron nitride powder.
Embodiment 13: metallic silicon power 70%, and silicon nitride powder 20%, boron nitride powder 10% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 14: metallic silicon power 90%, and synthesis of dichroite powder 10% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 15: metallic silicon power 85%, and synthesis of dichroite powder 5%, zirconium mullite powder 10% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 16: metallic silicon power 74%, and synthesis of dichroite powder 8%, zirconium mullite 8%, boron nitride powder 10% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 17: metallic silicon power 77%, and synthesis of dichroite powder 5%, boron nitride powder 15%, aluminium nitride 3% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 18: metallic silicon power 67%, and mullite powder 8%, boron nitride powder 20%, aluminium powder and/or aluminium nitride 5% add the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 19: metallic silicon power 90%, and zirconium mullite powder 10% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 20: metallic silicon power 75%, and carborundum powder 10%, silica powder 5%, boron nitride powder 10% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 21: metallic silicon power 95%, and silica powder 5% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
Embodiment 22: metallic silicon power 90%, and aluminium oxide 10% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying boron nitride powder.
Embodiment 23: metallic silicon power 85%, and mullite 15% adds the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying boron nitride powder.
Embodiment 24: silicon nitride powder 70%, and boron nitride powder 25%, aluminum nitride powder 5% adds the 0.8-4% binding agent, compression molding, nitriding atmosphere sintering.
Embodiment 25: silicon nitride powder 100%, add the 0.8-4% binding agent, and compression molding is behind the nitriding atmosphere sintering, at surface spraying or brushing boron nitride powder.
In addition, be added with boron nitride powder among the embodiment, also can also apply boron nitride again in the surface behind sintering.It can be the cold conditions spraying that boron nitride applies, and also can be thermal spraying.Above embodiment, sintering temperature is about 1450 ± 10 ℃.
Percentage amounts among the present invention does not have special instruction, all refers to the weight percent amount.

Claims (7)

1, a kind ofly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, form through mold pressing, sintering by ceramic powder, it is characterized in that said ceramic powder is metallic silicon or Sialon or the silicon nitride of 51-100wt%, the boron nitride of 0-49wt%, the forming and sintering rear surface applies boron nitride.
2, according to claim 1 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that boron nitride adds in the component material.
3, according to claim 2 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that metallic silicon or Sialon or silicon nitride and boron nitride proportioning are 60-96wt%:4-40wt%.
4, according to claim 3 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that metallic silicon or Sialon or silicon nitride and boron nitride proportioning are 70-90wt%:10-30wt%.
5, according to claim 1,2,3 or 4 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that the boron nitride consumption improves and increases along with serviceability temperature.
6, according to claim 5 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that having alumina powder, calcium oxide, zirconium mullite, carborundum, silicon nitride, cordierite, aluminium nitride, aluminium powder, the B of 0-30wt% 2O 3, in the silicon dioxide a kind of or several.
7, according to claim 1 describedly be used to weld, the ceramic welding mold of packaged semiconductor and lead-out wire, it is characterized in that said coating boron nitride is thermal spraying.
CNB2006100411305A 2006-08-07 2006-08-07 Semiconductor chip and lead-out wire welding, packaging ceramic welding mold Expired - Fee Related CN100468667C (en)

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL2675768T3 (en) * 2011-02-18 2021-05-31 Schott Ag Feed-through
CN102259247A (en) * 2011-06-14 2011-11-30 许行彪 One-hole welding mould and welding technique of electric element
CN104591699B (en) * 2015-02-03 2017-08-29 许行彪 Metal welds encapsulating mould ceramic material with high temp glass insulator
CN114291783A (en) * 2021-12-31 2022-04-08 深圳市信为科技发展有限公司 Pressure sensor with fine multi-lead and preparation method thereof

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN85107936A (en) * 1985-10-23 1987-07-22 国家建筑材料工业局山东工业陶瓷研究设计院 Sai Long (Sialon)-boron nitride fibre matrix material and manufacture method thereof
US5120688A (en) * 1990-05-29 1992-06-09 The Morgan Crucible Company Plc Pressureless sintered silicon nitride-boron nitride composite
CN1569743A (en) * 2004-04-23 2005-01-26 山东工业陶瓷研究设计院 Silicon nitride - boron nitride- silicon dioxide ceramic wave-transparent material and preparation process thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN85107936A (en) * 1985-10-23 1987-07-22 国家建筑材料工业局山东工业陶瓷研究设计院 Sai Long (Sialon)-boron nitride fibre matrix material and manufacture method thereof
US5120688A (en) * 1990-05-29 1992-06-09 The Morgan Crucible Company Plc Pressureless sintered silicon nitride-boron nitride composite
CN1569743A (en) * 2004-04-23 2005-01-26 山东工业陶瓷研究设计院 Silicon nitride - boron nitride- silicon dioxide ceramic wave-transparent material and preparation process thereof

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