CH611029A5 - - Google Patents
Info
- Publication number
- CH611029A5 CH611029A5 CH77877A CH77877A CH611029A5 CH 611029 A5 CH611029 A5 CH 611029A5 CH 77877 A CH77877 A CH 77877A CH 77877 A CH77877 A CH 77877A CH 611029 A5 CH611029 A5 CH 611029A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/653,936 US4036167A (en) | 1976-01-30 | 1976-01-30 | Apparatus for monitoring vacuum deposition processes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH611029A5 true CH611029A5 (US07923587-20110412-C00001.png) | 1979-05-15 |
Family
ID=24622868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH77877A CH611029A5 (US07923587-20110412-C00001.png) | 1976-01-30 | 1977-01-21 |
Country Status (6)
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4172020A (en) * | 1978-05-24 | 1979-10-23 | Gould Inc. | Method and apparatus for monitoring and controlling sputter deposition processes |
| DE2940616A1 (de) * | 1979-10-06 | 1981-04-16 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Verfahren zum plasma-aetzen in plasma-reaktoren |
| US4324812A (en) * | 1980-05-29 | 1982-04-13 | Ransburg Corporation | Method for controlling the flow of coating material |
| US4406252A (en) * | 1980-12-29 | 1983-09-27 | Rockwell International Corporation | Inductive heating arrangement for evaporating thin film alloy onto a substrate |
| US4335266A (en) * | 1980-12-31 | 1982-06-15 | The Boeing Company | Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2 |
| USRE31968E (en) * | 1980-12-31 | 1985-08-13 | The Boeing Company | Methods for forming thin-film heterojunction solar cells from I-III-VI.sub.2 |
| JPS57161063A (en) * | 1981-03-31 | 1982-10-04 | Nippon Sheet Glass Co Ltd | Method and device for sticking metallic oxide film on substrate |
| US4394237A (en) * | 1981-07-17 | 1983-07-19 | Bell Telephone Laboratories, Incorporated | Spectroscopic monitoring of gas-solid processes |
| GB2125541B (en) * | 1982-08-13 | 1986-02-12 | Inst Tzvetna Metalurgia | Method and device for determination of dust content in dust gas flow |
| GB2130716A (en) * | 1982-11-26 | 1984-06-06 | Philips Electronic Associated | Method of determining the composition of an alloy film grown by a layer-by layer process |
| US4428811A (en) | 1983-04-04 | 1984-01-31 | Borg-Warner Corporation | Rapid rate reactive sputtering of a group IVb metal |
| US4478173A (en) * | 1983-04-18 | 1984-10-23 | Energy Conversion Devices, Inc. | Method and apparatus for sensing and controlling the intensity of energy in a deposition system |
| JPS60204626A (ja) * | 1984-03-30 | 1985-10-16 | Anelva Corp | 酸化鉄薄膜の形成方法および装置 |
| US4845041A (en) * | 1985-11-20 | 1989-07-04 | Analyte Corporation | Atomic-absorption sputtering chamber and system |
| JPS62188941A (ja) * | 1986-02-14 | 1987-08-18 | Anelva Corp | 真空蒸着のモニタリング用センサ− |
| US4988871A (en) * | 1989-05-08 | 1991-01-29 | Leybold Inficon, Inc. | Gas partial pressure sensor for vacuum chamber |
| US5087815A (en) * | 1989-11-08 | 1992-02-11 | Schultz J Albert | High resolution mass spectrometry of recoiled ions for isotopic and trace elemental analysis |
| DE4304612C2 (de) * | 1993-02-16 | 1995-03-16 | Fraunhofer Ges Forschung | Verfahren zur kontinuierlichen Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze oder eines zu verdampfenden Materials im Vakuum |
| DE19607400C2 (de) * | 1996-02-28 | 1999-09-09 | Leybold Ag | Verdampferschiffchen für eine Vorrichtung zur Beschichtung von Substraten |
| DE19609970A1 (de) | 1996-03-14 | 1997-09-18 | Leybold Systems Gmbh | Vorrichtung zum Aufbringen dünner Schichten auf ein Substrat |
| US6513451B2 (en) * | 2001-04-20 | 2003-02-04 | Eastman Kodak Company | Controlling the thickness of an organic layer in an organic light-emiting device |
| US6558735B2 (en) * | 2001-04-20 | 2003-05-06 | Eastman Kodak Company | Reusable mass-sensor in manufacture of organic light-emitting devices |
| DE10361903A1 (de) * | 2003-12-22 | 2005-07-28 | Carl Zeiss Jena Gmbh | Verfahren zur spektroskopischen Analyse einer biologischen oder chemischen Substanz |
| US7719681B2 (en) * | 2007-10-12 | 2010-05-18 | Inficon | Apparatus and method for measuring vapor flux density |
| US8646408B2 (en) * | 2009-12-31 | 2014-02-11 | First Solar, Inc. | Flux monitor |
| DE102012200211A1 (de) * | 2012-01-09 | 2013-07-11 | Carl Zeiss Nts Gmbh | Vorrichtung und Verfahren zur Oberflächenbearbeitung eines Substrates |
| CN107532290B (zh) | 2015-03-31 | 2022-04-01 | 布勒阿尔策瑙股份有限公司 | 用于生产涂覆的基板的方法 |
| DE102022208770A1 (de) | 2022-08-24 | 2024-02-29 | Hochschule Reutlingen, Körperschaft des öffentlichen Rechts | Vorrichtung zum Erfassen von mindestens einer gasförmigen Komponente in einem Gas |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3168418A (en) * | 1962-03-27 | 1965-02-02 | Alloyd Electronics | Device for monitoring and controlling evaporation rate in vacuum deposition |
| US3373278A (en) * | 1965-01-06 | 1968-03-12 | United States Steel Corp | Determination of vapor coating rate by x-rays emitted from said vapor |
| FR1541499A (fr) * | 1966-10-31 | 1968-10-04 | Air Reduction | Procédé et appareil de contrôle de la densité d'une vapeur par spectroscopie |
| CH475559A (fr) * | 1967-04-21 | 1969-07-15 | Battelle Development Corp | Procédé de mesure de la vitesse d'évaporation sous vide, jauge pour la mise en oeuvre de ce procédé et application de ce procédé |
| US3612859A (en) * | 1968-01-31 | 1971-10-12 | Westinghouse Electric Corp | Method for measuring and controlling the density of a metallic vapor |
| LU59669A1 (US07923587-20110412-C00001.png) * | 1969-10-17 | 1971-08-10 | ||
| US3734620A (en) * | 1971-04-01 | 1973-05-22 | Ibm | Multiple band atomic absorption apparatus for simultaneously measuring different physical parameters of a material |
-
1976
- 1976-01-30 US US05/653,936 patent/US4036167A/en not_active Expired - Lifetime
-
1977
- 1977-01-12 DE DE2700979A patent/DE2700979C3/de not_active Expired
- 1977-01-21 CH CH77877A patent/CH611029A5/xx not_active IP Right Cessation
- 1977-01-28 FR FR7702524A patent/FR2339857A1/fr active Pending
- 1977-01-28 GB GB3587/77A patent/GB1543702A/en not_active Expired
- 1977-01-28 IT IT19768/77A patent/IT1076330B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| FR2339857A1 (fr) | 1977-08-26 |
| DE2700979C3 (de) | 1979-02-22 |
| IT1076330B (it) | 1985-04-27 |
| DE2700979A1 (de) | 1977-08-04 |
| GB1543702A (en) | 1979-04-04 |
| US4036167A (en) | 1977-07-19 |
| DE2700979B2 (de) | 1978-06-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |