CH602986A5 - - Google Patents

Info

Publication number
CH602986A5
CH602986A5 CH1548875A CH1548875A CH602986A5 CH 602986 A5 CH602986 A5 CH 602986A5 CH 1548875 A CH1548875 A CH 1548875A CH 1548875 A CH1548875 A CH 1548875A CH 602986 A5 CH602986 A5 CH 602986A5
Authority
CH
Switzerland
Application number
CH1548875A
Inventor
Peter Dr Richter
August Dr Wigger
Gerhard Dr Fahrbach
Erhard Dr Seiler
Helmut Dr Barzynski
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH602986A5 publication Critical patent/CH602986A5/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)
CH1548875A 1974-11-29 1975-11-28 CH602986A5 (no)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19742456439 DE2456439A1 (de) 1974-11-29 1974-11-29 Mehrschichtenverbundplatten fuer die herstellung von flexodruckformen

Publications (1)

Publication Number Publication Date
CH602986A5 true CH602986A5 (no) 1978-08-15

Family

ID=5932030

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1548875A CH602986A5 (no) 1974-11-29 1975-11-28

Country Status (11)

Country Link
JP (1) JPS5174703A (no)
AT (1) AT342090B (no)
BE (1) BE836070A (no)
CA (1) CA1070545A (no)
CH (1) CH602986A5 (no)
DE (1) DE2456439A1 (no)
DK (1) DK144344C (no)
FR (1) FR2292997A1 (no)
GB (1) GB1525965A (no)
NO (1) NO144121C (no)
SE (1) SE410058B (no)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53127004A (en) * 1977-04-11 1978-11-06 Asahi Chemical Ind Photosensitive elastomer composition
DE2834768A1 (de) * 1977-08-23 1979-03-08 Grace W R & Co Verfahren zur herstellung einer druckplatte und sie enthaltende haertbare polymerzusammensetzung
US4179531A (en) 1977-08-23 1979-12-18 W. R. Grace & Co. Polythiol effect, curable monoalkenyl aromatic-diene and ene composition
US4234676A (en) 1978-01-23 1980-11-18 W. R. Grace & Co. Polythiol effect curable polymeric composition
DE2823300C2 (de) * 1978-05-29 1986-02-20 Basf Ag, 6700 Ludwigshafen Verfahren zur Herstellung von klebfreien Oberflächen von photopolymeren Reliefdruckformen
CA1123649A (en) * 1978-06-22 1982-05-18 Norman E. Hughes Printing plates produced using a base layer with polymerization rate greater than that of the printing layer
JPS55135838A (en) * 1979-04-12 1980-10-23 Asahi Chem Ind Co Ltd Surface treating method for photosensitive elastomer printing plate
US4292150A (en) * 1979-06-26 1981-09-29 Uniroyal, Inc. Iodine treated elastomeric article
EP0057593A3 (en) * 1981-02-02 1983-01-19 Uniroyal, Inc. Compressible photopolymer printing plate
US4427759A (en) * 1982-01-21 1984-01-24 E. I. Du Pont De Nemours And Company Process for preparing an overcoated photopolymer printing plate
US4582777A (en) * 1983-05-18 1986-04-15 W. R. Grace & Co. Compressible printing plate
DE3630474A1 (de) * 1986-09-06 1988-03-10 Basf Ag Verfahren zur herstellung von aufzeichnungsschichten und deren verwendung zur herstellung von flexodruckformen
DE3744243C2 (de) * 1987-12-24 1995-12-07 Du Pont Deutschland Verbesserte photopolymerisierbare Aufzeichnungsmaterialien
CA1314752C (en) * 1988-04-13 1993-03-23 Hisao Satoh Photosensitive resin plate for flexography
DE19859623A1 (de) 1998-12-23 2000-08-24 Basf Drucksysteme Gmbh Photopolymerisierbare Druckformen mit Oberschicht zur Herstellung von Reliefdruckformen

Also Published As

Publication number Publication date
DE2456439A1 (de) 1976-08-12
NO753936L (no) 1976-06-01
SE7513246L (sv) 1976-05-31
DK144344B (da) 1982-02-22
DK144344C (da) 1982-07-19
JPS5174703A (no) 1976-06-28
ATA908775A (de) 1977-07-15
FR2292997B1 (no) 1981-09-25
FR2292997A1 (fr) 1976-06-25
CA1070545A (en) 1980-01-29
AT342090B (de) 1978-03-10
AU8702775A (en) 1977-06-02
DK539075A (da) 1976-05-30
SE410058B (sv) 1979-09-17
GB1525965A (en) 1978-09-27
NO144121B (no) 1981-03-16
NO144121C (no) 1981-06-24
BE836070A (fr) 1976-05-28

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Legal Events

Date Code Title Description
PL Patent ceased