CN100401009C - Long working distance interference microscope system - Google Patents
Long working distance interference microscope system Download PDFInfo
- Publication number
- CN100401009C CN100401009C CNB2006100829570A CN200610082957A CN100401009C CN 100401009 C CN100401009 C CN 100401009C CN B2006100829570 A CNB2006100829570 A CN B2006100829570A CN 200610082957 A CN200610082957 A CN 200610082957A CN 100401009 C CN100401009 C CN 100401009C
- Authority
- CN
- China
- Prior art keywords
- polarized light
- working distance
- long working
- wollaston prism
- microscope
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Instruments For Measurement Of Length By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
The present invention discloses a long working distance interference microscope system, which comprises a polarizer, a beam splitter, a long working distance microscope, and a Wollaston prism agglutinated by two birefringence rectangular prisms of which the optical axes are perpendicular to each other. A light source forms linearly-polarized light by the polarizer, the linearly-polarized light passes through the Wollaston prism after the reflection of the beam splitter, and thus, incident ray polarized light is divided into two bunches of linearly-polarized light which is provided with a micro included angle and the direction of vibrations are in a mutual perpendicular mode. The two bunches of light project on a sample to be measured, two bunches of orthogonal line polarized light reflected from the surface of the sample to be measured return from the original way to carry out the composite collinear operation by the Wollaston prism, and the orthogonal line polarized light forms elliptical polarized light by a quarter wave plate and forms the linearly polarized light with the same polarization direction by an analyzer. The present invention has not sensibility to the external environment of mechanical vibration, air agitation, temperature change, etc., the vertical measure resolution of the present invention reaches to 50 nanometer magnitude, and the present invention has the working distance more than 50mm.
Description
Technical field
The present invention relates to a kind of interference microscope system.
Background technology
The problem in science of many ambits has proposed more and more higher demand to the measuring technique of microscale, the measuring technique of micron dimension can not satisfy the needs of scientific development, and the Research on measuring technique of nanoscale has become the target that strive in the surveying field.The high-precision microscale measuring technique such as atomic force microscope, the scanning tunnel microscope etc. that have existed at present can provide very high measuring accuracy, but they are very responsive to external environments such as mechanical vibration, air turbulence and temperature variation, and be contact type measurement, range of application has been subjected to certain restriction.
Summary of the invention
At the problem of above-mentioned existence, the object of the present invention is to provide a kind of long working distance interference microscope system, this microscopic system can be realized the quantitative measurment of nanoscale.
For achieving the above object, invent a kind of long working distance interference microscope system, comprise: the polarizer, beam splitter, long working distance microscope and Wollaston (Wollaston) prism that is bonded by two mutually perpendicular birefringence right-angle prisms of optical axis, light source forms linearly polarized light through the described polarizer, and behind described beam splitter reflection again by described wollaston prism, incident ray polarized light is divided into two bundles has small angle and the mutually perpendicular linearly polarized light of direction of vibration, this two-beam projects on the measured sample, return through former road from two bundle orhtogonal linear polarizaiton light of measured sample return reflection surface, by the compound again conllinear of described wollaston prism, and through quarter-wave plate formation elliptically polarized light, again through forming the identical linearly polarized light in polarization direction behind the analyzer, interfere, receive picture signal by long working distance microscope and CCD camera, be transferred to the computing machine that is provided with image processing software again and carry out image acquisition and processing.
The present invention is by adopting contactless surface topography optical measuring technique, and it combines interference technique, long working distance microscopy, image acquisition and treatment technology, phase-shifting technique etc., realizes the quantitative measurment of nanoscale.The present invention is insensitive to external environments such as mechanical vibration, air turbulence and temperature variation, its vertical survey resolution reaches 50 nanometer scale, have the above operating distance of 50mm, can observe the details that general optical microscope is difficult to differentiate, can be applicable to multiple ambit.
Description of drawings
Fig. 1 is a structural representation of the present invention.
Optical flat and deielectric-coating photo in kind that Fig. 2 detects for adopting the present invention.
Fig. 3 is four step of an optical flat surface phase shift interference striped.
Fig. 4 is the surface type looks figure of Fig. 3.
Fig. 5 is the deielectric-coating surface fringe.
Fig. 6 is deielectric-coating surface deformation and wollaston prism basis deformation sum.
Fig. 7 is the deielectric-coating surface type looks figure of Fig. 6.
