CH565869A5 - - Google Patents

Info

Publication number
CH565869A5
CH565869A5 CH327572A CH327572A CH565869A5 CH 565869 A5 CH565869 A5 CH 565869A5 CH 327572 A CH327572 A CH 327572A CH 327572 A CH327572 A CH 327572A CH 565869 A5 CH565869 A5 CH 565869A5
Authority
CH
Switzerland
Application number
CH327572A
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH327572A priority Critical patent/CH565869A5/xx
Priority to NL7205592A priority patent/NL151137B/xx
Priority to DE19732305359 priority patent/DE2305359C3/de
Priority to GB555773A priority patent/GB1394655A/en
Priority to JP2274273A priority patent/JPS5411798B2/ja
Priority to AT178673A priority patent/AT319007B/de
Priority to FR7307650A priority patent/FR2174967B1/fr
Priority to US05/552,215 priority patent/US3980044A/en
Publication of CH565869A5 publication Critical patent/CH565869A5/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32422—Arrangement for selecting ions or species in the plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
CH327572A 1972-03-06 1972-03-06 CH565869A5 (fr)

Priority Applications (8)

Application Number Priority Date Filing Date Title
CH327572A CH565869A5 (fr) 1972-03-06 1972-03-06
NL7205592A NL151137B (nl) 1972-03-06 1972-04-25 Inrichting voor het onder vacuuem reactief opdampen van dunne lagen op dragers.
DE19732305359 DE2305359C3 (de) 1972-03-06 1973-02-03 Vorrichtung zur reaktiven Aufdampfung dünner Schichten auf Unterlagen
GB555773A GB1394655A (en) 1972-03-06 1973-02-05 Deposition of thin layers from the vapour phase under the simultaneous action of an ionised gas
JP2274273A JPS5411798B2 (fr) 1972-03-06 1973-02-27
AT178673A AT319007B (de) 1972-03-06 1973-02-28 Anordnung zur Aufdampfung dünner Schichten unter gleichzeitiger Einwirkung eines ionisierten Gases
FR7307650A FR2174967B1 (fr) 1972-03-06 1973-03-05
US05/552,215 US3980044A (en) 1972-03-06 1975-02-24 Apparatus for depositing thin coats by vaporization under the simultaneous action of an ionized gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH327572A CH565869A5 (fr) 1972-03-06 1972-03-06

Publications (1)

Publication Number Publication Date
CH565869A5 true CH565869A5 (fr) 1975-08-29

Family

ID=4252464

Family Applications (1)

Application Number Title Priority Date Filing Date
CH327572A CH565869A5 (fr) 1972-03-06 1972-03-06

Country Status (7)

Country Link
JP (1) JPS5411798B2 (fr)
AT (1) AT319007B (fr)
CH (1) CH565869A5 (fr)
DE (1) DE2305359C3 (fr)
FR (1) FR2174967B1 (fr)
GB (1) GB1394655A (fr)
NL (1) NL151137B (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691437A (en) * 1979-12-26 1981-07-24 Nippon Hoso Kyokai <Nhk> Preparation of metallized element
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS6115967A (ja) * 1984-06-29 1986-01-24 Sumitomo Electric Ind Ltd 表面処理方法
JPS61177366A (ja) * 1985-01-31 1986-08-09 Sharp Corp 超微粒子分散基板の製造装置
US4888202A (en) * 1986-07-31 1989-12-19 Nippon Telegraph And Telephone Corporation Method of manufacturing thin compound oxide film and apparatus for manufacturing thin oxide film

Also Published As

Publication number Publication date
JPS5411798B2 (fr) 1979-05-17
JPS48102076A (fr) 1973-12-21
FR2174967A1 (fr) 1973-10-19
DE2305359A1 (de) 1973-09-13
NL151137B (nl) 1976-10-15
DE2305359C3 (de) 1980-01-10
NL7205592A (fr) 1973-09-10
GB1394655A (en) 1975-05-21
FR2174967B1 (fr) 1977-04-22
AT319007B (de) 1974-11-25
DE2305359B2 (de) 1975-07-17

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Legal Events

Date Code Title Description
PL Patent ceased