CH566033A5 - - Google Patents
Info
- Publication number
- CH566033A5 CH566033A5 CH1409571A CH1409571A CH566033A5 CH 566033 A5 CH566033 A5 CH 566033A5 CH 1409571 A CH1409571 A CH 1409571A CH 1409571 A CH1409571 A CH 1409571A CH 566033 A5 CH566033 A5 CH 566033A5
- Authority
- CH
- Switzerland
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
- G03C1/73—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19702047816 DE2047816C3 (de) | 1970-09-29 | Verfahren zur Herstellung reprographischer Materialien durch Aufdampfen einer lichtempfindlichen Schicht |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH566033A5 true CH566033A5 (https=) | 1975-08-29 |
Family
ID=5783684
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1409571A CH566033A5 (https=) | 1970-09-29 | 1971-09-28 |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US3751285A (https=) |
| JP (1) | JPS5420884B1 (https=) |
| AT (1) | AT321102B (https=) |
| BE (1) | BE773146A (https=) |
| CA (1) | CA991003A (https=) |
| CH (1) | CH566033A5 (https=) |
| FR (1) | FR2108683A5 (https=) |
| GB (1) | GB1361786A (https=) |
| NL (1) | NL165852C (https=) |
| SE (1) | SE363909B (https=) |
| ZA (1) | ZA716445B (https=) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5645127B2 (https=) * | 1974-02-25 | 1981-10-24 | ||
| GB1588417A (en) * | 1977-03-15 | 1981-04-23 | Agfa Gevaert | Photoresist materials |
| DE2826122A1 (de) * | 1977-06-14 | 1978-12-21 | Fuji Photo Film Co Ltd | Aufzeichnungsmaterial |
| US4263392A (en) * | 1979-06-01 | 1981-04-21 | Richardson Graphics Company | Ultra high speed presensitized lithographic plates |
| US4334003A (en) * | 1979-06-01 | 1982-06-08 | Richardson Graphics Company | Ultra high speed presensitized lithographic plates |
| US4423137A (en) * | 1980-10-28 | 1983-12-27 | Quixote Corporation | Contact printing and etching method of making high density recording medium |
| US4587198A (en) * | 1984-07-16 | 1986-05-06 | Minnesota Mining And Manufacturing Company | Dye transfer image process |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3026218A (en) * | 1956-12-21 | 1962-03-20 | Eastman Kodak Co | Procedure for forming photosensitive lead sulfide layers by vacuum evaporation |
| US3276869A (en) * | 1961-05-09 | 1966-10-04 | Polaroid Corp | Capsular product coated with silver halide and containing a color-providing substance |
| US3219451A (en) * | 1962-12-11 | 1965-11-23 | Technical Operations Inc | Sensitizing photographic media |
| DE1202292B (de) * | 1963-10-04 | 1965-10-07 | Kalle Ag | Aluminiumtraeger fuer Flachdruckformen |
| US3440959A (en) * | 1966-02-18 | 1969-04-29 | Hercules Inc | Coated polymer |
| GB1116674A (en) * | 1966-02-28 | 1968-06-12 | Agfa Gevaert Nv | Naphthoquinone diazide sulphofluoride |
| NL6703090A (https=) * | 1966-03-12 | 1967-09-13 | ||
| US3551344A (en) * | 1967-03-20 | 1970-12-29 | Gen Motors Corp | Photochromic plastic and method of making |
| US3650743A (en) * | 1967-10-06 | 1972-03-21 | Teeg Research Inc | Methods for making lithographic offset plates by means of electromagnetic radiation sensitive elements |
| US3639250A (en) * | 1968-08-01 | 1972-02-01 | Nasa | Phototropic composition of matter |
| US3627599A (en) * | 1969-04-25 | 1971-12-14 | Rca Corp | Method of applying an n,n{40 diallylmelamine resist to a surface |
| US3669658A (en) * | 1969-06-11 | 1972-06-13 | Fuji Photo Film Co Ltd | Photosensitive printing plate |
| US3647443A (en) * | 1969-09-12 | 1972-03-07 | Eastman Kodak Co | Light-sensitive quinone diazide polymers and polymer compositions |
| US3661582A (en) * | 1970-03-23 | 1972-05-09 | Western Electric Co | Additives to positive photoresists which increase the sensitivity thereof |
-
1971
- 1971-09-17 NL NL7112806.A patent/NL165852C/xx not_active IP Right Cessation
- 1971-09-27 ZA ZA716445A patent/ZA716445B/xx unknown
- 1971-09-27 BE BE773146A patent/BE773146A/xx not_active IP Right Cessation
- 1971-09-27 CA CA123,726A patent/CA991003A/en not_active Expired
- 1971-09-27 AT AT834771A patent/AT321102B/de not_active IP Right Cessation
- 1971-09-27 US US00184299A patent/US3751285A/en not_active Expired - Lifetime
- 1971-09-27 GB GB4494471A patent/GB1361786A/en not_active Expired
- 1971-09-28 SE SE12263/71A patent/SE363909B/xx unknown
- 1971-09-28 CH CH1409571A patent/CH566033A5/xx not_active IP Right Cessation
- 1971-09-29 JP JP7622771A patent/JPS5420884B1/ja active Pending
- 1971-09-29 FR FR7135013A patent/FR2108683A5/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5420884B1 (https=) | 1979-07-26 |
| DE2047816A1 (de) | 1972-03-30 |
| DE2047816B2 (de) | 1976-07-08 |
| US3751285A (en) | 1973-08-07 |
| NL165852B (nl) | 1980-12-15 |
| CA991003A (en) | 1976-06-15 |
| ZA716445B (en) | 1972-05-31 |
| AT321102B (de) | 1975-03-10 |
| BE773146A (fr) | 1972-03-27 |
| GB1361786A (en) | 1974-07-30 |
| FR2108683A5 (https=) | 1972-05-19 |
| SE363909B (https=) | 1974-02-04 |
| NL165852C (nl) | 1981-05-15 |
| NL7112806A (https=) | 1972-04-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |