CH504025A - Verfahren zum Herstellen von Reliefformen für Druckzwecke - Google Patents

Verfahren zum Herstellen von Reliefformen für Druckzwecke

Info

Publication number
CH504025A
CH504025A CH1333466A CH1333466A CH504025A CH 504025 A CH504025 A CH 504025A CH 1333466 A CH1333466 A CH 1333466A CH 1333466 A CH1333466 A CH 1333466A CH 504025 A CH504025 A CH 504025A
Authority
CH
Switzerland
Prior art keywords
copolyamides
prepared
polymerisation
pref
initiators
Prior art date
Application number
CH1333466A
Other languages
English (en)
Inventor
Hans Dr Wilhelm
Herbert Dr Henkler
Georg Dr Floss Josef
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH504025A publication Critical patent/CH504025A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Polyamides (AREA)
CH1333466A 1965-10-05 1966-09-15 Verfahren zum Herstellen von Reliefformen für Druckzwecke CH504025A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB0083995 1965-10-05

Publications (1)

Publication Number Publication Date
CH504025A true CH504025A (de) 1971-02-28

Family

ID=6982227

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1333466A CH504025A (de) 1965-10-05 1966-09-15 Verfahren zum Herstellen von Reliefformen für Druckzwecke

Country Status (4)

Country Link
BE (1) BE687678A (de)
CH (1) CH504025A (de)
DE (1) DE1447932C3 (de)
GB (1) GB1154384A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3327521A1 (de) * 1983-07-30 1985-02-07 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von reliefformen mit speziellen ungesaettigten amiden
EP0273113B1 (de) * 1986-12-26 1991-01-23 Toray Industries, Inc. Lichtempfindliche Photopolymerzusammensetzung und Druckplatte

Also Published As

Publication number Publication date
DE1447932A1 (de) 1969-02-20
BE687678A (de) 1967-03-30
GB1154384A (en) 1969-06-04
DE1447932B2 (de) 1975-01-16
DE1447932C3 (de) 1975-08-28

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Legal Events

Date Code Title Description
PL Patent ceased