CH493861A - Process for controlling the distance between a photographic emulsion and an objective and instrument for carrying out this process - Google Patents

Process for controlling the distance between a photographic emulsion and an objective and instrument for carrying out this process

Info

Publication number
CH493861A
CH493861A CH1497568A CH1497568A CH493861A CH 493861 A CH493861 A CH 493861A CH 1497568 A CH1497568 A CH 1497568A CH 1497568 A CH1497568 A CH 1497568A CH 493861 A CH493861 A CH 493861A
Authority
CH
Switzerland
Prior art keywords
objective
instrument
carrying
controlling
distance
Prior art date
Application number
CH1497568A
Other languages
French (fr)
Inventor
Willis Stevens Guy William
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CH493861A publication Critical patent/CH493861A/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70341Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B3/00Focusing arrangements of general interest for cameras, projectors or printers
    • G03B3/02Focusing arrangements of general interest for cameras, projectors or printers moving lens along baseboard

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)
  • Eyeglasses (AREA)
CH1497568A 1967-10-20 1968-10-08 Process for controlling the distance between a photographic emulsion and an objective and instrument for carrying out this process CH493861A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB47867/67A GB1242527A (en) 1967-10-20 1967-10-20 Optical instruments

Publications (1)

Publication Number Publication Date
CH493861A true CH493861A (en) 1970-07-15

Family

ID=10446525

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1497568A CH493861A (en) 1967-10-20 1968-10-08 Process for controlling the distance between a photographic emulsion and an objective and instrument for carrying out this process

Country Status (5)

Country Link
US (1) US3648587A (en)
CH (1) CH493861A (en)
DE (1) DE1803461A1 (en)
FR (1) FR1587123A (en)
GB (1) GB1242527A (en)

Families Citing this family (192)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3837731A (en) * 1973-06-22 1974-09-24 Corning Glass Works Oil dispenser for microscope objective
US3936176A (en) * 1973-07-19 1976-02-03 Xerox Corporation Device for maintaining a developability regulating apparatus contaminant free
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
JPS57153433A (en) * 1981-03-18 1982-09-22 Hitachi Ltd Manufacturing device for semiconductor
US4434649A (en) 1981-04-20 1984-03-06 Accuray Corporation Gauge having a surface follower with peripheral vent
US4778995A (en) * 1987-05-12 1988-10-18 Eastman Kodak Company Stimulable phosphor imaging apparatus
US5123743A (en) * 1990-02-28 1992-06-23 Board Of Supervisors Of Louisiana State University And Agricultural And Mechanical College Lithography mask inspection
US5870223A (en) * 1996-07-22 1999-02-09 Nikon Corporation Microscope system for liquid immersion observation
US6330106B1 (en) * 1999-02-17 2001-12-11 Lucid, Inc. Tissue specimen holder
US20020163629A1 (en) * 2001-05-07 2002-11-07 Michael Switkes Methods and apparatus employing an index matching medium
DE10123027B4 (en) * 2001-05-11 2005-07-21 Evotec Oai Ag Device for the examination of chemical and / or biological samples
US7294446B2 (en) * 2001-10-29 2007-11-13 Eastman Kodak Company Digital analog recording using near field optical imaging
US7252097B2 (en) * 2002-09-30 2007-08-07 Lam Research Corporation System and method for integrating in-situ metrology within a wafer process
US6788477B2 (en) 2002-10-22 2004-09-07 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus for method for immersion lithography
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN100568101C (en) 2002-11-12 2009-12-09 Asml荷兰有限公司 Photolithography apparatus and device manufacturing method
DE60335595D1 (en) * 2002-11-12 2011-02-17 Asml Netherlands Bv Immersion lithographic apparatus and method of making a device
CN101470360B (en) 2002-11-12 2013-07-24 Asml荷兰有限公司 Immersion lithographic apparatus and device manufacturing method
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420298B1 (en) * 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR100585476B1 (en) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. Lithographic Apparatus and Device Manufacturing Method
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7372541B2 (en) * 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG131766A1 (en) * 2002-11-18 2007-05-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG121829A1 (en) * 2002-11-29 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7242455B2 (en) * 2002-12-10 2007-07-10 Nikon Corporation Exposure apparatus and method for producing device
EP1429190B1 (en) * 2002-12-10 2012-05-09 Canon Kabushiki Kaisha Exposure apparatus and method
WO2004053955A1 (en) * 2002-12-10 2004-06-24 Nikon Corporation Exposure system and device producing method
US7514699B2 (en) * 2002-12-19 2009-04-07 Koninklijke Philips Electronics N.V. Method and device for irradiating spots on a layer
EP2466623B1 (en) * 2003-02-26 2015-04-22 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
DE10309138A1 (en) * 2003-02-28 2004-09-16 Till I.D. Gmbh microscope device
EP1612850B1 (en) * 2003-04-07 2009-03-25 Nikon Corporation Exposure apparatus and method for manufacturing a device
WO2004093159A2 (en) * 2003-04-09 2004-10-28 Nikon Corporation Immersion lithography fluid control system
EP2950147B1 (en) 2003-04-10 2017-04-26 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
EP3352010A1 (en) * 2003-04-10 2018-07-25 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
EP3062152B1 (en) * 2003-04-10 2017-12-20 Nikon Corporation Environmental system including vaccum scavenge for an immersion lithography apparatus
CN101825847B (en) * 2003-04-11 2013-10-16 株式会社尼康 Cleanup method for optics in immersion lithography
KR101225884B1 (en) 2003-04-11 2013-01-28 가부시키가이샤 니콘 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
JP4025683B2 (en) * 2003-05-09 2007-12-26 松下電器産業株式会社 Pattern forming method and exposure apparatus
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
TW201806001A (en) * 2003-05-23 2018-02-16 尼康股份有限公司 Exposure device and device manufacturing method
TWI442694B (en) * 2003-05-30 2014-06-21 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317504B2 (en) * 2004-04-08 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261741A3 (en) * 2003-06-11 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TW201721717A (en) 2003-06-19 2017-06-16 尼康股份有限公司 Exposure apparatus, exposure method, and device manufacturing method
US6867844B2 (en) * 2003-06-19 2005-03-15 Asml Holding N.V. Immersion photolithography system and method using microchannel nozzles
EP1498778A1 (en) * 2003-06-27 2005-01-19 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US6809794B1 (en) * 2003-06-27 2004-10-26 Asml Holding N.V. Immersion photolithography system and method using inverted wafer-projection optics interface
EP1491956B1 (en) 2003-06-27 2006-09-06 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1494074A1 (en) * 2003-06-30 2005-01-05 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1494075B1 (en) * 2003-06-30 2008-06-25 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
WO2005006415A1 (en) * 2003-07-09 2005-01-20 Nikon Corporation Exposure apparatus and method for manufacturing device
WO2005006418A1 (en) 2003-07-09 2005-01-20 Nikon Corporation Exposure apparatus and method for manufacturing device
SG109000A1 (en) * 2003-07-16 2005-02-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1500982A1 (en) * 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7175968B2 (en) * 2003-07-28 2007-02-13 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a substrate
EP1503244A1 (en) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7326522B2 (en) * 2004-02-11 2008-02-05 Asml Netherlands B.V. Device manufacturing method and a substrate
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8149381B2 (en) * 2003-08-26 2012-04-03 Nikon Corporation Optical element and exposure apparatus
JP4474652B2 (en) * 2003-08-26 2010-06-09 株式会社ニコン Optical element and exposure apparatus
TWI245163B (en) 2003-08-29 2005-12-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP2261740B1 (en) 2003-08-29 2014-07-09 ASML Netherlands BV Lithographic apparatus
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US6954256B2 (en) * 2003-08-29 2005-10-11 Asml Netherlands B.V. Gradient immersion lithography
EP3223053A1 (en) 2003-09-03 2017-09-27 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
EP1519230A1 (en) * 2003-09-29 2005-03-30 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1519231B1 (en) * 2003-09-29 2005-12-21 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7158211B2 (en) * 2003-09-29 2007-01-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1524558A1 (en) 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1524557A1 (en) 2003-10-15 2005-04-20 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352433B2 (en) 2003-10-28 2008-04-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411653B2 (en) * 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
US7113259B2 (en) * 2003-10-31 2006-09-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7545481B2 (en) * 2003-11-24 2009-06-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7460206B2 (en) * 2003-12-19 2008-12-02 Carl Zeiss Smt Ag Projection objective for immersion lithography
US7589818B2 (en) * 2003-12-23 2009-09-15 Asml Netherlands B.V. Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
US7394521B2 (en) * 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602005019689D1 (en) * 2004-01-20 2010-04-15 Zeiss Carl Smt Ag EXPOSURE DEVICE AND MEASURING DEVICE FOR A PROJECTION SECTOR
US7589822B2 (en) * 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
US7050146B2 (en) 2004-02-09 2006-05-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101851511B1 (en) * 2004-03-25 2018-04-23 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7034917B2 (en) * 2004-04-01 2006-04-25 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US7295283B2 (en) * 2004-04-02 2007-11-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005104195A1 (en) * 2004-04-19 2005-11-03 Nikon Corporation Exposure apparatus and device producing method
US7379159B2 (en) * 2004-05-03 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8054448B2 (en) * 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7091502B2 (en) * 2004-05-12 2006-08-15 Taiwan Semiconductor Manufacturing, Co., Ltd. Apparatus and method for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7486381B2 (en) * 2004-05-21 2009-02-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2005119742A1 (en) * 2004-06-04 2005-12-15 Nikon Corporation Exposure apparatus, exposure method, and device producing method
US20070103661A1 (en) * 2004-06-04 2007-05-10 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3203498A1 (en) * 2004-06-09 2017-08-09 Nikon Corporation Exposure apparatus and device manufacturing method
US20070222959A1 (en) * 2004-06-10 2007-09-27 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
EP3067749B1 (en) * 2004-06-10 2017-10-18 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US7481867B2 (en) 2004-06-16 2009-01-27 Edwards Limited Vacuum system for immersion photolithography
US7463330B2 (en) * 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161663B2 (en) * 2004-07-22 2007-01-09 Asml Netherlands B.V. Lithographic apparatus
US7304715B2 (en) 2004-08-13 2007-12-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR20070048164A (en) * 2004-08-18 2007-05-08 가부시키가이샤 니콘 Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060044533A1 (en) * 2004-08-27 2006-03-02 Asmlholding N.V. System and method for reducing disturbances caused by movement in an immersion lithography system
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060060653A1 (en) * 2004-09-23 2006-03-23 Carl Wittenberg Scanner system and method for simultaneously acquiring data images from multiple object planes
US7522261B2 (en) * 2004-09-24 2009-04-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7355674B2 (en) * 2004-09-28 2008-04-08 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and computer program product
US7894040B2 (en) * 2004-10-05 2011-02-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7209213B2 (en) * 2004-10-07 2007-04-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7379155B2 (en) * 2004-10-18 2008-05-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7119876B2 (en) * 2004-10-18 2006-10-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7414699B2 (en) * 2004-11-12 2008-08-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7583357B2 (en) * 2004-11-12 2009-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7251013B2 (en) 2004-11-12 2007-07-31 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7411657B2 (en) * 2004-11-17 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7145630B2 (en) * 2004-11-23 2006-12-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) * 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7256121B2 (en) * 2004-12-02 2007-08-14 Texas Instruments Incorporated Contact resistance reduction by new barrier stack process
US7446850B2 (en) * 2004-12-03 2008-11-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7196770B2 (en) * 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7248334B2 (en) * 2004-12-07 2007-07-24 Asml Netherlands B.V. Sensor shield
US7365827B2 (en) 2004-12-08 2008-04-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7352440B2 (en) * 2004-12-10 2008-04-01 Asml Netherlands B.V. Substrate placement in immersion lithography
US7403261B2 (en) * 2004-12-15 2008-07-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) * 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7491661B2 (en) * 2004-12-28 2009-02-17 Asml Netherlands B.V. Device manufacturing method, top coat material and substrate
US7405805B2 (en) 2004-12-28 2008-07-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060147821A1 (en) 2004-12-30 2006-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE602006012746D1 (en) * 2005-01-14 2010-04-22 Asml Netherlands Bv Lithographic apparatus and manufacturing method
SG124351A1 (en) * 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US8692973B2 (en) * 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
KR101513840B1 (en) * 2005-01-31 2015-04-20 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
CN102360170B (en) 2005-02-10 2014-03-12 Asml荷兰有限公司 Immersion liquid, exposure apparatus, and exposure process
US8018573B2 (en) * 2005-02-22 2011-09-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7378025B2 (en) 2005-02-22 2008-05-27 Asml Netherlands B.V. Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
US7224431B2 (en) * 2005-02-22 2007-05-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7428038B2 (en) 2005-02-28 2008-09-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
US7324185B2 (en) * 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7684010B2 (en) * 2005-03-09 2010-03-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
US7330238B2 (en) * 2005-03-28 2008-02-12 Asml Netherlands, B.V. Lithographic apparatus, immersion projection apparatus and device manufacturing method
US7411654B2 (en) 2005-04-05 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7291850B2 (en) * 2005-04-08 2007-11-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US20060232753A1 (en) * 2005-04-19 2006-10-19 Asml Holding N.V. Liquid immersion lithography system with tilted liquid flow
US7433016B2 (en) 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7751027B2 (en) 2005-06-21 2010-07-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7652746B2 (en) * 2005-06-21 2010-01-26 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7474379B2 (en) 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834974B2 (en) 2005-06-28 2010-11-16 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7535644B2 (en) * 2005-08-12 2009-05-19 Asml Netherlands B.V. Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US8054445B2 (en) * 2005-08-16 2011-11-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7580112B2 (en) * 2005-08-25 2009-08-25 Nikon Corporation Containment system for immersion fluid in an immersion lithography apparatus
US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7656501B2 (en) * 2005-11-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus
US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US7633073B2 (en) * 2005-11-23 2009-12-15 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7773195B2 (en) * 2005-11-29 2010-08-10 Asml Holding N.V. System and method to increase surface tension and contact angle in immersion lithography
KR100768849B1 (en) * 2005-12-06 2007-10-22 엘지전자 주식회사 Power supply system and method for grid-connected fuel cell system
US7420194B2 (en) * 2005-12-27 2008-09-02 Asml Netherlands B.V. Lithographic apparatus and substrate edge seal
US7839483B2 (en) * 2005-12-28 2010-11-23 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and a control system
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8045134B2 (en) 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US9477158B2 (en) * 2006-04-14 2016-10-25 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7969548B2 (en) * 2006-05-22 2011-06-28 Asml Netherlands B.V. Lithographic apparatus and lithographic apparatus cleaning method
US7656502B2 (en) * 2006-06-22 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2087392B1 (en) * 2006-09-07 2018-01-10 Leica Microsystems CMS GmbH Method of using an immersion objective
US8045135B2 (en) * 2006-11-22 2011-10-25 Asml Netherlands B.V. Lithographic apparatus with a fluid combining unit and related device manufacturing method
US9632425B2 (en) * 2006-12-07 2017-04-25 Asml Holding N.V. Lithographic apparatus, a dryer and a method of removing liquid from a surface
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7791709B2 (en) * 2006-12-08 2010-09-07 Asml Netherlands B.V. Substrate support and lithographic process
US8654305B2 (en) * 2007-02-15 2014-02-18 Asml Holding N.V. Systems and methods for insitu lens cleaning in immersion lithography
US8817226B2 (en) 2007-02-15 2014-08-26 Asml Holding N.V. Systems and methods for insitu lens cleaning using ozone in immersion lithography
US8011377B2 (en) * 2007-05-04 2011-09-06 Asml Netherlands B.V. Cleaning device and a lithographic apparatus cleaning method
US7866330B2 (en) * 2007-05-04 2011-01-11 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US7841352B2 (en) * 2007-05-04 2010-11-30 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US8947629B2 (en) * 2007-05-04 2015-02-03 Asml Netherlands B.V. Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
US20110051113A1 (en) * 2009-09-01 2011-03-03 Wei-Cheng Shiu Lithography system and optical module thereof
NL2005207A (en) * 2009-09-28 2011-03-29 Asml Netherlands Bv Heat pipe, lithographic apparatus and device manufacturing method.
MX2012007581A (en) * 2009-12-28 2012-07-30 Pioneer Hi Bred Int Sorghum fertility restorer genotypes and methods of marker-assisted selection.
EP2381310B1 (en) 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
ES2878548T3 (en) 2012-02-26 2021-11-19 Caliber Imaging & Diagnostics Inc Tissue specimen stage for an optical sectioning microscope
US11106140B2 (en) * 2019-07-16 2021-08-31 Taiwan Semiconductor Manufacturing Co., Ltd. Semiconductor apparatus and method of operating the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3081682A (en) * 1961-06-28 1963-03-19 Ibm Method and apparatus for obtaining and maintaining spacing of a transducer
GB1028511A (en) * 1961-07-28 1966-05-04 Ass Elect Ind Improvements in and relating to optical masers
GB1018294A (en) * 1961-10-09 1966-01-26 Secr Aviation Improvements in or relating to optical masers
US3194055A (en) * 1963-05-06 1965-07-13 Knobel Max Work dimension and position detecting, indicating and controlling method and apparatus
US3343459A (en) * 1964-11-30 1967-09-26 H G Weber And Company Inc Control system
GB1094833A (en) * 1965-09-24 1967-12-13 Burchell James Gladwyn Improvements in or relating to gauges
DE1472298A1 (en) * 1966-09-29 1969-03-13 Leitz Ernst Gmbh Arrangement for guiding the lens of an optical device

Also Published As

Publication number Publication date
GB1242527A (en) 1971-08-11
DE1803461A1 (en) 1969-05-22
US3648587A (en) 1972-03-14
FR1587123A (en) 1970-03-13

Similar Documents

Publication Publication Date Title
CH493861A (en) Process for controlling the distance between a photographic emulsion and an objective and instrument for carrying out this process
CH498389A (en) Method for determining the elementary particle size interval and apparatus for carrying out this method
CH531912A (en) Method for securing a blank to a support and device for implementing this method
CH517326A (en) Method for forming an electrostatic latent image, and apparatus for carrying out this method
CH534029A (en) Method for securing a blank to a base plate and apparatus for implementing this method
FR1515433A (en) Method for producing metallic images by photographic means
FR1490096A (en) Process for developing electrostatic latent images and devices for implementing this process
CH470216A (en) Method for spinning a billet and apparatus for implementing this method
CH420691A (en) Method for automatic character identification and apparatus for carrying out this method
FR1543704A (en) Optical method for determining the geometric defects of a surface of imposed shape, and device for implementing this method
FR1515867A (en) Method for the detection of small differences between a test object and a reference surface and apparatus for its implementation
FR1450234A (en) Process for obtaining negative photographic images from photosoluble emulsions
CH428437A (en) Photographic printing method and apparatus for carrying out this method
CH495475A (en) Method and apparatus for erecting a construction
CH482230A (en) Method for forming an image by photoelectrophoresis and apparatus for carrying out this method
CH483660A (en) Method for providing a film with a mark, apparatus for carrying out this method and film provided with a mark obtained by this method
CH444663A (en) Method for producing an image of a selected design using a lens, and apparatus for carrying out this method
FR1535243A (en) Process for the pretreatment of polyerylene glycolterephthalate film supports for casting photographic emulsions
FR1528397A (en) Stereoscopic photography method and apparatus for carrying out this method
FR86004E (en) Method for generating a curve and device for implementing this method
FR1351889A (en) A method of flattening a photographic film in a camera, and a combination of a camera and a photographic film clearly suitable for carrying out this method
FR1539936A (en) New process for regulating the hygrometry of an enclosure and new device for implementing this process
CH494951A (en) Method for determining the opacity of an object and apparatus for carrying out this method
CH412564A (en) Method for producing a photographic print and apparatus for carrying out this method
FR1532478A (en) Refrigeration process and apparatus for carrying out this process

Legal Events

Date Code Title Description
PL Patent ceased