Fig. 8 and Fig. 9 are atomic force microscope measuring media film surface result.
Embodiment
As shown in Figure 1, the present invention includes: the polarizer 2, magnifier 3, beam splitter 10, long working distance microscope 7 and Wollaston (Wollaston) prism 5 that is bonded by two mutually perpendicular birefringence right-angle prisms of optical axis, light source 1 forms linearly polarized light through the polarizer 2, by magnifier 3 amplifications and after beam splitter 10 reflections, again by wollaston prism 5, incident ray polarized light is divided into two bundles has small angle and the mutually perpendicular linearly polarized light of direction of vibration, this two-beam projects on the measured sample 11, return through former road from two bundle orhtogonal linear polarizaiton light of measured sample return reflection surface, by the compound again conllinear of wollaston prism 5, again by catoptron 4 reflections, form elliptically polarized light through a quarter-wave plate 6, form the identical linearly polarized light in polarization direction through an analyzer 9 backs again, interfere, receive picture signal by long working distance microscope 7 and CCD camera 8, be transferred to the computing machine 12 that is provided with image processing software again and carry out Flame Image Process, between long working distance microscope 7 and CCD camera 8, frosted glass 13 is set, so that CCD camera 8 images acquired.Computing machine 12 is by traditional image processing method, and promptly Fourier transform method and four step phase-shift methods calculate and reduce image, and interference image is reduced to surface topography map.
As shown in Figure 2, be optical flat and the deielectric-coating photo in kind that detects with the present invention, as shown in Figure 3, four step of optical flat surface phase shift interference striped for Fig. 2, Fig. 4 is the surface type looks figure of Fig. 3, Fig. 3 and Fig. 4 provide optical flat surface fringe and surface type looks figure respectively, the basic striped of having represented wollaston prism to produce, Fig. 5 is the deielectric-coating surface fringe, Fig. 6 is deielectric-coating surface deformation and Wollaston prism basis deformation sum, and Fig. 7 is the deielectric-coating surface type looks figure of Fig. 6, and Fig. 8 and Fig. 9 have provided atomic force microscope measuring media film surface result, maximum distortion is 52nm, shows that interference microscope can realize the measurement of 50 nanometer deformation.
Claims (1)
1. long working distance interference microscope system, it is characterized in that, comprise: the polarizer, beam splitter, long working distance microscope and the wollaston prism that is bonded by two mutually perpendicular birefringence right-angle prisms of optical axis, light source forms linearly polarized light through the described polarizer, amplify by magnifier, and behind described beam splitter reflection again by described wollaston prism, incident ray polarized light is divided into two bundles has small angle and the mutually perpendicular linearly polarized light of direction of vibration, this two-beam projects on the measured sample, return through former road from two bundle orhtogonal linear polarizaiton light of measured sample return reflection surface, by the compound again conllinear of described wollaston prism, and through quarter-wave plate formation elliptically polarized light, again through forming the identical linearly polarized light in polarization direction behind the analyzer, interfere, receive picture signal by long working distance microscope and CCD camera, be transferred to the computing machine that is provided with image processing software again and carry out Flame Image Process, be provided with a frosted glass between long working distance microscope and the CCD camera, the long working distance microscope at first outputs to picture signal on the frosted glass, and then carries out image signal's collection by the CCD camera.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100829570A CN100401009C (en) | 2006-06-21 | 2006-06-21 | Long working distance interference microscope system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2006100829570A CN100401009C (en) | 2006-06-21 | 2006-06-21 | Long working distance interference microscope system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1862219A CN1862219A (en) | 2006-11-15 |
| CN100401009C true CN100401009C (en) | 2008-07-09 |
Family
ID=37389698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100829570A Expired - Fee Related CN100401009C (en) | 2006-06-21 | 2006-06-21 | Long working distance interference microscope system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN100401009C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100941980B1 (en) * | 2007-11-14 | 2010-02-11 | 한국표준과학연구원 | The minute measuring instrument for hign speed and large area and the method of thereof |
