CN100465130C - Underlay substrate semiconductor material for illuminating and heat radiating - Google Patents
Underlay substrate semiconductor material for illuminating and heat radiating Download PDFInfo
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- CN100465130C CN100465130C CNB2006100171246A CN200610017124A CN100465130C CN 100465130 C CN100465130 C CN 100465130C CN B2006100171246 A CNB2006100171246 A CN B2006100171246A CN 200610017124 A CN200610017124 A CN 200610017124A CN 100465130 C CN100465130 C CN 100465130C
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- beryllium oxide
- beryllium
- beo
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Abstract
The invention discloses an illuminating radiation substrate base plate material of semiconductor, which comprises the following steps: allocating raw material with 97-99% beryllium oxide, 0. 5-1. 6% alumina, 0. 4-1. 1% magnesia and 0. 1-0. 3% calcium oxide; adding beryllium oxide in the alumina before sintering; sintering under 3700-3900 deg. c in the sealing container; adding magnesia and calcium oxide to sinter 60 min; obtaining the beryllium oxide material with purity at 97-99%; milling to blend; moulding the ceramic blank; punching sheet; sintering to obtain the product. The invention adopts beryllium oxide on the chip packing radiation material to do once manufacturing and moulding with heat conductivity at 230K, which solves the key technique of radiation and antistatic to generalize the effect and reach the corresponding illuminating standard.
Description
Technical field
The invention belongs to a kind of semiconductor lighting chip cooling substrate light harvesting baseplate material and preparation method thereof.
Background technology
Semiconductor lighting is one of the high-tech sector of tool development prospect of 21 century.Since the nineties, along with the rise of gan (CaN) for the third generation semiconductor material of representative, research blue and white light-emitting diode (LED) is successful, and as novel solid state light emitter, semiconductor illuminating light source will become revolution again after incandescent light, luminescent lamp on the human illumination history.But, as hi-tech supporting with it gordian technique support must be arranged, the technology accessory support that matches with it be arranged, heat radiation underlay substrate material technology is exactly one of gordian technique wherein.
The emission wavelength of LED varies with temperature and is 0.2-0.3nm/ ℃, and spectral width increases thereupon, influences bright-colored degree.In addition, when flow through pn knot of forward current, the heat generation loss makes the interface produce temperature rise, at room temperature, 1 ℃ of the every rising of temperature, the luminous intensity of LED can correspondingly reduce about 1%, and encapsulation, heat radiation, to keep purity of color and luminous intensity be the assurance of technology.In the past ways that reduce its drive current that adopt reduce junction temperature more, and the drive current of traditional small-chip LED is limited in about 20mA.But the light output meeting of LED increases with the increase of electric current, and at present, the drive current of a lot of power-type LEDs can reach 70mA, 100mA even more than the 1A level, need improve thermal property, and novel heat sink material is crucial technology.Heat dissipation technology has become the key factor that influences the LED luminous efficiency, has only the improvement of heat dissipation technology that the LED photoelectric transformation efficiency is significantly improved.
Summary of the invention
The invention provides a kind of underlay substrate semiconductor material for illuminating and heat radiating, to solve the bad problem of radiating effect that present underlay substrate semiconductor material for illuminating and heat radiating exists.The technical scheme that the present invention takes is: it is to be made by following raw materials by weight percent and method:
Beryllium oxide BeO 97～99%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
30.5～1.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.4～1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.1～0.3%, particle diameter be at 10～20 μ m,
One, batching: by weight percentage,
Beryllium oxide BeO 97～99%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
30.5～1.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.4～1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.1～0.3%, particle diameter be at 10～20 μ m,
Two, calcination
Before calcining, will add aluminium oxide Al among the beryllium oxide BeO
2O
3, in the container of sealing, in 1600 degrees centigrade～1900 degrees centigrade high temperature, calcine, add magnesium oxide after 10 minutes, add calcium oxide after 20 minutes, and then calcined 40 minutes, purity up to 97～99% beryllium oxide material;
Three, ball milling mixes
The beryllium oxide material that obtains is dropped in the ball mill, grind, grind out the particle of 10～20 μ m;
Four, porcelain blank molding
With the beryllium oxide material after grinding, through behind the mould molding, use the shaper extrusion molding, made the porcelain base;
Five, punching
With porcelain base process flushing with clean water;
Eight, burn till
To carry out high temperature 1600-1900 degree centigrade sintering again through the porcelain base of flushing with clean water.
The inorganic synthesized semiconductor heat sink material of beryllium oxide BeO is a refractory oxide, and fusing point is 2570 ℃.The covalent linkage of inorganic synthetic materials is very strong, and the sintering temperature of pure inorganic synthetic materials pottery is very high, can reach 1900 ℃.Add aluminium oxide Al
2O
31.6%, magnesium oxide MgO1.1% and CaO 0.3% sintering temperature can be reduced to 1640 ℃.At room temperature can dispel the heat with about 300W/mK.Particle diameter should be controlled at 10～20 μ m, because the firing temperature of beryllium oxide ceramics is higher, therefore needs to add an amount of additive A l in prescription
2O
3, MgO, CaO reduce its firing temperature.Al
2O
3At high temperature generate the binary eutectic body with BeO, minimum eutectic temperature is that the temperature that 1835 ℃ of MgO and BeO generate minimum eutectic is 1850 ℃, Al
2O
3, MgO, CaO be separately as additive, and be not fairly obvious to the firing temperature that reduces beryllium oxide ceramics, but the three uses as additive simultaneously, and is fairly obvious to the firing temperature that reduces beryllium oxide.
The invention has the advantages that what adopt is the beryllium oxide material on the Chip Packaging heat sink material, the time processing moulding, thermal conductivity reaches 230K.Solve heat radiation and anti-electrostatic gordian technique, make its result of use reach universalization, solve heat dissipation technology, can reach corresponding lighting criteria again, thereby make the high-power integrated technology of LED reach illumination purposes.
The inorganic synthetic technology that the present invention adopts, its characteristic has good heat-conducting and the little performance of thermal resistance; Have good insulation performance, possess good substrate thermal conductivity simultaneously again.Melting temperature is up to 2570 degrees centigrade, and welding temperature is up to 980 degrees centigrade, and underlayer temperature reaches 980 degrees centigrade, has high strength, high temperature resistant, wear-resisting, anticorrosion, advantage such as prepared is accurate, volume is little.It has solved the difficult problem of key part design in the semiconductor illuminating light source lamp system; finished the exploitation of semiconductor illuminating light source heat radiation module suitability for industrialized production technology, so semiconductor illuminating light source heat radiation module product possessed the throughput of mass-producing, industrialization.
Embodiment
The key technical indexes test result of the present invention:
Intelligent module main performance index:.
Inorganic synthetic materials Interventions Requested, method and technical requirements
Measuring principle and experiment condition
1, thermal diffusivity and specific heat test
Testing tool: flash of light conductometer
Testing method: laser method
Test philosophy: launch a beam pulse by the heating source xenon lamp and beat surface, use the corresponding temperature rise of InSb infrared detector measurement sample upper surface, in analysis software, select for use suitable Model Calculation to go out the thermal diffusivity of sample at sample.Simultaneously the standard specimen (be the reference sample, specific heat of combustion is known) of identical geometry appearance is tested under the same conditions, by relatively both detect the intensity of signal can be in the hope of the specific heat of combustion of sample.
Reference sample: POCO graphite, Φ 12.63mm circle, thick 2.007mm, density 1.74g/cm
3
2, thermal conductivity calculates
λ(T)＝a(T)*Cp(T)*ρ(T)
T＝25℃，100℃
λ (T): thermal conductivity
A (T): thermal diffusivity
Cp (T): specific heat
ρ (T): density (ρ=m/V is similar to and thinks that density p remains unchanged in the said temperature scope)
Inorganic synthetic heat radiation substrate material air-tightness test:
1, test foundation
According to GB5594.1-85 " electronic devices and components structural ceramic material performance test methods, air tightness testing method ".
2, measuring unit
This test encapsulates the check group test of professional portion by No.13 Inst., Chinese Electronic Science ﹠ Technology Group Co
3, specimen
Specimen is divided into four groups:
3 whites of A 041024ASE
4 black of B 041025BSE
5 grey of C 040930BDE
5 whites of D 040824ADE
4, equipment situation
Device name: helium mass spectrometer leak detector
Unit type: ULVAC Japan vacuum HELLOTModel 306
Referance leak: proofread and correct 4.3 * 10
-9Pam
3/ s, test: 3.8 * 10
-9M
3/ s
5, test data
Unit: 10
-10M
3/ s
Measuring technology and data results
Scalar network analyzer Agilent8757Dopt001 S/N4047A07449/95025AS/N US38020305PSG continuous wave signnal generator Agilent E8247C Opt540,007,1EA, the vertical length-measuring meter JCG002-1 S/N88002 of UNR S/N MY43320614 numeral
The test precaution:
1. should measure planeness, the parallelism of sample and observe the impure point distribution situation before the test, in test report, indicate:
2. sample is under 120 ℃ of conditions, toasts to be placed on that to be cooled to room temperature in the dry cylinder to be measured in one hour.
The test process of each sheet sample:
The calibration of step 1. cavity:
Step 2. hand is worn rubber finger cot sample " facing up " is inserted cavity, with clamping fixture for correcting random sample product center;
Step 3. is TE
012～TE
015The broadband test of four patterns once;
Step 4. hand is worn rubber finger cot sample is taken out, and resets into cavity again, with clamping fixture for correcting random sample product center;
Step 5. is done a repeated test frequently on the TE013 mode frequency;
Step 6. repeating step 4, step 50 times are done ten some repeated tests frequently;
Step 7. hand is worn rubber finger cot sample is taken off, and inserts cavity with " reverse side upwards " again, centers with clamping fixture for correcting;
Step 8. repeating step 3～step 6.
Data processing:
Every tow sides have an average data, are net result after positive and negative two mean values are average.
Measuring unit: microwave test center
Test result
Sample size: φ 50.98 * 1.98mm
The sample situation: the surface is good, and parallel 10 μ do not observe impure point
Envrionment temperature: 24 ℃
Test duration: 2004.11.13 13:04～13:35
The wideband test:
Reperformance test:
Test frequency: 9473MHz
The thermal conductivity specimen is write and materials classification
Linear expansivity specimen numbering and materials classification
Inorganic synthetic heat sink material
The preparation of embodiment 1 beryllium oxide BeO
Beryllium oxide BeO raw material adopts the technology of activated sintering to obtain, with beryllium hydroxide [Be (OH)
2] solving active BeO powder through the pre-burning branch, pre-burning needs to carry out in 1000～1200 ℃ nitrogen atmosphere.
Embodiment 2
One, batching: by weight percentage,
Beryllium oxide BeO 97%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
31.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.3%, particle diameter be at 10～20 μ m,
Two, calcination
Before calcining, will add aluminium oxide Al among the beryllium oxide BeO
2O
3, in the container of sealing, in 1700 degrees centigrade high temperature, calcine, add magnesium oxide after 10 minutes, add calcium oxide after 20 minutes, and then calcined 40 minutes, purity up to 97% beryllium oxide material;
Three, ball milling mixes
The beryllium oxide material that obtains is dropped in the ball mill, grind, grind out the particle of 10～20 μ m;
Four, porcelain blank molding
With the beryllium oxide material after grinding, through behind the mould molding, use the shaper extrusion molding, made the porcelain base;
Five, punching
With porcelain base process flushing with clean water;
Eight, burn till
To carry out 1600 degrees centigrade of sintering of high temperature again through the porcelain base of flushing with clean water.
Embodiment 3
One, batching: by weight percentage,
Beryllium oxide BeO 98%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
31.0%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.8%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.2%, particle diameter be at 10～20 μ m,
Two, calcination
Before calcining, will add aluminium oxide Al among the beryllium oxide BeO
2O
3, in the container of sealing, in 1600 degrees centigrade high temperature, calcine, add magnesium oxide after 10 minutes, add calcium oxide after 20 minutes, and then calcined 40 minutes, purity up to 97% beryllium oxide material;
Three, ball milling mixes
The beryllium oxide material that obtains is dropped in the ball mill, grind, grind out the particle of 10～20 μ m;
Four, porcelain blank molding
With the beryllium oxide material after grinding, through behind the mould molding, use the shaper extrusion molding, made the porcelain base;
Five, punching
With porcelain base process flushing with clean water;
Eight, burn till
To carry out 1700 degrees centigrade of sintering of high temperature again through the porcelain base of flushing with clean water.
