CH582367A5 - - Google Patents

Info

Publication number
CH582367A5
CH582367A5 CH56473A CH56473A CH582367A5 CH 582367 A5 CH582367 A5 CH 582367A5 CH 56473 A CH56473 A CH 56473A CH 56473 A CH56473 A CH 56473A CH 582367 A5 CH582367 A5 CH 582367A5
Authority
CH
Switzerland
Application number
CH56473A
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH582367A5 publication Critical patent/CH582367A5/xx

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Laminated Bodies (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photoreceptors In Electrophotography (AREA)
CH56473A 1972-01-19 1973-01-16 CH582367A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19722202357 DE2202357C3 (de) 1972-01-19 1972-01-19 Photopolymerisierbares Aufzeichnungsmaterial und Verfahren zu seiner Herstellung

Publications (1)

Publication Number Publication Date
CH582367A5 true CH582367A5 (de) 1976-11-30

Family

ID=5833381

Family Applications (1)

Application Number Title Priority Date Filing Date
CH56473A CH582367A5 (de) 1972-01-19 1973-01-16

Country Status (9)

Country Link
JP (1) JPS561628B2 (de)
AT (1) AT321955B (de)
BE (1) BE794260A (de)
CA (1) CA1014404A (de)
CH (1) CH582367A5 (de)
DE (1) DE2202357C3 (de)
FR (1) FR2168577B1 (de)
GB (1) GB1409015A (de)
IT (1) IT988099B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5090404A (de) * 1973-12-13 1975-07-19
FR2455305A1 (fr) * 1979-04-24 1980-11-21 Uk Poligrafichesky Instit Composition adhesive antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
FR2457512A1 (fr) * 1979-05-22 1980-12-19 Uk Poligrafichesky Instit Composition adhesive-antihalo pour la preparation de cliches en photopolymeres sur supports metalliques
DE3032134A1 (de) * 1979-08-28 1981-03-19 Fuji Photo Film Co. Ltd., Minami-Ashigara, Kanagawa Lichtempfindliches bildausbildungsmaterial
JPS609799A (ja) * 1983-06-29 1985-01-18 Toray Ind Inc 湿し水不要平版印刷版
DE102013201392A1 (de) * 2013-01-29 2014-07-31 Evonik Industries Ag Haftvermittler- und Primer-Zusammensetzungen für Metall-Kunststoff-Hybridbauteile

Also Published As

Publication number Publication date
DE2202357B2 (de) 1980-04-03
FR2168577A1 (de) 1973-08-31
AT321955B (de) 1975-04-25
DE2202357A1 (de) 1973-07-26
IT988099B (it) 1975-04-10
JPS4882903A (de) 1973-11-06
GB1409015A (en) 1975-10-08
FR2168577B1 (de) 1976-08-27
CA1014404A (en) 1977-07-26
DE2202357C3 (de) 1980-12-04
BE794260A (fr) 1973-07-19
JPS561628B2 (de) 1981-01-14

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Legal Events

Date Code Title Description
PL Patent ceased