CL2012002732A1 - Metodo para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atomico de nitrogeno de menos de 45, y ambas capas son depositadas por deposicion de vapor fisica; y sustrato recubierto coloreado. - Google Patents

Metodo para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atomico de nitrogeno de menos de 45, y ambas capas son depositadas por deposicion de vapor fisica; y sustrato recubierto coloreado.

Info

Publication number
CL2012002732A1
CL2012002732A1 CL2012002732A CL2012002732A CL2012002732A1 CL 2012002732 A1 CL2012002732 A1 CL 2012002732A1 CL 2012002732 A CL2012002732 A CL 2012002732A CL 2012002732 A CL2012002732 A CL 2012002732A CL 2012002732 A1 CL2012002732 A1 CL 2012002732A1
Authority
CL
Chile
Prior art keywords
coated substrate
layer
substrate
depositing
nitride
Prior art date
Application number
CL2012002732A
Other languages
English (en)
Inventor
Bryce Randolph Anton
Jeffrey S Rice
Original Assignee
Vapor Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vapor Technologies Inc filed Critical Vapor Technologies Inc
Publication of CL2012002732A1 publication Critical patent/CL2012002732A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • Y10T428/12576—Boride, carbide or nitride component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Método para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atómico de nitrógeno de menos de 45, y ambas capas son depositadas por deposición de vapor fisica; y sustrato recubierto coloreado.
CL2012002732A 2011-09-29 2012-09-28 Metodo para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atomico de nitrogeno de menos de 45, y ambas capas son depositadas por deposicion de vapor fisica; y sustrato recubierto coloreado. CL2012002732A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/248,530 US20130084465A1 (en) 2011-09-29 2011-09-29 Stainless Steel and Silver Colored PVD Coatings

Publications (1)

Publication Number Publication Date
CL2012002732A1 true CL2012002732A1 (es) 2013-03-08

Family

ID=47002687

Family Applications (1)

Application Number Title Priority Date Filing Date
CL2012002732A CL2012002732A1 (es) 2011-09-29 2012-09-28 Metodo para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atomico de nitrogeno de menos de 45, y ambas capas son depositadas por deposicion de vapor fisica; y sustrato recubierto coloreado.

Country Status (9)

Country Link
US (1) US20130084465A1 (es)
EP (1) EP2574686A1 (es)
JP (1) JP2013076165A (es)
CN (1) CN103031515A (es)
AR (1) AR088049A1 (es)
BR (1) BR102012024485A2 (es)
CA (1) CA2790503A1 (es)
CL (1) CL2012002732A1 (es)
RU (1) RU2012141594A (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3214550U (ja) * 2017-10-27 2018-01-25 Ykk株式会社 スライドファスナー
CN108118298A (zh) * 2017-12-18 2018-06-05 池州市正彩电子科技有限公司 一种基于连续磁控溅射的颜色膜成型方法
US20220350062A1 (en) * 2021-05-03 2022-11-03 Apple Inc. Light Color Coatings for Electronic Devices

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4943486A (en) * 1987-04-01 1990-07-24 Seiko Epson Corporation Coated article and method of production
US6399219B1 (en) * 1999-12-23 2002-06-04 Vapor Technologies, Inc. Article having a decorative and protective coating thereon
US20060077580A1 (en) * 2004-10-07 2006-04-13 Guardian Industries Corp. First surface mirror with chromium nitride layer
TW201125745A (en) * 2010-01-19 2011-08-01 Hon Hai Prec Ind Co Ltd Casing having color and the related surface-treating method

Also Published As

Publication number Publication date
RU2012141594A (ru) 2014-04-10
EP2574686A1 (en) 2013-04-03
CN103031515A (zh) 2013-04-10
CA2790503A1 (en) 2013-03-29
BR102012024485A2 (pt) 2015-10-06
AR088049A1 (es) 2014-05-07
US20130084465A1 (en) 2013-04-04
JP2013076165A (ja) 2013-04-25

Similar Documents

Publication Publication Date Title
MX2016002432A (es) Pelicula delgada hibrida organica-inorganica y metodo para su preparacion.
GB2459372B (en) An article and a method of making an article
WO2016050419A3 (en) Plasma deposition method for catechol/quinone functionalised layers
MX347702B (es) Recubrimiento de nanocapas para herramientas de alto rendimiento.
MY198714A (en) Photovoltaic devices and method of manufacturing
CL2012003442A1 (es) Metodo para depositar una capa de metal con particulas luminescentes incorporadas a un sustrato de metal, que comprende mezclar dichas particulas con un material metalico para producir una solucion de galvanizado, insertar el sustrato en dicha solucion y realizar un proceso de galvanizado; sutrato de metal; y metodo para autenticar un objeto metalico.
GB201216405D0 (en) Multilayer coated wear-resistant member and method for making the same
WO2011103304A3 (en) Nano-coatings for articles
SG11201407816WA (en) Coating a substrate web by atomic layer deposition
EP2693506A4 (en) ORGANIC ELECTROLUMINESCENT ELEMENT, METHOD FOR PRODUCING THE SAME, AND COATING LIQUID FOR INJECTION LAYER / ELECTRON TRANSPORT
EP2861780A4 (en) Coating of a railway by means of atomic layer deposition
BRPI0813746A2 (pt) Método para formar película de revestimento de múltiplas camadas, e, artigos
WO2012047069A3 (ko) 발광소자 및 그 제조방법
PL412520A1 (pl) Sposób wytwarzania folii grafenowej o zadanej liczbie warstw grafenu
EA201001020A1 (ru) Стеклянное изделие и способ изготовления стеклянного изделия
SG10201809273VA (en) Light wave separation lattices and methods of forming light wave separation lattices
EP3067438A4 (en) Method for forming intermediate layer formed between substrate and dlc film, method for forming dlc film, and intermediate layer formed between substrate and dlc film
CL2012003173A1 (es) Proceso de deposito por plasma que comprende proporcionar una o mas plumas, proporcionar un material de recubrimiento, proporcionar un reactor de descarga de plasma y depositar una pelicula del material de recubrimiento sobre la superficie de las una o mas plumas mediante deposito por plasma; pluma; estructura; pluma recubierta por un compuesto; y articulo.
FR2914781B1 (fr) Procede de realisation de depots localises
CL2012002732A1 (es) Metodo para formar un sustrato recubierto coloreado, que comprende depositar una capa base sobre el sustrato y depositar una capa de nitruro de cromo sobre el sustrato recubierto, en donde la capa de nitruro tiene un porcentaje atomico de nitrogeno de menos de 45, y ambas capas son depositadas por deposicion de vapor fisica; y sustrato recubierto coloreado.
UA112300C2 (uk) Поділ модульного пристрою для нанесення покриття
WO2014113123A3 (en) Spallation-resistant thermal barrier coating
CL2016000946A1 (es) Recipiente revestido
EA201370102A1 (ru) Способ покрытия стекла
FR2999457B1 (fr) Procede de revetement d'un substrat par un materiau abradable ceramique, et revetement ainsi obtenu.