Embodiment 4
One, batching: by weight percentage,
Beryllium oxide BeO 99%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
30.5%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.4%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.1%, particle diameter be at 10～20 μ m,
Two, calcination
Before calcining, will add aluminium oxide Al among the beryllium oxide BeO
2O
3, in the container of sealing, in 1900 degrees centigrade high temperature, calcine, add magnesium oxide after 10 minutes, add calcium oxide after 20 minutes, and then calcined 40 minutes, purity up to 97% beryllium oxide material;
Three, ball milling mixes
The beryllium oxide material that obtains is dropped in the ball mill, grind, grind out the particle of 10～20 μ m;
Four, porcelain blank molding
With the beryllium oxide material after grinding, through behind the mould molding, use the shaper extrusion molding, made the porcelain base;
Five, punching
With porcelain base process flushing with clean water;
Eight, burn till
To carry out 1900 degrees centigrade of sintering of high temperature again through the porcelain base of flushing with clean water.
Claims (2)
1, underlay substrate semiconductor material for illuminating and heat radiating, it is made by following raw materials by weight percent and method:
Beryllium oxide BeO 97～99%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
30.5～1.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.4～1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.1～0.3%, particle diameter be at 10～20 μ m,
The preparation method:
One, batching: by weight percentage,
Beryllium oxide BeO 97～99%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
30.5～1.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 0.4～1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.1～0.3%, particle diameter be at 10～20 μ m,
Two, calcination
Before calcining, will add aluminium oxide Al among the beryllium oxide BeO
2O
3, in the container of sealing, in 1600 degrees centigrade～1900 degrees centigrade high temperature, calcine, add magnesium oxide after 10 minutes, add calcium oxide after 20 minutes, and then calcined 40 minutes, purity up to 97～99% beryllium oxide material;
Three, ball milling mixes
The beryllium oxide material that obtains is dropped in the ball mill, grind, grind out the particle of 10～20 μ m;
Four, porcelain blank molding
With the beryllium oxide material after grinding, through behind the mould molding, use the shaper extrusion molding, made the porcelain base;
Five, punching
With porcelain base process flushing with clean water;
Eight, burn till
To carry out 1600～1900 degrees centigrade of sintering of high temperature again through the porcelain base of flushing with clean water.
2, underlay substrate semiconductor material for illuminating and heat radiating according to claim 1, it is characterized in that: it is made by following raw materials by weight percent:
Beryllium oxide BeO 97%, particle diameter be at 10～20 μ m,
Aluminium oxide Al
2O
31.6%, particle diameter is at 10～20 μ m,
Magnesium oxide MgO 1.1%, particle diameter be at 10～20 μ m,
Calcium oxide CaO 0.3%, particle diameter is at 10～20 μ m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100171246A CN100465130C (en) | 2006-08-22 | 2006-08-22 | Underlay substrate semiconductor material for illuminating and heat radiating |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100171246A CN100465130C (en) | 2006-08-22 | 2006-08-22 | Underlay substrate semiconductor material for illuminating and heat radiating |
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| Publication Number | Publication Date |
|---|---|
| CN101130461A CN101130461A (en) | 2008-02-27 |
| CN100465130C true CN100465130C (en) | 2009-03-04 |
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| CNB2006100171246A Expired - Fee Related CN100465130C (en) | 2006-08-22 | 2006-08-22 | Underlay substrate semiconductor material for illuminating and heat radiating |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101462867B (en) * | 2009-01-16 | 2011-09-14 | 中南大学 | Method for preparing BeO ceramic by gel injection moulding forming technique |
| CN101565302B (en) * | 2009-04-09 | 2012-12-26 | 潮州三环（集团）股份有限公司 | Ceramic packaging material for LED and production method thereof |
| CN102123563B (en) * | 2011-03-30 | 2013-05-08 | 江西华烨节能照明股份有限公司 | Method for manufacturing ceramic PCB (Printed Circuit Board) |
| KR101920706B1 (en) * | 2016-12-26 | 2018-11-21 | (주)솔루에타 | Electrically insulated and heat radiated non-substrate tape and manufacturing method thereof |
| US20220289631A1 (en) * | 2019-08-15 | 2022-09-15 | Materion Corporation | Beryllium oxide pedestals |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1464025A (en) * | 2002-06-05 | 2003-12-31 | 高维新 | Heat dissipation sustrate and process for making same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1464025A (en) * | 2002-06-05 | 2003-12-31 | 高维新 | Heat dissipation sustrate and process for making same |
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Granted publication date: 20090304 Termination date: 20100822 |