CH504025A - Relief printing devices prepared from copolyamides - Google Patents
Relief printing devices prepared from copolyamidesInfo
- Publication number
- CH504025A CH504025A CH1333466A CH1333466A CH504025A CH 504025 A CH504025 A CH 504025A CH 1333466 A CH1333466 A CH 1333466A CH 1333466 A CH1333466 A CH 1333466A CH 504025 A CH504025 A CH 504025A
- Authority
- CH
- Switzerland
- Prior art keywords
- copolyamides
- prepared
- polymerisation
- pref
- initiators
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Polyamides (AREA)
Abstract
Manufacture of printing plates and devices from synthetic copolyamides prepared from compositions comprising 90-30% wt. linear polyamide (I), 10-70% wt. other monomers (II) containing at least two polymerisable double bonds, in conjunction with 1-50% (pref. 5-40% wt. of total monomers) N-methylolacrylamide and/or N-methylolmethacrylamide, and in the presence of 0.01-10% wt. (pref. 0.01-3% wt.) on total mixture of suitable photo-initiators (III) and/or thermal polymerisation inhibitors (IV). Rapid process needing relatively short exposures which produces a printing plate, having very sharp outlines, in relief, which can be associated with flexible or rigid supports, and which has a high resistance to abrasion and wear. Composition is not subject to undesirable cross-linking reactions during the preparation of the plates or layers from the copolyamide composition and before exposure to light. Achieved by exposing layer of above copolyamide (prepared by usual extrusion, casting or similar techniques) in contact with negative to suitable light source as in prior art, followed by removal of unexposed material by washing with benzene-methanol-water (2:7:1) mixture. The copolyamides used are soluble in the usual mixtures of solvents and are generally prepared by anionic polymerisation starting with any of the well known monomer. The well known photo-initiators (III) decompose into radicals on exposure to light and thereby induce the cross-linking polymerisation reactions. The inhibitors.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEB0083995 | 1965-10-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
CH504025A true CH504025A (en) | 1971-02-28 |
Family
ID=6982227
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH1333466A CH504025A (en) | 1965-10-05 | 1966-09-15 | Relief printing devices prepared from copolyamides |
Country Status (4)
Country | Link |
---|---|
BE (1) | BE687678A (en) |
CH (1) | CH504025A (en) |
DE (1) | DE1447932C3 (en) |
GB (1) | GB1154384A (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3327521A1 (en) * | 1983-07-30 | 1985-02-07 | Basf Ag, 6700 Ludwigshafen | METHOD FOR PRODUCING RELIEF FORMS WITH SPECIAL UNSATURATED AMIDES |
EP0273113B1 (en) * | 1986-12-26 | 1991-01-23 | Toray Industries, Inc. | Photosensitive polymer composition and master printing plate |
-
1965
- 1965-10-05 DE DE19651447932 patent/DE1447932C3/en not_active Expired
-
1966
- 1966-09-15 CH CH1333466A patent/CH504025A/en not_active IP Right Cessation
- 1966-09-30 BE BE687678D patent/BE687678A/xx unknown
- 1966-10-04 GB GB4419466A patent/GB1154384A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1447932A1 (en) | 1969-02-20 |
BE687678A (en) | 1967-03-30 |
GB1154384A (en) | 1969-06-04 |
DE1447932B2 (en) | 1975-01-16 |
DE1447932C3 (en) | 1975-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |