CH504025A - Relief printing devices prepared from copolyamides - Google Patents

Relief printing devices prepared from copolyamides

Info

Publication number
CH504025A
CH504025A CH1333466A CH1333466A CH504025A CH 504025 A CH504025 A CH 504025A CH 1333466 A CH1333466 A CH 1333466A CH 1333466 A CH1333466 A CH 1333466A CH 504025 A CH504025 A CH 504025A
Authority
CH
Switzerland
Prior art keywords
copolyamides
prepared
polymerisation
pref
initiators
Prior art date
Application number
CH1333466A
Other languages
German (de)
Inventor
Hans Dr Wilhelm
Herbert Dr Henkler
Georg Dr Floss Josef
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH504025A publication Critical patent/CH504025A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyamides (AREA)

Abstract

Manufacture of printing plates and devices from synthetic copolyamides prepared from compositions comprising 90-30% wt. linear polyamide (I), 10-70% wt. other monomers (II) containing at least two polymerisable double bonds, in conjunction with 1-50% (pref. 5-40% wt. of total monomers) N-methylolacrylamide and/or N-methylolmethacrylamide, and in the presence of 0.01-10% wt. (pref. 0.01-3% wt.) on total mixture of suitable photo-initiators (III) and/or thermal polymerisation inhibitors (IV). Rapid process needing relatively short exposures which produces a printing plate, having very sharp outlines, in relief, which can be associated with flexible or rigid supports, and which has a high resistance to abrasion and wear. Composition is not subject to undesirable cross-linking reactions during the preparation of the plates or layers from the copolyamide composition and before exposure to light. Achieved by exposing layer of above copolyamide (prepared by usual extrusion, casting or similar techniques) in contact with negative to suitable light source as in prior art, followed by removal of unexposed material by washing with benzene-methanol-water (2:7:1) mixture. The copolyamides used are soluble in the usual mixtures of solvents and are generally prepared by anionic polymerisation starting with any of the well known monomer. The well known photo-initiators (III) decompose into radicals on exposure to light and thereby induce the cross-linking polymerisation reactions. The inhibitors.
CH1333466A 1965-10-05 1966-09-15 Relief printing devices prepared from copolyamides CH504025A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB0083995 1965-10-05

Publications (1)

Publication Number Publication Date
CH504025A true CH504025A (en) 1971-02-28

Family

ID=6982227

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1333466A CH504025A (en) 1965-10-05 1966-09-15 Relief printing devices prepared from copolyamides

Country Status (4)

Country Link
BE (1) BE687678A (en)
CH (1) CH504025A (en)
DE (1) DE1447932C3 (en)
GB (1) GB1154384A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3327521A1 (en) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen METHOD FOR PRODUCING RELIEF FORMS WITH SPECIAL UNSATURATED AMIDES
EP0273113B1 (en) * 1986-12-26 1991-01-23 Toray Industries, Inc. Photosensitive polymer composition and master printing plate

Also Published As

Publication number Publication date
DE1447932A1 (en) 1969-02-20
BE687678A (en) 1967-03-30
GB1154384A (en) 1969-06-04
DE1447932B2 (en) 1975-01-16
DE1447932C3 (en) 1975-08-28

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Legal Events

Date Code Title Description
PL Patent ceased