| CN101726844B (en) * | 2008-10-21 | 2011-11-23 | 财团法人工业技术研究院 | Interference phase difference microscope |
| CN102539400B (en) * | 2011-12-31 | 2013-10-09 | 广东工业大学 | High-accuracy fluorescence anisotropy microscopic imaging device and method |
| DE102017101829A1 (en) * | 2017-01-31 | 2018-08-02 | Carl Zeiss Microscopy Gmbh | Arrangement for increasing the resolution of a laser scanning microscope |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2148311Y (en) * | 1992-06-17 | 1993-12-01 | 哈尔滨工业大学 | Surface microscopic appearance superprecision laser probe |
| US5420717A (en) * | 1992-02-18 | 1995-05-30 | Olympus Optical Co., Ltd. | Adjustable-contrast microscope |
| CN2375961Y (en) * | 1999-06-08 | 2000-04-26 | 束继祖 | Real-time on-line diagnostic device for material fatigue crack test |
| US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
| US6804009B2 (en) * | 2000-05-03 | 2004-10-12 | The Regents Of The University Of California | Wollaston prism phase-stepping point diffraction interferometer and method |
| US20050146708A1 (en) * | 2002-04-11 | 2005-07-07 | Xunqing Shi | Systems and methods for deformation measurement |
-
2006
- 2006-06-21 CN CNB2006100829570A patent/CN100401009C/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5420717A (en) * | 1992-02-18 | 1995-05-30 | Olympus Optical Co., Ltd. | Adjustable-contrast microscope |
| CN2148311Y (en) * | 1992-06-17 | 1993-12-01 | 哈尔滨工业大学 | Surface microscopic appearance superprecision laser probe |
| CN2375961Y (en) * | 1999-06-08 | 2000-04-26 | 束继祖 | Real-time on-line diagnostic device for material fatigue crack test |
| US6804009B2 (en) * | 2000-05-03 | 2004-10-12 | The Regents Of The University Of California | Wollaston prism phase-stepping point diffraction interferometer and method |
| US6721094B1 (en) * | 2001-03-05 | 2004-04-13 | Sandia Corporation | Long working distance interference microscope |
| US20050146708A1 (en) * | 2002-04-11 | 2005-07-07 | Xunqing Shi | Systems and methods for deformation measurement |
Also Published As
| Publication number | Publication date |
|---|---|
| CN1862219A (en) | 2006-11-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US9903704B2 (en) | Three-DOF heterodyne grating interferometer displacement measurement system | |
| CN100552376C (en) | The method and apparatus of called optical interferometry about spectrometer, imaging and simultaneous phase-shifting | |
| CN103307986B (en) | A kind of two degrees of freedom heterodyne grating interferometer displacement measurement system | |
| CN101666630B (en) | Method and device for detecting precision wafer based on parallel optical flat splitting polarized beam and phase-shifting interferometry | |
| CN105823422A (en) | Two-degree-of-freedom heterodyne grating interferometer displacement measurement system and method | |
| CN101893429A (en) | Super-precision surface measuring system based on polarization phase-shifting microscopy interference technology | |
| CN101324421A (en) | Synchronous phase-shifting Fizeau interferometer | |
| CN103630077B (en) | A kind of diaxon grating displacement measuring system that uses double-frequency laser | |
| CN100401009C (en) | Long working distance interference microscope system | |
| CN108895986A (en) | Microscopic three-dimensional topography measurement device based on striped projection | |
| CN103673899A (en) | Two-axis grating displacement measuring system capable of measuring vertical displacement | |
| CN107860318A (en) | A kind of plane grating interferometer displacement measurement system | |
| Zhang et al. | Modified michelson interferometer based dual shearing single camera digital sherography | |
| Sivakumar et al. | Large surface profile measurement with instantaneous phase-shifting interferometry | |
| CN201251428Y (en) | Synchronous phase-shifting fizeau interferometer | |
| CN207487599U (en) | A kind of plane grating interferometer displacement measurement system | |
| Hooshmand-Ziafi et al. | Common-path spatial phase-shift speckle shearography using a glass plate | |
| CN101487695A (en) | Multi-sensibility grating moire interferometer | |
| CN200969000Y (en) | Long working distance interference microscope | |
| CN1587896A (en) | Optical eight-subdivision dual-frequency laser interferometer | |
| Zhao et al. | Simultaneous trishearing digital shearography for nondestructive testing | |
| Kao et al. | High resolution planar encoder by retro-reflection | |
| TWI495841B (en) | High - resolution Reflective Three - dimensional Photoelectric Microscope | |
| Huang | Precise compensation for positional accuracy of ultra-precision air-bearing motion stage based on the self-calibration method | |
| Singh et al. | Nanoscale measurement of in-plane and out-of-plane displacements of microscopic object by sensor fusion |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20080709 Termination date: 20160621 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |