CH504025A - Verfahren zum Herstellen von Reliefformen für Druckzwecke - Google Patents
Verfahren zum Herstellen von Reliefformen für DruckzweckeInfo
- Publication number
- CH504025A CH504025A CH1333466A CH1333466A CH504025A CH 504025 A CH504025 A CH 504025A CH 1333466 A CH1333466 A CH 1333466A CH 1333466 A CH1333466 A CH 1333466A CH 504025 A CH504025 A CH 504025A
- Authority
- CH
- Switzerland
- Prior art keywords
- copolyamides
- prepared
- polymerisation
- pref
- initiators
- Prior art date
Links
- 239000000203 mixture Substances 0.000 abstract 6
- 239000000178 monomer Substances 0.000 abstract 3
- 238000004132 cross linking Methods 0.000 abstract 2
- 239000003112 inhibitor Substances 0.000 abstract 2
- 239000003999 initiator Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 abstract 1
- 239000004952 Polyamide Substances 0.000 abstract 1
- 238000005299 abrasion Methods 0.000 abstract 1
- 125000000129 anionic group Chemical group 0.000 abstract 1
- 238000005266 casting Methods 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 238000001125 extrusion Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 abstract 1
- UTZNELIJGYWMKS-UHFFFAOYSA-N phenylmethanol;hydrate Chemical compound O.OCC1=CC=CC=C1 UTZNELIJGYWMKS-UHFFFAOYSA-N 0.000 abstract 1
- 229920002647 polyamide Polymers 0.000 abstract 1
- 238000006116 polymerization reaction Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Polyamides (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEB0083995 | 1965-10-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH504025A true CH504025A (de) | 1971-02-28 |
Family
ID=6982227
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1333466A CH504025A (de) | 1965-10-05 | 1966-09-15 | Verfahren zum Herstellen von Reliefformen für Druckzwecke |
Country Status (4)
| Country | Link |
|---|---|
| BE (1) | BE687678A (oth) |
| CH (1) | CH504025A (oth) |
| DE (1) | DE1447932C3 (oth) |
| GB (1) | GB1154384A (oth) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3327521A1 (de) * | 1983-07-30 | 1985-02-07 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von reliefformen mit speziellen ungesaettigten amiden |
| DE3767690D1 (de) * | 1986-12-26 | 1991-02-28 | Toray Industries | Lichtempfindliche photopolymerzusammensetzung und druckplatte. |
-
1965
- 1965-10-05 DE DE19651447932 patent/DE1447932C3/de not_active Expired
-
1966
- 1966-09-15 CH CH1333466A patent/CH504025A/de not_active IP Right Cessation
- 1966-09-30 BE BE687678D patent/BE687678A/xx unknown
- 1966-10-04 GB GB4419466A patent/GB1154384A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE1447932C3 (de) | 1975-08-28 |
| DE1447932B2 (de) | 1975-01-16 |
| BE687678A (oth) | 1967-03-30 |
| GB1154384A (en) | 1969-06-04 |
| DE1447932A1 (de) | 1969-02-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |