CN100361026C - 用于制造平板显示器件的方法和设备 - Google Patents

用于制造平板显示器件的方法和设备 Download PDF

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CN100361026C
CN100361026C CNB2004100955894A CN200410095589A CN100361026C CN 100361026 C CN100361026 C CN 100361026C CN B2004100955894 A CNB2004100955894 A CN B2004100955894A CN 200410095589 A CN200410095589 A CN 200410095589A CN 100361026 C CN100361026 C CN 100361026C
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CN1637614A (zh
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金珍郁
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Abstract

一种制造平板显示器件的方法，包括：在薄膜上涂布抗蚀剂；形成用于对所述薄膜进行构图的具有凹槽和凸起的软模；对所述凸起的端面进行处理；将所述软模施加在所述抗蚀剂上以形成抗蚀剂图案；将所述软模与所述抗蚀剂图案分开；以及利用所述抗蚀剂图案对所述薄膜进行刻蚀以形成薄膜图案。

Description

用于制造平板显示器件的方法和设备
本申请要求2003年12月27日提交的韩国专利申请NO.P2003-98122的优先权，在此以引用的方式并入其内容。
技术领域
本发明涉及平板显示器件，具体涉及用于制造平板显示器件的方法和设备。
背景技术
近几年，显示视觉信息的显示设备的重要性逐渐提高。过去，阴极射线管使用非常广泛。但是，阴极射线管重量和体积都太大。
液晶显示(LCD)器件、场致发射显示(FED)器件、等离子显示板(PDP)和电致发光(EL)器件都是市场上能够得到的薄型平板显示器件。液晶显示器件很轻而且其大规模生产能力在不断提高。因此，液晶显示器件在很多领域很快取代了阴极射线管。
利用薄膜晶体管(以下称为“TFT”)来驱动液晶单元的有源矩阵型液晶显示器件具有很好的画质和较低的功耗。有源矩阵型液晶显示器件很快发展成了大尺寸和高分辨率。另外，大规模制造技术也提高了这种液晶显示器件的成品率。
参考图1，有源矩阵型液晶显示器件包括滤色器阵列基板22和TFT阵列基板23。在TFT阵列基板23的底面上贴有偏振片17。在滤色器阵列基板22和TFT阵列基板23之间有液晶层15。图1示出的液晶显示器件只表示有源矩阵型液晶显示器件的一部分。
在滤色器阵列基板22中，在上玻璃基板12的底面上形成有滤色器单元13和公共电极14。在上玻璃基板12的上表面上贴有偏振片11。滤色器13包括红色R滤色器层、绿色G滤色器层和蓝色B滤色器层，它们分别透过特定波段的光，以显示相应的颜色。在毗邻的滤色器13之间形成有黑底(没有示出)。
在TFT阵列基板23中，数据线19和选通线18彼此交叉。在数据线19和选通线18的各个交点处分别形成有TFT 20。另外，在数据线19和选通线18之间限定的单元区域中形成有像素电极21。
液晶层15根据施加在液晶层15上的电场来控制透过TFT阵列基板23的光量。偏振片11和17透过一个方向的偏振光，并且它们的偏振方向相互垂直。当液晶15是90°TN模式时，光经由液晶层15透过偏振片11和17。在滤色器阵列基板22和TFT阵列基板23的相对表面上形成有配向膜(没有示出)。
制造有源矩阵型液晶显示器件的制造工艺包括基板清洁处理、基板构图处理、配向膜形成/摩擦处理、基板接合/液晶注入处理、安装处理、检查处理、维修处理等。基板清洁处理去除液晶显示器的基板表面上的杂物。基板构图处理可以再细分为滤色器阵列基板的构图处理和TFT阵列基板的构图处理。配向膜形成/摩擦处理在每个滤色基板和TFT阵列基板上涂布配向膜，并使用摩擦轮对配向膜进行摩擦。基板接合/液晶注入处理使用密封剂将滤色基板与TFT阵列基板接合在一起，并且通过液晶注入孔注入液晶和分隔体，然后封闭液晶注入孔。安装处理将带载封装(TCP)连接到基板的焊盘部分上。TCP具有集成电路，例如选通驱动IC和数据驱动IC。除了使用TCP的载带自动焊接(TAB)技术之外，还可以通过玻载芯片(COG)技术把驱动集成电路直接安装到基板上。检查处理包括在TFT阵列基板上形成数据线、选通线和像素电极等的信号线之后进行的电检查，以及在进行基板接合/液晶注入处理之后进行的附加电检查和肉眼检查。维修处理对在检查处理中判断为可维修的基板进行修复。在检查处理中判断为不可维修的基板被丢弃。
在制造包括液晶显示器件在内的平板显示器件的方法中，通过光刻工艺对基板上淀积的薄膜材料进行构图。一般来说，光刻处理包括一系列光处理，包括涂布光刻胶、掩模对准、曝光、显影和清洗处理。然而，光刻工艺存在一些问题：需要很长时间、浪费光刻胶材料和剥离溶液、以及需要使用曝光设备等的昂贵设备。另外，还有图案缺陷的问题。
发明内容
因此，本发明旨在一种能够基本上避免由于现有技术的局限和缺点导致的一个或更多个问题的平板显示器件制造方法和设备。
因此，本发明的一个目的是提供一种能够缩短处理时间并减少图案缺陷的制造平板显示器件的方法和设备。
本发明的其他特征和优点将在随后的说明中进行阐述，一部分可以通过说明书而明了，或者可以通过本发明的实践而体验到。通过说明书、权利要求书和附图中具体指出的结构，可以实现或获得本发明的这些和其它优点。
为了达到本发明的这些和其他目的，一种制造平板显示器件的方法包括：在薄膜上涂布抗蚀剂；形成具有用于对薄膜进行构图的凹槽和凸起的软模；对凸起的端面进行处理；将软模施加在抗蚀剂上以形成抗蚀剂图案；将软模与抗蚀剂图案分开；以及，利用该抗蚀剂图案对薄膜进行刻蚀以形成薄膜图案，其中对所述凸起的端面进行处理包括：利用紫外线对所述凸起的端面进行曝光；向曝光的凸起端面供应臭氧O3；以及将被供应了臭氧的凸起的端面暴露于自组装材料中。
在另一方面，一种用于制造平板显示器件的设备包括：用于在薄膜上涂布抗蚀剂的装置；用于对薄膜进行构图的具有凹槽和凸起的软模，其中所述凸起的端面经过了表面处理；用于将软模施加在抗蚀剂上以形成抗蚀剂图案的装置；用于将软模与抗蚀剂图案分开的装置；以及利用该抗蚀剂图案对薄膜进行刻蚀以形成薄膜图案的装置，其中对所述凸起的端面进行的表面处理包括：利用紫外线对所述凸起的端面进行曝光；向曝光的凸起端面供应臭氧O3；以及将被供应了臭氧的凸起的端面暴露于自组装材料中。
可以理解，前面的概述和下面的详细描述都是示例性和说明性的，旨在为权利要求所限定的本发明提供进一步的解释。
附图说明
通过以下的详细说明，结合附图，可以更清楚地理解本发明的其他目的、特点和优点。
图1是有源矩阵型液晶显示器件的透视图。
图2的剖面图顺序地示出了根据本发明一个实施例的制造平板显示器件的方法。
图3的剖面图示出了当图2所示的软模与基板接触时抗蚀剂溶液的运动。
图4A到4C的剖面图示意性地示出了不同类型的抗蚀剂图案。
图5的剖面图示出了使用图2所示的软模进行的表面处理。
具体实施方式
下面详细说明本发明的优选实施例，在附图中显示了实施例的几个例子。随后，参照图2到图5详细描述本发明的优选实施例。
参照图2，根据本发明一个实施例的制造平板显示器件的方法包括：抗蚀剂涂布处理，其中在形成有薄膜32a的玻璃基板31上涂布抗蚀剂溶液33a；使用软模34进行的抗蚀剂溶液33a的构图处理；对薄膜32a进行构图的刻蚀处理和去除残留抗蚀剂图案的剥离处理；以及检查处理。在玻璃基板31上形成的薄膜32a是平板显示器件的像素阵列中使用的典型材料，例如通过涂镀工艺或淀积工艺在玻璃基板上形成的金属图案、有机图案和无机图案。抗蚀剂溶液33a具有耐热和耐化学腐蚀的特性，例如，在乙醇中加入5％～30％重量百分比的酚醛树脂所得的溶液。通过涂布工艺，如喷嘴喷涂或旋涂，把抗蚀剂溶液33a涂布在薄膜32a上。
软模34是由高弹性的橡胶材料制成的，例如聚二甲基硅氧烷(PDMS)、聚氨酯以及交联酚醛树脂。软模34具有与要保留在玻璃基板31上的预期图案相对应的凹槽34a以及凸起34b。在抗蚀剂溶液33a上对准软模34，然后将其压在抗蚀剂溶液33a上。例如，软模34通过其自身重量对薄膜32a施压。同时，在低于约130℃的温度下对玻璃基板31烘烤10分钟到2小时。如图3所示，抗蚀剂溶液33a在软模34和玻璃基板31之间的压力作用下通过毛细管作用力并通过软模34与抗蚀剂溶液33a之间的斥力流动到软模34的凹槽34a中。结果，在薄膜32a上形成了作为反向转移图案的抗蚀剂图案33b。
随后，把软模34与玻璃基板31分开，然后使用湿法刻蚀设备或干法刻蚀设备进行刻蚀处理。此时，抗蚀剂图案33b作为掩模。因此，只有抗蚀剂图案33b下面的薄膜32a部分保留在玻璃基板31上，而薄膜32a的其他部分被去除了。接着，通过剥离处理去除抗蚀剂图案33b。通过对薄膜图案32b进行电和光的检测来判断薄膜32b是否短接或断开。
在从玻璃基板31上分离下来之后，利用紫外线UV和臭氧(O3)对软模34进行清洗，然后重新用于另一个薄膜32a的构图处理。
图4A到4C示意性地示出了不同类型的抗蚀剂图案的剖面图。然而，在抗蚀剂材料的构图处理中，会有不希望的残留膜与抗蚀剂图案33b一起留在薄膜32a上。在这样的情况下，会在薄膜32a中产生图案缺陷。例如，如果软模34和抗蚀剂溶液33a之间的毛细管作用力和斥力变强，那么抗蚀剂溶液33a的流动就会变得顺畅，结果如图4A和4B所示，形成预期形状的抗蚀剂图案33b。相反，如果软模34和抗蚀剂溶液33a之间的斥力变弱，那么抗蚀剂溶液33a的流动就不会顺畅。结果如图4C所示，除了抗蚀剂溶液33a之外，还会在薄膜32a上留下不希望有的残留膜33c。
根据本发明实施例中制造平板显示器件的方法，通过对软模34进行表面处理，使软模34与抗蚀剂材料相对的表面可以对抗蚀剂溶液33a施加更强的斥力。表面处理使软模34和抗蚀剂溶液33a之间的斥力变强，从而在把软模34压到抗蚀剂溶液33a上时抗蚀剂溶液33a可以顺畅地流到软模34的凹槽34a中。
图5图示了根据本发明实施例使用软模34进行的表面处理。如图5所示，在软模34要与抗蚀剂相对的表面上对准光掩模36。如上所述，软模34包含高弹性的橡胶材料，例如聚二甲基硅氧烷(PDMS)、聚氨酯以及交联酚醛树脂，在软模34的要与抗蚀剂相对的表面上形成有凹槽34a和凸起34b。当软模34的凸起34b的端面与薄膜32a接触时，抗蚀剂溶液33a流动到凹槽34a中。光掩模36具有透光部分，该透光部分只使软模34的凸起34b的端面曝光。
在对准光掩模36的状态下，向软模34的凸起34b的端面照射紫外线。紫外线的波长是180nm至300nm。于是，自由基CH3从软模34的凸起34b的端面蒸发出来，从而凸起34b的端面的相转变成氧化硅(SiOx)层。如果在这个曝光过过程中供应臭氧，那么虽然软模34是强疏水性材料，凸起34b的端面也会暂时地具有亲水性(约2小时)。
随后，进行处理以使汽态或液态的自组装材料(SAM)与软模34的凸起34b的转变成氧化硅层的端面发生反应。SAM使凸起34b的端面变成超疏水性的或者超亲水性的。SAM的一个示例包含具有下列化学式1的甲基氯硅烷蒸汽。
化学式1：Cl3SiR-X
在化学式1中，R表示烷基，X表示端基。软模34中的凸起34b的端面根据端基X而变成超疏水性或超亲水性。例如，当端基X是烷基-Cl、-F、-I或-CH3的化学要素时，凸起34b的表面永久地具有超疏水性。相反，当端基X是羧基-OH、-COOH或-COH的化学要素时，凸起34b的表面永久地具有超疏水性。
使凸起34b的端面上已经变成超疏水性或超亲水性的排斥层35对抗蚀剂材料具有很强的斥力。如果抗蚀剂溶液33a具有亲水性，则排斥层35应该具有疏水性，相反，如果抗蚀剂溶液33a具有疏水性，则排斥层35应该是亲水性的。排斥层35的厚度大约为几十埃()。
根据本发明实施例的用于制造平板显示器件的方法和设备可以应用于对平板显示器件(如液晶显示(LCD)器件、场致发射显示(FED)器件、等离子显示板(PDP)和电致发光(EL)器件)的电极层、有机层和无机层的构图处理。
如上所述，根据本发明实施例的用于制造平板显示器件的方法和设备通过使用软模和抗蚀剂，无需采用光处理即可对平板显示器件的薄膜进行构图，从而缩短了处理时间，并通过软模的表面处理使软模和抗蚀剂之间的斥力变大，减少了图案缺陷。
尽管通过附图中所示的实施例对本发明进行了解释，但本领域技术人员可以理解，本发明不限于这些实施例，在不脱离本发明的实质的情况下，可以对本发明进行各种变化和改进。因此，本发明的范围应该仅由所附的权利要求及其等同来限定。

Claims (20)

1.一种制造平板显示器件的方法，包括：
在薄膜上涂布抗蚀剂；
形成用于对所述薄膜进行构图的具有凹槽和凸起的软模；
对所述凸起的端面进行处理；
将所述软模施加在所述抗蚀剂上以形成抗蚀剂图案；
将所述软模与所述抗蚀剂图案分开；以及
利用所述抗蚀剂图案对所述薄膜进行刻蚀以形成薄膜图案，其中
对所述凸起的端面进行处理包括：
利用紫外线对所述凸起的端面进行曝光；
向曝光的凸起端面供应臭氧O3；以及
将被供应了臭氧的凸起的端面暴露于自组装材料中。
2.根据权利要求1所述的方法，其中所述凸起的端面根据所述自组材料的端基而具有亲水性和疏水性中的一种。
3.根据权利要求2所述的方法，其中所述的端基包括-OH、-COOH或-COH中的至少一种，并且所述凸起的端面是亲水性的。
4.根据权利要求2所述的方法，其中所述凸起的端面是疏水性的，并且所述端基包括-Cl、-F、-I和-CH3中的至少一种。
5.根据权利要求1所述的方法，其中所述平板显示器件包括液晶显示器件、场致发射显示器件、等离子显示板和电致发光器件中的任意一种。
6.根据权利要求1所述的方法，还包括在将所述软模施加在所述抗蚀剂上以形成抗蚀剂图案时对所述抗蚀剂进行烘烤。
7.根据权利要求1所述的方法，还包括在刻蚀所述薄膜图案之后剥离所述抗蚀剂图案。
8.根据权利要求1所述的方法，其中对所述端面的处理在所述端面上形成了排斥层，该排斥层具有对所述抗蚀剂的斥力。
9.根据权利要求1所述的方法，其中形成软模包括使用聚二甲基硅氧烷(PDMS)、聚氨酯以及交联酚醛树脂中的一种。
10.根据权利要求1所述的方法，还包括：
利用紫外线UV和臭氧O3清洗所述软模；以及
重复使用所述软模，用于另一个薄膜的构图处理。
11.一种用于制造平板显示器件的设备，包括：
用于在薄膜上涂布抗蚀剂的装置；
用于对所述薄膜进行构图的具有凹槽和凸起的软模，其中所述凸起的端面经过了表面处理；
用于将所述软模施加在所述抗蚀剂上以形成抗蚀剂图案的装置；
用于将所述软模与所述抗蚀剂图案分开的装置；以及
用于利用所述抗蚀剂图案对所述薄膜进行刻蚀以形成薄膜图案的装置，其中
对所述凸起的端面进行的表面处理包括：
利用紫外线对所述凸起的端面进行曝光；
向曝光的凸起端面供应臭氧O3；以及
将被供应了臭氧的凸起的端面暴露于自组装材料中。
12.根据权利要求11所述的设备，其中所述端面具有排斥层，所述排斥层对所述抗蚀剂具有斥力。
13.根据权利要求12所述的设备，其中所述软模的所述排斥层的厚度大约为几十埃()。
14.根据权利要求12所述的设备，其中所述软模的所述排斥层具有疏水性，并且所述抗蚀剂具有亲水性。
15.根据权利要求14所述的设备，其中所述软模的所述排斥层包含-Cl、-F、-I和-CH3中的至少一种。
16.根据权利要求12所述的设备，其中所述软模的所述排斥层具有亲水性，并且所述抗蚀剂具有疏水性。
17.根据权利要求16所述的设备，其中所述软模的所述排斥层包含-OH、-COOH或-COH中的至少一种。
18.根据权利要求11所述的设备，其中所述软模包括能够填充所述抗蚀剂的凹槽和具有所述端面的凸起。
19.根据权利要求11所述的设备，其中所述平板显示器件包括液晶显示器件、场致发射显示器件、等离子显示板和电致发光器件中的任意一种。
20.根据权利要求11所述的设备，还包括：
用于利用紫外线UV和臭氧O3来清洗所述软模的装置；以及
用于重复使用所述软模以对另一个薄膜进行构图处理的装置。
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JP2005196168A (ja) 2005-07-21
US7273564B2 (en) 2007-09-25
FR2864698B1 (fr) 2007-05-11
US20050139576A1 (en) 2005-06-30
GB2409574B (en) 2006-05-10
GB0425499D0 (en) 2004-12-22
GB2409574A (en) 2005-06-29
FR2864698A1 (fr) 2005-07-01
US20080017312A1 (en) 2008-01-24
KR20050067244A (ko) 2005-07-01
CN1637614A (zh) 2005-07-13

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